KR920016265A - 알칼리 현상가능한 감광성 수지 조성물 - Google Patents
알칼리 현상가능한 감광성 수지 조성물 Download PDFInfo
- Publication number
- KR920016265A KR920016265A KR1019920002216A KR920002216A KR920016265A KR 920016265 A KR920016265 A KR 920016265A KR 1019920002216 A KR1019920002216 A KR 1019920002216A KR 920002216 A KR920002216 A KR 920002216A KR 920016265 A KR920016265 A KR 920016265A
- Authority
- KR
- South Korea
- Prior art keywords
- resin composition
- alkali
- developable photosensitive
- composition according
- photosensitive resin
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/124—Duplicating or marking methods; Sheet materials for use therein using pressure to make a masked colour visible, e.g. to make a coloured support visible, to create an opaque or transparent pattern, or to form colour by uniting colour-forming components
- B41M5/132—Chemical colour-forming components; Additives or binders therefor
- B41M5/155—Colour-developing components, e.g. acidic compounds; Additives or binders therefor; Layers containing such colour-developing components, additives or binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (5)
- (a)분자내에 하기 일반식(1)의 양쪽성이온 그룹 및/또는 하기 일반식(2)의 양쪽성이온 그룹을 가지며, 5내지 150의 총 산가를 갖는 수지를 함유하는 알칼리-용해성 유형의 결합제 수지[상기식에서, R1은 H, 또는 쇄중에 치환체 또는 작용 그룹을 임의로 갖는 C1-10알킬그룹이고, R2는 각각 동일하거나 상이하며, 쇄중에 치환체 또는 작용그룹을 임의로 갖는 C1-10알킬그룹이며, R은 치환되거나 비치환된 C1-20알킬렌 또는 페닐렌 그룹이고, A는 -COO 또는 -SO3이다], (b) 감광성 물질 및 (c) 염료를 포함하는 알칼리 현상 가능한 감광성 수지 조성물.
- 제1항에 있어서, 상기 감광성 물질(b)가 디아조수지인 알칼리 현상가능한 감광성 수지 조성물.
- 제1항에 있어서, 상기 감광성 물질(b)가 광중합가능한 조성물인 알킬리 현상가능한 감광성 수지 조성물.
- 제1항에 있어서, 상기 감광성 물질(b)가 퀴논디아지드 화합물 또는 수지인 알칼리 현상가능한 감광성 수지 조성물.
- 옵셋 인쇄판에 사용되는 제1항 내지 4항중 어느 한 항에 따른 알칼리 현상가능한 감광성 수지 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3020919A JP2677460B2 (ja) | 1991-02-14 | 1991-02-14 | アルカリ現像性感光性樹脂組成物 |
JP91-020919 | 1991-02-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR920016265A true KR920016265A (ko) | 1992-09-24 |
Family
ID=12040634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920002216A KR920016265A (ko) | 1991-02-14 | 1992-02-14 | 알칼리 현상가능한 감광성 수지 조성물 |
Country Status (7)
Country | Link |
---|---|
US (1) | US5478690A (ko) |
EP (1) | EP0499447A1 (ko) |
JP (1) | JP2677460B2 (ko) |
KR (1) | KR920016265A (ko) |
AU (1) | AU649305B2 (ko) |
CA (1) | CA2061070A1 (ko) |
TW (1) | TW223152B (ko) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5712022A (en) * | 1992-09-14 | 1998-01-27 | Yoshino Kogyosho Co., Ltd. | Printed thermoplastic resin products and method for printing such products |
JP3317574B2 (ja) * | 1994-03-15 | 2002-08-26 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
DE4430680A1 (de) * | 1994-08-29 | 1996-03-07 | Hoechst Ag | Lichtempfindliches Gemisch |
US5853957A (en) * | 1995-05-08 | 1998-12-29 | Tamura Kaken Co., Ltd | Photosensitive resin compositions, cured films thereof, and circuit boards |
DE19533608A1 (de) * | 1995-09-11 | 1997-03-13 | Basf Ag | Positivarbeitendes strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen |
