KR100798415B1 - Method of manufacturing protective layer of electrostatic chuck by coating hybrid ceramic - Google Patents

Method of manufacturing protective layer of electrostatic chuck by coating hybrid ceramic Download PDF

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Publication number
KR100798415B1
KR100798415B1 KR1020060094287A KR20060094287A KR100798415B1 KR 100798415 B1 KR100798415 B1 KR 100798415B1 KR 1020060094287 A KR1020060094287 A KR 1020060094287A KR 20060094287 A KR20060094287 A KR 20060094287A KR 100798415 B1 KR100798415 B1 KR 100798415B1
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South Korea
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coating layer
plasma
electrostatic chuck
coating
bonder
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KR1020060094287A
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Korean (ko)
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강현기
강병기
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알마티(주)
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells

Abstract

A method for manufacturing a protective layer of an electrostatic chuck by coating dissimilar ceramics is provided to be able to melt and grow a coating layer having micro-cracks and pores in an electrolyte by plasma arc by coating a coated electrostatic chuck by wet type plasma electrolytic oxidation process using plasma arc discharge. A method for manufacturing a protective layer of an electrostatic chuck by coating dissimilar ceramics comprises: a first step of forming a bond coating layer using plasma thermal spray coating after cleaning the aluminum alloy matrix with air in a state that a surface of an aluminum alloy matrix is sanded; and a second step of forming a top coating layer using arc discharge naturally generated during the plasma electrolytic oxidation process by dipping the bond coating layer into an electrolyte using plasma electrolytic oxidation process in a state that the thermal spray coated bond coating layer is grinded or not grinded, wherein the bond coating layer is made from alumina, and the top coating layer is a mullite(Al2O3.SiO2) having a composition ratio of Al2O3/SiO2 in the range of 0.2 to 1.

Description

이종 세라믹 코팅에 의한 정전척 보호막 제조방법{Method of manufacturing protective layer of electrostatic chuck by coating hybrid ceramic}Method of manufacturing electrostatic chuck by dissimilar ceramic coating {Method of manufacturing protective layer of electrostatic chuck by coating hybrid ceramic}

본 발명은 플라즈마 용사법과 플라즈마 전해 산화법에 의해 형성된 이종 박막의 세라믹층이 TFT-LCD 및 반도체 제조공정 즉, 플라즈마 식각공정에서 챔버내에 있는 정전척의 사용 수명을 연장시키는 보호막의 제조방법에 관한 것으로, 특히 식각가스의 화학적 공격과 플라즈마에 대한 내구성을 향상시키는 이종 세라믹 코팅에 의한 정전척 보호막 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a protective film for extending the service life of an electrostatic chuck in a chamber during a TFT-LCD and semiconductor manufacturing process, that is, in a plasma etching process, in which a ceramic layer of a heterogeneous thin film formed by a plasma spray method and a plasma electrolytic oxidation method is used. The present invention relates to a method for manufacturing an electrostatic chuck protective film by using a heterogeneous ceramic coating for improving chemical attack of etching gas and durability to plasma.

일반적으로 TFT-LCD 및 반도체 제조공정 챔버내에 있는 정전척의 표면은 RF 플라즈마 및 공정가스(F,Cl)에 화학적으로 안정적인 알루미나, 지르코늄, 이트리아 등과 같은 세라믹을 코팅하여 사용하고 있다.In general, the surface of the electrostatic chuck in the TFT-LCD and semiconductor manufacturing process chamber is coated with a ceramic, such as alumina, zirconium, yttria, which are chemically stable to RF plasma and process gas (F, Cl).

특히, 최근에는 알루미늄 합금모재에 아노다이징 피막으로 형성된 알루미나층을 샌딩으로 표면처리한 후 위에 플라즈마 용사를 이용하여 이트리아 및 알루미니와 이트리아를 혼합하여 대부분 보호막 코팅을 실시하고 있다.In particular, in recent years, after the surface treatment of the alumina layer formed of an anodizing coating on the aluminum alloy base material by sanding, it is mostly coated with a yttria and alumini and yttria by using a plasma spray to coat the protective film.

종래의 기술을 설명하면 알루미늄 합금모재에 통상 아노다이징 전처리에 샌딩 표면처리 후 플라즈마 용사한 세라믹층을 나타낸다.In the prior art, an aluminum alloy base material usually shows a ceramic layer in which plasma spraying is performed after sanding surface treatment in anodizing pretreatment.

여기서 플라즈마 용사한 코팅층의 경우 아노다이징 피막된 알루미나층과 달리 고온의 플라즈마 제트를 사용하여 세라믹 분말을 용융 가속하여 코팅하기 때문에 코팅된 세라믹층 표면에는 일부 용융되지 않는 세라믹 입자와 용융된 세라믹의 급속냉각(107-9 K/s)으로 기공이 존재하게 된다.In the case of the plasma-sprayed coating layer, unlike the anodized alumina layer, the ceramic powder is melt-accelerated and coated using a high-temperature plasma jet, so that the rapid cooling of the ceramic particles and the molten ceramic that are not partially melted on the coated ceramic layer surface ( 10 7-9 K / s), the pores are present.

