KR950014027A - 이산화규소의 함량이 높은 형체와 그와같은 형체를 생산하는 과정 - Google Patents
이산화규소의 함량이 높은 형체와 그와같은 형체를 생산하는 과정 Download PDFInfo
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- KR950014027A KR950014027A KR1019940029261A KR19940029261A KR950014027A KR 950014027 A KR950014027 A KR 950014027A KR 1019940029261 A KR1019940029261 A KR 1019940029261A KR 19940029261 A KR19940029261 A KR 19940029261A KR 950014027 A KR950014027 A KR 950014027A
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- 238000000034 method Methods 0.000 title claims abstract 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract 7
- 235000012239 silicon dioxide Nutrition 0.000 title 1
- 239000000377 silicon dioxide Substances 0.000 title 1
- 239000011148 porous material Substances 0.000 claims abstract 6
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims abstract 4
- 239000000126 substance Substances 0.000 claims abstract 4
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract 3
- 230000003595 spectral effect Effects 0.000 claims abstract 2
- 238000001228 spectrum Methods 0.000 claims abstract 2
- 238000010438 heat treatment Methods 0.000 claims 3
- 238000005245 sintering Methods 0.000 claims 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 2
- 238000001816 cooling Methods 0.000 claims 2
- 239000007858 starting material Substances 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 230000007704 transition Effects 0.000 claims 1
- 238000010792 warming Methods 0.000 claims 1
- 230000017525 heat dissipation Effects 0.000 abstract 1
- 230000035939 shock Effects 0.000 abstract 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22C—FOUNDRY MOULDING
- B22C9/00—Moulds or cores; Moulding processes
- B22C9/12—Treating moulds or cores, e.g. drying, hardening
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
- Y10T428/1317—Multilayer [continuous layer]
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- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Metallurgy (AREA)
- Glass Melting And Manufacturing (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Silicon Compounds (AREA)
- Producing Shaped Articles From Materials (AREA)
- Glass Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
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Abstract
적어도 99.9%의 화학적 순도와 많아야 1%의 크리스토발라이트 할양을 가지며 가스가 스며들지 않는 무정형 이산화규소의 형체가 알려져 있다. 정밀도가 높고 크기가 작거나 클수 있고 모양이 단순하거나 복잡할수 있으며, 화학적 순도가 적어도 99.9%이고, 벽두께 1mm이상에서는 가스가 스며들지 않으며 높은 냉간 쏠림강도, 낮은 열전도성 및 낮은 방열성을 가지며 내열 충격성이 있고, 1000 내지 1300。C의 온도에 반복하며 또는 장기간 노출될수 있으며 접합선을 늘리지 않고 예리하게 윤곽을 그린 방법으로 용접될수 있고 자외선 영역에서 중간적외선 영역까지 낮은 스펙트럼 전도성을 갖는 무정형 이산화규소의 형체들을 제공하기 위하여 형체는 불전도성이고 구멍들을 함유하며 1mm의 벽두께에서는 λ=1900mm에서 λ=2650mm까지의 파장에서 사실상 일정한 직접스펙트럼전도성을 가지고 10%이하이며 또 적어도 2.15g/cm3의 밀도를 갖는다. 그와같은 형체들을 생산하는 과정을 제시한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (23)
- 불전도성 이고 기공들을 함유하며 λ=190mm에서 λ=2650mm까지의 파장에서 사실상 일정하고 10% 이하인 직접스펙트럼 전도성을 1mm의 벽두께에서 가지고 또 적어도 2.15g/cm3의 밀도을 갖는 무정형 이산화규소의 형체에 있어서, 적어도 99.9%의 화학적 순도와 많아야 1%의 크리스토발라이트 함량을 가지며 가스가 스며들지 않는 것을 특징으로 하는 형체.
- 제1항에 있어서, 기공들의 적어도 80%가 20㎛이하의 최대구멍 치수를 갖는것을 특징으로 하는 형체.
- 제1항 또는 제2항에 있어서, 기공함량이 0.5 내지 2.5%인것을 특징으로 하는 형체.
- 제1항 내지 제3항중 어느 항에 있어서, 1내지 100mm의 벽두께를 갖는 것을 특징으로 하는 형체.
- 제1항 내지 제4항중 어느항에 있어서, 오목한 물체의 형태를 갖는것을 특징으로 하는 형체.
- 제5항에 있어서, 플랜지의 형태를 갖는것을 특징으로 하는 형체.
- 제5항에 있어서, 도가니의 형체를 갖는것을 특징으로 하는 형체.
- 적어도 99.9%의 순도를 가지는 무정형 석영유리 개시물질이 70㎛ 이항의 입자 크기를 가지는 분말을 내기 위하여 분쇄되고 슬립이 준비되며, 상기 슬립은 녹색 형체를 생산하기 위하여 형체의 상당하는 다공 모울드에 집어 넣고 미리 정한 시간동안 그안에 남겨두며 모울드를 제거한후에는 녹색형체를 건조시키고 다음에는 용광로에서 1200°C 이상으로 가열한후 냉각시키는데 이러한 일들을 1mm의 벽두께에서의 직접스펙트럼 전도가 λ=190mm에서,λ=2650 μm까지의 파장에서 사실상 일정하고 10% 이하인 부전도성이고 기공을 함유하는 형체를 생산하기 위하여 슬립을 다공 모우드에 넣기전에 1 내지 240시간 계속적으로 운동시켜 안정 시키고 건조된 녹색형체를 5 내지 60K/min의 가열비율로 용광로에서 1350 내지 1450°C의 소결온도로 가열하고 적어도 40분간 1330°C의 온도에 노출시키고 소결된 형체를 5K/min 이상의 냉각 비율로 약 1000°C까지 냉각시키는 것으로 구성되는 무정형 이산화규소의 가스불 침투성 형체를 생산하는 과정에 있어서, 화학적 순도가 적어도 99.9%이고 크리스토발라이트 함량이 많아야 1%인 것을 특징으로 하는 과정.
- 제8항에 있어서, 모울드에 넣기전에 슬립을 감소된 압력을 간단하게 받게하는 것을 특징으로 하는 과정.
- 제8항 또는 제9항에 있어서, 슬립을 모울드에 집어 넣는 동안 및/ 또는 슬립을 모둘드에 남겨 두는 동안 압력 착이가 슬립의 자유표면과 슬립에 의하여 적어지지 않은 모울드의 바깥 표면간에 바깥 표면의 압력이 슬립의 자유 표면 압력보다 낮은 방법으로 유지되는 것을 특징으로 하는 과정.
- 제10항에 있어서, 0.8바아 이하의 압력이 모울등뢰 바깥 표면에 유지되는 특징으로 하는 과정.
- 제10항 또는 제11항에 있어서, 모울드가 기압보다 낮은 압력에서 유지되는 콘테이너에 삽입되는 것을 특징으로 하는 과정.
- 제8항 내지 제12항중 어느 한 항에 있어서, 슬립을 녹색형체를 형성하기 위하여 5내지 400분간 모울드에 남겨두는 것을 특징으로 하는 과정.
- 제8항 내지 제13항중 어느 한 항에 있어서, 녹색형체를 실온 내지 300°C로 가열하여 건조시키는 것을 특징으로 하는 과정.
- 제14항에 있어서, 온도가 300°C까지 단계적으로 증가하는 것을 특징으로 하는 과정.
- 제15항에 있어서, 온도단계가 100 내지 300°C의 범위에서 보다 100°C 이하의 온동 범위에서 작아지도록 선택되는 것을 특징으로 하는 과정.
- 제8항 내지 제16항중 어느 한 항에 있어서, '녹색 형체의 건조를 감소된 압력하에서 행하는 것을 특징으로 하는 과정.
- 제8항 내지 제17항중 어느 한 항에 있어서, 건조된 녹색 형체를 900 내지 1100°C의 온도에 30 내지 200분간 노출시키는 것을 특징으로 하는 과정.
- 제9항 내지 제18항중 어느 한 항에 있어서, 녹색 형체를 가열비율의 증가와 함께 증가되는 시간동안 소결온도에서 유지하는 것을 특징으로 하는 과정.
- 제8항 내지 제19항중 어느 한 항에 있어서, 녹색 형체를 고온소결하기 위하여 용광로에 산화분위기를 유지하는 것을 특징으로 하는 과정.
- 제8항 내지 제20항중 어느 한 항에 있어서, 얇고 거칠거칠한 소결표면층을 기계적으로 또는 불화수소산으로 간단히 처리하여 냉각된 형체로 부터 제거하는 것을 특징으로 하는 과정.
- 제8항 내지 제21항중 어느 한 항에 있어서, 모울의에 넣어진 슬립이 3내지 5의pH를 갖는 것을 특징으로 하는 과정.
- 제8항 내지 제21항중 어느 한 항에 있어서, 사용된 개시물질이 석영유리 파편인 것을 특징으로 하는 과정.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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Application Number | Priority Date | Filing Date | Title |
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DEP4338807.8 | 1993-11-12 | ||
DE4338807A DE4338807C1 (de) | 1993-11-12 | 1993-11-12 | Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper |
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KR950014027A true KR950014027A (ko) | 1995-06-15 |
KR100321284B1 KR100321284B1 (ko) | 2002-06-28 |
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KR1019940029261A KR100321284B1 (ko) | 1993-11-12 | 1994-11-09 | 높은이산화규소함량을갖는형상체및상기형상체의제조방법 |
KR1019960702414A KR100349412B1 (ko) | 1993-11-12 | 1994-11-10 | 석영유리성형체및그제조방법 |
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US (1) | US5736206A (ko) |
EP (1) | EP0653381B1 (ko) |
JP (2) | JP3241046B2 (ko) |
KR (2) | KR100321284B1 (ko) |
CN (1) | CN1066696C (ko) |
CA (1) | CA2135542C (ko) |
DE (4) | DE4338807C1 (ko) |
WO (1) | WO1995013248A1 (ko) |
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Publication number | Priority date | Publication date | Assignee | Title |
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1993
- 1993-11-12 DE DE4338807A patent/DE4338807C1/de not_active Expired - Lifetime
-
1994
- 1994-08-31 EP EP94113614A patent/EP0653381B1/de not_active Expired - Lifetime
- 1994-09-29 DE DE4434858A patent/DE4434858C2/de not_active Expired - Lifetime
- 1994-10-13 DE DE59404672T patent/DE59404672D1/de not_active Expired - Lifetime
- 1994-11-09 KR KR1019940029261A patent/KR100321284B1/ko not_active IP Right Cessation
- 1994-11-10 WO PCT/EP1994/003722 patent/WO1995013248A1/de active Application Filing
- 1994-11-10 KR KR1019960702414A patent/KR100349412B1/ko not_active IP Right Cessation
- 1994-11-10 US US08/640,759 patent/US5736206A/en not_active Expired - Lifetime
- 1994-11-10 JP JP51289695A patent/JP3241046B2/ja not_active Expired - Fee Related
- 1994-11-10 CA CA002135542A patent/CA2135542C/en not_active Expired - Fee Related
- 1994-11-10 DE DE4440104A patent/DE4440104C2/de not_active Expired - Lifetime
- 1994-11-10 JP JP27653794A patent/JP3763420B2/ja not_active Expired - Lifetime
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KR100321284B1 (ko) | 2002-06-28 |
DE4434858C2 (de) | 1997-05-22 |
DE4440104A1 (de) | 1995-05-18 |
KR100349412B1 (ko) | 2002-11-14 |
JPH07267724A (ja) | 1995-10-17 |
WO1995013248A1 (de) | 1995-05-18 |
DE4434858A1 (de) | 1995-05-18 |
US5736206A (en) | 1998-04-07 |
DE4440104C2 (de) | 1996-04-25 |
DE59404672D1 (de) | 1998-01-08 |
EP0653381B1 (de) | 1998-04-29 |
KR960705742A (ko) | 1996-11-08 |
CA2135542A1 (en) | 1995-05-13 |
CA2135542C (en) | 2007-10-23 |
JP3241046B2 (ja) | 2001-12-25 |
CN1066696C (zh) | 2001-06-06 |
DE4338807C1 (de) | 1995-01-26 |
EP0653381A1 (de) | 1995-05-17 |
JP3763420B2 (ja) | 2006-04-05 |
CN1105650A (zh) | 1995-07-26 |
JPH09506324A (ja) | 1997-06-24 |
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