KR20010089795A - 니켈 분말, 그 제조 방법 및 도전 페이스트 - Google Patents
니켈 분말, 그 제조 방법 및 도전 페이스트 Download PDFInfo
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- KR20010089795A KR20010089795A KR1020017008662A KR20017008662A KR20010089795A KR 20010089795 A KR20010089795 A KR 20010089795A KR 1020017008662 A KR1020017008662 A KR 1020017008662A KR 20017008662 A KR20017008662 A KR 20017008662A KR 20010089795 A KR20010089795 A KR 20010089795A
- Authority
- KR
- South Korea
- Prior art keywords
- nickel
- nickel powder
- particle diameter
- powder
- less
- Prior art date
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 172
- 238000000034 method Methods 0.000 title claims description 8
- 238000002360 preparation method Methods 0.000 title description 2
- 239000002245 particle Substances 0.000 claims abstract description 131
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 40
- 238000009826 distribution Methods 0.000 claims abstract description 38
- 239000003985 ceramic capacitor Substances 0.000 claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 claims abstract description 30
- 239000012535 impurity Substances 0.000 claims abstract description 17
- 230000000737 periodic effect Effects 0.000 claims abstract description 17
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 13
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000460 chlorine Substances 0.000 claims abstract description 13
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 13
- 239000011593 sulfur Substances 0.000 claims abstract description 13
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 13
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 13
- 150000003624 transition metals Chemical class 0.000 claims abstract description 13
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 9
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 9
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 8
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 8
- 239000007864 aqueous solution Substances 0.000 claims description 33
- 150000002815 nickel Chemical class 0.000 claims description 33
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 claims description 31
- 239000002002 slurry Substances 0.000 claims description 22
- 239000000243 solution Substances 0.000 claims description 21
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 20
- 239000000843 powder Substances 0.000 claims description 17
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 16
- 239000012266 salt solution Substances 0.000 claims description 15
- 150000001875 compounds Chemical class 0.000 claims description 10
- 125000003277 amino group Chemical group 0.000 claims description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 9
- 238000006722 reduction reaction Methods 0.000 claims description 8
- 239000003638 chemical reducing agent Substances 0.000 claims description 7
- 238000000790 scattering method Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 230000002950 deficient Effects 0.000 description 11
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 6
- 239000001856 Ethyl cellulose Substances 0.000 description 6
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 239000002270 dispersing agent Substances 0.000 description 6
- 229920001249 ethyl cellulose Polymers 0.000 description 6
- 235000019325 ethyl cellulose Nutrition 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 5
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 5
- 239000011575 calcium Substances 0.000 description 5
- 229910052791 calcium Inorganic materials 0.000 description 5
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 238000005469 granulation Methods 0.000 description 5
- 230000003179 granulation Effects 0.000 description 5
- 229910052500 inorganic mineral Inorganic materials 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 229910052749 magnesium Inorganic materials 0.000 description 5
- 239000011707 mineral Substances 0.000 description 5
- 239000011591 potassium Substances 0.000 description 5
- 229910052700 potassium Inorganic materials 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- 235000015096 spirit Nutrition 0.000 description 5
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 4
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000010298 pulverizing process Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- -1 epoxy and acryl Chemical class 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- 239000004471 Glycine Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000005194 fractionation Methods 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229940053662 nickel sulfate Drugs 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- FUSNOPLQVRUIIM-UHFFFAOYSA-N 4-amino-2-(4,4-dimethyl-2-oxoimidazolidin-1-yl)-n-[3-(trifluoromethyl)phenyl]pyrimidine-5-carboxamide Chemical compound O=C1NC(C)(C)CN1C(N=C1N)=NC=C1C(=O)NC1=CC=CC(C(F)(F)F)=C1 FUSNOPLQVRUIIM-UHFFFAOYSA-N 0.000 description 1
- PXRKCOCTEMYUEG-UHFFFAOYSA-N 5-aminoisoindole-1,3-dione Chemical compound NC1=CC=C2C(=O)NC(=O)C2=C1 PXRKCOCTEMYUEG-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- BIVUUOPIAYRCAP-UHFFFAOYSA-N aminoazanium;chloride Chemical compound Cl.NN BIVUUOPIAYRCAP-UHFFFAOYSA-N 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- PTYMQUSHTAONGW-UHFFFAOYSA-N carbonic acid;hydrazine Chemical compound NN.OC(O)=O PTYMQUSHTAONGW-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 229920005839 ecoflex® Polymers 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- 239000012493 hydrazine sulfate Substances 0.000 description 1
- 229910000377 hydrazine sulfate Inorganic materials 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000004682 monohydrates Chemical class 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/008—Selection of materials
- H01G4/0085—Fried electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/052—Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Ceramic Capacitors (AREA)
- Conductive Materials (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
Claims (16)
- SEM 관찰에 의한 평균 입자 직경의 1.2배 이상의 입자 직경을 가진 입자수가 전 입자수의 5% 이하이고, 이 평균 입자 직경의 0.8배 이하의 입자 직경을 가진 입자수가 전 입자수의 5% 이하인 것을 특징으로 하는 니켈 분말.
- 제 1 항에 있어서, 용액 중에 분산시켜 레이저 회절 산란법에 의해 체적 분포를 측정하여 구한 입도 분포의 사하 적산 분포 50%에 상당하는 입자 직경(D50)에 대한 최대 입자 직경(Dmax)의 비가 4배 이하인 것을 특징으로 하는 니켈 분말.
- 제 1 항에 있어서, 니켈 분말 중의 알칼리 금속, 알칼리 토금속, 원소 주기율표 제 4 주기의 전이 금속(단 니켈은 제외), 황 및 염소로 구성되는 불순물의 총량이 600rpm 이하인 것을 특징으로 하는 니켈 분말.
- 제 2 항에 있어서, 니켈 분말 중의 알칼리 금속, 알칼리 토금속, 원조 주기율표 제 4 주기의 전이 금속(단, 니켈은 제외), 황 및 염소로 구성되는 불순물의 총량이 600rpm 이하인 것을 특징으로 하는 니켈 분말.
- 제 1 항에 기재되어 있는 니켈 분말을 함유하는 것을 특징으로 하는 적층 세라믹 콘덴서용 도전 페이스트.
- 제 2 항에 기재되어 있는 니켈 분말을 함유하는 것을 특징으로 하는 적층 세라믹 콘덴서용 도전 페이스트.
- 제 3 항에 기재되어 있는 니켈 분말을 함유하는 것을 특징으로 하는 적층 세라믹 콘덴서용 도전 페이스트.
- 제 4 항에 기재되어 있는 니켈 분말을 함유하는 것을 특징으로 하는 적층 세라믹 콘덴서용 도전 페이스트.
- 니켈염 수용액을 알칼리 금속 수산화물 수용액에 첨가함으로써 수득되는 니켈 수산화물을 함유하는 슬러리를 55℃ 이상의 온도 조건하에서 히드라진계 환원제와 접촉시켜서 니켈 수산화물을 환원하는 것을 특징으로 하는 니켈 분말의 제조 방법.
- 제 9 항에 있어서, 니켈염 수용액이 니켈 착체를 함유하고 있는 것을 특징으로 하는 니켈 분말의 제조 방법.
- 제 9 항에 있어서, 니켈 착체를 함유하고 있는 니켈염 수용액이, 니켈염과,카르복실기 및/또는 아미노기를 가진 수용성 화합물을 함유하는 수용액을 생성시킴에 의해 수득되는 것을 특징으로 하는 니켈 분말의 제조 방법.
- 제 10 항에 있어서, 니켈 착체를 함유하고 있는 니켈염 수용액이, 니켈염과, 카르복실기 및/또는 아미노기를 가진 수용성 화합물을 함유하는 수용액을 생성시킴에 의해 수득되는 것을 특징으로 하는 니켈 분말의 제조 방법.
- 제 9 항에 있어서, 환원 반응을 실시한 후에, 그 수득된 니켈 분말을 해립 처리하여 단분산 분말을 수득하는 것을 특징으로 하는 니켈 분말의 제조 방법.
- 제 10 항에 있어서, 환원 반응을 실시한 후에, 그 수득된 니켈 분말을 해립 처리하여 단분산 분말을 수득하는 것을 특징으로 하는 니켈 분말의 제조 방법.
- 제 11 항에 있어서, 환원 반응을 실시한 후에, 그 수득된 니켈 분말을 해립 처리하여 단분산 분말을 수득하는 것을 특징으로 하는 니켈 분말의 제조 방법.
- 제 12 항에 있어서, 환원 반응을 실시한 후, 그 수득된 니켈 분말을 해립 처리하여 단분산 분말을 수득하는 것을 특징으로 하는 니켈 분말의 제조 방법.
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JPJP-P-1999-00320163 | 1999-11-10 | ||
JP32016399 | 1999-11-10 |
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KR20010089795A true KR20010089795A (ko) | 2001-10-08 |
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US (1) | US6632265B1 (ko) |
EP (1) | EP1151815B1 (ko) |
KR (1) | KR100480866B1 (ko) |
DE (1) | DE60017710T2 (ko) |
TW (1) | TW467780B (ko) |
WO (1) | WO2001034327A1 (ko) |
Cited By (1)
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KR20140146928A (ko) * | 2013-06-18 | 2014-12-29 | 주식회사 엘지화학 | 니켈 입자의 제조 방법 및 그에 의하여 제조된 니켈 입자 |
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JP3868421B2 (ja) * | 2001-06-14 | 2007-01-17 | 東邦チタニウム株式会社 | 金属粉の製造方法および金属粉並びにこれを用いた導電ペーストおよび積層セラミックコンデンサ |
KR100682884B1 (ko) * | 2003-04-08 | 2007-02-15 | 삼성전자주식회사 | 니켈금속분말 및 그 제조 방법 |
CN1299863C (zh) * | 2005-03-31 | 2007-02-14 | 上海交通大学 | 空心或包覆型镍合金球形粉末的制备方法 |
US7604679B2 (en) * | 2005-11-04 | 2009-10-20 | Sumitomo Metal Mining Co., Ltd. | Fine nickel powder and process for producing the same |
JP2007191786A (ja) * | 2005-12-20 | 2007-08-02 | Shinano Kenshi Co Ltd | ニッケル粉およびニッケル粉の製造方法 |
US7911315B2 (en) * | 2006-07-28 | 2011-03-22 | Honeywell International Inc. | Miniature pressure sensor assembly for catheter |
TWI405519B (zh) * | 2007-04-23 | 2013-08-11 | Panasonic Corp | A conductive paste composition for hole filling, a printed circuit board using the same, and a method for manufacturing the same |
US20100038604A1 (en) * | 2007-08-03 | 2010-02-18 | Noritake Co., Limited | Nickel Paste |
JP2009079239A (ja) * | 2007-09-25 | 2009-04-16 | Sumitomo Electric Ind Ltd | ニッケル粉末、またはニッケルを主成分とする合金粉末およびその製造方法、導電性ペースト、並びに積層セラミックコンデンサ |
JP5352259B2 (ja) * | 2009-01-30 | 2013-11-27 | 三井金属鉱業株式会社 | 水酸化ニッケル被覆ニッケル粒子及びその製造方法 |
DE102009057251A1 (de) | 2009-12-08 | 2011-06-09 | Pommersheim, Rainer, Dr. | Verfahren und technischer Prozess zur Herstellung von fein zerteiltem metallischem Pulver |
JP5540921B2 (ja) * | 2010-06-17 | 2014-07-02 | ソニー株式会社 | 音響変換装置 |
JP5598109B2 (ja) * | 2010-06-17 | 2014-10-01 | ソニー株式会社 | 音響変換装置 |
JP5540920B2 (ja) * | 2010-06-17 | 2014-07-02 | ソニー株式会社 | 音響変換装置 |
DE102015006727A1 (de) | 2015-05-30 | 2016-12-01 | Rainer Pommersheim | Verfahren und technischer Prozess zur Herstellung von Mikro- und Nanopartikeln unterschiedlicher Größe |
KR102217288B1 (ko) * | 2018-08-16 | 2021-02-19 | 삼성전기주식회사 | 적층 세라믹 전자부품 및 그 제조방법 |
KR102147408B1 (ko) * | 2018-08-23 | 2020-08-24 | 삼성전기주식회사 | 적층 세라믹 전자부품 및 그 제조방법 |
CN117773096A (zh) * | 2024-01-09 | 2024-03-29 | 长沙立优金属材料有限公司 | 一种高纯度球形镍粉及其制备方法与用途 |
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JP2945644B2 (ja) * | 1997-12-12 | 1999-09-06 | 三井金属鉱業株式会社 | ニッケル微粉末及びその製造方法 |
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- 2000-11-10 DE DE60017710T patent/DE60017710T2/de not_active Expired - Lifetime
- 2000-11-10 EP EP00974911A patent/EP1151815B1/en not_active Expired - Lifetime
- 2000-11-10 KR KR10-2001-7008662A patent/KR100480866B1/ko active IP Right Grant
- 2000-11-10 US US09/869,970 patent/US6632265B1/en not_active Expired - Lifetime
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Cited By (1)
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KR20140146928A (ko) * | 2013-06-18 | 2014-12-29 | 주식회사 엘지화학 | 니켈 입자의 제조 방법 및 그에 의하여 제조된 니켈 입자 |
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Publication number | Publication date |
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DE60017710D1 (de) | 2005-03-03 |
DE60017710T2 (de) | 2005-12-22 |
KR100480866B1 (ko) | 2005-04-07 |
TW467780B (en) | 2001-12-11 |
WO2001034327A1 (fr) | 2001-05-17 |
US6632265B1 (en) | 2003-10-14 |
EP1151815B1 (en) | 2005-01-26 |
EP1151815A1 (en) | 2001-11-07 |
EP1151815A4 (en) | 2003-07-09 |
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