KR100721094B1 - 진공라인용 블록히터 - Google Patents
진공라인용 블록히터 Download PDFInfo
- Publication number
- KR100721094B1 KR100721094B1 KR1020050094722A KR20050094722A KR100721094B1 KR 100721094 B1 KR100721094 B1 KR 100721094B1 KR 1020050094722 A KR1020050094722 A KR 1020050094722A KR 20050094722 A KR20050094722 A KR 20050094722A KR 100721094 B1 KR100721094 B1 KR 100721094B1
- Authority
- KR
- South Korea
- Prior art keywords
- vacuum line
- heater
- block heater
- present
- chamber
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (3)
- 챔버(1); CVD 공정의 증착공정을 통해 상기 챔버(1)로부터 발생되는 부산물을 외부로 배출시키도록 이동통로 역할을 하는 진공라인(2); 및 상기 챔버(1)로부터 발생되는 부산물이 진공라인(2)을 통해 외부로 배출가능하도록 펌핑하는 펌프(3)로 구성된 반도체 제조장치에 있어서,상기 챔버(1)와 펌프(3)를 연결하는 진공라인(2)의 내부에 진공라인(2)의 형상에 부합되도록 제조되어 카트리지, 마이크로시스 및 운모히터를 내장하고 그 표면이 하드 아노다이징되어 삽입 조립된 알루미늄 재질의 블록히터(4); 및상기 블록히터(4)를 20∼250℃의 범위에서 온도조절 하는 써모커플(5)이 포함 구성된 것을 특징으로 하는 진공라인용 블록히터.
- 삭제
- 삭제
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050094722A KR100721094B1 (ko) | 2005-10-10 | 2005-10-10 | 진공라인용 블록히터 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050094722A KR100721094B1 (ko) | 2005-10-10 | 2005-10-10 | 진공라인용 블록히터 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070039635A KR20070039635A (ko) | 2007-04-13 |
KR100721094B1 true KR100721094B1 (ko) | 2007-05-25 |
Family
ID=38160332
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050094722A KR100721094B1 (ko) | 2005-10-10 | 2005-10-10 | 진공라인용 블록히터 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100721094B1 (ko) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100260246B1 (ko) | 1995-04-20 | 2000-07-01 | 히가시 데쓰로 | 진공배기시스템 및 혼입물 제거방법 |
-
2005
- 2005-10-10 KR KR1020050094722A patent/KR100721094B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100260246B1 (ko) | 1995-04-20 | 2000-07-01 | 히가시 데쓰로 | 진공배기시스템 및 혼입물 제거방법 |
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Publication number | Publication date |
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KR20070039635A (ko) | 2007-04-13 |
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