JPS56121031A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS56121031A
JPS56121031A JP2598380A JP2598380A JPS56121031A JP S56121031 A JPS56121031 A JP S56121031A JP 2598380 A JP2598380 A JP 2598380A JP 2598380 A JP2598380 A JP 2598380A JP S56121031 A JPS56121031 A JP S56121031A
Authority
JP
Japan
Prior art keywords
photosensitive composition
groups
high molecular
molecular compound
oil soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2598380A
Other languages
Japanese (ja)
Inventor
Yoshio Kurita
Noriyasu Kita
Atsuo Yamazaki
Norihito Suzuki
Kazuo Noguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP2598380A priority Critical patent/JPS56121031A/en
Publication of JPS56121031A publication Critical patent/JPS56121031A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)

Abstract

PURPOSE:To easily discriminate the exposed and nonexposed parts of a photosensitive composition under yellow safelight after imagewise exposure by adding a specified percentage of a specified diazo resin together with a high molecular compound having OH groups and an oil soluble dye. CONSTITUTION:To a photosensitive composition is added a 0.1-50wt% diazo resin which is a salt such as the condensate of p-diazodiphenyl-amine and formaldehyde and is represented by the formula (where R is H, CH3 or phenyl, X is PF6 or BF4 and n is 1-15). At this time, >=90mol% of the resin has n<=5. The composition contains a high molecular compound having OH groups and an oil soluble dye by about 55-95wt% and about 0.5-10wt%, respectively. The resulting photosensitive composition is fit for a photosensitive lithographic plate, and after exposure in a plate making process the exposed part is clearly bleached out to give a superior visible image. A printing plate with superior printing resistance is obtd.
JP2598380A 1980-02-28 1980-02-28 Photosensitive composition Pending JPS56121031A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2598380A JPS56121031A (en) 1980-02-28 1980-02-28 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2598380A JPS56121031A (en) 1980-02-28 1980-02-28 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS56121031A true JPS56121031A (en) 1981-09-22

Family

ID=12180945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2598380A Pending JPS56121031A (en) 1980-02-28 1980-02-28 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS56121031A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58199342A (en) * 1982-05-17 1983-11-19 Sekisui Chem Co Ltd Photosetting resin composition
JPS5944044A (en) * 1982-09-06 1984-03-12 Okamoto Kagaku Kogyo Kk Photosensitive lithographic plate
JPS5997136A (en) * 1982-11-26 1984-06-04 Fuji Photo Film Co Ltd Photosensitive composition
US4469772A (en) * 1982-06-03 1984-09-04 American Hoechst Corporation Water developable dye coating on substrate with two diazo polycondensation products and water soluble polymeric binder
JPS61117548A (en) * 1984-11-13 1986-06-04 Mitsubishi Chem Ind Ltd Photosensitive lithographic plate
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58199342A (en) * 1982-05-17 1983-11-19 Sekisui Chem Co Ltd Photosetting resin composition
US4469772A (en) * 1982-06-03 1984-09-04 American Hoechst Corporation Water developable dye coating on substrate with two diazo polycondensation products and water soluble polymeric binder
JPS5944044A (en) * 1982-09-06 1984-03-12 Okamoto Kagaku Kogyo Kk Photosensitive lithographic plate
JPH0345824B2 (en) * 1982-09-06 1991-07-12 Okamoto Kagaku Kogyo Kk
JPS5997136A (en) * 1982-11-26 1984-06-04 Fuji Photo Film Co Ltd Photosensitive composition
JPH0514896B2 (en) * 1982-11-26 1993-02-26 Fuji Photo Film Co Ltd
JPS61117548A (en) * 1984-11-13 1986-06-04 Mitsubishi Chem Ind Ltd Photosensitive lithographic plate
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate

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