DE69809694T2 - Halbleiteranordnung - Google Patents

Halbleiteranordnung

Info

Publication number
DE69809694T2
DE69809694T2 DE69809694T DE69809694T DE69809694T2 DE 69809694 T2 DE69809694 T2 DE 69809694T2 DE 69809694 T DE69809694 T DE 69809694T DE 69809694 T DE69809694 T DE 69809694T DE 69809694 T2 DE69809694 T2 DE 69809694T2
Authority
DE
Germany
Prior art keywords
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69809694T
Other languages
English (en)
Other versions
DE69809694D1 (de
Inventor
Yasuo Yamguchi
Takashi Ippooshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of DE69809694D1 publication Critical patent/DE69809694D1/de
Publication of DE69809694T2 publication Critical patent/DE69809694T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203—Particular design considerations for integrated circuits
    • H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203—Particular design considerations for integrated circuits
    • H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
DE69809694T 1997-10-09 1998-04-17 Halbleiteranordnung Expired - Fee Related DE69809694T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27713397A JP4054093B2 (ja) 1997-10-09 1997-10-09 半導体装置

Publications (2)

Publication Number Publication Date
DE69809694D1 DE69809694D1 (de) 2003-01-09
DE69809694T2 true DE69809694T2 (de) 2003-07-10

Family

ID=17579260

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69809694T Expired - Fee Related DE69809694T2 (de) 1997-10-09 1998-04-17 Halbleiteranordnung

Country Status (6)

Country Link
US (1) US6274908B1 (de)
EP (2) EP1267407A3 (de)
JP (1) JP4054093B2 (de)
KR (1) KR100298983B1 (de)
DE (1) DE69809694T2 (de)
TW (1) TW388128B (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6137143A (en) * 1998-06-30 2000-10-24 Intel Corporation Diode and transistor design for high speed I/O
FR2803099B1 (fr) * 1999-12-22 2002-08-16 St Microelectronics Sa Dispositif de protection d'une structure soi
DE10014384B4 (de) * 2000-03-23 2005-11-03 Infineon Technologies Ag Mittels Feldeffekt steuerbare Halbleiteranordnung mit lateral verlaufender Kanalzone
TW441074B (en) * 2000-04-15 2001-06-16 United Microelectronics Corp Electrostatic discharge protection circuit structure for high voltage device
TW446192U (en) * 2000-05-04 2001-07-11 United Microelectronics Corp Electrostatic discharge protection circuit
DE10022367C2 (de) * 2000-05-08 2002-05-08 Micronas Gmbh ESD-Schutzstruktur und Verfahren zur Herstellung
WO2002061841A2 (en) * 2001-01-31 2002-08-08 Advanced Micro Devices, Inc. Partially silicide diode and method of manufacture
US6462381B1 (en) * 2001-02-22 2002-10-08 Advanced Micro Devices, Inc. Silicon-on-insulator (SOI) electrostatic discharge (ESD) protection device with backside contact opening
US6589823B1 (en) 2001-02-22 2003-07-08 Advanced Micro Devices, Inc. Silicon-on-insulator (SOI)electrostatic discharge (ESD) protection device with backside contact plug
JP2003031669A (ja) 2001-07-13 2003-01-31 Ricoh Co Ltd 半導体装置
US6611025B2 (en) * 2001-09-05 2003-08-26 Winbond Electronics Corp. Apparatus and method for improved power bus ESD protection
US6693783B2 (en) * 2002-04-08 2004-02-17 Exar Corporation Bounce tolerant fuse trimming circuit with controlled timing
US6582997B1 (en) * 2002-05-17 2003-06-24 Taiwan Semiconductor Manufacturing Company ESD protection scheme for outputs with resistor loading
CN100570872C (zh) * 2002-05-24 2009-12-16 独立行政法人产业技术综合研究所 电信号传输线
DE10314505B4 (de) * 2003-03-31 2009-05-07 Advanced Micro Devices, Inc., Sunnyvale Verbesserte Diodenstruktur für Soi-Schaltungen
DE10344849B3 (de) * 2003-09-26 2005-07-21 Infineon Technologies Ag Integrierte Schaltung mit Schutz vor elektrostatischer Entladung
US7067883B2 (en) * 2003-10-31 2006-06-27 Lattice Semiconductor Corporation Lateral high-voltage junction device
JP2005191161A (ja) * 2003-12-25 2005-07-14 Oki Electric Ind Co Ltd 半導体装置
JP5154000B2 (ja) * 2005-05-13 2013-02-27 ラピスセミコンダクタ株式会社 半導体装置
US7863610B2 (en) * 2007-08-22 2011-01-04 Qimonda North America Corp. Integrated circuit including silicide region to inhibit parasitic currents
JP2009283610A (ja) * 2008-05-21 2009-12-03 Elpida Memory Inc Ｅｓｄ保護回路
CN102110671B (zh) * 2009-12-29 2013-01-02 中芯国际集成电路制造(上海)有限公司 静电放电保护装置
JP2014056972A (ja) * 2012-09-13 2014-03-27 Ricoh Co Ltd 静電破壊保護回路及び半導体集積回路
JP6243720B2 (ja) * 2013-02-06 2017-12-06 エスアイアイ・セミコンダクタ株式会社 Ｅｓｄ保護回路を備えた半導体装置
JP6146165B2 (ja) * 2013-07-01 2017-06-14 セイコーエプソン株式会社 静電気保護回路、電気光学装置、及び電子機器
CN103944154A (zh) * 2013-12-11 2014-07-23 厦门天马微电子有限公司 一种静电保护电路及液晶显示器
JP6300659B2 (ja) * 2014-06-19 2018-03-28 株式会社東芝 半導体装置
FR3051969A1 (fr) 2016-05-31 2017-12-01 Stmicroelectronics Rousset Procede de fabrication de diodes de puissance, en particulier pour former un pont de graetz, et dispositif correspondant
KR20190140216A (ko) * 2018-06-11 2019-12-19 에스케이하이닉스 주식회사 Esd 보호 회로를 포함하는 반도체 집적 회로 장치
JP7396774B2 (ja) * 2019-03-26 2023-12-12 ラピスセミコンダクタ株式会社 論理回路
TWI713279B (zh) 2019-05-17 2020-12-11 明基電通股份有限公司 過電流保護系統
US10971633B2 (en) 2019-09-04 2021-04-06 Stmicroelectronics (Rousset) Sas Structure and method of forming a semiconductor device
KR20230102030A (ko) 2021-12-29 2023-07-07 삼성디스플레이 주식회사 정전기 방전 회로 및 이를 포함하는 표시 장치
CN114582282B (zh) * 2022-03-30 2023-07-25 武汉华星光电半导体显示技术有限公司 Esd保护电路及显示装置
KR20230143662A (ko) 2022-04-05 2023-10-13 삼성디스플레이 주식회사 표시 패널 및 그것을 포함하는 표시 장치

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0758734B2 (ja) * 1987-02-23 1995-06-21 株式会社東芝 絶縁ゲ−ト型セミカスタム集積回路
US4989057A (en) 1988-05-26 1991-01-29 Texas Instruments Incorporated ESD protection for SOI circuits
JPH02260459A (ja) 1989-03-30 1990-10-23 Ricoh Co Ltd 入力保護回路
KR940004449B1 (ko) 1990-03-02 1994-05-25 가부시키가이샤 도시바 반도체장치
US5283449A (en) 1990-08-09 1994-02-01 Nec Corporation Semiconductor integrated circuit device including two types of MOSFETS having source/drain region different in sheet resistance from each other
JP3244581B2 (ja) 1993-12-29 2002-01-07 株式会社リコー デュアルゲート型ｃｍｏｓ半導体装置
JPH0837284A (ja) 1994-07-21 1996-02-06 Nippondenso Co Ltd 半導体集積回路装置
JPH08195443A (ja) 1995-01-18 1996-07-30 Fujitsu Ltd 半導体装置及びその製造方法
US5610790A (en) * 1995-01-20 1997-03-11 Xilinx, Inc. Method and structure for providing ESD protection for silicon on insulator integrated circuits
US5629544A (en) * 1995-04-25 1997-05-13 International Business Machines Corporation Semiconductor diode with silicide films and trench isolation
JPH098331A (ja) * 1995-06-23 1997-01-10 Mitsubishi Electric Corp Ｓｏｉ入力保護回路
JP3717227B2 (ja) 1996-03-29 2005-11-16 株式会社ルネサステクノロジ 入力／出力保護回路
US5818086A (en) * 1996-06-11 1998-10-06 Winbond Electronics Corporation Reinforced ESD protection for NC-pin adjacent input pin

Also Published As

Publication number Publication date
JPH11121750A (ja) 1999-04-30
JP4054093B2 (ja) 2008-02-27
EP0923132A1 (de) 1999-06-16
EP0923132B1 (de) 2002-11-27
TW388128B (en) 2000-04-21
EP1267407A3 (de) 2005-05-11
KR19990036477A (ko) 1999-05-25
KR100298983B1 (ko) 2001-10-19
US6274908B1 (en) 2001-08-14
EP1267407A2 (de) 2002-12-18
DE69809694D1 (de) 2003-01-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee