KR100945709B1 - 수계 금속 재료 표면 처리제, 표면 처리 방법 및 표면 처리금속 재료 - Google Patents
수계 금속 재료 표면 처리제, 표면 처리 방법 및 표면 처리금속 재료 Download PDFInfo
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Abstract
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Claims (18)
- 삭제
- 에폭시실란, 아미노실란, 메르캅토실란, 이소시아네이트실란, 에폭시 화합물, 이소시아네이트 화합물, 멜라민, 메틸올 함유 화합물 또는 이미드 화합물인 유기 화합물 (A) 와 아미노실란, 아민 화합물, 에폭시 화합물의 폴리옥시에틸렌 부가물, 히드록실아민류, 다가 알코올, 아민티올, 히드록시카르복실산, 아미노술폰산, 히드록시포스폰산, 디아미노알킬술폰산 또는 아미노산인 유기 화합물 (B) 를 배합하여 이루어지는 수계 금속 표면 처리제로서,유기 화합물 (A) 와 유기 화합물 (B) 의 적어도 1 개가 식-SiR1R2R3 (식 중, R1, R2 및 R3 은 서로 독립적으로, 탄소수 1∼6 의 알킬기, 탄소수 1∼6 의 알콕시기 또는 수산기를 나타내고, 적어도 1 개는 알콕시기를 나타낸다) 로 나타내는 관능기 (a) 를 갖는 유기 실란 화합물이며; 유기 화합물 (A) 가 에폭시실란인 경우, 유기 화합물 (B) 는 아미노실란, 아민 화합물, 히드록실아민류, 다가 알코올, 아민티올, 히드록시카르복실산, 아미노술폰산, 히드록시포스폰산, 디아미노알킬술폰산 또는 아미노산이며; 유기 화합물 (A) 가 아미노실란 또는 메르캅토실란인 경우, 유기 화합물 (B) 는 에폭시 화합물의 폴리옥시에틸렌 부가물이며; 유기 화합물 (A) 가 이소시아네이트실란인 경우, 유기 화합물 (B) 는 아미노실란, 아민 화합물, 에폭시 화합물의 폴리옥시에틸렌 부가물, 히드록실아민류, 다가 알코올, 아민티올, 히드록시카르복실산, 아미노술폰산, 히드록시포스폰산, 디아미노알킬술폰산 또는 아미노산이며; 유기 화합물 (A) 가 에폭시 화합물, 이소시아네이트 화합물, 멜라민, 메틸올 함유 화합물 또는 이미드 화합물인 경우, 유기 화합물 (B) 는 아미노실란이고; 유기 화합물 (A) 와 유기 화합물 (B) 의 반응에 의한 생성물이 1 분자 중에 적어도 2 개의 규소 원자를 갖는 수계 금속 표면 처리제.
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- 제 2 항에 있어서,유기 화합물 (A) 에 있어서, 에폭시실란이 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필트리에톡시실란, 3-글리시독시프로필메틸디메톡시실란 또는 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란이고; 아미노실란이 N-(2-아미노에틸)3-아미노프로필메틸디메톡시실란, N-(아미노에틸)3-아미노프로필트리메톡시실란, N-(아미노에틸)3-아미노프로필트리에톡시실란, 3-아미노프로필트리에톡시실란 또는 3-아미노프로필트리메톡시실란이고; 메르캅토실란이 3-메르캅토프로필트리메톡시실란이고; 이소시아네이트실란이 3-이소시아네이트프로필트리메톡시실란 또는 3-이소시아네이트프로필트리에톡시실란이며; 에폭시 화합물이 소르비톨폴리글리시딜에테르, 폴리글리세롤폴리글리시딜에테르 또는 펜타에리트리톨폴리글리시딜에테르이고; 이소시아네이트 화합물이 톨릴렌디이소시아네이트, 디페닐메탄디이소시아네이트, 나프탈렌디이소시아네이트 또는 자일릴렌디이소시아네이트이며; 메틸올 함유 화합물이 디메틸올프로피온산이며; 이미드 화합물이 N,N-디이소프로필카르보디이미드인 수계 금속 표면 처리제.
- 제 2 항에 있어서,유기 화합물 (B) 에 있어서, 아미노실란이 N-(2-아미노에틸)3-아미노프로필메틸디메톡시실란, N-(아미노에틸)3-아미노프로필트리메톡시실란, N-(아미노에틸)3-아미노프로필트리에톡시실란, 3-아미노프로필트리에톡시실란 또는 3-아미노프로필트리메톡시실란이고; 아민 화합물이 이소포론디아민, 피페라진 또는 디페닐메탄디아민이며; 에폭시 화합물의 폴리옥시에틸렌 부가물이 네오펜틸글리콜디글리시딜에테르, 네오펜틸글리콜폴리글리시딜에테르, 1,6-헥산디올디글리시딜에테르 또는 수소 첨가 비스페놀 A 디글리시딜에테르의 폴리옥시에틸렌 부가물이며; 히드록실아민류가 에탄올 아민 또는 프로판올 아민이며; 다가 알코올이 글리콜 또는 글리세린이고; 아민티올이 2-아미노에탄티올 또는 2-아미노프로판 티올이고; 히드록시카르복실산이 타르타르산 또는 L-아스코르브산이고; 아미노술폰산이 2-아미노-1-나프탈렌 술폰산이며; 히드록시포스폰산이 α-글리셀로포스폰산이며; 아미노산이 글리신, 알라닌 또는 글루타민산인 수계 금속 표면 처리제.
- 제 2 항에 있어서,Ti, Zr, Hf, V, Mg, Mn, Zn, W, Mo, Al, Ni, Co, Ce 및 Ca 이온에서 선택되는 적어도 1 종의 금속 이온을 함유하는 금속 화합물 (C), 여기서, 상기 금속 이온이 Zr, Ti, Hf 또는 Ce 이온인 경우에는, 그 금속 화합물 (C) 가 콜로이드 분산체의 형태를 취해 존재하고 있는 경우를 제외하는 것인 금속 화합물 (C) 의 함유량과 관능기 (a) 유래의 Si 의 함유량과의 질량비 (C/Si) 가 O.O1∼10.0 이 되도록 배합한 수계 금속 표면 처리제.
- 제 2 항에 있어서,불화 수소산, 유기산 및 인산에서 선택되는 적어도 1 종의 산 (D) 을, 산 (D) 의 함유량과 관능기 (a) 유래의 Si 의 함유량과의 질량비 (D/Si) 가 0.01∼10.0 이 되도록 배합한 수계 금속 표면 처리제.
- 제 2 항에 있어서,Si, Zr, Ti, Sn, Hf, Ce 및 Nb 에서 선택되는 적어도 1 종의 원소의 단체 혹은 화합물의 콜로이드 분산체 (E) 를, 콜로이드 분산체 (E) 의 고형분 함유량과 관능기 (a) 유래의 Si 의 함유량과의 질량비 (E/Si) 가 0.01∼10.0 이 되도록 배합한 수계 금속 표면 처리제.
- 제 2 항 또는 제 13 항 내지 제 17 항 중 어느 한 항에 기재된 수계 금속 표면 처리제로부터의 건조 피막을 갖는 금속 재료에 있어서, SiO2 로서 10∼30OOmg/㎡ 인 건조 피막을 표면에 갖는 금속 재료.
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