JPS6431971A - Vacuum treatment device - Google Patents
Vacuum treatment deviceInfo
- Publication number
- JPS6431971A JPS6431971A JP18803087A JP18803087A JPS6431971A JP S6431971 A JPS6431971 A JP S6431971A JP 18803087 A JP18803087 A JP 18803087A JP 18803087 A JP18803087 A JP 18803087A JP S6431971 A JPS6431971 A JP S6431971A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- vacuum treatment
- carrier
- gate valves
- unloading
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18803087A JPS6431971A (en) | 1987-07-28 | 1987-07-28 | Vacuum treatment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18803087A JPS6431971A (en) | 1987-07-28 | 1987-07-28 | Vacuum treatment device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6431971A true JPS6431971A (en) | 1989-02-02 |
JPH0242901B2 JPH0242901B2 (ja) | 1990-09-26 |
Family
ID=16216436
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18803087A Granted JPS6431971A (en) | 1987-07-28 | 1987-07-28 | Vacuum treatment device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6431971A (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0841643A (ja) * | 1994-05-05 | 1996-02-13 | Leybold Ag | プレート状の工作部材を処理するための真空装置用の処理ユニット及び該処理ユニットの製造方法 |
US5950330A (en) * | 1990-08-29 | 1999-09-14 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US7089680B1 (en) | 1990-08-29 | 2006-08-15 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
USRE39756E1 (en) * | 1990-08-29 | 2007-08-07 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
USRE39776E1 (en) | 1990-08-29 | 2007-08-21 | Hitachi, Ltd. | Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors |
JP2008520837A (ja) * | 2004-11-18 | 2008-06-19 | インテバック・インコーポレイテッド | ウエハファブ |
US8206551B2 (en) | 2004-11-18 | 2012-06-26 | Intevac, Inc. | Processing thin wafers |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5763676A (en) * | 1980-10-03 | 1982-04-17 | Hitachi Ltd | Continuous sputtering device |
JPS5877239A (ja) * | 1981-11-04 | 1983-05-10 | Ulvac Corp | 連続式真空処理装置 |
JPS6040532A (ja) * | 1983-07-19 | 1985-03-02 | バリアン・アソシエイツ・インコ−ポレイテツド | デイスク又はウエ−ハ取り扱い及びコ−テイング装置 |
JPS6050312A (ja) * | 1983-08-31 | 1985-03-20 | Sharp Corp | 石油燃焼器の点火装置 |
JPS60109218A (ja) * | 1983-11-18 | 1985-06-14 | Hitachi Ltd | 分子線エピタキシャル成長装置 |
JPS6155926A (ja) * | 1984-08-27 | 1986-03-20 | Nec Corp | 半導体製造装置 |
JPS61112312A (ja) * | 1984-11-07 | 1986-05-30 | Hitachi Ltd | 真空連続処理装置 |
JPS6328863A (ja) * | 1986-07-22 | 1988-02-06 | Ulvac Corp | 真空処理装置 |
-
1987
- 1987-07-28 JP JP18803087A patent/JPS6431971A/ja active Granted
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5763676A (en) * | 1980-10-03 | 1982-04-17 | Hitachi Ltd | Continuous sputtering device |
JPS5877239A (ja) * | 1981-11-04 | 1983-05-10 | Ulvac Corp | 連続式真空処理装置 |
JPS6040532A (ja) * | 1983-07-19 | 1985-03-02 | バリアン・アソシエイツ・インコ−ポレイテツド | デイスク又はウエ−ハ取り扱い及びコ−テイング装置 |
JPS6050312A (ja) * | 1983-08-31 | 1985-03-20 | Sharp Corp | 石油燃焼器の点火装置 |
JPS60109218A (ja) * | 1983-11-18 | 1985-06-14 | Hitachi Ltd | 分子線エピタキシャル成長装置 |
JPS6155926A (ja) * | 1984-08-27 | 1986-03-20 | Nec Corp | 半導体製造装置 |
JPS61112312A (ja) * | 1984-11-07 | 1986-05-30 | Hitachi Ltd | 真空連続処理装置 |
JPS6328863A (ja) * | 1986-07-22 | 1988-02-06 | Ulvac Corp | 真空処理装置 |
Cited By (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6634116B2 (en) | 1990-08-09 | 2003-10-21 | Hitachi, Ltd. | Vacuum processing apparatus |
US5950330A (en) * | 1990-08-29 | 1999-09-14 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6012235A (en) * | 1990-08-29 | 2000-01-11 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6044576A (en) * | 1990-08-29 | 2000-04-04 | Hitachi, Ltd. | Vacuum processing and operating method using a vacuum chamber |
US6055740A (en) * | 1990-08-29 | 2000-05-02 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6070341A (en) * | 1990-08-29 | 2000-06-06 | Hitachi, Ltd. | Vacuum processing and operating method with wafers, substrates and/or semiconductors |
US6108929A (en) * | 1990-08-29 | 2000-08-29 | Hitachi, Ltd. | Vacuum processing apparatus |
US6112431A (en) * | 1990-08-29 | 2000-09-05 | Hitachi, Ltd. | Vacuum processing and operating method |
US6263588B1 (en) | 1990-08-29 | 2001-07-24 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6301801B1 (en) | 1990-08-29 | 2001-10-16 | Shigekazu Kato | Vacuum processing apparatus and operating method therefor |
US6301802B1 (en) | 1990-08-29 | 2001-10-16 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6314658B2 (en) | 1990-08-29 | 2001-11-13 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6330756B1 (en) | 1990-08-29 | 2001-12-18 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6330755B1 (en) | 1990-08-29 | 2001-12-18 | Hitachi, Ltd. | Vacuum processing and operating method |
US6332280B2 (en) | 1990-08-29 | 2001-12-25 | Hitachi, Ltd. | Vacuum processing apparatus |
US6446353B2 (en) | 1990-08-29 | 2002-09-10 | Hitachi, Ltd. | Vacuum processing apparatus |
US6457253B2 (en) | 1990-08-29 | 2002-10-01 | Hitachi, Ltd. | Vacuum processing apparatus |
US6460270B2 (en) | 1990-08-29 | 2002-10-08 | Hitachi, Ltd. | Vacuum processing apparatus |
US6463676B1 (en) | 1990-08-29 | 2002-10-15 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6463678B2 (en) | 1990-08-29 | 2002-10-15 | Hitachi, Ltd. | Substrate changing-over mechanism in a vaccum tank |
US6467186B2 (en) | 1990-08-29 | 2002-10-22 | Hitachi, Ltd. | Transferring device for a vacuum processing apparatus and operating method therefor |
US6467187B2 (en) | 1990-08-29 | 2002-10-22 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6470596B2 (en) | 1990-08-29 | 2002-10-29 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6473989B2 (en) | 1990-08-29 | 2002-11-05 | Hitachi, Ltd. | Conveying system for a vacuum processing apparatus |
US6484415B2 (en) | 1990-08-29 | 2002-11-26 | Hitachi, Ltd. | Vacuum processing apparatus |
US6484414B2 (en) | 1990-08-29 | 2002-11-26 | Hitachi, Ltd. | Vacuum processing apparatus |
US6487793B2 (en) | 1990-08-29 | 2002-12-03 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6487794B2 (en) | 1990-08-29 | 2002-12-03 | Hitachi, Ltd. | Substrate changing-over mechanism in vacuum tank |
US6487791B2 (en) | 1990-08-29 | 2002-12-03 | Hitachi, Ltd. | Vacuum processing apparatus |
US6490810B2 (en) | 1990-08-29 | 2002-12-10 | Hitachi, Ltd. | Vacuum processing apparatus |
US6499229B2 (en) | 1990-08-29 | 2002-12-31 | Hitachi, Ltd. | Vacuum processing apparatus |
US6505415B2 (en) | 1990-08-29 | 2003-01-14 | Hitachi, Ltd. | Vacuum processing apparatus |
US6588121B2 (en) | 1990-08-29 | 2003-07-08 | Hitachi, Ltd. | Vacuum processing apparatus |
US6625899B2 (en) | 1990-08-29 | 2003-09-30 | Hitachi, Ltd. | Vacuum processing apparatus |
US6655044B2 (en) | 1990-08-29 | 2003-12-02 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6662465B2 (en) | 1990-08-29 | 2003-12-16 | Hitachi, Ltd. | Vacuum processing apparatus |
US6880264B2 (en) | 1990-08-29 | 2005-04-19 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6886272B2 (en) | 1990-08-29 | 2005-05-03 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6904699B2 (en) | 1990-08-29 | 2005-06-14 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US6968630B2 (en) | 1990-08-29 | 2005-11-29 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US7089680B1 (en) | 1990-08-29 | 2006-08-15 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
USRE39756E1 (en) * | 1990-08-29 | 2007-08-07 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
USRE39776E1 (en) | 1990-08-29 | 2007-08-21 | Hitachi, Ltd. | Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors |
USRE39775E1 (en) * | 1990-08-29 | 2007-08-21 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
USRE39823E1 (en) * | 1990-08-29 | 2007-09-11 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
USRE39824E1 (en) * | 1990-08-29 | 2007-09-11 | Hitachi, Ltd. | Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors |
US7367135B2 (en) | 1990-08-29 | 2008-05-06 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
JPH0841643A (ja) * | 1994-05-05 | 1996-02-13 | Leybold Ag | プレート状の工作部材を処理するための真空装置用の処理ユニット及び該処理ユニットの製造方法 |
JP2008520837A (ja) * | 2004-11-18 | 2008-06-19 | インテバック・インコーポレイテッド | ウエハファブ |
US8206551B2 (en) | 2004-11-18 | 2012-06-26 | Intevac, Inc. | Processing thin wafers |
US8354001B2 (en) | 2004-11-18 | 2013-01-15 | Intevac, Inc. | Processing thin wafers |
Also Published As
Publication number | Publication date |
---|---|
JPH0242901B2 (ja) | 1990-09-26 |
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