US6140022A (en) * | 1996-07-19 | 2000-10-31 | Agfa-Gevaert, N.V. | Radiation sensitive imaging element and a method for producing lithographic plates therewith |
US5846685A (en) * | 1997-01-31 | 1998-12-08 | Kodak Polychrome Graphics, Llc | Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate |
TW550438B (en) * | 1999-04-26 | 2003-09-01 | Jsr Corp | Radiation-sensitive resin composition |
DE10064889A1 (de) | 2000-12-23 | 2002-07-18 | Agfa Gevaert Nv | Aufzeichnungsmaterial mit negativ arbeitender, strahlungsempfindlicher Schicht, die Zusätze zur Förderung der Entwickelbarkeit enthält |
US7008751B2 (en) * | 2004-08-04 | 2006-03-07 | Eastman Kodak Company | Thermally switchable imageable elements containing betaine-containing co-polymers |
US7029805B2 (en) * | 2004-09-07 | 2006-04-18 | Eastman Kodak Company | Imageable element with masking layer comprising betaine-containing co-polymers |
JP2008089712A (ja) * | 2006-09-29 | 2008-04-17 | Fujifilm Corp | 感光性平版印刷版の製造方法 |
US8257907B2 (en) * | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
WO2018168309A1 (ja) * | 2017-03-15 | 2018-09-20 | Jsr株式会社 | 感放射線性樹脂組成物、パターン膜およびその製造方法、パターン基板、細胞培養器具、マイクロ流路デバイス、ならびに細胞塊の製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3497482A (en) * | 1963-10-14 | 1970-02-24 | Rohm & Haas | Polymers of quaternary ammonium compounds |
US3411912A (en) * | 1965-04-21 | 1968-11-19 | Eastman Kodak Co | Novel polymers and their use in photographic applications |
DE1595589A1 (de) * | 1966-02-02 | 1970-04-30 | Bayer Ag | Verfahren zur Herstellung von Acrylnitrilmischpolymeren |
US3671502A (en) * | 1970-11-12 | 1972-06-20 | Kendall & Co | Betaine copolymers with hydroxyalkylacrylates and hydroxyalkylmethacrylates |
US4207109A (en) * | 1978-04-05 | 1980-06-10 | Eastman Kodak Company | Element for photographic use containing crosslinkable polymers having acrylamidophenol units |
GB1603700A (en) * | 1978-05-31 | 1981-11-25 | Vickers Ltd | Developers for lithographic printing plates |
JPS56142528A (en) * | 1980-04-08 | 1981-11-06 | Mitsubishi Chem Ind Ltd | Developing solution for o-quinone diazide photosensitive material |
JPS56151727A (en) * | 1980-04-26 | 1981-11-24 | Nippon Paint Co Ltd | Novel oil free-polyester and its preparation |
US4379872A (en) * | 1980-08-22 | 1983-04-12 | Nippon Paint Co., Ltd. | Amphoteric amino sulfonate derivatives of epoxy resins |
JPS57178242A (en) * | 1981-04-27 | 1982-11-02 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic plate |
US4749762A (en) * | 1982-05-12 | 1988-06-07 | E. I. Du Pont De Nemours And Company | Acrylic amphoteric polymers |
US4574110A (en) * | 1983-07-28 | 1986-03-04 | Mitsui Toatsu Chemicals, Incorporated | Process for producing microcapsules and microcapsule slurry |
DE3516387A1 (de) * | 1984-05-07 | 1985-11-07 | Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa | Lichtempfindliche zusammensetzungen und aufzeichnungsmaterialien |
