JPS6477936A - Reduction type x-ray lithographic device - Google Patents

Reduction type x-ray lithographic device

Info

Publication number
JPS6477936A
JPS6477936A JP62235415A JP23541587A JPS6477936A JP S6477936 A JPS6477936 A JP S6477936A JP 62235415 A JP62235415 A JP 62235415A JP 23541587 A JP23541587 A JP 23541587A JP S6477936 A JPS6477936 A JP S6477936A
Authority
JP
Japan
Prior art keywords
mask
reflecting
rays
pattern
reflecting mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62235415A
Other languages
Japanese (ja)
Inventor
Junichi Nishino
Mitsuaki Morigami
Mitsuaki Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP62235415A priority Critical patent/JPS6477936A/en
Publication of JPS6477936A publication Critical patent/JPS6477936A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To reduce a mask pattern independently in the X and Y directions by using an asymmetric Bragg reflection phenomenon by a reflecting X-ray mask and a reflecting mirror reflecting X-rays in a desired wavelength acquired from a monochromator in the mutually orthogonal directions. CONSTITUTION:A desired pattern is drawn on an asymmetric Bragg reflecting Xray mask 6 reducing and reflecting X-rays in a desired wavelength obtained from a monochromator 5, through which only X-rays in the desired wavelength are passed, in the X direction by a material largely absorbing X-rays such as Au. The mask 6 consists of an asymmetric Bragg reflecting mask, and the size of the pattern drawn on the mask is several times as large as a final exposure pattern. A reflecting mirror 7 reducing and reflecting X-rays reflected by the mask 6 in the Y direction is formed from an asymmetric Bragg reflecting mirror for X-rays composed of a single crystal. A resist film exposed by X-rays acquired through the reflecting mirror 7 is applied on a substrate 8. The pattern on the mask 6 can be reduced independently in the X and Y directions by the reflecting mask 6 and the reflecting mirror 7.
JP62235415A 1987-09-18 1987-09-18 Reduction type x-ray lithographic device Pending JPS6477936A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62235415A JPS6477936A (en) 1987-09-18 1987-09-18 Reduction type x-ray lithographic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62235415A JPS6477936A (en) 1987-09-18 1987-09-18 Reduction type x-ray lithographic device

Publications (1)

Publication Number Publication Date
JPS6477936A true JPS6477936A (en) 1989-03-23

Family

ID=16985758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62235415A Pending JPS6477936A (en) 1987-09-18 1987-09-18 Reduction type x-ray lithographic device

Country Status (1)

Country Link
JP (1) JPS6477936A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5072950A (en) * 1989-08-25 1991-12-17 Seal Technology Systems Valve stem assembly
JP2009519593A (en) * 2005-12-13 2009-05-14 コミシリア ア レネルジ アトミック Reflective photolithography mask and method of making the mask
DE102019118113B4 (en) 2018-07-06 2023-12-07 Honda Motor Co., Ltd. Internal combustion engine with starter in a recessed space

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5072950A (en) * 1989-08-25 1991-12-17 Seal Technology Systems Valve stem assembly
JP2009519593A (en) * 2005-12-13 2009-05-14 コミシリア ア レネルジ アトミック Reflective photolithography mask and method of making the mask
DE102019118113B4 (en) 2018-07-06 2023-12-07 Honda Motor Co., Ltd. Internal combustion engine with starter in a recessed space

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