KR20040030921A - 접촉패드가 구비된 표면을 가진 전기장치의 전기적 및기계적 연결을 허용하는 방법 및 장치 - Google Patents

접촉패드가 구비된 표면을 가진 전기장치의 전기적 및기계적 연결을 허용하는 방법 및 장치 Download PDF

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KR20040030921A
KR20040030921A KR10-2004-7001685A KR20047001685A KR20040030921A KR 20040030921 A KR20040030921 A KR 20040030921A KR 20047001685 A KR20047001685 A KR 20047001685A KR 20040030921 A KR20040030921 A KR 20040030921A
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South Korea
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opening
layer
electrical device
adhesive
contact pad
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KR10-2004-7001685A
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English (en)
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KR100934862B1 (ko
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베아뜨리스 봉발로
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슐럼버거 시스템즈
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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Connections Effected By Soldering, Adhesion, Or Permanent Deformation (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Multi-Conductor Connections (AREA)

Abstract

다른 전기장치에 전기적으로 및 기계적으로 연결가능하며, 접촉패드가 구비된 표면을 가지는 전기장치를 제작하는 방법에 있어서,
상기 방법은, - 접착층이 접촉패드가 구비된 표면 상에 제공되어지고, 접착층은 접착성질을 가진 물질로 구성되어지는 층 제공 단계(layer-application step)와 - 오프닝이 접착패드의 레벨에서 접착층을 통하여 발생되어지는 오프닝 발생 단계, 그리고 - 오프닝이 전도성재료로 채워져서 오프닝에 의해 한정되는 전도성 경로의 체적을 형성하도록 오프닝이 전도성 재료로 실질적으로 채워지는 오프닝 채움 단계를 포함하는 것을 특징으로 하는 방법

