KR20100032335A - 산화아연계 타깃 - Google Patents
산화아연계 타깃 Download PDFInfo
- Publication number
- KR20100032335A KR20100032335A KR1020090087378A KR20090087378A KR20100032335A KR 20100032335 A KR20100032335 A KR 20100032335A KR 1020090087378 A KR1020090087378 A KR 1020090087378A KR 20090087378 A KR20090087378 A KR 20090087378A KR 20100032335 A KR20100032335 A KR 20100032335A
- Authority
- KR
- South Korea
- Prior art keywords
- zinc oxide
- content
- gallium
- titanium
- less
- Prior art date
Links
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 title claims abstract description 69
- 239000011787 zinc oxide Substances 0.000 title claims abstract description 34
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 38
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 38
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 35
- 239000010936 titanium Substances 0.000 claims description 48
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 abstract description 8
- 238000000034 method Methods 0.000 description 22
- 230000007613 environmental effect Effects 0.000 description 21
- 238000012360 testing method Methods 0.000 description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- 238000000465 moulding Methods 0.000 description 11
- 239000000843 powder Substances 0.000 description 7
- 238000005477 sputtering target Methods 0.000 description 7
- 238000001914 filtration Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000012528 membrane Substances 0.000 description 5
- 239000011812 mixed powder Substances 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/003—Titanates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
- C04B35/632—Organic additives
- C04B35/634—Polymers
- C04B35/63404—Polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C04B35/63416—Polyvinylalcohols [PVA]; Polyvinylacetates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
- C04B35/638—Removal thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3232—Titanium oxides or titanates, e.g. rutile or anatase
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3284—Zinc oxides, zincates, cadmium oxides, cadmiates, mercury oxides, mercurates or oxide forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5409—Particle size related information expressed by specific surface values
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
- C04B2235/6562—Heating rate
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
- C04B2235/6565—Cooling rate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
Claims (3)
- 산화아연을 주성분으로 하고, 티탄(Ti) 및 갈륨(Ga)의 양 원소를 함유하고, 양 원소가 티탄 1.1at% 이상 또는 갈륨 4.5at% 이상의 범위에서 함유되어 있는 산화물 소결체를 구비하는 것을 특징으로 하는 산화아연계 타깃.
- 제 1 항에 있어서, 갈륨의 함유량(y)(at%)이 티탄의 함유량(x)(at%)으로 표시되는 값 (-2x+10.4) 이하의 범위이고 또한 티탄의 함유량(x)(at%)으로 표시되는 값 (-0.5x+1.1) 이상의 범위에 있는 것을 특징으로 하는 산화아연계 타깃.
- 제 1 항 또는 제 2 항에 있어서, 갈륨의 함유량(y)(at%)이 티탄의 함유량(x)(at%)으로 표시되는 값 (-x+3.4) 이하, (x-0.9) 이하, 또는 (-2.3X+10.1) 이상의 범위에 있는 것을 특징으로 하는 산화아연계 타깃.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008238751A JP4295811B1 (ja) | 2008-09-17 | 2008-09-17 | 酸化亜鉛系ターゲット |
