KR920001243A - 포지티브 감 방사선성 레지스트 조성물 - Google Patents
포지티브 감 방사선성 레지스트 조성물 Download PDFInfo
- Publication number
- KR920001243A KR920001243A KR1019910009755A KR910009755A KR920001243A KR 920001243 A KR920001243 A KR 920001243A KR 1019910009755 A KR1019910009755 A KR 1019910009755A KR 910009755 A KR910009755 A KR 910009755A KR 920001243 A KR920001243 A KR 920001243A
- Authority
- KR
- South Korea
- Prior art keywords
- resist composition
- phenolic compound
- radiation sensitive
- alkali
- soluble resin
- Prior art date
Links
- 230000002285 radioactive effect Effects 0.000 title 1
- 150000002989 phenols Chemical class 0.000 claims 5
- 230000005855 radiation Effects 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 4
- 239000011347 resin Substances 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 239000004793 Polystyrene Substances 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 229920003986 novolac Polymers 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
- C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (4)
- 감 방사선성 성분, 알카리 가용성 수지 및 하기 일반식 (Ⅰ) [식중, R은 수소원자, 저급 알킬기 또는 페닐기, R'은 알킬기 또는 알콕시기, 그리고 n은 0-3의 수이다]의 페놀 화합물을 함유하는 감 방사선성 포지티브 레지스트 조성물.
- 제1항에 있어서, 상기 하기 페놀 화합물이 페놀 화합물(Ⅱ)인 감방사선성 포지티브 레지스트 조성물.
- 제1항에 있어서, 상기 페놀 화합물의 양이 상기 페놀 화합물과 상기 알카리 가용성 수지의 총 100중량%당 4-40중량%인 감 방사선성 포지티브 레지스트 조성물.
- 제1항에 있어서, 상기 알카리 가용성 수지가 노보락 수지이며, 그의 GPC에 의한 폴리스틸렌 환산 분자량 900 이하의 성분의 면적이 GPC전 면적에 대하여 25% 이하임을 특징으로 하는 감 방사선성 레지스트 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP156877/1990 | 1990-06-14 | ||
| JP2156877A JPH0450851A (ja) | 1990-06-14 | 1990-06-14 | ポジ型感放射線性レジスト組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR920001243A true KR920001243A (ko) | 1992-01-30 |
Family
ID=15637344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019910009755A KR920001243A (ko) | 1990-06-14 | 1991-06-13 | 포지티브 감 방사선성 레지스트 조성물 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5188920A (ko) |
| EP (1) | EP0461654B1 (ko) |
| JP (1) | JPH0450851A (ko) |
| KR (1) | KR920001243A (ko) |
| CA (1) | CA2044560A1 (ko) |
| DE (1) | DE69130896T2 (ko) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2711590B2 (ja) † | 1990-09-13 | 1998-02-10 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
| JP2743697B2 (ja) * | 1991-04-26 | 1998-04-22 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
| JPH05158233A (ja) * | 1991-12-04 | 1993-06-25 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| EP0550893A1 (en) * | 1992-01-10 | 1993-07-14 | Minnesota Mining And Manufacturing Company | Light sensitive layer for positive-negative copying material |
| US5318875A (en) * | 1992-02-12 | 1994-06-07 | Fuji Photo Film Co., Ltd. | Positive quinonediazide photoresist composition containing select hydroxyphenol additive |
| JPH05249666A (ja) * | 1992-03-05 | 1993-09-28 | Sumitomo Chem Co Ltd | ポジ型レジスト組成物 |
| JPH05323604A (ja) * | 1992-05-27 | 1993-12-07 | Sumitomo Chem Co Ltd | ポジ型レジスト組成物 |
| US5275911A (en) * | 1993-02-01 | 1994-01-04 | Ocg Microelectronic Materials, Inc. | Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures |
| JPH07281428A (ja) * | 1994-04-07 | 1995-10-27 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| EP0695740B1 (en) | 1994-08-05 | 2000-11-22 | Sumitomo Chemical Company Limited | Quinonediazide sulfonic acid esters and positive photoresist compositions comprising the same |
| US5580602A (en) * | 1994-09-01 | 1996-12-03 | International Business Machines Corporation | Process for making a thin film magnetic head |
| JP3549592B2 (ja) * | 1994-11-02 | 2004-08-04 | クラリアント インターナショナル リミテッド | 放射線感応性組成物 |
| US5939134A (en) * | 1996-07-10 | 1999-08-17 | International Business Machines Corporation | Process for making a thin film magnetic head |
| JP3666839B2 (ja) * | 1998-01-23 | 2005-06-29 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物およびその製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2547905C2 (de) * | 1975-10-25 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
| US4059449A (en) * | 1976-09-30 | 1977-11-22 | Rca Corporation | Photoresist containing a thiodipropionate compound |
| JPS59150047A (ja) * | 1983-02-15 | 1984-08-28 | Hitachi Metals Ltd | 形状記憶合金およびその製造方法 |
| US4891311A (en) * | 1984-02-03 | 1990-01-02 | Abbott Laboratories | Stabilized enzyme conjugate composition |
| JP2625882B2 (ja) * | 1988-05-17 | 1997-07-02 | 住友化学工業株式会社 | ポジ型レジスト用組成物 |
| JPH061377B2 (ja) * | 1989-12-28 | 1994-01-05 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
-
1990
- 1990-06-14 JP JP2156877A patent/JPH0450851A/ja active Pending
-
1991
- 1991-06-10 US US07/712,729 patent/US5188920A/en not_active Expired - Fee Related
- 1991-06-13 CA CA002044560A patent/CA2044560A1/en not_active Abandoned
- 1991-06-13 EP EP91109727A patent/EP0461654B1/en not_active Expired - Lifetime
- 1991-06-13 DE DE69130896T patent/DE69130896T2/de not_active Expired - Fee Related
- 1991-06-13 KR KR1019910009755A patent/KR920001243A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| DE69130896D1 (de) | 1999-03-25 |
| EP0461654B1 (en) | 1999-02-17 |
| EP0461654A2 (en) | 1991-12-18 |
| DE69130896T2 (de) | 1999-06-17 |
| EP0461654A3 (en) | 1992-04-22 |
| CA2044560A1 (en) | 1991-12-15 |
| JPH0450851A (ja) | 1992-02-19 |
| US5188920A (en) | 1993-02-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E601 | Decision to refuse application |