KR920018522A - 아크릴레이트를 기제로 하는 감광성 조성물 - Google Patents
아크릴레이트를 기제로 하는 감광성 조성물 Download PDFInfo
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- KR920018522A KR920018522A KR1019920005148A KR920005148A KR920018522A KR 920018522 A KR920018522 A KR 920018522A KR 1019920005148 A KR1019920005148 A KR 1019920005148A KR 920005148 A KR920005148 A KR 920005148A KR 920018522 A KR920018522 A KR 920018522A
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (16)
- (1) 2 내지 4의 관능가와 500 내지 10,000의 분자량(Mw)을 갖는 우레판(메타) 아크릴레이트 40 내지 80중량%; (2) 히드록시기-함유 지방족 또는 지환족 디(메타)아크릴레이트 5 내지 40중량%; (3) 500 이하의 분자량(Mw)을 갖는 모노-N-비닐 화합물 또는 모노(메타)아크릴레이트 0 내지 40중량%; (4) 광개시제 0.1 내지 10중량%; (5) 상기 성분(2)와는 다른 지방족 또는 치환족 디(메타)아크릴레이트, 지방족트리(메타)아크릴레이트 혹은 방향족 디 -또는 트리(메타)아크릴레이트 0 내지 30중량%; 및 (6) 통상적인 첨가제 0 내지 5중량%를, 그 전체 비율이 100중량%가 되도록 포함하는 액체 감광성 조성물.
- 제1항에 있어서, (1) 2 내지 4의 관능기과 500 내지 10,000의 분자량(Mw)을 갖는 우레판(메타)아크릴레이트 40 내지 80중량%; (2)히드록시기-함유 지방족 또는 지환족 디(메타)아크릴레이트 5 내지 40중량%; (3) 500 이하의 분자량(Mw)을 갖는 모노-N-비닐 화합물 또는 모노(메타)아크릴레이트 5 내지 40중량%; (4) 광개시제 0.1 내지 10중량%; (5)상기 성분 (2)와는 다른 지방족 또는 지환족 디(메타)아크릴레이트, 자방족트리(메타)아크릴레이트 혹은 방향족 디-또는 트리(메타)아크릴레이트 0 내지 30중량%; 및 (6) 통상적인 첨가제 0 내지 5중량%를 포함하는 조성물.
- 제1항에 있어서, 성분(1)이 지방족 우레탄 아크릴레이트인 조성물.
- 제1항에 있어서, 히드록시기-함유 디아크릴레이트(2)가1,4-디부탄디올의 디글리시딜에테르와 아크릴산의 반응 생성물인 조성물.
- 제1항에 있어서, 성분(2)가 히드록시기-함유 지환족 디(메타)아크릴레이트인 조성물.
- 제5항에 있어서, 성분(2)가 헥사히드로프탈산의 디글리시딜에스테르 또는 비스(3,4-에폭시시클로헥실메틸)아디페이트와 (메타)아크릴산의 반응 생성물인 조성물.
- 제1항에 있어서, 성분(3)이 모노-N-비닐 화합물인 조성물.
- 제7항에 있어서, 성분(3)이 N-비닐피롤리돈인 조성물.
- 제1항에 있어서, 광개시제(4)가 1-히드록시페닐케톤인 조성물.
- 제1항에 있어서, 광개시제(4)가 1-히드록시시클로헥실페닐케톤인 조성물.
- 제1항에 있어서, 성분(5)가 비스페놀 디글리시딜에테르와 아크릴산의 반응 생성물인 조성물.
- 제1항에 있어서, 성분 (5)가 비스페놀 A의 디글리시딜에테르와 아크릴산의 반응 생성물인 조성물.
- 제1항에 따른 조성물을 화학선 조사(照射)에 의하여 중합시키는 방법.
- 조사된 영역안에서 층이 원하는 두께로 응고되도록 신규 액체 조성물의 층을 그 전체 표면위에 또는 예정된 패턴에 UV/VIs 광원으로 조사한후, 응고된 층위에 신규 조성물의 새로운 층을 형성시켜 그 전체 표면위에 또는 예정된 패턴에 조사하고, 반복 코팅 및 조사에 의하여 서로 붙어있는 다수의 응고된 층들로부터 3차원의 물체를 형성시키는 것을 포함하는, 석판술에 의해 신규 액체 조성물로부터 3차원 물체를 제조하는 방법.
- 제14항에 있어서, 조사원으로서 레이저 비임, 바람직하게는 컴퓨터-제어 레이저 비임을 사용하는 방법.
- 광중합층, 특히 서로 붙어있는 다수의 응고된 층들로부터 형성된 3차원 물체 형태의 광중합층을 제조하기 위한 제1항에 따른 조성물의 용도.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH93691 | 1991-03-27 | ||
CH936/91-5 | 1991-03-27 | ||
CH00936/91-5 | 1991-03-27 | ||
CH19992 | 1992-01-23 | ||
CH199/92-4 | 1992-01-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920018522A true KR920018522A (ko) | 1992-10-22 |
KR100199479B1 KR100199479B1 (ko) | 1999-06-15 |
Family
ID=25683853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920005148A KR100199479B1 (ko) | 1991-03-27 | 1992-03-26 | 아크릴레이트를 기제로 하는 감광성 조성물 |
Country Status (7)
Country | Link |
---|---|
US (1) | US5476749A (ko) |
EP (1) | EP0506616B1 (ko) |
JP (1) | JP3252331B2 (ko) |
KR (1) | KR100199479B1 (ko) |
CA (1) | CA2063982C (ko) |
DE (1) | DE59209143D1 (ko) |
HK (1) | HK1005630A1 (ko) |
Cited By (1)
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KR100519032B1 (ko) * | 2000-11-07 | 2005-10-05 | 도쿄 오카 고교 가부시키가이샤 | 샌드블래스팅용 감광성 조성물 및 이를 사용한 감광성 필름 |
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EP0286594A2 (de) * | 1987-04-06 | 1988-10-12 | Ciba-Geigy Ag | Verfahren zur Herstellung von photostrukturierbaren Ueberzügen |
KR0147812B1 (ko) * | 1989-01-10 | 1998-08-17 | 베르너 발대크 | 감광성 액체 수지 조성물 및 그로부터 3차원 물체를 제조하는 방법 |
DE59010008D1 (de) * | 1989-10-27 | 1996-02-08 | Ciba Geigy Ag | Photoempfindliches Gemisch |
-
1992
- 1992-03-19 EP EP92810201A patent/EP0506616B1/de not_active Expired - Lifetime
- 1992-03-19 DE DE59209143T patent/DE59209143D1/de not_active Expired - Fee Related
- 1992-03-25 CA CA002063982A patent/CA2063982C/en not_active Expired - Fee Related
- 1992-03-26 KR KR1019920005148A patent/KR100199479B1/ko not_active IP Right Cessation
- 1992-03-27 JP JP11513692A patent/JP3252331B2/ja not_active Expired - Fee Related
-
1994
- 1994-09-09 US US08/303,563 patent/US5476749A/en not_active Expired - Lifetime
-
1998
- 1998-06-02 HK HK98104761A patent/HK1005630A1/xx not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100519032B1 (ko) * | 2000-11-07 | 2005-10-05 | 도쿄 오카 고교 가부시키가이샤 | 샌드블래스팅용 감광성 조성물 및 이를 사용한 감광성 필름 |
Also Published As
Publication number | Publication date |
---|---|
EP0506616A1 (de) | 1992-09-30 |
CA2063982A1 (en) | 1992-09-28 |
JP3252331B2 (ja) | 2002-02-04 |
JPH05224412A (ja) | 1993-09-03 |
DE59209143D1 (de) | 1998-02-26 |
CA2063982C (en) | 2002-05-28 |
EP0506616B1 (de) | 1998-01-21 |
KR100199479B1 (ko) | 1999-06-15 |
HK1005630A1 (en) | 1999-01-15 |
US5476749A (en) | 1995-12-19 |
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