Description

접촉패드가 구비된 표면을 가진 전기장치의 전기적 및 기계적 연결을 허용하는 방법 및 장치{PROCESS TO ALLOW ELECTRICAL AND MECHANICAL CONNECTION OF AN ELECTRICAL DEVICE WITH A FACE EQUIPPED WITH CONTACT PADS}
연결프로세스(connection process)는 이방성도체필름(ACF, Anisotropic Conductor Film)이라 불리우는 필름의 사용에 근거하고 있다. 필름의 이러한 타입은 필름의 두께를 통하여 연장되는 전도성 소재(conducting element)를 포함한다. 제 1 단계에 따라서, 필름은 중립 서포트(neutral support) 상에서 분리가능하게 만들어진다. 제 2 단계에 따라서, 필름은 부-인그레이빙(sub-engraving)을 사용하여 정밀하게 회복되어진다. 제 3 단계에 따라서, 필름은 각각의 표면 상에서 접착제(glue)로서 제 1 구성성분 상으로 제공되도록 접착되어진다. 마지막 단계는 아직 덮혀지지 않은 필름의 부분 상으로 제 2 성분을 연결하는 것으로 이루어진다. 마지막으로, 양 구성성분들은 필름의 양쪽 면 상에 접착된 접착제를 통하여 기계적으로 고정되어지고, 필름 내에서 둘러싸여진 금속소재를 전기적으로 사용한다.
미국 특허 US 6,256,874호는 제 1 전도층의 선택된 영역 상에서 덴트리트(dentrites)들을 형성하고, 제 2 전도층의 선택된 영역 상에서 덴트리트들을 형성하는 단계들을 포함하는 전자 회로패키지 내의 두개의 전도층(conductive layer)을 연결하기 위한 방법을 기술하고 있다. 덴트리트들은 포토레지스트 재료(photoresist material)에 의해서 제 1 표면금속의 부위에 형성되어지고, 다음으로 덴트리트들이 형성되어지게 되는 노출된 부위를 제공하도록 포토리소그래픽 기술(photolithographic technique)에 의한 레지스트를 노출하고 전개한다. 그 다음 포토레지스트들이 제거되어진다. 상기 방법은 제 1 전도층에 걸쳐서 에폭시 접착재료를 제공하고, 제 1 전도층에 제 2 전도층을 압축적으로 부착하게 하여 제 1 전도층 상의 덴트리들이 제 2 전도층 상의 덴트리들과 접촉하게 하는 단계를 추가로 포함한다.
본 발명은 다른 전기장치(electrical device)와의 전기적 및 기계적 연결(connection)하는 전기장치에 관한 것이다. 양자는 예를 들어 웨이퍼(wafer), 집적회로(integrated circuit) 또는 심지어 구성성분(component)으로 될 수 있다. 본 발명은 특히 집적회로의 보호분야에 제공되며, 더욱 상세하게는 메모리 카드의 분야에 제공된다.
도 1은 본 발명의 프로세스(process)를 위한 시작점인 플레이트(plate)를 도시하는 단면도
도 2는 본 발명의 프로세스 주제의 제 1 단계에 따라 플레이트에 제공되어지는 고정 유기층(fixing organic layer)을 도시하는 단면도
도 3은 본 발명의 프로세스 주제의 제 2 단계에 따라 구조화되어지는 고정 유기층을 도시하는 단면도
도 4는 고정층이 작은 금속 스틱(stick)들을 갖춘 본 발명에 따른 프로세스의 단계를 도시하는 모습
도 5는 플레이트의 부분에 대하여 수평 모습과 단면모습으로서 도시된 모습
도 6은 본 발명의 프로세스에 따라 고정단계(fixing stage)의 시작을 도시하는 모습
도 7은 열압착(thermo-compression)에 의해 고정단계 후에 플레이트를 도시하는 단면도
도 8은 제 1 플레이트의 테이퍼링(tapering)을 도시하는 단면도
<도면의 주요부분에 대한 부호의 설명>
O, 0' : 플레이트 1 : 실리콘 칩
2 : 회로 3 : 보호층
4 : 접촉패드 5 : 유기층
본 발명의 목적은 비용을 감소하는 것이다.
다른 전기장치에 전기적으로 그리고 기계적으로 연결가능한 전기장치를 제작하기 위한 방법인 본 발명의 하나의 특징에 따르면, 전기장치는 접촉 패드(contact pad)가 갖추어진 표면(face)을 가지며, 방법은 다음의 단계를 포함하는 것을 특징으로 한다.
- 접착층(adhesive layer)이 접촉패드가 갖추어진 표면 상에 제공되어지고, 접착층은 접착성질을 가진 물질로 구성되어지는 층-적용 단계(layer-application step)
- 접촉패드의 레벨에서 접착층들을 통하여 오프닝(opening)이 발생되어지는 오프닝-발생 단계(opening creation step)
- 오프닝에 의해 한정되는 체적이 전도성 경로를 형성하기 위하여 오프닝들이 전도성 재료로 실질적으로 채워지도록, 전도성 재료로 오프닝들을 채우는 오프닝-채움 단계(opening-filling step)
말하자면, 접착층(adhesive layer)은 전도성 경로(conductive path)를 형성하는 몰드로서 사용되어진다. 결과적으로 미국 특허 US 6,256,874호와 같이 특정의 포토레지스트 층에 대한 필요는 없다. 따라서 본 발명은 비용의 감소를 허용한다.
본 발명은 첨부한 도면과 관련하여 기술되는 다음의 비제한적인 실시예의 설명으로부터 더욱 잘 이해되어진다.
도 1은 본 발명에 따른 프로세스의 시작점(stating point)을 도시한다. 플레이트(0)는 실리콘 칩(silicium chip, 1)을 포함하며, 상기 실리콘 칩 상에 회로(2)가 배열되어진다. 보호층(passivation layer, 3)은 회로(2)를 포함하는 층(layer) 상에 덧붙여진다. 상기 보호층(3) 에서는, 접촉패드(contact pad, 4)가 추가적인 회로와의 상호연결을 배열하기 위한 목적으로 삽입되어진다.
도 2는 붙이는 성질(sticking characteristics)을 가지는 유기층(organic layer, 5)이 놓여지는 단계인, 프로세스의 제 1 단계를 도시한다. 상기 유기층은 접촉패드(4)를 포함하는 보호층(3)상에 덧붙여진다. 상기 유기층은 예를 들어 원심분리(centrifuging)에 의해 얻어지는 용액(solution)의 형태로 놓여지게 된다.
도 3에서 도시되어지는 바와 같이, 건조단계 후에 유기물(5)은 부분적으로 또는 전체적으로 제거되어지고, 이러한 것은 특히 접촉패드(4)의 레벨에서 발생한다. 상기 물질의 제거는 예를 들어 에칭(etching)에 의해서 얻어질 수도 있다. 만일 유기물이 감광성(photosensitive)이라면, 마스커(masker)를 제공한 후에 광선(ray) 특히 자외선에 노출되어질 수도 있다. 노출된 유기물의 부분들은 화학제욕(chemical bath)을 사용하여 최종적으로 분해되어질 수 있다. 수정된 유기층(5)은 구조적으로 형성되어지는 것으로 말해진다.
도 4는 유기물이 제거되어진 영역에서의 작은 금속 스틱(stick, 7)을 위한 성장단계인 차후의 단계를 도시한다. 상기 금속스틱 성장(growth)은 예를 들어 무전해(electroless) 또는 전기화학(electrochemistry)을 사용하는 화확제욕 내에서 얻어진다. 작은 금속스틱(7)들은 접촉패드 표면(4)에 수직하게 방향화되어지는 것이 선호되며, 층(5) 내의 유기물에 의해 서로로부터 절연되어지게 된다. 비록 도 4는 접촉패드(4)의 레벨에서 작은 금속스틱(7)의 존재를 제시하고 있지만, 이러한 것은 다른 분야에서 또한 특정의 성장을 하는 가능성을 배제하는 것은 아니다.
도 6에서 도시되는 바와 같이 다음의 단계는, 플레이트(0)와 같은 형태의 제 2 플레이트(0')를 제 1 플레이트(0) 상에 일렬로 되어, 패드(4)와 패드(4')가 서로 접촉하도록 하는 단계를 나타낸다. 상기 제 2 플레이트는 회로(2)의 작동을 위하여 필요한 회로(2')을 포함할 수도 있다.
도 7에서 기술되어지는 바와 같이 그 다음의 단계에서, 플레이트 (0)과 (0')은 예를 들어 열압착을 사용하여 서로 고정되어진다. 초음파기술은 장점적으로 사용되어질 수도 있다.
플레이트(0')는, 도 7에서 볼 수 있는 바와 같이 예를 들어 전선(wiringcable, 9)에 의해서 전기접촉(4)이 외부에도 존재할 수 있도록 매체(media, 8)를 포함한다.
도 8은, 예를 들어 카드 몸체 속으로 슬립시트(slip sheet)의 삽입을 가능하게 하도록 또는 안전을 위하여 회로의 분리에 있어서의 어려움을 증가하기 위하여, 플레이트(0) 다음이 하부면(1")의 레벨에서 테이퍼(tapering) 처리가 가능한 것을 도시하고 있다.
물론 상기에서 주어진 본 발명의 실시예의 기술은 넓게 이해되어져하는 본 발명을 제한하는 것은 아니다.
특히, 본 발명의 주제는 구성성분(component) 또는 집적회로의 레벨뿐만 아니라 접촉패드가 갖추어진 표면을 가진 다른 전기장치의 레벨에서의 기계적인 및 전기적인 연결분야에 적용될 수 있다. 특히 예를 들어 150 mm의 직경을 가진 특정한 크기와 대략 천가지 구성성분을 포함하는 웨이퍼(wafer)가 의문인 경우에 될 수 있다.
유기층(5)에 관하여, 접착 성질(sticking characteristic)을 가지는 것이 선호되는 특정의 재료가 사용되어질 수 있다. 이러한 것은 특히 폴리마이드(polyimide), 감광성수지(photosensitive resin) 또는열가소성물질(thermoplastics)로 되어질 수 있다. 상기 재료들은 또한 금속 구성성분의 성장(growth)을 조장하는 장점을 가진다. 열가소성물질의 사용은, 두개의 전기적 소재에 피해를 주지 않으면서 분리하는 것이 가능하기 때문에 이익이 된다. 반면에, 폴리마이드는 물리적인 피해없이 두개의 구성성분의 분리를 어렵게 하는 의도일 때마다 장점을 가지고 사용되어질 수 있다. 이러한 것은 물리적 안전(physical security)에 관한 메모리카드 분야에서 특히 이익이 된다.
작은 금속스틱(7)은 더욱 일반적으로는 금속 구성성분, 예를 들어 니켈, 팔라듐(palladium) 또는 구리(copper)를 가진 구성성분으로 되어질 수 있다.
도 5에서 도시되어질 수 있는 바와 같이, 여러 가지 작은 금속스틱(7)들이 전형적으로는 10개인 접촉부위(4) 마다, 성장되어질 수 있는 것이 선호되어진다. 이러한 것은 상대적으로 양질이 전기적 접촉을 허용한다. 금속의 작은 스틱의 직경은 예를 들어 10 ㎛ 내지 30 ㎛의 범위에 있다. 본 발명에 따라서 금속 접촉 구조(4, 7, 4')는 소위 접촉회복(contact recovery)이라 불리우는 것을 회피한다. 이러한 것은 시장 웨이퍼(market wafer) 상에서 국부화된 산화패치(localised oxidation patch)들이 일반적으로 알루미늄으로 되는 접촉패드 상에 종종 존재하기 때문이다. 상기 접촉회복은 양질의 전기적 연결을 가지기 위하여 산화를 제거하도록 하는 상기 접촉패드의 청소(cleaning)에 놓여있다. 그러나 본 발명에 따른 접촉구조(4, 7, 4')는, 특히 산화패치의 크기와 관련된 작은 금속스틱(7)들의 단면의감소된 크기와 수로 인하여, 접촉회복이라 불리우는 상기 단계를 제거하는 것이 가능하게 된다. 예를 들어 특정의 접촉패드 레벨에서 25개의 금속의 작은 스틱이 있다고 가정해보자. 또한, 상기 25개의 작은 스틱들 중 10개가 접촉패드와 접촉하게 되는 것을 방지하는 산화패치들이 있다는 것도 가정할 수 있다. 상기의 경우에 있어서, 15개의 작은 스틱들은 접촉하게 남아 있으며, 그리고 전기장치들 사이에 다소 양질의 전기연결을 보장할 수 있다.
특히 열압착에 의해서 고정되는 경우에 있어서, 만일 도 7 상에서 도시된 전도성 경로(7)가 유기층 두께(5) 보다 더 큰 길이를 가진다면, 고정될 때 제 2 플레이트(0')의 접촉패드(4')의 금속 내에서의 상기 경로의 우수한 상호침투(interpenetration)가 있게 된다. 일반적으로 상기 패드들은 알루미늄이고, 약 1㎛의 두께이다.
본 발명의 실시예의 다른 상태는 또한 특정의 이익의 결과를 가져올 수 있다.
인터페이스 고정레벨(5,7)에서, 복합재료의 여러 가지 층들이 사용되어질 수 있다. 매개층(intermediary layer)은 인터페이스(5,7) 상의 접촉부위(4)를 재배열하는데 사용되어질 수 있다. 제 1 유기층의 구조화에 더하여, 금속트랙(metal track)이 증착(deposition)에 의해 발생되어질 수 있다. 구조화된 제 2 유기층은금속적인 합성물의 성장을 위하여 다시 사용되어질 수 있다. 유기층(5)과 유사한 여러 가지 층들이 전도성 매체를 발생하거나 또는 금속트랙을 발송하도록 이러한 방법으로 사용되어질 수 있다. 마지막 단계에는 제 2 전기장치와의 전기적 및 기계적 연결의 단계가 남아있다. 유기층(5)과 유사한 여러 가지 층들은 인터페이스의 안전성(complexity)과 복잡성(complexity)을 개선하기 위하여 사용되어질 수도 잇다. 다중층(multi-layer)은 회로표면의 개선된 펴주기(planishing) 또는 개선된 화학적 반응성(chemical reactivity)을 위한 모습을 통하여 고정의 품질을 개선할 수 있다.
고정층과 같이 작용하는 유기층(5) 내의 금속의 작은 스틱들의 성장 후에, 플레이트는 더 작은 전기적 개체들로, 예를 들어 집적회로 또는 구성성분으로 나누어질 수 있다. 이때 상기 전기적 개체들은 소위 플립 칩(Flip chip)이라 불리우는 기술을 사용하여 실치되어진다. 유기층내의 재료는 서포트(support) 상에 접착제(sticking agent)로서 사용되어진다. 따라서 플립 칩 기술을 사용하여 얻어지는 40 내지 60 ㎛ 대신에 10 ㎛의 순서로의 연결을 얻는 것이 가능하다. 연결 크기에 있어서 상기의 감소는 특히 높은 주파수 분야에서 장점적으로 된다.

Claims (7)

  1. 다른 전기장치에 전기적으로 및 기계적으로 연결가능하며, 접촉패드가 구비된 표면을 가지는 전기장치를 제작하는 방법에 있어서,
    상기 방법은
    - 접착층이 접촉패드가 구비된 표면 상에 제공되어지고, 접착층은 접착성질을 가진 물질로 구성되어지는 층 제공 단계(layer-application step)
    - 오프닝이 접착패드의 레벨에서 접착층을 통하여 발생되어지는 오프닝 발생 단계
    - 오프닝이 전도성재료로 채워져서 오프닝에 의해 한정되는 전도성 경로의 체적을 형성하도록 오프닝이 전도성 재료로 실질적으로 채워지는 오프닝 채움 단계를 포함하는 것을 특징으로 하는 방법
  2. 제 1 항에 있어서, 고정측은 폴리마이드인 것을 특징으로 하는 방법
  3. 제 1 항에 있어서, 여러 오프닝들은 접촉패드의 레벨에서 고정층을 통하여 발생되어지고, 전도성재료들은 오프닝 속으로 공급되어져서 오프닝에 의해 한정되는 전도성 경로 체적을 형성하도록 각각의 오프닝들이 전도성 재료로 실질적으로 채워지는 것을 특징으로 하는 방법
  4. 제 1 전기장치와 제 2 전기장치를 전기적으로 및 기계적으로 연결하며, 각각의 장치는 접촉패드가 구비된 표면을 가지는 전기장치를 제작하는 방법에 있어서,
    상기 방법은
    - 접착층이 제 1 전기장치의 접촉패드가 구비된 표면 상에 제공되어지고, 접착층은 접착성질을 가진 물질로 구성되어지는 층 제공 단계
    - 오프닝이 접착패드의 레벨에서 접착층을 통하여 발생되어지는 오프닝 발생 단계
    - 오프닝이 전도성재료로 채워져서 오프닝에 의해 한정되는 전도성 경로의 체적을 형성하도록 오프닝이 전도성 재료로 실질적으로 채워지는 오프닝 채움 단계
    - 상기 고정층은 제 2 전기장치의 상기 표면과의 접촉을 발생시키고, 제 1 전기장치의 접촉패드와 제 2 전기장치의 접촉패드 사이의 전기적 연결을 만드는 전도성 경로를 가지는 장치 연결단계를 포함하는 것을 특징으로 하는 방법
  5. 제 1 웨이퍼와 제 2 웨이퍼를 전기적으로 및 기계적으로 연결하며, 각각의 웨이퍼는 접촉패드가 구비된 표면들을 가지게 되는 방법에 있어서,
    상기 방법은
    - 접착층이 제 1 웨이퍼의 접촉패드가 구비된 표면 상에 제공되어지고, 접착층은 접착성질을 가진 물질로 구성되어지는 층 제공 단계
    - 오프닝이 접착패드의 레벨에서 접착층을 통하여 발생되어지는 오프닝 발생 단계
    - 오프닝이 전도성재료로 채워져서 오프닝에 의해 한정되는 전도성 경로의 체적을 형성하도록 오프닝이 전도성 재료로 실질적으로 채워지는 오프닝 채움 단계
    - 상기 고정층은 제 2 웨이퍼의 상기 표면과의 접촉되도록 위치되어지고, 제 1 웨이퍼의 접촉패드와 제 2 웨이퍼의 접촉패드 사이의 전기적 연결을 만드는 전도성 경로를 가지는 장치 연결단계
    - 서로 연결되어지는 두개의 웨이퍼들은 더 작은 전기적 개체로 나누어지는 절단단계를 포함하는 것을 특징으로 하는 방법
  6. 다른 전기장치에 전기적으로 및 기계적으로 연결가능하며, 접촉패드가 구비된 표면을 가지는 전기장치에 있어서,
    전기장치는 상기 표면에 제공되는 연결층을 포함하며, 연결층은 접착성질을 가지며 연결층을 통하여 연장되고 전도성재료로 재워지는 연결층 내의 오프닝에 의해 형성되는 전도성 경로로 구성되는 것을 특징으로 하는 장치
  7. 제 1 전기장치 및 제 2 전기장치로 구성되며, 제 1 장치 및 제 2 장치는 부착성질을 가진 물질로 구성되는 연결층에 의해서 서로 전기적으로 연결되어지는 전기적 조립체에 있어서,
    연결층은, 연결층을 통하여 연장되고 전도성 재료로 채워지게 되는 오프닝에 의해 형성되는 전도성 경로로 구성되는 것을 특징으로 하는 조립체
KR1020047001685A 2001-08-03 2002-08-02 접촉패드가 구비된 표면을 가진 전기장치의 전기적 및기계적 연결을 허용하는 방법 및 장치 KR100934862B1 (ko)

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FR01/10483 2001-08-03
FR0110483A FR2828334A1 (fr) 2001-08-03 2001-08-03 Procede pour rendre connectable electriquement et mecaniquement un dispositif electrique ayant une face munie de plots de contacts
PCT/IB2002/003041 WO2003015153A2 (en) 2001-08-03 2002-08-02 Process to allow electrical and mechanical connection of an electrical device with a face equipped with contact pads

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KR100934862B1 (ko) 2009-12-31
CN1565053B (zh) 2010-05-26
US20050034303A1 (en) 2005-02-17
WO2003015153A3 (en) 2004-03-11
US8429813B2 (en) 2013-04-30
AU2002355496A1 (en) 2003-02-24
US8508952B2 (en) 2013-08-13
EP1421614A2 (en) 2004-05-26
US20100157555A1 (en) 2010-06-24
CN1565053A (zh) 2005-01-12
EP1421614B1 (en) 2015-02-25
CN101872753A (zh) 2010-10-27
FR2828334A1 (fr) 2003-02-07
CN101872753B (zh) 2013-01-30
WO2003015153A2 (en) 2003-02-20
JP2005526374A (ja) 2005-09-02
HK1068730A1 (en) 2005-04-29

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