KR960701236A - 필름 및 코우팅의 연소 화학적 증기 증착을 위한 방법 및 장치(method and apparatus for the combustion chemical vapor deposition of films and coatings) - Google Patents

필름 및 코우팅의 연소 화학적 증기 증착을 위한 방법 및 장치(method and apparatus for the combustion chemical vapor deposition of films and coatings) Download PDF

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KR960701236A
KR960701236A KR1019950704075A KR19950704075A KR960701236A KR 960701236 A KR960701236 A KR 960701236A KR 1019950704075 A KR1019950704075 A KR 1019950704075A KR 19950704075 A KR19950704075 A KR 19950704075A KR 960701236 A KR960701236 A KR 960701236A
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coating
support
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티이. 헌트 앤드류
케이. 코크란 조오
브렌트 카아터 윌리엄
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배리 로젠버어그
조오지아 테크 리서어치 코오포레이션
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
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    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
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Abstract

시약 및 부형제 용액을 함께 혼합하여 시약 혼합물을 형성하고, 시약 혼합물을 점화하여 불꽃을 발생시키거나, 시약이 적어도 부분적으로는 증기상으로 증기화되는 플라즈마 토오치를 통해 시약 혼합물을 유동시키고, 상기 시약의 증기상을 지지체에 접촉시켜, 지지체상에 바람직한 배향을 가지도록 조절될 수 있는 상기 시약의 코우팅의 (적어도 일부분은 증기상으로부터의) 증착을 초래함으로써 지지체로 코우팅을 적용하는 방법, 및 상기 방법을 수행하는 장치, 상기 도면은 지지체(22)를 내부 불꽃(18a) 내지 외부 불꽃(18b) 사이에 Smithell 분리기(30)의 환원 영역(32)내 위치시킬 수 있는 CCVD 장치의 개략도를 나타낸다.

Description

필름 및 코우팅의 연소 화학적 증기 증착을 위한 방법 및 장치(METHOD AND APPARATUS FOR THE COMBUSTION CHEMICAL VAPOR DEPOSITION OF FILMS AND COATINGS)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 연소 화학 증기 증착 장치의 개략도.

Claims (43)

  1. 하기 단계로 구성되는 화학적 증기 증착을 사용하여 지지체에 코우팅을 적용하는 방법: (a) 코우팅될 하나 이상의 표면을 갖는 지지체를 제공하는 단계; (b) 시약 및 부형제 용액을 선택하고 상기 시약 및 상기 부형재 용액을 함께 혼합하여 시약 혼합물을 형성하는 단계; (c) 연소 수단을 제공하는 단계; (d) 상기 시약 혼합물을 상기 연소 수단에 혼입시키고, 상기 시약 혼합물을 연소시켜 불꽃을 발생시키고 적어도 상기 시약의 일부를 증기상으로 증기화시키는 단계; 및 (e) 상기 시약의 상기 증기상을 상기 지지체와 접촉시켜 상기 지지체상에 코우팅의 상기 증기상의 증착을 초래하는 단계.
  2. 제1항에 있어서, 산화제를 상기 연소 수단에 공급하여 상기 시약 혼합물의 연소를 돕는 방법.
  3. 제2항에 있어서, 상기 코우팅이 결정형 무기 필름인 방법.
  4. 제2항에 있어서, 상기 시약 혼합물이 액체 용액이고, 상기 코우팅이 비-결정형 무기 필름인 방법.
  5. 제2항에 있어서, 상기 시약 혼합물이 가연성인 방법.
  6. 제3항에 있어서, 가연송 연료를 상기 연소 수단에 공급하여 상기 시약 혼합물의 상기 연소에 연료를 공급하는 방법.
  7. 제4항에 있어서, 가연성 연료를 상기 경소 수단에 공급하여 상기 시약 혼합물의 상기 연소에 연료를 공급하는 방법.
  8. 제3항에 있어서, 상기 부형제 용액이 유기 용매인 방법.
  9. 제4항에 있어서, 상기 부형제 용액이 유기 용매인 방법.
  10. 제3항에 있어서, 상기 시약이 기체상, 증기상 또는 액상이며, 상기 부형제 용액이 기체상, 증기상 또는 액상인 방법.
  11. 제4항에 있어서, 상기 시약이 기체상, 증기상 또는 액상이며, 상기 부형제 용액이 기체상, 증기상 또는 액상인 방법.
  12. 제10항에 있어서, 상기 시약 혼합물이 액체 용액이며, 상기 증기상이 본질적으로 상기 시약의 증기로 구성되는 방법.
  13. 제12항에 있어서, 상기 코우팅이 증착되고 스프레이 열분해 증착된 상기 시약의 필름으로 구성되는 방법.
  14. 제13항에 있어서, 상기 코우팅이 본질적으로 스프레이 열분해 증착된 상기 시약의 필름으로 구성되는 방법.
  15. 제8항에 있어서, 상기 시약 혼합물이 상기 시약의 고체 입자로 구성된 액체 용액이며, 상기 증기는 상기 시약의 증기 및 상기 시약의 고체 입자로 구성되는 방법.
  16. 제12항에 있어서, 상기 코오팅이 본질적으로 상기 시약으로 구성된 비균질하게 핵생성된 필름인 방법.
  17. 제15항에 있어서, 상기 코우팅이 상기 시약의 고체 입자 및 상기 시약으로 구성된 필름인 방법.
  18. 제17항에 있어서, 상기 코우팅이 약 50부피% 미만의 상기 고체로 구성되는 방법.
  19. 제8항에 있어서, 상기 코우팅이 두께가 약 1000 미크론 미만인 방법.
  20. 제19항에 있어서, 상기 코우팅이 상기 두께가 약 100 미크론 미만인 방법.
  21. 제1항에 있어서, 상기 지지체가 거의 상기 시약 혼합물의 연소로 발생된 연소열로 가열되는 방법.
  22. 제1항에 있어서, 상기 지지체가 거의 이차 열원으로 가열되는 방법.
  23. 제8항에 있어서, 상기 코우팅이 산화되는 고온 환경에서 안정한 방법.
  24. 제8항에 있어서, 상기 코우팅이 산화하는 고온 환경에서 안정하지 않은 방법.
  25. 제23항에 있어서, 시악 시약이 금속유기 화합물로 구성된 군으로부터 선택되는 방법.
  26. 제24항에 있어서, 부가의 반응물을 상기 연소 수단의 상기 불꽃 바로 위에 공급하는 방법.
  27. 제8항에 있어서, 상기 시약 혼합물이 부가로 상기 코우팅과 함께 상기 지지체 상에 부착된 비-반응성 입자로 구성되는 방법.
  28. 제27항에 있어서, 상기 비-반응성 입자가 상기 지지체에 부딪힐 때 용융되는 방법.
  29. 제1항에 있어서, 상기 불꽃이 약 300℃내지 2800℃사이의 온도를 가지며, 상기 지지체가 약 100℃ 내지 2200℃사이의 표면 온도를 가지며, 상기 증착이 약 10 torr 내지 10,000 torr 사이의 압력에서 발생하는 방법.
  30. 제29항에 있어서, 상기 코우팅이 약 0.1㎛/hr-1000㎛/hr 사이의 증착 속도로 상기 지지체 상에 증착되는 방법.
  31. 제30항에 있어서, 상기 지지체가 약 400℃내지 1300℃사이의 표면 온도를 가지는 방법.
  32. 제4항에 있어서, 상기 코우팅이 두께가 약 1밀리미터 미만인 방법.
  33. 제32항에 있어서, 상기 불꽃이 약 300℃ 내지 2800℃ 사이의 온도를 가지며, 상기 지지체가 약 100℃내지 1500℃ 사이의 표면 온도를 가지며, 상기 증착이 약 10 tor 내지 10,000 torr 사이의 압력에서 발생하는 방법.
  34. 제33항에 있어서, 상기 코우팅이 약 0.1㎛/hr-1000㎛/hr 사이의 증착 속도로 상기 지지체 상에 증착되는 방법.
  35. 제34항에 있어서, 상기 지지체가 약 400 내지 1300℃사이의 표면 온도를 가지는 방법.
  36. 하기 단계로 구성되는 화학적 증기 증착을 사용하여 지지체에 코우팅을 적용하는 방법: (a) 코우팅될 하나 이상의 표면을 갖는 지지체를 제공하는 단계; (b) 시약 및 부형제 용액을 선택하고 상기 시약 및 상기 부형제 용액을 함께 혼합하여 시약 혼합물을 형성하는 단계; (c) 플라즈마 생산 수단을 제공하는 단계; (d) 상기 시약 혼합물을 상기 플라즈마 생산 수단에 혼입시킴으로써 적어도 상기 시약의 일부를 플라즈마 증기상으로 증기화시키는 단계; 및 (e) 상기 시약의 상기 플라즈마 증기상을 상기 지지체와 접촉시켜 상기 지지체 상에 코우팅의 상기 플라즈마 증기상의 증착을 초래하는 단계.
  37. 제36항에 있어서, 상기 시약이 기체상, 증기상 또는 액상이며, 상기 부형제 용액이 기체상, 증기상 또는 액상인 방법.
  38. 제37항에 있어서, 상기 시약 혼합물이 액체 용액이며, 상기 플라즈마 증기상이 본질적으로 상기 시약의 증기로 구성되는 방법.
  39. 제38항에 있어서, 상기 플라즈마 증기상이 약 800℃ 내지 3500℃ 사이의 온도를 가지는 방법.
  40. 불꽃을 사용하는 주변 조건하에 연소 화학적 증기 증착을 사용하여 지지체에 코우팅을 적용하는 장치로서 하기로 구성되는 장치; (a) 연소 수단; (b) 상기 연소수단에 시약 혼합물을 공급하는 공급 수단; (c) 상기 시약 혼합물을 점화시키는 점화 수단; (d) 지지체를 사익 연소 수단에 아주 인접하게 지지시킴으로써 상기 지지체가 상기 시약 혼합물을 점화시켜 초래되는 연소 생산물이 통과하는 영역내에 지지되는 지지 수단.
  41. 제40항에 있어서, 부가로 상기 연소 수단에 산화제를 공급하는 수단으로 구성되는 장치.
  42. 불꽃을 사용하는 주변 조건하에 연소 화학적 증기 증착과 함께 사용하기 위한 지지체에 무기 산화물 코우팅을 적용하는 장치로서, 가연성 시약 혼합물을 보유하는 보유 수단, 상기 보유 수단으로부터 상기 시약 혼합물을 방출시키는 출구 수단, 상기 출구 수단을 통해 상기 보유 수단으로부터 상기 시약 혼합물을 추진시키는 추진수단, 및 상기 시약 혼합물을 점화시키는 점화 수단으로 구성되는 장치.
  43. 제42항에 있어서, 상기 장치가 한 사람이 손에 잡고 사용할 수 있는 크기 및 구조인 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950704075A 1993-03-24 1994-03-24 필름및코우팅의연소화학적증기증착을위한방법 KR100323216B1 (ko)

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Families Citing this family (114)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5858465A (en) * 1993-03-24 1999-01-12 Georgia Tech Research Corporation Combustion chemical vapor deposition of phosphate films and coatings
US5997956A (en) * 1995-08-04 1999-12-07 Microcoating Technologies Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions
CA2237588A1 (en) 1995-11-13 1997-05-22 The University Of Connecticut Nanostructured feeds for thermal spray
US6447848B1 (en) * 1995-11-13 2002-09-10 The United States Of America As Represented By The Secretary Of The Navy Nanosize particle coatings made by thermally spraying solution precursor feedstocks
JP2999751B2 (ja) * 1997-06-27 2000-01-17 三星電子株式会社 シリカ膜の製造装置及びその製造方法
US7575784B1 (en) 2000-10-17 2009-08-18 Nanogram Corporation Coating formation by reactive deposition
US20090075083A1 (en) * 1997-07-21 2009-03-19 Nanogram Corporation Nanoparticle production and corresponding structures
US20060147369A1 (en) * 1997-07-21 2006-07-06 Neophotonics Corporation Nanoparticle production and corresponding structures
US6919054B2 (en) * 2002-04-10 2005-07-19 Neophotonics Corporation Reactant nozzles within flowing reactors
US6952504B2 (en) * 2001-12-21 2005-10-04 Neophotonics Corporation Three dimensional engineering of planar optical structures
US6788866B2 (en) 2001-08-17 2004-09-07 Nanogram Corporation Layer materials and planar optical devices
US6368665B1 (en) * 1998-04-29 2002-04-09 Microcoating Technologies, Inc. Apparatus and process for controlled atmosphere chemical vapor deposition
US6329899B1 (en) 1998-04-29 2001-12-11 Microcoating Technologies, Inc. Formation of thin film resistors
US6210592B1 (en) 1998-04-29 2001-04-03 Morton International, Inc. Deposition of resistor materials directly on insulating substrates
US6208234B1 (en) 1998-04-29 2001-03-27 Morton International Resistors for electronic packaging
US6193911B1 (en) 1998-04-29 2001-02-27 Morton International Incorporated Precursor solution compositions for electronic devices using CCVD
US6214473B1 (en) 1998-05-13 2001-04-10 Andrew Tye Hunt Corrosion-resistant multilayer coatings
EP0960955A1 (en) * 1998-05-26 1999-12-01 Universiteit Gent Method and apparatus for flame spraying to form a tough coating
US6207522B1 (en) 1998-11-23 2001-03-27 Microcoating Technologies Formation of thin film capacitors
DE19858701C2 (de) * 1998-12-18 2001-06-21 Mtu Aero Engines Gmbh Verfahren zur Herstellung einer Wärmedämmschicht
US6579805B1 (en) * 1999-01-05 2003-06-17 Ronal Systems Corp. In situ chemical generator and method
TW511105B (en) * 1999-03-11 2002-11-21 Murata Manufacturing Co Method of firing magnetic core
US20030078499A1 (en) * 1999-08-12 2003-04-24 Eppstein Jonathan A. Microporation of tissue for delivery of bioactive agents
US6372364B1 (en) 1999-08-18 2002-04-16 Microcoating Technologies, Inc. Nanostructure coatings
US6388230B1 (en) * 1999-10-13 2002-05-14 Morton International, Inc. Laser imaging of thin layer electronic circuitry material
US6212078B1 (en) 1999-10-27 2001-04-03 Microcoating Technologies Nanolaminated thin film circuitry materials
BR0016782A (pt) * 1999-12-29 2005-01-11 Microcoating Technologies Processo de deposição de vapor quìmico e revestimentos produzidos a partir deste
AU2001270245A1 (en) * 2000-06-30 2002-01-14 Microcoating Technologies, Inc. Method of depositing materials
WO2002004552A1 (en) * 2000-07-06 2002-01-17 Commonwealth Scientific And Industrial Research Organisation A process for modifying the surface of a substrate containing a polymeric material by means of vaporising the surface modifying agent
AUPQ859000A0 (en) * 2000-07-06 2000-07-27 Commonwealth Scientific And Industrial Research Organisation Apparatus for surface engineering
US6475316B1 (en) 2000-07-07 2002-11-05 3M Innovative Properties Company Methods of enhancing adhesion
EP1307340A4 (en) * 2000-07-14 2007-05-30 Ngimat Co CRYSTALLINE THIN FINISHING FILM WITH REDUCED GRAIN BORDER
US20050191515A1 (en) * 2000-07-20 2005-09-01 Shipley Company, L.L.C. Very low thermal expansion composite
US6986955B2 (en) * 2000-08-03 2006-01-17 Ngimat Co. Electronic and optical materials
EP1333935A4 (en) * 2000-10-17 2008-04-02 Nanogram Corp PREPARATION OF A COAT BY REACTIVE DEPOSITION
AU2002239458A1 (en) * 2000-10-26 2002-06-11 Nanogram Corporation Multilayered optical structures
US6620520B2 (en) * 2000-12-29 2003-09-16 Lam Research Corporation Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
EP1251530A3 (en) * 2001-04-16 2004-12-29 Shipley Company LLC Dielectric laminate for a capacitor
US6917511B1 (en) 2001-08-14 2005-07-12 Neophotonics Corporation Reactive deposition for the formation of chip capacitors
US20060127599A1 (en) * 2002-02-12 2006-06-15 Wojak Gregory J Process and apparatus for preparing a diamond substance
AU2003215291A1 (en) * 2002-02-19 2003-09-09 Tal Materials Mixed-metal oxide particles by liquid feed flame spray pyrolysis of oxide precursors in oxygenated solvents
US9918665B2 (en) 2002-03-11 2018-03-20 Nitto Denko Corporation Transdermal porator and patch system and method for using same
ES2701884T3 (es) * 2002-03-11 2019-02-26 Nitto Denko Corp Sistema de parche de administración transdérmica de fármacos
US8116860B2 (en) 2002-03-11 2012-02-14 Altea Therapeutics Corporation Transdermal porator and patch system and method for using same
EP1565930A2 (en) 2002-11-08 2005-08-24 Advanced Lighting Technologies, Inc. Barrier coatings and methods in discharge lamps
US20040185346A1 (en) * 2003-03-19 2004-09-23 Takeuchi Esther S. Electrode having metal vanadium oxide nanoparticles for alkali metal-containing electrochemical cells
US7375035B2 (en) 2003-04-29 2008-05-20 Ronal Systems Corporation Host and ancillary tool interface methodology for distributed processing
JP4541900B2 (ja) * 2003-05-20 2010-09-08 アイトゲネシッシェ テヒニッシェ ホーホシューレ チューリッヒ ナノ粒子製造用金属供給システム
US8865271B2 (en) * 2003-06-06 2014-10-21 Neophotonics Corporation High rate deposition for the formation of high quality optical coatings
US7521097B2 (en) * 2003-06-06 2009-04-21 Nanogram Corporation Reactive deposition for electrochemical cell production
US7429714B2 (en) * 2003-06-20 2008-09-30 Ronal Systems Corporation Modular ICP torch assembly
US7390535B2 (en) * 2003-07-03 2008-06-24 Aeromet Technologies, Inc. Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
US8016811B2 (en) 2003-10-24 2011-09-13 Altea Therapeutics Corporation Method for transdermal delivery of permeant substances
US7387816B2 (en) 2003-12-15 2008-06-17 Guardian Industries Corp. Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD
CN1942396B (zh) * 2004-03-15 2010-09-01 苏黎世联合高等工业学校 金属盐纳米颗粒，特别是包含钙和磷酸根的纳米颗粒的火焰合成
EP1614720A1 (en) * 2004-06-28 2006-01-11 Ensci Incorporated Process for producing thin film metal non-oxide coated powder substrates and products produced therefrom
US7909263B2 (en) * 2004-07-08 2011-03-22 Cube Technology, Inc. Method of dispersing fine particles in a spray
US7455883B2 (en) * 2004-10-19 2008-11-25 Guardian Industries Corp. Hydrophilic DLC on substrate with flame pyrolysis treatment
US20060110605A1 (en) * 2004-11-24 2006-05-25 Guardian Industries Corp. Hydrophilic coating and method of making same
US8088440B2 (en) * 2004-11-24 2012-01-03 Guardian Industries Corp. Hydrophobic coating including underlayer(s) deposited via flame pyrolysis
US20060107599A1 (en) * 2004-11-24 2006-05-25 Guardian Industries Corp. Flush-mounted slider window for pick-up truck with hydrophilic coating on interior surface thereof, and method of making same
US7597938B2 (en) * 2004-11-29 2009-10-06 Guardian Industries Corp. Method of making coated article with color suppression coating including flame pyrolysis deposited layer(s)
US20060124046A1 (en) * 2004-12-09 2006-06-15 Honeywell International, Inc. Using thin film, thermal batteries to provide security protection for electronic systems
US20100151130A1 (en) * 2004-12-10 2010-06-17 Koninklijke Philips Electronics, N.V. Combustion chemical vapor deposition on temperature-sensitive substrates
CN101072895A (zh) * 2004-12-10 2007-11-14 皇家飞利浦电子股份有限公司 用于燃烧化学气相沉积的基板温度控制
US7491431B2 (en) * 2004-12-20 2009-02-17 Nanogram Corporation Dense coating formation by reactive deposition
