KR20150118582A - 감광성 수지 조성물, 그것을 열경화시켜서 이루어지는 보호막 또는 절연막, 그것을 사용한 터치 패널 및 그 제조 방법 - Google Patents

감광성 수지 조성물, 그것을 열경화시켜서 이루어지는 보호막 또는 절연막, 그것을 사용한 터치 패널 및 그 제조 방법 Download PDF

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KR20150118582A
KR20150118582A KR1020157017378A KR20157017378A KR20150118582A KR 20150118582 A KR20150118582 A KR 20150118582A KR 1020157017378 A KR1020157017378 A KR 1020157017378A KR 20157017378 A KR20157017378 A KR 20157017378A KR 20150118582 A KR20150118582 A KR 20150118582A
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South Korea
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group
carbon atoms
compound
resistance
maleimide
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KR1020157017378A
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English (en)
Korean (ko)
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유고 타니가키
타케노리 후지와라
미츠히토 스와
쇼 후쿠하라
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도레이 카부시키가이샤
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Publication of KR20150118582A publication Critical patent/KR20150118582A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020157017378A 2013-02-12 2014-01-22 감광성 수지 조성물, 그것을 열경화시켜서 이루어지는 보호막 또는 절연막, 그것을 사용한 터치 패널 및 그 제조 방법 KR20150118582A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013024039 2013-02-12
JPJP-P-2013-024039 2013-02-12
PCT/JP2014/051249 WO2014125884A1 (ja) 2013-02-12 2014-01-22 感光性樹脂組成物、それを熱硬化させてなる保護膜又は絶縁膜、それを用いたタッチパネル及びその製造方法

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KR20150118582A true KR20150118582A (ko) 2015-10-22

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KR1020157017378A KR20150118582A (ko) 2013-02-12 2014-01-22 감광성 수지 조성물, 그것을 열경화시켜서 이루어지는 보호막 또는 절연막, 그것을 사용한 터치 패널 및 그 제조 방법

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JP (1) JP6319082B2 (zh)
KR (1) KR20150118582A (zh)
CN (1) CN104981737A (zh)
TW (1) TWI596427B (zh)
WO (1) WO2014125884A1 (zh)

Cited By (2)

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KR20180071807A (ko) * 2016-12-20 2018-06-28 솔브레인 주식회사 오버코팅 조성물 및 이를 이용하여 제조된 도전막
KR20180134196A (ko) * 2017-06-08 2018-12-18 마이크로크래프트코리아 주식회사 잉크젯용 수지 조성물 및 이를 이용하여 제조된 인쇄 배선판

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JP6417669B2 (ja) * 2013-03-05 2018-11-07 東レ株式会社 感光性樹脂組成物、保護膜及び絶縁膜並びにタッチパネルの製造方法
WO2015129443A1 (ja) * 2014-02-26 2015-09-03 株式会社日本触媒 硬化性樹脂組成物及びその用途
TWI512058B (zh) * 2014-12-25 2015-12-11 Chi Mei Corp 光硬化性塗佈組成物、光硬化塗佈膜及觸控面板
JP6732215B2 (ja) 2015-07-06 2020-07-29 三菱瓦斯化学株式会社 樹脂組成物、プリプレグ、レジンシート、金属箔張積層板及びプリント配線板
JP6714493B2 (ja) * 2015-12-24 2020-06-24 信越化学工業株式会社 有機膜形成用化合物、有機膜形成用組成物、有機膜形成方法、及びパターン形成方法
CN107957655A (zh) * 2016-10-18 2018-04-24 广州亦盛环保科技有限公司 一种3d盖板玻璃用负型感光性白色油墨及其制备方法、使用方法
CN110419003B (zh) * 2017-03-17 2023-04-18 大阪有机化学工业株式会社 感光性树脂组合物
KR102254366B1 (ko) * 2017-03-28 2021-05-24 도레이 카부시키가이샤 감광성 수지 조성물, 경화막, 경화막을 구비하는 소자, 경화막을 구비하는 유기 el 표시 장치, 경화막의 제조 방법, 및 유기 el 표시 장치의 제조 방법
JPWO2019059169A1 (ja) * 2017-09-22 2020-09-03 東レ株式会社 透明感光性樹脂組成物、フォトスペーサー、液晶表示装置、フォトスペーサーの製造方法、液晶表示装置の製造方法および透明感光性樹脂組成物のレンズスキャン露光への使用
WO2019065687A1 (ja) * 2017-09-26 2019-04-04 大阪有機化学工業株式会社 フォトスペーサ形成用感光性樹脂組成物、フォトスペーサの形成方法、フォトスペーサ付基板、及び、カラーフィルタ
CN111837075B (zh) 2018-03-23 2024-07-05 默克专利股份有限公司 负型超厚膜光刻胶
EP3793750A4 (en) * 2018-05-14 2022-06-22 NBD Nanotechnologies, Inc. ORGANOSILANE COATING COMPOSITIONS
JPWO2020040092A1 (ja) * 2018-08-20 2021-09-02 Jsr株式会社 パターン形成方法及び感放射線性組成物
JP2020166214A (ja) * 2019-03-29 2020-10-08 太陽インキ製造株式会社 感光性樹脂組成物、ドライフィルム、硬化物、および、電子部品
JP7428491B2 (ja) * 2019-08-20 2024-02-06 東京応化工業株式会社 硬化性組成物、硬化物、及び絶縁膜の形成方法
KR20210122066A (ko) * 2020-03-30 2021-10-08 동우 화인켐 주식회사 절연막 형성용 수지 조성물, 이를 이용하여 제조된 절연막, 화상표시장치 및 절연막 제조 방법
CN114236966A (zh) * 2021-12-21 2022-03-25 潍坊星泰克微电子材料有限公司 用于干法刻蚀的丙烯酸酯类负性光刻胶膜及其制备方法
KR20230141587A (ko) 2022-03-31 2023-10-10 아사히 가세이 가부시키가이샤 감광성 수지 조성물 및 감광성 엘리먼트

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KR20180071807A (ko) * 2016-12-20 2018-06-28 솔브레인 주식회사 오버코팅 조성물 및 이를 이용하여 제조된 도전막
KR20180134196A (ko) * 2017-06-08 2018-12-18 마이크로크래프트코리아 주식회사 잉크젯용 수지 조성물 및 이를 이용하여 제조된 인쇄 배선판
US11390766B2 (en) 2017-06-08 2022-07-19 Microcraft Korea Co., Ltd. Resin composition for inkjet printing and printed wiring board prepared by using same

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Publication number Publication date
WO2014125884A1 (ja) 2014-08-21
CN104981737A (zh) 2015-10-14
JPWO2014125884A1 (ja) 2017-02-02
TW201435493A (zh) 2014-09-16
JP6319082B2 (ja) 2018-05-09
TWI596427B (zh) 2017-08-21

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