JPWO2023042263A1 - - Google Patents
Info
- Publication number
- JPWO2023042263A1 JPWO2023042263A1 JP2023547970A JP2023547970A JPWO2023042263A1 JP WO2023042263 A1 JPWO2023042263 A1 JP WO2023042263A1 JP 2023547970 A JP2023547970 A JP 2023547970A JP 2023547970 A JP2023547970 A JP 2023547970A JP WO2023042263 A1 JPWO2023042263 A1 JP WO2023042263A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
- Packaging Frangible Articles (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2021/033749 WO2023042263A1 (ja) | 2021-09-14 | 2021-09-14 | エキスパンド装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023042263A1 true JPWO2023042263A1 (zh) | 2023-03-23 |
Family
ID=85601994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023547970A Pending JPWO2023042263A1 (zh) | 2021-09-14 | 2021-09-14 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2023042263A1 (zh) |
KR (1) | KR20240021309A (zh) |
CN (1) | CN117981053A (zh) |
TW (1) | TWI828058B (zh) |
WO (1) | WO2023042263A1 (zh) |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5243101Y2 (zh) | 1972-11-02 | 1977-09-30 | ||
JP3657190B2 (ja) * | 2000-11-13 | 2005-06-08 | Necセミコンパッケージ・ソリューションズ株式会社 | エキスパンド装置 |
JP5243101B2 (ja) * | 2008-05-14 | 2013-07-24 | 株式会社ディスコ | 破断装置 |
US10008405B2 (en) * | 2012-12-26 | 2018-06-26 | Hitachi Chemical Company, Ltd | Expansion method, method for manufacturing semiconductor device, and semiconductor device |
JP6298635B2 (ja) * | 2014-01-10 | 2018-03-20 | 株式会社ディスコ | 分割装置及び被加工物の分割方法 |
JP2016004832A (ja) * | 2014-06-13 | 2016-01-12 | 株式会社ディスコ | テープ拡張装置 |
JP2019029363A (ja) * | 2017-07-25 | 2019-02-21 | 株式会社ディスコ | 接着フィルムの破断方法 |
JP7030469B2 (ja) * | 2017-10-02 | 2022-03-07 | 株式会社ディスコ | テープ拡張装置及びテープ拡張方法 |
JP7030006B2 (ja) * | 2018-04-12 | 2022-03-04 | 株式会社ディスコ | 拡張方法及び拡張装置 |
JP7242130B2 (ja) * | 2019-02-06 | 2023-03-20 | 株式会社ディスコ | エキスパンド装置 |
-
2021
- 2021-09-14 JP JP2023547970A patent/JPWO2023042263A1/ja active Pending
- 2021-09-14 KR KR1020247001850A patent/KR20240021309A/ko unknown
- 2021-09-14 CN CN202180102154.XA patent/CN117981053A/zh active Pending
- 2021-09-14 WO PCT/JP2021/033749 patent/WO2023042263A1/ja active Application Filing
-
2022
- 2022-02-10 TW TW111104878A patent/TWI828058B/zh active
Also Published As
Publication number | Publication date |
---|---|
TWI828058B (zh) | 2024-01-01 |
CN117981053A (zh) | 2024-05-03 |
KR20240021309A (ko) | 2024-02-16 |
TW202312315A (zh) | 2023-03-16 |
WO2023042263A1 (ja) | 2023-03-23 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240126 |