KR960025345U - 반도체 장치의 포토레지스트 제거장치. - Google Patents

반도체 장치의 포토레지스트 제거장치.

Info

Publication number
KR960025345U
KR960025345U KR2019940032932U KR19940032932U KR960025345U KR 960025345 U KR960025345 U KR 960025345U KR 2019940032932 U KR2019940032932 U KR 2019940032932U KR 19940032932 U KR19940032932 U KR 19940032932U KR 960025345 U KR960025345 U KR 960025345U
Authority
KR
South Korea
Prior art keywords
semiconductor devices
removal device
photoresist removal
photoresist
semiconductor
Prior art date
Application number
KR2019940032932U
Other languages
English (en)
Other versions
KR0118361Y1 (ko
Inventor
신봉철
Original Assignee
엘지반도체 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체 주식회사 filed Critical 엘지반도체 주식회사
Priority to KR2019940032932U priority Critical patent/KR0118361Y1/ko
Publication of KR960025345U publication Critical patent/KR960025345U/ko
Application granted granted Critical
Publication of KR0118361Y1 publication Critical patent/KR0118361Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019940032932U 1994-12-06 1994-12-06 반도체 장치의 포토레지스트 제거장치. KR0118361Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940032932U KR0118361Y1 (ko) 1994-12-06 1994-12-06 반도체 장치의 포토레지스트 제거장치.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940032932U KR0118361Y1 (ko) 1994-12-06 1994-12-06 반도체 장치의 포토레지스트 제거장치.

Publications (2)

Publication Number Publication Date
KR960025345U true KR960025345U (ko) 1996-07-22
KR0118361Y1 KR0118361Y1 (ko) 1998-06-01

Family

ID=19400436

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940032932U KR0118361Y1 (ko) 1994-12-06 1994-12-06 반도체 장치의 포토레지스트 제거장치.

Country Status (1)

Country Link
KR (1) KR0118361Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010034043A (ko) * 1998-11-12 2001-04-25 다니구찌 이찌로오 포토레지스트막 제거방법 및 이를 위한 장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010034043A (ko) * 1998-11-12 2001-04-25 다니구찌 이찌로오 포토레지스트막 제거방법 및 이를 위한 장치

Also Published As

Publication number Publication date
KR0118361Y1 (ko) 1998-06-01

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