따라서, 후속 공정으로 플라즈마 용사된 세라믹 코팅표면을 연마하는 공정과 연마된 표면에 이물질 및 파티클 등을 제거할 목적으로 세정공정이 추가되는데 이는 궁극적으로 정전척 제조단가의 상승을 초래하게 된다.Therefore, a cleaning process is added in order to remove the plasma-sprayed ceramic coating surface as a subsequent process and to remove foreign substances and particles from the polished surface, which ultimately increases the manufacturing cost of the electrostatic chuck.

뿐만 아니라, 고온의 플라즈마 제트(5,000~12,000℃)에 의해 용융 충돌된 세라믹이 알루미나 코팅층에서 급냉되기 때문에 알루미늄 합금모재의 모서리 부분에서 냉각속도의 차이로 크랙이 발생한 경우 이를 보완할 방법에 한계가 있다.In addition, since the ceramic collided by the hot plasma jet (5,000-12,000 ° C.) is quenched in the alumina coating layer, there is a limit to how to compensate for cracks caused by the difference in cooling rate at the corners of the aluminum alloy base material. .

본 발명은 상기와 같은 문제점을 보완하기 위하여 안출된 것으로 알루미늄 합금 모재표면에 샌딩으로 표면적을 넓힌 후 알루미나 분말을 사용하여 플라즈마 용사를 실시하면 플라즈마 용사시 급냉으로 인한 알루미나 코팅층에 미세한 크랙 및 기공이 발생되지만 코팅된 정전척을 습식 플라즈마 전해 산화법으로 플라즈마 아크방전에 의해 코팅하게 되면 미세한 크랙 및 기공을 가진 코팅층이 전해액 속에서 플라즈마 아크에 의해 용융 성장하기 때문에 이들 문제점을 해결할 수 있다.The present invention has been made in order to solve the above problems, when the surface of the aluminum alloy base surface by sanding to increase the surface area by performing a thermal spraying using alumina powder, fine cracks and pores are generated in the alumina coating layer due to rapid cooling during plasma spraying. However, when the coated electrostatic chuck is coated by plasma arc discharge by wet plasma electrolytic oxidation, these problems can be solved because the coating layer having fine cracks and pores is melt-grown by plasma arc in the electrolyte.

본 발명은 플라즈마 용사법과 플라즈마 전해 산화법에 의해 형성된 이종 박막의 세라믹층이 TFT-LCD 및 반도체 제조공정 즉, 플라즈마 식각공정에서 챔버내에 있는 정전척의 사용 수명을 연장시키는 보호막의 제조방법에 관한 것으로, 특히 식각가스의 화학적 공격과 플라즈마에 대한 내구성을 향상시키는 이종 세라믹 코팅에 의한 정전척 보호막 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a protective film for extending the service life of an electrostatic chuck in a chamber during a TFT-LCD and semiconductor manufacturing process, that is, in a plasma etching process, in which a ceramic layer of a heterogeneous thin film formed by a plasma spray method and a plasma electrolytic oxidation method is used. The present invention relates to a method for manufacturing an electrostatic chuck protective film by using a heterogeneous ceramic coating for improving chemical attack of etching gas and durability to plasma.

본 발명에 의한 이종 세라믹 코팅에 의한 정전척 보호막 제조방법을 설명하면 다음과 같다.Referring to the method of manufacturing the electrostatic chuck protective film by the dissimilar ceramic coating according to the present invention.

먼저 알루미늄 합금모재를 샌딩 표면처리한 상태에서 에어 클린한 후 플라즈마 용사를 이용하여 알루미나 본더 코팅층을 형성한다.First, the aluminum alloy base material is air-cleaned in the sanding surface treatment state, and then an alumina bonder coating layer is formed by using a plasma spray.

이 때 용사된 알루미나층를 본더 코팅층이라 칭하고 이렇게 해서 코팅된 표면을 연마 또는 연마하지 않은 상태에서 플라즈마 전해산화법을 이용하여 본더 코팅층이 형성된 정전척을 전해액에 침지하여 플라즈마 전해산화법시 자연 발생하는 아크방전을 이용하여 코팅하게 되면 종래의 기술과 달리 연마와 같은 후속처리 공정을 생략할 수 있다.In this case, the thermally sprayed alumina layer is referred to as a bonder coating layer, and thus, an electrostatic chuck on which the bonder coating layer is formed is immersed in the electrolyte solution using plasma electrolytic oxidation in a state in which the coated surface is not polished or polished, thereby causing arc discharge that occurs naturally during plasma electrolytic oxidation. Coating by means of the prior art, it is possible to omit a post-treatment process such as polishing, unlike the prior art.

여기서 플라즈마 전해산화법에 의해 형성된 코팅을 탑코팅층이라 한다.The coating formed by the plasma electrolytic oxidation method is referred to as a top coating layer.

본더 코팅층은 알루미나로 이루어져 있으며, 탑코팅층은 뮬라이트(Al2O3·SiO2)로 Al2O3/SiO2의 조성비는 0.2∼1 범위인 것을 특징으로 한다.The bonder coating layer is made of alumina, and the top coating layer is mullite (Al 2 O 3 · SiO 2 ), the composition ratio of Al 2 O 3 / SiO 2 is characterized in that the range of 0.2 to 1.

알루니늄 합금모재에 플라즈마 용사에 의해 본더 코팅층을 형성하는 단계와 본더 코팅층과 다른 세라믹층을 본더 코팅층 위에 형성하는 플라즈마 전해산화법에 의해 탑코팅 하는 것으로 구성되어 있다.Forming a bonder coating layer by plasma spraying on an aluminum alloy base material, and top-coating by the plasma electrolytic oxidation method which forms a bonder coating layer and another ceramic layer on a bonder coating layer.

상술한 바와 같이 이종 세라믹 코팅에 의한 정전척 보호막 제조방법은 종래 의 아노다이징법에 의해 코팅층 위에 플라즈마 용사법으로 코팅한 탑코팅층에 있는 크랙 및 입자를 줄일 수 있고, 또한 후속공정으로 연마공정을 생략할 수 있어 경제적인 방법으로 정전척을 제조할 수 있다.As described above, the method of manufacturing the electrostatic chuck protective film by dissimilar ceramic coating can reduce the cracks and particles in the top coating layer coated by the plasma spray method on the coating layer by the conventional anodizing method, and the polishing step can be omitted in a subsequent step. Thus, the electrostatic chuck can be manufactured in an economical way.

또한, 탑코팅층이 뮬라이트(Al2O3·SiO2)층으로 고온에서 내구성이 우수하여 정전척의 사용수명이 연장되기 때문에 TFT-LCD 및 반도체 제조공정에서 글라스 및 실리콘 페이퍼의 생산수율을 증가시키게 된다.In addition, since the top coating layer is a mullite (Al 2 O 3 · SiO 2 ) layer, it has excellent durability at high temperatures and thus extends the service life of the electrostatic chuck, thereby increasing the yield of glass and silicon paper in TFT-LCD and semiconductor manufacturing processes. .

Claims (1)

플라즈마 용사법과 플라즈마 전해 산화법에 의해 형성된 이종 박막의 세라믹층이 TFT-LCD 및 반도체 제조공정 즉, 플라즈마 식각공정에서 챔버내에 있는 정전척의 사용수명을 연장시키는 보호막의 제조방법에 있어서,In the method of manufacturing a protective film in which a ceramic layer of a heterogeneous thin film formed by a plasma spraying method and a plasma electrolytic oxidation method extends the service life of an electrostatic chuck in a chamber in a TFT-LCD and a semiconductor manufacturing process, that is, a plasma etching process, 알루미늄 합금모재를 샌딩 표면처리한 상태에서 에어 클린한 후 플라즈마 용사를 이용하여 알루미나 본더 코팅층을 형성하는 1단계와, 이 때 용사된 알루미나 본더 코팅층을 연마 또는 연마하지 않은 상태에서 플라즈마 전해산화법을 이용하여 본더 코팅층을 전해액에 침지하여 플라즈마 전해산화법시 자연 발생하는 아크방전을 이용하여 탑코팅층을 형성하는 2단계의 과정으로 이루어져 있고, 본더 코팅층은 알루미나로 이루어져 있으며 탑코팅층은 뮬라이트(Al2O3·SiO2)로 Al2O3/SiO2의 조성비는 0.2~1 범위인 것을 특징으로 하는 이종 세라믹 코팅에 의한 정전척 보호막 제조방법.Air-cleaning the aluminum alloy base material in the state of sanding surface treatment, and then forming alumina bonder coating layer using plasma spraying, and using plasma electrooxidation method without polishing or polishing the sprayed alumina bonder coating layer. It consists of a two-step process of forming a top coating layer by using an arc discharge that naturally occurs during plasma electrolytic oxidation by immersing the bonder coating layer in an electrolyte solution. The bonder coating layer is made of alumina and the top coating layer is mullite (Al 2 O 3 · SiO). 2 ) to Al 2 O 3 / SiO 2 The composition ratio of the electrostatic chuck protective film by a dissimilar ceramic coating, characterized in that the range of 0.2 ~ 1.
KR1020060094287A 2006-09-27 2006-09-27 Method of manufacturing protective layer of electrostatic chuck by coating hybrid ceramic KR100798415B1 (en)

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CN104923524A (en) * 2015-06-12 2015-09-23 山东电力建设第一工程公司 Wind generating set spindle etched surface treatment method
WO2019107895A1 (en) * 2017-11-28 2019-06-06 한국세라믹기술원 Method for manufacturing ceramic thermal barrier coating layer having excellent adhesive strength and heat durability
CN112301402A (en) * 2020-11-02 2021-02-02 东北大学 Novel magnesium alloy thermal barrier coating and preparation method thereof

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