WO2006084390A1 (en) * 2005-02-11 2006-08-17 Eth Zurich Antimicrobial and antifungal powders made by flame spray pyrolysis
US20060246218A1 (en) * 2005-04-29 2006-11-02 Guardian Industries Corp. Hydrophilic DLC on substrate with barrier discharge pyrolysis treatment
US7402826B2 (en) * 2005-05-13 2008-07-22 Honeywell International Inc. System and method for non-destructively determining thickness and uniformity of anti-tamper coatings
US20060275542A1 (en) * 2005-06-02 2006-12-07 Eastman Kodak Company Deposition of uniform layer of desired material
ITMI20051308A1 (it) * 2005-07-11 2007-01-12 Milano Politecnico Metodo e reattore per crescere cristalli
US7189335B1 (en) * 2005-08-31 2007-03-13 Honeywell International Inc. Conformal coverings for electronic devices
JP5319288B2 (ja) * 2005-10-17 2013-10-16 ナショナル・リサーチ・カウンシル・オブ・カナダ 被膜および粉末の反応性噴射形成
US20070113881A1 (en) * 2005-11-22 2007-05-24 Guardian Industries Corp. Method of making solar cell with antireflective coating using combustion chemical vapor deposition (CCVD) and corresponding product
KR100742857B1 (ko) 2005-12-26 2007-07-25 주식회사 포스코 젖음성이 우수한 실리콘 산화피막의 연소화학 기상증착방법
US7427577B2 (en) * 2006-04-06 2008-09-23 Nanocerox Inc Sintered polycrystalline terbium aluminum garnet and use thereof in magneto-optical devices
DE102006029617A1 (de) * 2006-06-23 2007-12-27 Verein zur Förderung von Innovationen durch Forschung, Entwicklung und Technologietransfer e.V. (Verein INNOVENT e.V.) Verfahren zur Modifizierung der Oberflächeneigenschaften von Glas
DE102006045617B4 (de) * 2006-09-22 2010-06-10 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung einer anorganisch-anorganischen Gradientenverbundschicht
US20100120576A1 (en) * 2007-03-29 2010-05-13 Masanori Satou Planetary gear device
CN101680091A (zh) * 2007-06-15 2010-03-24 纳克公司 反应性气流沉积和无机箔的合成
WO2009007745A1 (en) * 2007-07-06 2009-01-15 Pilkington Group Limited Deposition process
US8105649B1 (en) 2007-08-09 2012-01-31 Imaging Systems Technology Fabrication of silicon carbide shell
EP2190577A4 (en) * 2007-08-31 2011-06-22 Univ Washington SYNTHESIS OF NANOSTRUCTURED PHOTOACTIVE FILMS WITH CONTROLLED MORPHOLOGY WITH THE HELP OF A FLAMMEDAEROSOL REACTOR
US7655274B2 (en) * 2007-11-05 2010-02-02 Guardian Industries Corp. Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings
US7923063B2 (en) 2007-12-10 2011-04-12 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) Method of making glass including surface treatment with aluminum chloride using combustion deposition prior to deposition of antireflective coating
US8563097B2 (en) 2007-12-17 2013-10-22 Guardian Industries Corp. Remote combustion deposition burner and/or related methods
US8440256B2 (en) * 2007-12-17 2013-05-14 Guardian Industries Corp. Combustion deposition of metal oxide coatings deposited via infrared burners
US8414970B2 (en) * 2008-02-15 2013-04-09 Guardian Industries Corp. Organosiloxane inclusive precursors having ring and/or cage-like structures for use in combustion deposition
US8795773B2 (en) 2008-03-13 2014-08-05 Guardian Industries Corp. Nano-particle loaded metal oxide matrix coatings deposited via combustion deposition
US20090233105A1 (en) * 2008-03-13 2009-09-17 Remington Jr Michael P Composite coatings comprising hollow and/or shell like metal oxide particles deposited via combustion deposition
US20090233088A1 (en) * 2008-03-13 2009-09-17 Lewis Mark A In situ nano-particle matrix loading of metal oxide coatings via combustion deposition
US8197908B2 (en) * 2008-03-14 2012-06-12 Hestia Tec, Llc Method for preparing electrically conducting materials
US20090274930A1 (en) * 2008-04-30 2009-11-05 Guardian Industries Corp. Alkaline earth fluoride coatings deposited via combustion deposition
US8231730B2 (en) 2008-06-09 2012-07-31 Guardian Industries Corp. Combustion deposition burner and/or related methods
US20090311423A1 (en) * 2008-06-12 2009-12-17 Guardian Industries Corp. Surface-assisted combustion deposition deposited coatings, and/or methods of making the same
US8003164B2 (en) * 2008-09-19 2011-08-23 Guardian Industries Corp. Method of making a scratch-and etch-resistant coated glass article
EP2192091A1 (en) * 2008-12-01 2010-06-02 ETH Zurich Process for providing super-hydrophilic properties to a substrate
US8329071B2 (en) * 2008-12-08 2012-12-11 Hestia Tec, Llc Multicomponent nanoparticle materials and process and apparatus therefor
US20100203287A1 (en) * 2009-02-10 2010-08-12 Ngimat Co. Hypertransparent Nanostructured Superhydrophobic and Surface Modification Coatings
US20110086178A1 (en) * 2009-10-14 2011-04-14 General Electric Company Ceramic coatings and methods of making the same
US20110159199A1 (en) * 2009-12-28 2011-06-30 Guardian Industries Corp. Large area combustion deposition line, and associated methods
US9637820B2 (en) * 2009-12-28 2017-05-02 Guardian Industries Corp. Flame guard and exhaust system for large area combustion deposition line, and associated methods
JP5427680B2 (ja) * 2010-04-14 2014-02-26 株式会社金陽社 有機薄膜太陽電池の製造方法
JP5612425B2 (ja) * 2010-10-01 2014-10-22 大阪瓦斯株式会社 粉粒体加熱装置
JP2012107318A (ja) * 2010-10-25 2012-06-07 Koba Technology:Kk 基材の表面改質方法及びその装置
GB201108244D0 (en) 2011-05-17 2011-06-29 Pilkington Group Ltd Burner for flame coating
US9264150B2 (en) 2012-03-28 2016-02-16 Globalfoundries Inc. Reactive metal optical security device and methods of fabrication and use
CA2872318A1 (en) 2012-06-23 2013-12-27 Frito-Lay North America, Inc. Deposition of ultra-thin inorganic oxide coatings on packaging
CN104395493B (zh) 2012-06-23 2017-08-25 福瑞托-雷北美有限公司 超薄无机氧化物涂层在包装上的沉积
FR3011545B1 (fr) * 2013-10-09 2018-01-12 Saint-Gobain Glass France Procede de formation d'une couche de verre colore sur un substrat verrier par pyrolyse a la flamme
US10533264B1 (en) 2015-12-02 2020-01-14 General Graphene Corp. Apparatus for producing graphene and other 2D materials
WO2017160121A1 (ko) * 2016-03-18 2017-09-21 주식회사 엘지화학 폴리실리콘 제조를 위한 초고온 석출 공정
WO2020210718A1 (en) * 2019-04-10 2020-10-15 New Mexico Tech University Research Park Corporation Solid particle aerosol generator
CN116396064B (zh) * 2023-03-29 2024-02-02 昆明理工大学 一种喷雾热解沉积制备氧化铝基复合材料复杂形状磨粒的方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3642521A (en) * 1969-10-27 1972-02-15 Texas Instruments Inc Production of metal oxides
US3849057A (en) * 1970-12-14 1974-11-19 Peck Co C Jet flame cleaning and coating apparatus and method
US3883336A (en) * 1974-01-11 1975-05-13 Corning Glass Works Method of producing glass in a flame
US4173305A (en) * 1978-03-10 1979-11-06 Corning Glass Works System for delivering materials to deposition site on optical waveguide blank
US4591825A (en) * 1983-08-22 1986-05-27 Trw Inc. Analog-to-digital-converter and related encoding technique
JPS60108338A (ja) * 1983-11-15 1985-06-13 Nippon Telegr & Teleph Corp <Ntt> 光フアイバ母材の製造方法
JPS62288842A (ja) * 1986-06-09 1987-12-15 Tosoh Corp フオトマスク，レチクルの保護防塵体
US5275798A (en) * 1986-07-11 1994-01-04 Kyocera Corporation Method for producing diamond films
EP0252755A1 (en) * 1986-07-11 1988-01-13 Unvala Limited Chemical vapour deposition
CA1332324C (en) * 1987-03-30 1994-10-11 Jun Shioya Method for producing thin film of oxide superconductor
JPH0280303A (ja) * 1987-06-04 1990-03-20 Tonen Corp 超伝導体薄膜の形成方法及びその為の装置
US4822466A (en) * 1987-06-25 1989-04-18 University Of Houston - University Park Chemically bonded diamond films and method for producing same
JPH01212220A (ja) * 1987-10-09 1989-08-25 Fujitsu Ltd 超伝導材料の気相成長方法
JPH01115857A (ja) * 1987-10-13 1989-05-09 Dow Corning Corp 超電導物質の製造方法
US5034372A (en) * 1987-12-07 1991-07-23 Mitsubishi Denki Kabushiki Kaisha Plasma based method for production of superconductive oxide layers
JPH01246116A (ja) * 1988-03-29 1989-10-02 Natl Inst For Res In Inorg Mater 針状，繊維状，多孔質状ダイヤモンドまたはそれらの集合体の製造法
JPH07106898B2 (ja) * 1988-06-01 1995-11-15 株式会社フジクラ 酸化物系超電導体の製造方法
US5178905A (en) * 1988-11-24 1993-01-12 Canon Kabushiki Kaisha Process for the formation of a functional deposited film by hydrogen radical-assisted cvd method utilizing hydrogen gas plasma in sheet-like state
US5021399A (en) * 1989-03-10 1991-06-04 Microelectronics & Computer Technology Corp. Spray pyrolysis process for preparing superconductive films
US4994420A (en) * 1989-10-12 1991-02-19 Dow Corning Corporation Method for forming ceramic materials, including superconductors
US5108983A (en) * 1989-11-21 1992-04-28 Georgia Tech Research Corporation Method for the rapid deposition with low vapor pressure reactants by chemical vapor deposition
US5215788A (en) * 1990-07-06 1993-06-01 Kabushiki Kaisha Toyota Chuo Kenkyusho Combustion flame method for forming diamond films
US5174983A (en) * 1990-09-24 1992-12-29 The United States Of America, As Represented By The Secretary Of The Navy Flame or plasma synthesis of diamond under turbulent and transition flow conditions
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
US5715788A (en) * 1996-07-29 1998-02-10 Cummins Engine Company, Inc. Integrated fuel injector and ignitor assembly

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EP0689618B1 (en) 2003-02-26
JP3519406B2 (ja) 2004-04-12
US6013318A (en) 2000-01-11
DE69432175T2 (de) 2004-03-04
EP0689618A4 (en) 1998-01-21
CA2158568A1 (en) 1994-09-29
AU6415294A (en) 1994-10-11
EP0689618A1 (en) 1996-01-03
US5863604A (en) 1999-01-26
DE69432175D1 (de) 2003-04-03
ATE233327T1 (de) 2003-03-15
ES2193156T3 (es) 2003-11-01
JPH08511062A (ja) 1996-11-19
CA2158568C (en) 2001-12-04
US5652021A (en) 1997-07-29
KR100323216B1 (ko) 2002-07-03
WO1994021841A1 (en) 1994-09-29

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