US4614701A (en) * | 1984-09-28 | 1986-09-30 | Sekisui Fine Chemical Co., Ltd. | Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units |
DE3751598T2 (de) * | 1986-10-23 | 1996-04-18 | Ciba Geigy Ag | Bilderzeugungsverfahren. |
US5028516A (en) * | 1986-12-04 | 1991-07-02 | Fuji Photo Film Co., Ltd. | Method of forming an image comprising rapidly developing an infrared sensitized photographic material comprising surfactants |
JPH02294646A (ja) * | 1989-05-10 | 1990-12-05 | Mitsubishi Kasei Corp | 感光性平版印刷版 |
JPH0368946A (ja) * | 1989-08-08 | 1991-03-25 | Konica Corp | 湿し水不要の感光性平版印刷版 |
-
1991
- 1991-02-14 JP JP3020919A patent/JP2677460B2/ja not_active Expired - Lifetime
-
1992
- 1992-02-11 EP EP92301136A patent/EP0499447A1/en not_active Withdrawn
- 1992-02-11 AU AU10857/92A patent/AU649305B2/en not_active Ceased
- 1992-02-12 CA CA002061070A patent/CA2061070A1/en not_active Abandoned
- 1992-02-14 KR KR1019920002216A patent/KR920016265A/ko not_active Application Discontinuation
- 1992-02-15 TW TW081101080A patent/TW223152B/zh active
-
1994
- 1994-12-30 US US08/366,444 patent/US5478690A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
TW223152B (ko) | 1994-05-01 |
AU1085792A (en) | 1992-08-20 |
JP2677460B2 (ja) | 1997-11-17 |
US5478690A (en) | 1995-12-26 |
AU649305B2 (en) | 1994-05-19 |
CA2061070A1 (en) | 1992-08-15 |
EP0499447A1 (en) | 1992-08-19 |
JPH04258956A (ja) | 1992-09-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR920016265A (ko) | 알칼리 현상가능한 감광성 수지 조성물 | |
ATE528133T1 (de) | Positiv arbeitende lichtempfindliche flachdruckplatte | |
DE3852690D1 (de) | Positiv arbeitendes lichtempfindliches Gemisch, enthaltend einen Farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches Aufzeichnungsmaterial. | |
ATE8820T1 (de) | Lichtempfindliches gemisch auf basis von onaphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial. | |
KR920004450A (ko) | 광중합성 조성물 및 이 조성물을 사용하여 제조한 광중합성 기록물질 | |
KR900000727A (ko) | 내식제 조성물 | |
KR960022623A (ko) | 가교결합된 중합체 | |
EP0397474A3 (en) | Photosensitive composition | |
KR970028826A (ko) | 신규 술포늄염 및 화학 증폭 포지형 레지스트 재료 | |
KR920701869A (ko) | 포지티브 레지스트 조성물 | |
KR900002125A (ko) | 내식막 조성물 | |
KR920001243A (ko) | 포지티브 감 방사선성 레지스트 조성물 | |
KR900003678A (ko) | 감광제 및 그 감광제를 사용한 감광성 수지조성물 및 그의 감광성 수지조성물을 사용한 패턴형성방법 | |
KR910006779A (ko) | 감방사선성 포지티브 레지스트 조성물 | |
KR930016829A (ko) | 감방사선성 수지 조성물 | |
KR890007120A (ko) | 염료를 함유하는 양성-작용성 감광성 조성물 및 이러한 조성물로부터 제조된 양성-작용성 감광성 기록물질 | |
KR920001242A (ko) | 포지티브 레지스트 조성물 | |
JPS56121031A (en) | Photosensitive composition | |
KR960001896A (ko) | 광경화 조성물 | |
KR920018523A (ko) | 포지티브 레지스트 조성물 | |
KR890002342A (ko) | 안트라퀴논계색소 및 이색소를 사용한 편광필름 | |
KR900702423A (ko) | 전자사진용 토너 | |
GB1356086A (en) | Photosensitive diazide materials for printing plates | |
KR910012813A (ko) | 감광성 수지 조성물 | |
KR930013862A (ko) | 포스핀 유도체를 포함하는 감광성 조성물 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |