KR102331091B1 - 캐리어가 있는 동박 및 동박적층판 - Google Patents
캐리어가 있는 동박 및 동박적층판 Download PDFInfo
- Publication number
- KR102331091B1 KR102331091B1 KR1020200011008A KR20200011008A KR102331091B1 KR 102331091 B1 KR102331091 B1 KR 102331091B1 KR 1020200011008 A KR1020200011008 A KR 1020200011008A KR 20200011008 A KR20200011008 A KR 20200011008A KR 102331091 B1 KR102331091 B1 KR 102331091B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- carrier
- ultra
- copper
- thin copper
- Prior art date
Links
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/16—Electroplating with layers of varying thickness
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201962800263P | 2019-02-01 | 2019-02-01 | |
US62/800,263 | 2019-02-01 | ||
TW109101285A TWI718843B (zh) | 2019-02-01 | 2020-01-15 | 附載體銅箔及銅箔基板 |
TW109101285 | 2020-01-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20200096428A KR20200096428A (ko) | 2020-08-12 |
KR102331091B1 true KR102331091B1 (ko) | 2021-11-25 |
Family
ID=72039149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020200011008A KR102331091B1 (ko) | 2019-02-01 | 2020-01-30 | 캐리어가 있는 동박 및 동박적층판 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6882544B2 (ja) |
KR (1) | KR102331091B1 (ja) |
MY (1) | MY194463A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI781818B (zh) * | 2021-11-05 | 2022-10-21 | 長春石油化學股份有限公司 | 表面處理銅箔及銅箔基板 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0787270B2 (ja) * | 1992-02-19 | 1995-09-20 | 日鉱グールド・フォイル株式会社 | 印刷回路用銅箔及びその製造方法 |
KR20070017547A (ko) * | 2004-06-03 | 2007-02-12 | 미쓰이 긴조꾸 고교 가부시키가이샤 | 표면 처리 동박 및 그 표면 처리 동박을 이용하여 제조한플렉서블 동박 적층판 및 필름 캐리어 테이프 |
JP6415033B2 (ja) * | 2012-09-11 | 2018-10-31 | Jx金属株式会社 | キャリア付銅箔、銅張積層板の製造方法、及び、プリント配線板の製造方法 |
JP6403969B2 (ja) * | 2013-03-29 | 2018-10-10 | Jx金属株式会社 | キャリア付銅箔、プリント配線板、銅張積層板、電子機器及びプリント配線板の製造方法 |
US10257938B2 (en) * | 2013-07-24 | 2019-04-09 | Jx Nippon Mining & Metals Corporation | Surface-treated copper foil, copper foil with carrier, substrate, resin substrate, printed wiring board, copper clad laminate and method for producing printed wiring board |
JP6782561B2 (ja) * | 2015-07-16 | 2020-11-11 | Jx金属株式会社 | キャリア付銅箔、積層体、積層体の製造方法、プリント配線板の製造方法及び電子機器の製造方法 |
JP6339636B2 (ja) * | 2015-08-06 | 2018-06-06 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
US10057984B1 (en) * | 2017-02-02 | 2018-08-21 | Chang Chun Petrochemical Co., Ltd. | Composite thin copper foil and carrier |
US10205170B1 (en) * | 2017-12-04 | 2019-02-12 | Chang Chun Petrochemical Co., Ltd. | Copper foil for current collector of lithium secondary battery |
-
2020
- 2020-01-30 JP JP2020014029A patent/JP6882544B2/ja active Active
- 2020-01-30 KR KR1020200011008A patent/KR102331091B1/ko active IP Right Grant
- 2020-01-30 MY MYPI2020000548A patent/MY194463A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP6882544B2 (ja) | 2021-06-02 |
MY194463A (en) | 2022-11-30 |
JP2020125542A (ja) | 2020-08-20 |
KR20200096428A (ko) | 2020-08-12 |
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