JPJP-P-2008-238751 | 2008-09-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100032335A true KR20100032335A (ko) | 2010-03-25 |
KR100958665B1 KR100958665B1 (ko) | 2010-05-20 |
Family
ID=40921894
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090087378A KR100958665B1 (ko) | 2008-09-17 | 2009-09-16 | 산화아연계 타깃 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7790644B2 (ko) |
JP (1) | JP4295811B1 (ko) |
KR (1) | KR100958665B1 (ko) |
CN (1) | CN101914754B (ko) |
TW (1) | TWI396675B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105476443A (zh) * | 2014-12-08 | 2016-04-13 | 三次火炉工程公司 | 旋转式大型汤锅 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008052913A (ja) * | 2006-08-22 | 2008-03-06 | Sumitomo Chemical Co Ltd | 透明導電膜およびその製造方法 |
JP5003600B2 (ja) * | 2008-06-13 | 2012-08-15 | 住友金属鉱山株式会社 | 酸化物焼結体、ターゲット、およびそれを用いて得られる透明導電膜、導電性積層体 |
JP5585046B2 (ja) * | 2009-10-27 | 2014-09-10 | 東ソー株式会社 | 複合酸化物焼結体、ターゲット及び酸化物透明導電膜 |
WO2011102425A1 (ja) * | 2010-02-18 | 2011-08-25 | 住友化学株式会社 | 酸化物焼結体、酸化物混合体、それらの製造方法およびそれらを用いたターゲット |
JP2011222687A (ja) * | 2010-04-08 | 2011-11-04 | Tosoh Corp | 太陽電池 |
US9111663B2 (en) * | 2010-09-29 | 2015-08-18 | Tosoh Corporation | Sintered composite oxide, manufacturing method therefor, sputtering target, transparent conductive oxide film, and manufacturing method therefor |
US9885108B2 (en) * | 2012-08-07 | 2018-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming sputtering target |
JP6776931B2 (ja) * | 2016-03-23 | 2020-10-28 | 三菱マテリアル株式会社 | 積層反射電極膜、積層反射電極パターン、積層反射電極パターンの製造方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62154411A (ja) | 1985-12-26 | 1987-07-09 | 三井金属鉱業株式会社 | 透明導電膜 |
US5236632A (en) * | 1989-08-10 | 1993-08-17 | Tosoh Corporation | Zinc oxide sintered body, and preparation process and use thereof |
JPH08264022A (ja) | 1995-03-27 | 1996-10-11 | Gunze Ltd | 透明導電膜 |
JPH0945140A (ja) | 1995-07-28 | 1997-02-14 | Sumitomo Metal Mining Co Ltd | 酸化亜鉛系透明導電性膜 |
JPH10306367A (ja) | 1997-05-06 | 1998-11-17 | Sumitomo Metal Mining Co Ltd | スパッタリングターゲット用ZnO−Ga2O3系焼結体およびその製造方法 |
JP3571540B2 (ja) | 1998-02-04 | 2004-09-29 | 三井金属鉱業株式会社 | 濾過式成形型およびその型を用いたセラミックス焼結体の製造方法 |
JP3841388B2 (ja) | 1998-02-16 | 2006-11-01 | 日鉱金属株式会社 | 光ディスク用保護膜及び光ディスクの保護膜形成用スパッタリングターゲット |
JP3636914B2 (ja) | 1998-02-16 | 2005-04-06 | 株式会社日鉱マテリアルズ | 高抵抗透明導電膜及び高抵抗透明導電膜の製造方法並びに高抵抗透明導電膜形成用スパッタリングターゲット |
JPH11256320A (ja) | 1998-03-13 | 1999-09-21 | Sumitomo Metal Mining Co Ltd | ZnO系焼結体 |
JPH11322332A (ja) * | 1998-05-21 | 1999-11-24 | Sumitomo Metal Mining Co Ltd | ZnO系焼結体およびその製造方法 |
JP2000195101A (ja) * | 1998-12-28 | 2000-07-14 | Japan Energy Corp | 光ディスク保護膜及び同保護膜形成用スパッタリングタ―ゲット |
JP2002075061A (ja) | 2000-08-30 | 2002-03-15 | Uchitsugu Minami | 透明導電膜 |
JP2002075062A (ja) | 2000-09-01 | 2002-03-15 | Uchitsugu Minami | 透明導電膜 |
EP1431414A1 (en) * | 2001-09-27 | 2004-06-23 | Idemitsu Kosan Co., Ltd. | Sputtering target and transparent electroconductive film |
CN100363531C (zh) * | 2005-06-21 | 2008-01-23 | 山东大学 | 一种镓掺杂氧化锌透明导电膜的制备方法 |
KR101004981B1 (ko) * | 2005-06-28 | 2011-01-04 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | 산화갈륨-산화아연계 스퍼터링 타겟, 투명 도전막의 형성방법 및 투명 도전막 |
