JPWO2003023481A1 - 光学系、投影光学系、この投影光学系を備えた露光装置、及びこの露光装置を用いたマイクロデバイスの製造方法 - Google Patents

光学系、投影光学系、この投影光学系を備えた露光装置、及びこの露光装置を用いたマイクロデバイスの製造方法 Download PDF

Info

Publication number: JPWO2003023481A1
Authority: JP; Japan
Prior art keywords: optical; axis; optical system; crystal; crystal axis
Prior art date: 2001-09-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Withdrawn

Application number

JP2003527483A

Other languages

English (en)

Japanese (ja)

Inventor

大村　泰弘

泰弘大村

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-09-07

Filing date

2002-08-29

Publication date

2004-12-24

2002-08-29 Application filed by Nikon Corp filed Critical Nikon Corp

2004-12-24 Publication of JPWO2003023481A1 publication Critical patent/JPWO2003023481A1/ja

Status Withdrawn legal-status Critical Current

Links

230000003287 optical effect Effects 0.000 title claims abstract description 709
238000000034 method Methods 0.000 title description 113
238000004519 manufacturing process Methods 0.000 title description 22
239000013078 crystal Substances 0.000 claims abstract description 319
WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims abstract description 149
239000000463 material Substances 0.000 claims description 29
238000005286 illumination Methods 0.000 claims description 25
239000000758 substrate Substances 0.000 claims description 17
OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims description 11
229910001632 barium fluoride Inorganic materials 0.000 claims description 11
229910001634 calcium fluoride Inorganic materials 0.000 claims description 9
210000001747 pupil Anatomy 0.000 claims description 9
239000010436 fluorite Substances 0.000 abstract description 139
238000012937 correction Methods 0.000 abstract description 81
238000003384 imaging method Methods 0.000 abstract description 25
201000009310 astigmatism Diseases 0.000 abstract description 13
230000002542 deteriorative effect Effects 0.000 abstract description 5
238000010586 diagram Methods 0.000 description 40
230000004075 alteration Effects 0.000 description 21
230000000694 effects Effects 0.000 description 16
238000013461 design Methods 0.000 description 8
239000011521 glass Substances 0.000 description 8
230000010355 oscillation Effects 0.000 description 8
239000004065 semiconductor Substances 0.000 description 8
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
238000009826 distribution Methods 0.000 description 6
PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 6
230000008569 process Effects 0.000 description 6
230000005540 biological transmission Effects 0.000 description 5
ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 5
238000005452 bending Methods 0.000 description 4
230000006866 deterioration Effects 0.000 description 4
239000004973 liquid crystal related substance Substances 0.000 description 4
238000001459 lithography Methods 0.000 description 4
230000010287 polarization Effects 0.000 description 4
FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 4
229910001637 strontium fluoride Inorganic materials 0.000 description 4
239000000126 substance Substances 0.000 description 4
239000010409 thin film Substances 0.000 description 4
229910004261 CaF 2 Inorganic materials 0.000 description 3
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
238000005530 etching Methods 0.000 description 3
239000000835 fiber Substances 0.000 description 3
229910001635 magnesium fluoride Inorganic materials 0.000 description 3
238000012805 post-processing Methods 0.000 description 3
238000007781 pre-processing Methods 0.000 description 3
238000012545 processing Methods 0.000 description 3
229910052710 silicon Inorganic materials 0.000 description 3
239000010703 silicon Substances 0.000 description 3
238000002834 transmittance Methods 0.000 description 3
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
229910052691 Erbium Inorganic materials 0.000 description 2
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
230000009471 action Effects 0.000 description 2
230000008859 change Effects 0.000 description 2
238000011161 development Methods 0.000 description 2
238000010894 electron beam technology Methods 0.000 description 2
UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 2
239000011737 fluorine Substances 0.000 description 2
229910052731 fluorine Inorganic materials 0.000 description 2
230000004907 flux Effects 0.000 description 2
239000007789 gas Substances 0.000 description 2
239000001257 hydrogen Substances 0.000 description 2
229910052739 hydrogen Inorganic materials 0.000 description 2
238000007689 inspection Methods 0.000 description 2
239000011295 pitch Substances 0.000 description 2
239000010453 quartz Substances 0.000 description 2
238000007493 shaping process Methods 0.000 description 2
239000004575 stone Substances 0.000 description 2
238000012360 testing method Methods 0.000 description 2
229910016036 BaF 2 Inorganic materials 0.000 description 1
206010010071 Coma Diseases 0.000 description 1
229910052769 Ytterbium Inorganic materials 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
230000001154 acute effect Effects 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
238000012790 confirmation Methods 0.000 description 1
238000005538 encapsulation Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
230000001747 exhibiting effect Effects 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
239000010408 film Substances 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
238000005468 ion implantation Methods 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
238000005259 measurement Methods 0.000 description 1
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238000012546 transfer Methods 0.000 description 1
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NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1

Images

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
- G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Health & Medical Sciences (AREA)
Toxicology (AREA)
Chemical & Material Sciences (AREA)
Crystallography & Structural Chemistry (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Lenses (AREA)

JP2003527483A 2001-09-07 2002-08-29 光学系、投影光学系、この投影光学系を備えた露光装置、及びこの露光装置を用いたマイクロデバイスの製造方法 Withdrawn JPWO2003023481A1 (ja)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP2001272648		2001-09-07
JP2001272648		2001-09-07
PCT/JP2002/008726 WO2003023481A1 (fr)	2001-09-07	2002-08-29	Systeme optique, systeme optique de projection, dispositif d'exposition presentant ledit systeme de projection et procede de fabrication d'un microdispositif a l'aide dudit dispositif d'exposition

Publications (1)

Publication Number	Publication Date
JPWO2003023481A1 true JPWO2003023481A1 (ja)	2004-12-24

Family

ID=19097988

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2003527483A Withdrawn JPWO2003023481A1 (ja)	2001-09-07	2002-08-29	光学系、投影光学系、この投影光学系を備えた露光装置、及びこの露光装置を用いたマイクロデバイスの製造方法

Country Status (3)

Country	Link
JP (1)	JPWO2003023481A1 (fr)
TW (1)	TW554412B (fr)
WO (1)	WO2003023481A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2002093209A2 (fr)	2001-05-15	2002-11-21	Carl Zeiss	Objectif comportant des lentilles de cristal de fluorure
US7292388B2 (en)	2002-05-08	2007-11-06	Carl Zeiss Smt Ag	Lens made of a crystalline material
JP4547714B2 (ja) *	2004-05-19	2010-09-22	株式会社ニコン	投影光学系、露光装置、および露光方法
DE102007055567A1 (de)	2007-11-20	2009-05-28	Carl Zeiss Smt Ag	Optisches System
JP6150313B1 (ja) *	2016-02-15	2017-06-21	三菱重工業株式会社	レーザ加工機

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4643534A (en) *	1984-08-20	1987-02-17	General Electric Company	Optical transmission filter for far field beam correction
DE60042186D1 (de) *	1999-01-06	2009-06-25	Nikon Corp	Onssystems
JP2000331927A (ja) *	1999-03-12	2000-11-30	Canon Inc	投影光学系及びそれを用いた投影露光装置

2002
- 2002-08-02 TW TW091117458A patent/TW554412B/zh not_active IP Right Cessation
- 2002-08-29 WO PCT/JP2002/008726 patent/WO2003023481A1/fr active Application Filing
- 2002-08-29 JP JP2003527483A patent/JPWO2003023481A1/ja not_active Withdrawn

Also Published As

Publication number	Publication date
TW554412B (en)	2003-09-21
WO2003023481A1 (fr)	2003-03-20

Legal Events

Date

Code

Title

Description

2005-11-01

A300

Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20051101

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US6775063B2 (en)	2004-08-10	Optical system and exposure apparatus having the optical system
US6844982B2 (en)	2005-01-18	Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system
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