KR910013024U - Spinhead part environmental maintenance device for wafer photoresist coating - Google Patents

Spinhead part environmental maintenance device for wafer photoresist coating

Info

Publication number
KR910013024U
KR910013024U KR2019890019211U KR890019211U KR910013024U KR 910013024 U KR910013024 U KR 910013024U KR 2019890019211 U KR2019890019211 U KR 2019890019211U KR 890019211 U KR890019211 U KR 890019211U KR 910013024 U KR910013024 U KR 910013024U
Authority
KR
South Korea
Prior art keywords
spinhead
maintenance device
photoresist coating
environmental maintenance
wafer photoresist
Prior art date
Application number
KR2019890019211U
Other languages
Korean (ko)
Other versions
KR930004200Y1 (en
Inventor
백승호
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019890019211U priority Critical patent/KR930004200Y1/en
Publication of KR910013024U publication Critical patent/KR910013024U/en
Application granted granted Critical
Publication of KR930004200Y1 publication Critical patent/KR930004200Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
KR2019890019211U 1989-12-18 1989-12-18 Spin head cleaner for photoresist coating process KR930004200Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019890019211U KR930004200Y1 (en) 1989-12-18 1989-12-18 Spin head cleaner for photoresist coating process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019890019211U KR930004200Y1 (en) 1989-12-18 1989-12-18 Spin head cleaner for photoresist coating process

Publications (2)

Publication Number Publication Date
KR910013024U true KR910013024U (en) 1991-07-30
KR930004200Y1 KR930004200Y1 (en) 1993-07-07

Family

ID=19293395

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019890019211U KR930004200Y1 (en) 1989-12-18 1989-12-18 Spin head cleaner for photoresist coating process

Country Status (1)

Country Link
KR (1) KR930004200Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100830394B1 (en) * 2001-12-14 2008-05-20 삼성전자주식회사 Spin coating apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100830394B1 (en) * 2001-12-14 2008-05-20 삼성전자주식회사 Spin coating apparatus

Also Published As

Publication number Publication date
KR930004200Y1 (en) 1993-07-07

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Legal Events

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Payment date: 20020618

Year of fee payment: 10

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