JP4926977B2 (ja) * | 2005-12-08 | 2012-05-09 | Jx日鉱日石金属株式会社 | 酸化ガリウム−酸化亜鉛系焼結体スパッタリングターゲット |
-
2008
- 2008-09-17 JP JP2008238751A patent/JP4295811B1/ja active Active
-
2009
- 2009-09-16 TW TW098131168A patent/TWI396675B/zh active
- 2009-09-16 KR KR1020090087378A patent/KR100958665B1/ko active IP Right Grant
- 2009-09-17 US US12/561,715 patent/US7790644B2/en not_active Expired - Fee Related
- 2009-09-17 CN CN2009102584923A patent/CN101914754B/zh active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105476443A (zh) * | 2014-12-08 | 2016-04-13 | 三次火炉工程公司 | 旋转式大型汤锅 |
Also Published As
Publication number | Publication date |
---|---|
TW201022178A (en) | 2010-06-16 |
KR100958665B1 (ko) | 2010-05-20 |
US20100065424A1 (en) | 2010-03-18 |
JP2010070796A (ja) | 2010-04-02 |
CN101914754A (zh) | 2010-12-15 |
JP4295811B1 (ja) | 2009-07-15 |
CN101914754B (zh) | 2012-10-31 |
TWI396675B (zh) | 2013-05-21 |
US7790644B2 (en) | 2010-09-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100958665B1 (ko) | 산화아연계 타깃 | |
KR101590429B1 (ko) | 복합 산화물 소결체, 복합 산화물 소결체의 제조방법, 스퍼터링 타겟 및 박막의 제조방법 | |
KR101738742B1 (ko) | 산화물 소결체, 스퍼터링 타깃 및 박막 그리고 산화물 소결체의 제조 방법 | |
JP2009132998A (ja) | ZnOスパッタリングターゲットとその製造方法 | |
KR100958666B1 (ko) | 산화 인듐계 투명 도전막 및 그 제조 방법 | |
KR20080113054A (ko) | 투명 도전성막 및 그 제조 방법 | |
JP2011184715A (ja) | 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、および酸化亜鉛系透明導電膜の形成方法 | |
TW201013709A (en) | Zinc oxide group transparent conductive film and process for making same | |
JP2008255474A (ja) | ZnO蒸着材及びそれにより形成されたZnO膜 | |
KR101668963B1 (ko) | 산화물 소결체 및 그 제조 방법, 산화물 스퍼터링 타깃 그리고 도전성 산화물 박막 | |
WO2011152682A2 (ko) | 투명도전막, 투명도전막용 타겟 및 투명도전막용 타겟의 제조방법 | |
JP2012158825A (ja) | 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、酸化亜鉛系透明導電膜の形成方法および透明導電性基板 | |
JP5952031B2 (ja) | 酸化物焼結体の製造方法およびターゲットの製造方法 | |
JP2008255475A (ja) | ZnO蒸着材及びそれにより形成されたZnO膜 | |
JP2008255473A (ja) | ZnO蒸着材及びそれにより形成されたZnO膜 | |
TW590995B (en) | Metal oxide sintered compact and its use | |
JP2012106880A (ja) | 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、および酸化亜鉛系透明導電膜の形成方法 | |
JP2012106879A (ja) | 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、および酸化亜鉛系透明導電膜の形成方法 | |
JP2012197216A (ja) | 酸化物焼結体、その製造方法およびそれを用いたターゲット | |
JP2012140673A (ja) | 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、および酸化亜鉛系透明導電膜の形成方法 | |
JP2002050231A (ja) | 透明導電膜およびその製造方法並びにその用途 | |
JP3379743B2 (ja) | 透明導電性酸化物材料 | |
JP2012148937A (ja) | 導電性複合酸化物、酸化亜鉛系焼結体、その製造方法およびターゲット | |
JP2012140696A (ja) | 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、および酸化亜鉛系透明導電膜の形成方法 | |
KR20120072237A (ko) | 투명전극용 인듐-갈륨-실리콘-아연 산화물계 조성물 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
A302 | Request for accelerated examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130502 Year of fee payment: 4 |
|
FPAY | Annual fee payment |
Payment date: 20140418 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20150416 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20160418 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20170421 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20180418 Year of fee payment: 9 |