JPS648296A - Production of silicon dioxide film - Google Patents
Production of silicon dioxide filmInfo
- Publication number
- JPS648296A JPS648296A JP16299487A JP16299487A JPS648296A JP S648296 A JPS648296 A JP S648296A JP 16299487 A JP16299487 A JP 16299487A JP 16299487 A JP16299487 A JP 16299487A JP S648296 A JPS648296 A JP S648296A
- Authority
- JP
- Japan
- Prior art keywords
- sio2
- anode
- substrate
- production
- silicon dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16299487A JPS648296A (en) | 1987-06-30 | 1987-06-30 | Production of silicon dioxide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16299487A JPS648296A (en) | 1987-06-30 | 1987-06-30 | Production of silicon dioxide film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS648296A true JPS648296A (en) | 1989-01-12 |
Family
ID=15765181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16299487A Pending JPS648296A (en) | 1987-06-30 | 1987-06-30 | Production of silicon dioxide film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS648296A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5616233A (en) * | 1996-05-01 | 1997-04-01 | National Science Council | Method for making a fluorinated silicon dioxide layer on silicon substrate by anodic oxidation at room temperature |
AT409273B (de) * | 2000-08-28 | 2002-07-25 | Friedrich Dr Kroener | Elektrochemische abscheidung eines dotierstoffenthaltenden silicatfilms auf die oberfläche von siliziumplättchen für die solarzellenerzeugung |
JP2009184913A (ja) * | 2009-02-20 | 2009-08-20 | Shibaura Institute Of Technology | ガラス材料の回収方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5023349A (ja) * | 1973-07-04 | 1975-03-13 | ||
JPS5025448A (ja) * | 1973-07-06 | 1975-03-18 | ||
JPS6033233A (ja) * | 1983-07-27 | 1985-02-20 | Nippon Sheet Glass Co Ltd | 酸化珪素被膜の製造方法 |
-
1987
- 1987-06-30 JP JP16299487A patent/JPS648296A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5023349A (ja) * | 1973-07-04 | 1975-03-13 | ||
JPS5025448A (ja) * | 1973-07-06 | 1975-03-18 | ||
JPS6033233A (ja) * | 1983-07-27 | 1985-02-20 | Nippon Sheet Glass Co Ltd | 酸化珪素被膜の製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5616233A (en) * | 1996-05-01 | 1997-04-01 | National Science Council | Method for making a fluorinated silicon dioxide layer on silicon substrate by anodic oxidation at room temperature |
AT409273B (de) * | 2000-08-28 | 2002-07-25 | Friedrich Dr Kroener | Elektrochemische abscheidung eines dotierstoffenthaltenden silicatfilms auf die oberfläche von siliziumplättchen für die solarzellenerzeugung |
JP2009184913A (ja) * | 2009-02-20 | 2009-08-20 | Shibaura Institute Of Technology | ガラス材料の回収方法 |
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