KR102011723B1 - 프레임 일체형 마스크의 제조 장치 - Google Patents

프레임 일체형 마스크의 제조 장치 Download PDF

Info

Publication number: KR102011723B1
Authority: KR; South Korea
Prior art keywords: mask; frame; unit; grip; manufacturing
Prior art date: 2018-04-20

Application number

KR1020180126078A

Other languages

English (en)

Korean (ko)

Inventor

이유진

Original Assignee

주식회사 티지오테크

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2018-04-20

Filing date

2018-10-22

Publication date

2019-08-19

2018-10-22 Application filed by 주식회사 티지오테크 filed Critical 주식회사 티지오테크

2019-04-12 Priority to PCT/KR2019/004445 priority Critical patent/WO2019203510A1/ko

2019-04-17 Priority to TW108113411A priority patent/TW201945571A/zh

2019-04-19 Priority to CN201910317998.0A priority patent/CN110385527B/zh

2019-08-19 Application granted granted Critical

2019-08-19 Publication of KR102011723B1 publication Critical patent/KR102011723B1/ko

Links

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Images

Classifications

- H01L51/56—
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/20—Bonding
- B23K26/21—Bonding by welding
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

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Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Plasma & Fusion (AREA)
Mechanical Engineering (AREA)
Condensed Matter Physics & Semiconductors (AREA)
General Physics & Mathematics (AREA)
Manufacturing & Machinery (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Electroluminescent Light Sources (AREA)

KR1020180126078A 2018-04-20 2018-10-22 프레임 일체형 마스크의 제조 장치 KR102011723B1 (ko)

Priority Applications (3)

Application Number	Priority Date	Filing Date	Title
PCT/KR2019/004445 WO2019203510A1 (ko)	2018-04-20	2019-04-12	프레임 일체형 마스크의 제조 장치
TW108113411A TW201945571A (zh)	2018-04-20	2019-04-17	框架一體型掩模的製造裝置
CN201910317998.0A CN110385527B (zh)	2018-04-20	2019-04-19	框架一体型掩模的制造装置

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
KR1020180046330		2018-04-20
KR20180046330		2018-04-20

Related Child Applications (2)

Application Number	Title	Priority Date	Filing Date
KR1020190097342A Division KR102152687B1 (ko)	2018-04-20	2019-08-09	프레임 일체형 마스크의 제조 장치
KR1020190097341A Division KR102152686B1 (ko)	2018-04-20	2019-08-09	프레임 일체형 마스크의 제조 장치

Publications (1)

Publication Number	Publication Date
KR102011723B1 true KR102011723B1 (ko)	2019-08-19

Family

ID=67807272

Family Applications (3)

Application Number	Title	Priority Date	Filing Date
KR1020180126078A KR102011723B1 (ko)	2018-04-20	2018-10-22	프레임 일체형 마스크의 제조 장치
KR1020190097342A KR102152687B1 (ko)	2018-04-20	2019-08-09	프레임 일체형 마스크의 제조 장치
KR1020190097341A KR102152686B1 (ko)	2018-04-20	2019-08-09	프레임 일체형 마스크의 제조 장치

Family Applications After (2)

Application Number	Title	Priority Date	Filing Date
KR1020190097342A KR102152687B1 (ko)	2018-04-20	2019-08-09	프레임 일체형 마스크의 제조 장치
KR1020190097341A KR102152686B1 (ko)	2018-04-20	2019-08-09	프레임 일체형 마스크의 제조 장치

Country Status (4)

Country	Link
KR (3)	KR102011723B1 (zh)
CN (1)	CN110385527B (zh)
TW (1)	TW201945571A (zh)
WO (1)	WO2019203510A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN112442654A (zh) *	2019-08-29	2021-03-05	悟勞茂材料公司	掩模支撑模板、掩模支撑模板的制造方法及框架一体型掩模的制造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN113529081A (zh) *	2020-04-09	2021-10-22	悟勞茂材料公司	掩模支撑模板及其制造方法、掩模制造方法及框架一体型掩模的制造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR20040084314A (ko) *	2003-03-27	2004-10-06	삼성에스디아이 주식회사	표시장치용 증착 마스크 및 그의 제조방법
KR20090052203A (ko) *	2007-11-20	2009-05-25	삼성모바일디스플레이주식회사	수직 증착형 마스크 제조장치 및 이를 이용한 수직 증착형마스크의 제조방법
KR20130022586A (ko) *	2011-08-25	2013-03-07	(주)한 송	Ａｍｏｌｅｄ 패널 제작용 분할 마스크 프레임 어셈블리 제조 장치
JP2015127441A (ja) *	2013-12-27	2015-07-09	大日本印刷株式会社	蒸着マスク装置の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR100742385B1 (ko) *	2006-01-23	2007-07-24	삼성에스디아이 주식회사	마스크 정렬장치 및 그 정렬방법
JP2008115411A (ja) *	2006-11-01	2008-05-22	Seiko Epson Corp	蒸着マスクの製造方法、蒸着マスク、およびマスク蒸着方法
JP4985227B2 (ja) *	2007-08-24	2012-07-25	大日本印刷株式会社	蒸着マスク、蒸着マスク装置、蒸着マスクの製造方法、蒸着マスク装置の製造方法、および、蒸着マスク用シート状部材の製造方法
CN104097027A (zh) *	2013-04-10	2014-10-15	昆山思拓机器有限公司	一种oled金属掩膜板的制作方法
CN107425135A (zh) *	2017-05-05	2017-12-01	京东方科技集团股份有限公司	掩膜板固定底板及掩模板固定装置

2018
- 2018-10-22 KR KR1020180126078A patent/KR102011723B1/ko active IP Right Grant
2019
- 2019-04-12 WO PCT/KR2019/004445 patent/WO2019203510A1/ko active Application Filing
- 2019-04-17 TW TW108113411A patent/TW201945571A/zh unknown
- 2019-04-19 CN CN201910317998.0A patent/CN110385527B/zh active Active
- 2019-08-09 KR KR1020190097342A patent/KR102152687B1/ko active IP Right Grant
- 2019-08-09 KR KR1020190097341A patent/KR102152686B1/ko active IP Right Grant

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR20040084314A (ko) *	2003-03-27	2004-10-06	삼성에스디아이 주식회사	표시장치용 증착 마스크 및 그의 제조방법
KR20090052203A (ko) *	2007-11-20	2009-05-25	삼성모바일디스플레이주식회사	수직 증착형 마스크 제조장치 및 이를 이용한 수직 증착형마스크의 제조방법
KR20130022586A (ko) *	2011-08-25	2013-03-07	(주)한 송	Ａｍｏｌｅｄ 패널 제작용 분할 마스크 프레임 어셈블리 제조 장치
JP2015127441A (ja) *	2013-12-27	2015-07-09	大日本印刷株式会社	蒸着マスク装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN112442654A (zh) *	2019-08-29	2021-03-05	悟勞茂材料公司	掩模支撑模板、掩模支撑模板的制造方法及框架一体型掩模的制造方法

Also Published As

Publication number	Publication date
KR102152687B1 (ko)	2020-09-07
TW201945571A (zh)	2019-12-01
KR102152686B1 (ko)	2020-09-07
CN110385527A (zh)	2019-10-29
KR20190122599A (ko)	2019-10-30
CN110385527B (zh)	2021-10-29
WO2019203510A1 (ko)	2019-10-24
KR20190122598A (ko)	2019-10-30

Legal Events

Date	Code	Title
2019-06-24	E701	Decision to grant or registration of patent right
2019-08-09	A107	Divisional application of patent
2019-08-12	GRNT	Written decision to grant

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KR102011723B1 - 프레임 일체형 마스크의 제조 장치 - Google Patents

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