KR101883164B1 - 비대칭 디옥심에테르 화합물 및 그 제조 방법과 응용 - Google Patents

비대칭 디옥심에테르 화합물 및 그 제조 방법과 응용 Download PDF

Info

Publication number
KR101883164B1
KR101883164B1 KR1020167035925A KR20167035925A KR101883164B1 KR 101883164 B1 KR101883164 B1 KR 101883164B1 KR 1020167035925 A KR1020167035925 A KR 1020167035925A KR 20167035925 A KR20167035925 A KR 20167035925A KR 101883164 B1 KR101883164 B1 KR 101883164B1
Authority
KR
South Korea
Prior art keywords
group
alkyl group
alkyl
naphthyl
substituted
Prior art date
Application number
KR1020167035925A
Other languages
English (en)
Korean (ko)
Other versions
KR20170009966A (ko
Inventor
원차오 자오
용린 왕
천룽 왕
중리 마
리시우 야오
웨이징 후
Original Assignee
인사이트 하이 테크놀로지 씨오., 엘티디.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 인사이트 하이 테크놀로지 씨오., 엘티디. filed Critical 인사이트 하이 테크놀로지 씨오., 엘티디.
Publication of KR20170009966A publication Critical patent/KR20170009966A/ko
Application granted granted Critical
Publication of KR101883164B1 publication Critical patent/KR101883164B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C249/00—Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C249/04—Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of oximes
    • C07C249/12—Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of oximes by reactions not involving the formation of oxyimino groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/34—Oximes with oxygen atoms of oxyimino groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
    • C07C251/44—Oximes with oxygen atoms of oxyimino groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals with the carbon atom of at least one of the oxyimino groups being part of a ring other than a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • C07C319/20—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/22—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and doubly-bound oxygen atoms bound to the same carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/45—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms doubly-bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/94—[b, c]- or [b, d]-condensed containing carbocyclic rings other than six-membered
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/78—Benzo [b] furans; Hydrogenated benzo [b] furans
    • C07D307/82—Benzo [b] furans; Hydrogenated benzo [b] furans with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
    • C07D307/83—Oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Furan Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Indole Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
KR1020167035925A 2014-06-09 2015-04-22 비대칭 디옥심에테르 화합물 및 그 제조 방법과 응용 KR101883164B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201410253184.2A CN104910053B (zh) 2014-06-09 2014-06-09 不对称二肟酯化合物及其制造方法与应用
CN201410253184.2 2014-06-09
PCT/CN2015/077138 WO2015188661A1 (zh) 2014-06-09 2015-04-22 不对称二肟酯化合物及其制造方法与应用

Publications (2)

Publication Number Publication Date
KR20170009966A KR20170009966A (ko) 2017-01-25
KR101883164B1 true KR101883164B1 (ko) 2018-07-30

Family

ID=54079557

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167035925A KR101883164B1 (ko) 2014-06-09 2015-04-22 비대칭 디옥심에테르 화합물 및 그 제조 방법과 응용

Country Status (5)

Country Link
JP (1) JP6261778B2 (ja)
KR (1) KR101883164B1 (ja)
CN (1) CN104910053B (ja)
TW (1) TWI495631B (ja)
WO (1) WO2015188661A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108957950B (zh) * 2017-05-18 2022-06-07 常州强力先端电子材料有限公司 含芴氨基酮类光引发剂的uv光固化组合物
CN107163169B (zh) * 2017-05-25 2018-08-24 同济大学 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用
CN109666088A (zh) * 2017-10-16 2019-04-23 北京英力科技发展有限公司 一种双酮肟酯化合物及其制造方法与应用
KR102335614B1 (ko) * 2018-03-21 2021-12-03 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
CN112341359B (zh) * 2019-08-07 2022-05-06 常州强力电子新材料股份有限公司 芴肟酯类化合物，其制备方法及应用
CN114149517B (zh) * 2020-09-07 2022-12-30 常州强力电子新材料股份有限公司 含噻吩结构的肟酯光引发剂、制备方法及光敏树脂组合物
CN112521529B (zh) * 2020-11-24 2022-07-08 同济大学 一种led敏感二苯乙烯基肟酯型光引发剂及其制备和应用
WO2024070695A1 (ja) * 2022-09-26 2024-04-04 富士フイルム株式会社 着色組成物、膜、光学フィルタ、固体撮像素子および画像表示装置
CN115611782A (zh) * 2022-10-15 2023-01-17 瑞红(苏州)电子化学品股份有限公司 高产酸肟磺酸酯类光产酸剂及其抗蚀剂组合物应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103833872A (zh) 2014-03-18 2014-06-04 常州强力先端电子材料有限公司 一种双肟酯类光引发剂及其制备方法和应用

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US5223506A (en) * 1991-06-04 1993-06-29 Glaxo Inc. Cyclic antitumor compounds
WO1993020046A1 (fr) * 1992-04-03 1993-10-14 Innothera Derives d'indane-1,3-dione et d'indane-1,2,3-trione, leurs procedes de preparation et leur application en therapeutique
WO2002100903A1 (en) * 2001-06-11 2002-12-19 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators having a combined structure
WO2004050653A2 (en) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP2007171320A (ja) * 2005-12-20 2007-07-05 Chisso Corp 感光性組成物およびそれを用いた表示素子
EP2144900B1 (en) * 2007-05-11 2015-03-18 Basf Se Oxime ester photoinitiators
JP5669386B2 (ja) * 2009-01-15 2015-02-12 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5317879B2 (ja) * 2009-07-31 2013-10-16 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、並びに、平版印刷版原版
CN102492060B (zh) * 2011-11-28 2013-06-26 常州强力先端电子材料有限公司 一种二苯硫醚肟酯类光引发剂、其制备方法及应用
US9594302B2 (en) * 2012-03-22 2017-03-14 Adeka Corporation Compound and photosensitive resin composition
JP6328642B2 (ja) * 2013-09-02 2018-05-23 インサイト ハイ テクノロジー カンパニー リミテッドＩｎｓｉｇｈｔ Ｈｉｇｈ Ｔｅｃｈｎｏｌｏｇｙ Ｃｏ．， Ｌｔｄ． シクロペンタンジオンオキシムエステルとその応用
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103833872A (zh) 2014-03-18 2014-06-04 常州强力先端电子材料有限公司 一种双肟酯类光引发剂及其制备方法和应用

Also Published As

Publication number Publication date
JP6261778B2 (ja) 2018-01-17
KR20170009966A (ko) 2017-01-25
CN104910053A (zh) 2015-09-16
JP2017520544A (ja) 2017-07-27
CN104910053B (zh) 2017-09-12
TW201546034A (zh) 2015-12-16
WO2015188661A1 (zh) 2015-12-17
TWI495631B (zh) 2015-08-11

Similar Documents

Publication Publication Date Title
KR101883164B1 (ko) 비대칭 디옥심에테르 화합물 및 그 제조 방법과 응용
JP6328642B2 (ja) シクロペンタンジオンオキシムエステルとその応用
KR101077214B1 (ko) 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
KR101700476B1 (ko) 고감광도 카르바졸 옥심 에스테르계 광개시제, 그 제조방법 및 용도
JP5713477B2 (ja) 光活性化合物およびこれを含む感光性樹脂組成物
TWI680118B (zh) 含有可聚合基團的芴肟酯類光引發劑、製備方法及其應用
US11639331B2 (en) Trans, trans-diketone oxime ester isomer, manufacturing method thereof and application thereof
JP5450314B2 (ja) 光重合開始剤及び感光性組成物
JP6778266B2 (ja) 耐熱安定性に優れたオキシムエステル化合物、それを含む光重合開始剤及び感光性樹脂組成物
JP6816067B2 (ja) 着色感光性樹脂組成物、これを含むカラーフィルタおよびこれを含む表示装置
KR102067858B1 (ko) 화합물 및 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물
KR20130140096A (ko) 옥심에스테르 화합물 및 그 화합물을 함유하는 광중합 개시제
JP2004149755A (ja) チオール化合物、光重合開始剤組成物および感光性組成物
KR20130038151A (ko) 옥심 에스테르 화합물 및 그것을 포함하는 광중합 개시제
KR101831358B1 (ko) 광활성 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR101355152B1 (ko) 광중합 개시제 및 이를 이용한 감광성 수지 조성물
KR101574535B1 (ko) 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광개시제 및 감광성 수지 조성물
KR101457172B1 (ko) 광개시제 및 이를 포함한 감광성 조성물
KR101991838B1 (ko) 신규 1,3-벤조디아졸 베타-옥심 에스테르 화합물 및 이를 포함하는 조성물
KR102509606B1 (ko) 신규한 퀴놀리닐 베타 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 포토레지스트 조성물

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant