KR100686611B1 - 전기화학 장치와 이를 사용하는 방법 - Google Patents

전기화학 장치와 이를 사용하는 방법 Download PDF

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Publication number
KR100686611B1
KR100686611B1 KR1020017000771A KR20017000771A KR100686611B1 KR 100686611 B1 KR100686611 B1 KR 100686611B1 KR 1020017000771 A KR1020017000771 A KR 1020017000771A KR 20017000771 A KR20017000771 A KR 20017000771A KR 100686611 B1 KR100686611 B1 KR 100686611B1
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KR
South Korea
Prior art keywords
target
oxide
alloy
metal
nickel oxide
Prior art date
Application number
KR1020017000771A
Other languages
English (en)
Korean (ko)
Other versions
KR20010070985A (ko
Inventor
빠비엔 베텔르
쟝-크리스토프 기론
막스 베르메어슈
Original Assignee
쌩-고벵 글래스 프랑스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쌩-고벵 글래스 프랑스 filed Critical 쌩-고벵 글래스 프랑스
Publication of KR20010070985A publication Critical patent/KR20010070985A/ko
Application granted granted Critical
Publication of KR100686611B1 publication Critical patent/KR100686611B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/085—Oxides of iron group metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/1514—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
    • G02F1/1523—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material
    • G02F1/1524—Transition metal compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Physical Vapour Deposition (AREA)
KR1020017000771A 1999-05-20 2000-05-19 전기화학 장치와 이를 사용하는 방법 KR100686611B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR99/06408 1999-05-20
FR9906408A FR2793888B1 (fr) 1999-05-20 1999-05-20 Dispositif electrochimique

Publications (2)

Publication Number Publication Date
KR20010070985A KR20010070985A (ko) 2001-07-28
KR100686611B1 true KR100686611B1 (ko) 2007-02-23

Family

ID=9545804

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017000771A KR100686611B1 (ko) 1999-05-20 2000-05-19 전기화학 장치와 이를 사용하는 방법

Country Status (5)

Country Link
EP (1) EP1109945A1 (fr)
JP (1) JP5005854B2 (fr)
KR (1) KR100686611B1 (fr)
FR (1) FR2793888B1 (fr)
WO (1) WO2000071777A1 (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE0103198D0 (sv) * 2001-09-26 2001-09-26 Andris Azens Electrochromic film and device comprising the same
FR2833107B1 (fr) * 2001-12-05 2004-02-20 Saint Gobain Electrode de dispositifs electrochimiques/electrocommandables
FR2835534B1 (fr) 2002-02-06 2004-12-24 Saint Gobain CIBLE CERAMIQUE NiOx NON STOECHIOMETRIQUE
CA2476507C (fr) 2002-02-20 2009-06-16 Saint-Gobain Glass France Vitrage avec un element rigide eventuellement incorpore dans une piece en plastique surmoulee
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
FR2904704B1 (fr) 2006-08-04 2008-12-05 Saint Gobain Dispositif electrochimique, et/ou elelctrocommandable du type vitrage et a proprietes optiques et/ou energetiques variables
JP5233133B2 (ja) * 2007-03-06 2013-07-10 日産自動車株式会社 エレクトロクロミック膜
JP5305137B2 (ja) * 2007-12-05 2013-10-02 日立金属株式会社 垂直磁気記録媒体のＮｉ合金中間層を形成するためのＮｉ−Ｗ系焼結ターゲット材
DE102009025972B4 (de) * 2009-06-15 2018-12-27 Sage Electrochromics, Inc. Verbundglasscheibe und deren Verwendung
WO2013013135A1 (fr) 2011-07-21 2013-01-24 Sage Electrochromics, Inc. Oxyde de nickel électrochromique dopé simultanément avec du lithium et un dopant métallique
JP5965258B2 (ja) * 2012-09-10 2016-08-03 国立大学法人北見工業大学 エレクトロクロミック素子及びその製造方法
US8947759B2 (en) * 2012-10-12 2015-02-03 Sage Electrochromics, Inc. Partially tinted clear state for improved color and solar-heat gain control of electrochromic devices
AT14157U1 (de) 2013-12-20 2015-05-15 Plansee Se W-Ni-Sputtertarget
FR3140954A1 (fr) 2022-10-13 2024-04-19 Saint-Gobain Glass France Vitrage electrochrome
FR3140955A1 (fr) 2022-10-13 2024-04-19 Saint-Gobain Glass France Vitrage electrochrome

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4094761A (en) * 1977-07-25 1978-06-13 Motorola, Inc. Magnetion sputtering of ferromagnetic material
JPH10251848A (ja) * 1997-03-17 1998-09-22 Japan Energy Corp スパッタリング用ターゲットおよび皮膜形成方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2639441A1 (fr) * 1988-11-21 1990-05-25 Saint Gobain Vitrage Contre-electrode pour systemes electrochromes
JP3427430B2 (ja) * 1993-07-14 2003-07-14 旭硝子株式会社 エレクトロクロミック調光体の製造方法およびスパッタリング装置
JP2570179B2 (ja) * 1994-05-26 1997-01-08 日本電気株式会社 半導体集積回路装置の製造方法
JPH09152634A (ja) * 1995-03-03 1997-06-10 Canon Inc エレクトロクロミック素子及びその製造方法
JP2810013B2 (ja) * 1996-03-14 1998-10-15 株式会社東芝 酸化物薄膜の形成方法および酸化物薄膜
FR2746934B1 (fr) * 1996-03-27 1998-05-07 Saint Gobain Vitrage Dispositif electrochimique
FR2753545B1 (fr) * 1996-09-18 1998-10-16 Saint Gobain Vitrage Dispositif electrochimique
DE19640515A1 (de) * 1996-10-01 1998-04-09 Flachglas Ag Elektrochromer Spiegel und Verfahren zum Herstellen eines elektrochromen Spiegels
JP4142753B2 (ja) * 1996-12-26 2008-09-03 株式会社東芝 スパッタターゲット、スパッタ装置、半導体装置およびその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4094761A (en) * 1977-07-25 1978-06-13 Motorola, Inc. Magnetion sputtering of ferromagnetic material
JPH10251848A (ja) * 1997-03-17 1998-09-22 Japan Energy Corp スパッタリング用ターゲットおよび皮膜形成方法

Also Published As

Publication number Publication date
KR20010070985A (ko) 2001-07-28
WO2000071777A1 (fr) 2000-11-30
JP2003500534A (ja) 2003-01-07
JP5005854B2 (ja) 2012-08-22
EP1109945A1 (fr) 2001-06-27
FR2793888B1 (fr) 2002-06-28
FR2793888A1 (fr) 2000-11-24

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