KR920017181A - LOCOS process method using oxygen ion implantation - Google Patents
LOCOS process method using oxygen ion implantation Download PDFInfo
- Publication number
- KR920017181A KR920017181A KR1019910002466A KR910002466A KR920017181A KR 920017181 A KR920017181 A KR 920017181A KR 1019910002466 A KR1019910002466 A KR 1019910002466A KR 910002466 A KR910002466 A KR 910002466A KR 920017181 A KR920017181 A KR 920017181A
- Authority
- KR
- South Korea
- Prior art keywords
- ion implantation
- oxygen ion
- process method
- nitride
- locos process
- Prior art date
Links
- 229910052760 oxygen Inorganic materials 0.000 title claims description 4
- 239000001301 oxygen Substances 0.000 title claims description 4
- 238000000034 method Methods 0.000 title description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title description 2
- 238000005468 ion implantation Methods 0.000 title description 2
- 150000004767 nitrides Chemical class 0.000 claims 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000010703 silicon Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- -1 oxygen ions Chemical class 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
Landscapes
- Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Local Oxidation Of Silicon (AREA)
Abstract
내용 없음No content
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도는 본 발명의 산소이온주입에 의한 LOCOS 공정도.2 is a LOCOS process diagram by the oxygen ion implantation of the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910002466A KR920017181A (en) | 1991-02-13 | 1991-02-13 | LOCOS process method using oxygen ion implantation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910002466A KR920017181A (en) | 1991-02-13 | 1991-02-13 | LOCOS process method using oxygen ion implantation |
Publications (1)
Publication Number | Publication Date |
---|---|
KR920017181A true KR920017181A (en) | 1992-09-26 |
Family
ID=67396654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910002466A KR920017181A (en) | 1991-02-13 | 1991-02-13 | LOCOS process method using oxygen ion implantation |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR920017181A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4300978A1 (en) * | 1992-01-21 | 1993-07-22 | Kyung Park | Combined grinder and polisher for glass plates - has separate tanks for grinding fluid and polishing fluid and automatic control for recycling of fluids |
-
1991
- 1991-02-13 KR KR1019910002466A patent/KR920017181A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4300978A1 (en) * | 1992-01-21 | 1993-07-22 | Kyung Park | Combined grinder and polisher for glass plates - has separate tanks for grinding fluid and polishing fluid and automatic control for recycling of fluids |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |