KR920018522A - 아크릴레이트를 기제로 하는 감광성 조성물 - Google Patents

아크릴레이트를 기제로 하는 감광성 조성물 Download PDF

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KR920018522A
KR920018522A KR1019920005148A KR920005148A KR920018522A KR 920018522 A KR920018522 A KR 920018522A KR 1019920005148 A KR1019920005148 A KR 1019920005148A KR 920005148 A KR920005148 A KR 920005148A KR 920018522 A KR920018522 A KR 920018522A
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KR100199479B1 (ko
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스타인만 베티나
비젠단거 롤프
슐데스 아드리안
훈찌커 막스
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베르너 발데크
시바-가이기 아게
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10Processes of additive manufacturing
    • B29C64/106Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00Materials specially adapted for additive manufacturing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037Production of three-dimensional images

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

내용 없음

Description

아크릴레이트를 기제로 하는 감광성 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (16)

  1. (1) 2 내지 4의 관능가와 500 내지 10,000의 분자량(Mw)을 갖는 우레판(메타) 아크릴레이트 40 내지 80중량%; (2) 히드록시기-함유 지방족 또는 지환족 디(메타)아크릴레이트 5 내지 40중량%; (3) 500 이하의 분자량(Mw)을 갖는 모노-N-비닐 화합물 또는 모노(메타)아크릴레이트 0 내지 40중량%; (4) 광개시제 0.1 내지 10중량%; (5) 상기 성분(2)와는 다른 지방족 또는 치환족 디(메타)아크릴레이트, 지방족트리(메타)아크릴레이트 혹은 방향족 디 -또는 트리(메타)아크릴레이트 0 내지 30중량%; 및 (6) 통상적인 첨가제 0 내지 5중량%를, 그 전체 비율이 100중량%가 되도록 포함하는 액체 감광성 조성물.
  2. 제1항에 있어서, (1) 2 내지 4의 관능기과 500 내지 10,000의 분자량(Mw)을 갖는 우레판(메타)아크릴레이트 40 내지 80중량%; (2)히드록시기-함유 지방족 또는 지환족 디(메타)아크릴레이트 5 내지 40중량%; (3) 500 이하의 분자량(Mw)을 갖는 모노-N-비닐 화합물 또는 모노(메타)아크릴레이트 5 내지 40중량%; (4) 광개시제 0.1 내지 10중량%; (5)상기 성분 (2)와는 다른 지방족 또는 지환족 디(메타)아크릴레이트, 자방족트리(메타)아크릴레이트 혹은 방향족 디-또는 트리(메타)아크릴레이트 0 내지 30중량%; 및 (6) 통상적인 첨가제 0 내지 5중량%를 포함하는 조성물.
  3. 제1항에 있어서, 성분(1)이 지방족 우레탄 아크릴레이트인 조성물.
  4. 제1항에 있어서, 히드록시기-함유 디아크릴레이트(2)가1,4-디부탄디올의 디글리시딜에테르와 아크릴산의 반응 생성물인 조성물.
  5. 제1항에 있어서, 성분(2)가 히드록시기-함유 지환족 디(메타)아크릴레이트인 조성물.
  6. 제5항에 있어서, 성분(2)가 헥사히드로프탈산의 디글리시딜에스테르 또는 비스(3,4-에폭시시클로헥실메틸)아디페이트와 (메타)아크릴산의 반응 생성물인 조성물.
  7. 제1항에 있어서, 성분(3)이 모노-N-비닐 화합물인 조성물.
  8. 제7항에 있어서, 성분(3)이 N-비닐피롤리돈인 조성물.
  9. 제1항에 있어서, 광개시제(4)가 1-히드록시페닐케톤인 조성물.
  10. 제1항에 있어서, 광개시제(4)가 1-히드록시시클로헥실페닐케톤인 조성물.
  11. 제1항에 있어서, 성분(5)가 비스페놀 디글리시딜에테르와 아크릴산의 반응 생성물인 조성물.
  12. 제1항에 있어서, 성분 (5)가 비스페놀 A의 디글리시딜에테르와 아크릴산의 반응 생성물인 조성물.
  13. 제1항에 따른 조성물을 화학선 조사(照射)에 의하여 중합시키는 방법.
  14. 조사된 영역안에서 층이 원하는 두께로 응고되도록 신규 액체 조성물의 층을 그 전체 표면위에 또는 예정된 패턴에 UV/VIs 광원으로 조사한후, 응고된 층위에 신규 조성물의 새로운 층을 형성시켜 그 전체 표면위에 또는 예정된 패턴에 조사하고, 반복 코팅 및 조사에 의하여 서로 붙어있는 다수의 응고된 층들로부터 3차원의 물체를 형성시키는 것을 포함하는, 석판술에 의해 신규 액체 조성물로부터 3차원 물체를 제조하는 방법.
  15. 제14항에 있어서, 조사원으로서 레이저 비임, 바람직하게는 컴퓨터-제어 레이저 비임을 사용하는 방법.
  16. 광중합층, 특히 서로 붙어있는 다수의 응고된 층들로부터 형성된 3차원 물체 형태의 광중합층을 제조하기 위한 제1항에 따른 조성물의 용도.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920005148A 1991-03-27 1992-03-26 아크릴레이트를 기제로 하는 감광성 조성물 KR100199479B1 (ko)

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Application Number Priority Date Filing Date Title
CH93691 1991-03-27
CH936/91-5 1991-03-27
CH00936/91-5 1991-03-27
CH19992 1992-01-23
CH199/92-4 1992-01-23

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KR100199479B1 KR100199479B1 (ko) 1999-06-15

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US (1) US5476749A (ko)
EP (1) EP0506616B1 (ko)
JP (1) JP3252331B2 (ko)
KR (1) KR100199479B1 (ko)
CA (1) CA2063982C (ko)
DE (1) DE59209143D1 (ko)
HK (1) HK1005630A1 (ko)

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EP0506616A1 (de) 1992-09-30
CA2063982A1 (en) 1992-09-28
JP3252331B2 (ja) 2002-02-04
JPH05224412A (ja) 1993-09-03
DE59209143D1 (de) 1998-02-26
CA2063982C (en) 2002-05-28
EP0506616B1 (de) 1998-01-21
KR100199479B1 (ko) 1999-06-15
HK1005630A1 (en) 1999-01-15
US5476749A (en) 1995-12-19

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