JPWO2020075246A1 - レーザ装置 - Google Patents
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
- H01S3/08063—Graded reflectivity, e.g. variable reflectivity mirror
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08086—Multiple-wavelength emission
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0811—Construction or shape of optical resonators or components thereof comprising three or more reflectors incorporating a dispersive element, e.g. a prism for wavelength selection
- H01S3/0812—Construction or shape of optical resonators or components thereof comprising three or more reflectors incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
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- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
- H01S3/115—Q-switching using intracavity electro-optic devices
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Abstract
Description
図1は、本発明の実施の形態1にかかるレーザ装置10の概略構成を示す図である。レーザ装置10は、レーザ媒質である気体中での放電によって気体分子を励起させ、レーザ光を発振させるガスレーザである。レーザ装置10は、二酸化炭素(CO2)を含むレーザ媒質を用いてレーザ発振を行うCO2レーザである。
(1−An)2=(1−A1)2exp{2(g1−gn)L} ・・・(1)
An=exp(−2φn 2/ωn 2) ・・・(2)
rn=r1exp{2(g1−gn)L} ・・・(3)
図10は、本発明の実施の形態2にかかるレーザ装置20の概略構成を示す図である。レーザ装置20は、平板形状をなすいわゆるスラブ状の収容部8を有する。実施の形態2では、上記の実施の形態1と同一の構成要素には同一の符号を付し、実施の形態1とは異なる構成について主に説明する。
d2/(4λL)<1 ・・・(4)
図16は、本発明の実施の形態3にかかるレーザ装置30の概略構成を示す図である。レーザ装置30は、電気光学(Electro-Optic:EO)結晶31と偏光ビームスプリッタ32とを有する。電気光学結晶31と偏光ビームスプリッタ32とは、パルス発振機構を構成する。パルス発振機構は、複数のビームをパルス化する。実施の形態3では、上記の実施の形態1および2と同一の構成要素には同一の符号を付し、実施の形態1および2とは異なる構成について主に説明する。
図20は、本発明の実施の形態4にかかるレーザ装置40の概略構成を示す図である。レーザ装置40は、少なくとも1つの増幅器41と、増幅器41へ向けてビームが伝搬する光学系42とを有する。実施の形態4では、上記の実施の形態1から3と同一の構成要素には同一の符号を付し、実施の形態1から3とは異なる構成について主に説明する。
Claims (13)
- 互いに波長が異なる複数のビームを共振させる第1のミラーおよび第2のミラーと、
ビーム中心軸の向きが互いに異なる状態で前記第1のミラーから入射する前記複数のビームを、互いにビーム中心軸を一致させて前記第2のミラーへ進行させ、かつ、ビーム中心軸が互いに一致する状態で前記第2のミラーから入射する前記複数のビームを、ビーム中心軸の向きを互いに異ならせて前記第1のミラーへ進行させる回折格子と、
前記第1のミラーと前記回折格子との間を進行する前記複数のビームが通過する媒質であって前記複数のビームの各波長においてピークが現れる離散的な利得スペクトルを有するレーザ媒質を収容する収容部と、
を備えることを特徴とするレーザ装置。 - 前記収容部は、平板形状をなすことを特徴とする請求項1に記載のレーザ装置。
- 前記回折格子と前記第2のミラーとの間に設けられ、前記複数のビームをパルス化するパルス発振機構を備えることを特徴とする請求項1または2に記載のレーザ装置。
- 前記第1のミラーは、凹面である反射面を有し、前記第1のミラーの断面における前記凹面の曲率半径が、前記回折格子と前記第1のミラーとの間の距離と等しいことを特徴とする請求項1から3のいずれか1つに記載のレーザ装置。
- 前記回折格子と前記収容部との間に設けられ、前記回折格子から伝搬する前記複数のビームを平行化するとともに前記収容部から伝搬する前記複数のビームを収束させる光学素子を備えることを特徴とする請求項1から3のいずれか1つに記載のレーザ装置。
- 前記回折格子と前記第2のミラーとの間に設けられ、前記複数のビームの横モードを一括して調整する調整部を備えることを特徴とする請求項1から3のいずれか1つに記載のレーザ装置。
- 前記回折格子と前記第1のミラーとの間に設けられ、前記複数のビームの横モードをビームごとに調整する調整部を備えることを特徴とする請求項1から3のいずれか1つに記載のレーザ装置。
- 前記第1のミラーは、前記複数のビームの各々が入射する領域ごとに異なる反射率を持たせた反射面を有することを特徴とする請求項1から3のいずれか1つに記載のレーザ装置。
- 前記第1のミラーと前記レーザ媒質との間を光学的に結合する光学素子を備えることを特徴とする請求項2に記載のレーザ装置。
- 前記第2のミラーと前記レーザ媒質との間を光学的に結合する光学素子を備えることを特徴とする請求項2に記載のレーザ装置。
