JPS5425674A - Electron beam exposure unit - Google Patents
Electron beam exposure unitInfo
- Publication number
- JPS5425674A JPS5425674A JP9126477A JP9126477A JPS5425674A JP S5425674 A JPS5425674 A JP S5425674A JP 9126477 A JP9126477 A JP 9126477A JP 9126477 A JP9126477 A JP 9126477A JP S5425674 A JPS5425674 A JP S5425674A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure unit
- beam exposure
- radiation
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To establish uniform pattern, by correcting the ununiformity of reaction present continuously in the electron ray resist even after the stoppage of radiation, through the radiation while increasing automatically the strength of radiation of electron rays.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9126477A JPS5425674A (en) | 1977-07-28 | 1977-07-28 | Electron beam exposure unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9126477A JPS5425674A (en) | 1977-07-28 | 1977-07-28 | Electron beam exposure unit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5425674A true JPS5425674A (en) | 1979-02-26 |
Family
ID=14021554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9126477A Pending JPS5425674A (en) | 1977-07-28 | 1977-07-28 | Electron beam exposure unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5425674A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633825A (en) * | 1979-08-29 | 1981-04-04 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method for electron ray drawing |
-
1977
- 1977-07-28 JP JP9126477A patent/JPS5425674A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633825A (en) * | 1979-08-29 | 1981-04-04 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method for electron ray drawing |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5212828A (en) | Exposure control process for the object of a non-uniform distribution of brightness | |
JPS5385188A (en) | Pulse x-ray apparatus | |
JPS5427369A (en) | Pattern formation method | |
JPS5425674A (en) | Electron beam exposure unit | |
JPS53103392A (en) | Tomograph | |
JPS5438787A (en) | X-ray source apparatus | |
JPS51148365A (en) | Electron beam exposure method | |
JPS5394889A (en) | Tomograph | |
JPS5442979A (en) | Electron beam exposure device | |
JPS5368994A (en) | X-ray apparatus | |
JPS53148284A (en) | Charged particle ray apparatus | |
JPS52129394A (en) | X-ray generator | |
JPS5411680A (en) | Exposure unit of electron beam | |
JPS53145558A (en) | Peripheral unit for cathode ray tube | |
JPS5416181A (en) | Electron beam exposure method | |
JPS546484A (en) | Radiant ray generator | |
JPS5279662A (en) | Electron beam exposure device | |
JPS53114676A (en) | Electron beam exposure method | |
JPS53149767A (en) | X-ray exposing device | |
JPS529483A (en) | Radiographic inspection method of weld zone and radiation absorbing ma sk used in the same inspectoon | |
JPS51147987A (en) | Revolving plate type x-ray tube | |
JPS5342678A (en) | X-ray exposure method | |
JPS54114177A (en) | Manufacture of semiconductor device | |
JPS5340195A (en) | Irradiating method of radioactive ray | |
JPS53127267A (en) | Inspection method for pattern |