WO2003023481A1 - Systeme optique, systeme optique de projection, dispositif d'exposition presentant ledit systeme de projection et procede de fabrication d'un microdispositif a l'aide dudit dispositif d'exposition - Google Patents

Systeme optique, systeme optique de projection, dispositif d'exposition presentant ledit systeme de projection et procede de fabrication d'un microdispositif a l'aide dudit dispositif d'exposition Download PDF

Info

Publication number
WO2003023481A1
WO2003023481A1 PCT/JP2002/008726 JP0208726W WO03023481A1 WO 2003023481 A1 WO2003023481 A1 WO 2003023481A1 JP 0208726 W JP0208726 W JP 0208726W WO 03023481 A1 WO03023481 A1 WO 03023481A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical system
projection optical
exposure device
lens
rotation
Prior art date
Application number
PCT/JP2002/008726
Other languages
English (en)
Japanese (ja)
Inventor
Yasuhiro Omura
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2003527483A priority Critical patent/JPWO2003023481A1/ja
Publication of WO2003023481A1 publication Critical patent/WO2003023481A1/fr

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

La présente invention concerne un système optique pouvant régler les caractéristiques optiques à asymétrie de rotation (par exemple, une composante d'erreur d'astigmatisme et de grossissement à asymétrie de révolution) par rapport à l'axe optique du système optique sans dégrader les performances de focalisation sous l'effet de la double réfraction. Dans ledit système optique, un objectif torique constitué de fluorine et présentant une puissance à asymétrie de rotation et un objectif corrigé constitué de fluorine forment une paire, et l'objectif corrigé est placé de telle sorte que son axe optique est dans une relation de position prédéterminée par rapport à l'axe optique de l'objectif torique. Ledit objectif torique et ledit objectif corrigé peuvent tourner autour de l'axe optique et peuvent se déplacer le long de l'axe optique et la relation de position prédéterminée peut être conservée même lorsque l'objectif torique tourne et se déplace.
PCT/JP2002/008726 2001-09-07 2002-08-29 Systeme optique, systeme optique de projection, dispositif d'exposition presentant ledit systeme de projection et procede de fabrication d'un microdispositif a l'aide dudit dispositif d'exposition WO2003023481A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003527483A JPWO2003023481A1 (ja) 2001-09-07 2002-08-29 光学系、投影光学系、この投影光学系を備えた露光装置、及びこの露光装置を用いたマイクロデバイスの製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001272648 2001-09-07
JP2001-272648 2001-09-07

Publications (1)

Publication Number Publication Date
WO2003023481A1 true WO2003023481A1 (fr) 2003-03-20

Family

ID=19097988

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/008726 WO2003023481A1 (fr) 2001-09-07 2002-08-29 Systeme optique, systeme optique de projection, dispositif d'exposition presentant ledit systeme de projection et procede de fabrication d'un microdispositif a l'aide dudit dispositif d'exposition

Country Status (3)

Country Link
JP (1) JPWO2003023481A1 (fr)
TW (1) TW554412B (fr)
WO (1) WO2003023481A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005331694A (ja) * 2004-05-19 2005-12-02 Nikon Corp 投影光学系、露光装置、および露光方法
US7126765B2 (en) 2001-05-15 2006-10-24 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
WO2009065819A3 (fr) * 2007-11-20 2009-07-09 Zeiss Carl Smt Ag Système optique
WO2017141852A1 (fr) * 2016-02-15 2017-08-24 三菱重工業株式会社 Machine de traitement au laser

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4643534A (en) * 1984-08-20 1987-02-17 General Electric Company Optical transmission filter for far field beam correction
JP2000331927A (ja) * 1999-03-12 2000-11-30 Canon Inc 投影光学系及びそれを用いた投影露光装置
EP1063684A1 (fr) * 1999-01-06 2000-12-27 Nikon Corporation Systeme optique de projection, procede de fabrication associe et appareil d'exposition par projection utilisant ce systeme

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4643534A (en) * 1984-08-20 1987-02-17 General Electric Company Optical transmission filter for far field beam correction
EP1063684A1 (fr) * 1999-01-06 2000-12-27 Nikon Corporation Systeme optique de projection, procede de fabrication associe et appareil d'exposition par projection utilisant ce systeme
JP2000331927A (ja) * 1999-03-12 2000-11-30 Canon Inc 投影光学系及びそれを用いた投影露光装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7126765B2 (en) 2001-05-15 2006-10-24 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7180667B2 (en) 2001-05-15 2007-02-20 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
US7672044B2 (en) 2002-05-08 2010-03-02 Carl Zeiss Smt Ag Lens made of a crystalline material
JP2005331694A (ja) * 2004-05-19 2005-12-02 Nikon Corp 投影光学系、露光装置、および露光方法
JP4547714B2 (ja) * 2004-05-19 2010-09-22 株式会社ニコン 投影光学系、露光装置、および露光方法
WO2009065819A3 (fr) * 2007-11-20 2009-07-09 Zeiss Carl Smt Ag Système optique
US8379188B2 (en) 2007-11-20 2013-02-19 Carl Zeiss Smt Gmbh Optical system
WO2017141852A1 (fr) * 2016-02-15 2017-08-24 三菱重工業株式会社 Machine de traitement au laser

Also Published As

Publication number Publication date
JPWO2003023481A1 (ja) 2004-12-24
TW554412B (en) 2003-09-21

Similar Documents

Publication Publication Date Title
EP1720199B1 (fr) Système optique, système d'exposition, et procédé d'exposition
TWI385414B (zh) 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
JP4849165B2 (ja) 照明光学装置、露光装置および露光方法
US20180341185A1 (en) Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
WO2002093257A3 (fr) Dispositif d'insolation par projection pour microlithographie, systeme optique, procede de fabrication d'un objectif de projection pour microlithographie et procede de structuration microlithographique
TW200643463A (en) Zoom lens system and camera having the same
US20070222962A1 (en) Illumination Optical Equipment, Exposure System and Method
KR20060039925A (ko) 조명 광학 장치, 노광 장치 및 노광 방법
WO2003023481A1 (fr) Systeme optique, systeme optique de projection, dispositif d'exposition presentant ledit systeme de projection et procede de fabrication d'un microdispositif a l'aide dudit dispositif d'exposition
KR102045133B1 (ko) 조명 광학계
JP4905151B2 (ja) 光軸調整装置
EP1615067A4 (fr) Element optique, systeme optique, dispositif laser, dispositif d'exposition et dispositif de traitement de cristaux de haut polymere
TWI439816B (zh) 光學積分器、照明光學裝置、曝光裝置以及元件製造方法
JP2004103746A (ja) 露光装置および露光方法
CN101452212B (zh) 投影式光刻机
KR20050100878A (ko) 소형 카메라의 초점 조정 장치

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BY BZ CA CH CN CO CR CU CZ DE DM DZ EC EE ES FI GB GD GE GH HR HU ID IL IN IS JP KE KG KR KZ LK LR LS LT LU LV MA MD MG MK MW MX MZ NO NZ OM PH PL PT RO SD SE SG SI SK SL TJ TM TN TR TT UA UG US UZ VC VN YU ZA ZM

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW MZ SD SL SZ UG ZM ZW AM AZ BY KG KZ RU TJ TM AT BE BG CH CY CZ DK EE ES FI FR GB GR IE IT LU MC PT SE SK TR BF BJ CF CG CI GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2003527483

Country of ref document: JP

122 Ep: pct application non-entry in european phase