- 前記第2のミラーを通過した前記複数のビームを出力することを特徴とする請求項1から10のいずれか1つに記載のレーザ装置。
- 前記パルス発振機構によってパルス化された前記複数のビームを増幅する増幅器を備えることを特徴とする請求項3に記載のレーザ装置。
- 前記レーザ媒質は、二酸化炭素レーザガスであることを特徴とする請求項1から12のいずれか1つに記載のレーザ装置。
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CN113488843A (zh) * | 2021-07-15 | 2021-10-08 | 陕西澳威激光科技有限公司 | 一种光谱组束***及超大功率激光的输出方法 |
CN113659416B (zh) * | 2021-08-11 | 2022-08-16 | 中国科学院长春光学精密机械与物理研究所 | 双波长激光共轴输出***与方法 |
CN115128821B (zh) * | 2022-08-30 | 2022-12-06 | 中国科学院长春光学精密机械与物理研究所 | 基于偏振分离外腔反馈的光谱合束装置及方法 |
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FR2386918A1 (fr) * | 1977-04-05 | 1978-11-03 | Comp Generale Electricite | Laser a emission multiraie |
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JPS61287189A (ja) * | 1985-06-13 | 1986-12-17 | Mitsubishi Electric Corp | レ−ザ装置 |
JPH069286B2 (ja) * | 1985-06-13 | 1994-02-02 | 三菱電機株式会社 | レ−ザ装置 |
JPS6298682A (ja) * | 1985-10-25 | 1987-05-08 | Hitachi Ltd | 導波路型ガスレ−ザ装置 |
DE4023571A1 (de) * | 1990-07-25 | 1992-02-06 | Uranit Gmbh | Verfahren zur erzeugung von laserstrahlung mit anteilen verschiedener wellenlaengen synchronisierter und raeumlich ueberlappter strahlenausbreitung und mehrwellenlaengen co(pfeil abwaerts)2(pfeil abwaerts)-laser zur durchfuehrung des verfahrens |
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JP2928838B2 (ja) * | 1991-02-07 | 1999-08-03 | 新日本製鐵株式会社 | 2波長発振qスイッチco2 レーザ装置 |
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JP5100990B2 (ja) * | 2004-10-07 | 2012-12-19 | ギガフォトン株式会社 | 極端紫外光源装置用ドライバーレーザ及びlpp型極端紫外光源装置 |
US7948680B2 (en) * | 2007-12-12 | 2011-05-24 | Northrop Grumman Systems Corporation | Spectral beam combination using broad bandwidth lasers |
JP5536401B2 (ja) * | 2008-10-16 | 2014-07-02 | ギガフォトン株式会社 | レーザ装置および極端紫外光光源装置 |
US8902497B2 (en) * | 2009-08-20 | 2014-12-02 | Lawrence Livermore National Security, Llc | Spatial filters for high power lasers |
JP2013062484A (ja) * | 2011-08-24 | 2013-04-04 | Gigaphoton Inc | レーザ装置 |
JP6157194B2 (ja) * | 2013-04-23 | 2017-07-05 | 三菱電機株式会社 | レーザ装置および光ビームの波長結合方法 |
JP2016054295A (ja) * | 2014-09-01 | 2016-04-14 | 三菱電機株式会社 | 波長結合外部共振器型レーザ装置 |
DE112015006769T5 (de) * | 2015-08-04 | 2018-05-03 | Mitsubishi Electric Corporation | Halbleiterlaservorrichtung |
-
2018
- 2018-10-10 JP JP2019509567A patent/JP6652684B1/ja active Active
- 2018-10-10 US US17/281,579 patent/US20210391683A1/en not_active Abandoned
- 2018-10-10 WO PCT/JP2018/037773 patent/WO2020075246A1/ja active Application Filing
- 2018-10-10 CN CN201880098412.XA patent/CN112805886B/zh active Active
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US20210391683A1 (en) | 2021-12-16 |
WO2020075246A1 (ja) | 2020-04-16 |
CN112805886A (zh) | 2021-05-14 |
JP6652684B1 (ja) | 2020-02-26 |
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