JPS5425674A - Electron beam exposure unit - Google Patents

Electron beam exposure unit

Info

Publication number
JPS5425674A
JPS5425674A JP9126477A JP9126477A JPS5425674A JP S5425674 A JPS5425674 A JP S5425674A JP 9126477 A JP9126477 A JP 9126477A JP 9126477 A JP9126477 A JP 9126477A JP S5425674 A JPS5425674 A JP S5425674A
Authority
JP
Japan
Prior art keywords
electron beam
exposure unit
beam exposure
radiation
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9126477A
Other languages
Japanese (ja)
Inventor
Kenji Mizuno
Yoshitake Onishi
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP9126477A priority Critical patent/JPS5425674A/en
Publication of JPS5425674A publication Critical patent/JPS5425674A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To establish uniform pattern, by correcting the ununiformity of reaction present continuously in the electron ray resist even after the stoppage of radiation, through the radiation while increasing automatically the strength of radiation of electron rays.
COPYRIGHT: (C)1979,JPO&Japio
JP9126477A 1977-07-28 1977-07-28 Electron beam exposure unit Pending JPS5425674A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9126477A JPS5425674A (en) 1977-07-28 1977-07-28 Electron beam exposure unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9126477A JPS5425674A (en) 1977-07-28 1977-07-28 Electron beam exposure unit

Publications (1)

Publication Number Publication Date
JPS5425674A true JPS5425674A (en) 1979-02-26

Family

ID=14021554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9126477A Pending JPS5425674A (en) 1977-07-28 1977-07-28 Electron beam exposure unit

Country Status (1)

Country Link
JP (1) JPS5425674A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633825A (en) * 1979-08-29 1981-04-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Method for electron ray drawing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633825A (en) * 1979-08-29 1981-04-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Method for electron ray drawing

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