KR930018575U - Automatic photoresist disposal device for coating process for semiconductor manufacturing - Google Patents
Automatic photoresist disposal device for coating process for semiconductor manufacturingInfo
- Publication number
- KR930018575U KR930018575U KR2019920000452U KR920000452U KR930018575U KR 930018575 U KR930018575 U KR 930018575U KR 2019920000452 U KR2019920000452 U KR 2019920000452U KR 920000452 U KR920000452 U KR 920000452U KR 930018575 U KR930018575 U KR 930018575U
- Authority
- KR
- South Korea
- Prior art keywords
- coating process
- semiconductor manufacturing
- disposal device
- automatic photoresist
- photoresist
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR92000452U KR0123049Y1 (en) | 1992-01-15 | 1992-01-15 | Photoresist disposing apparatus for coating process in semiconductor manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR92000452U KR0123049Y1 (en) | 1992-01-15 | 1992-01-15 | Photoresist disposing apparatus for coating process in semiconductor manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930018575U true KR930018575U (en) | 1993-08-21 |
KR0123049Y1 KR0123049Y1 (en) | 1998-09-15 |
Family
ID=19327873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR92000452U KR0123049Y1 (en) | 1992-01-15 | 1992-01-15 | Photoresist disposing apparatus for coating process in semiconductor manufacture |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0123049Y1 (en) |
-
1992
- 1992-01-15 KR KR92000452U patent/KR0123049Y1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0123049Y1 (en) | 1998-09-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20040326 Year of fee payment: 7 |
|
LAPS | Lapse due to unpaid annual fee |