JPS57200558A - Gate valve method of transferring wafer into air-tight chamber - Google Patents

Gate valve method of transferring wafer into air-tight chamber

Info

Publication number
JPS57200558A
JPS57200558A JP8256581A JP8256581A JPS57200558A JP S57200558 A JPS57200558 A JP S57200558A JP 8256581 A JP8256581 A JP 8256581A JP 8256581 A JP8256581 A JP 8256581A JP S57200558 A JPS57200558 A JP S57200558A
Authority
JP
Japan
Prior art keywords
wafers
slits
transferred
gate valve
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8256581A
Other languages
Japanese (ja)
Inventor
Yasusuke Akai
Shinya Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP8256581A priority Critical patent/JPS57200558A/en
Publication of JPS57200558A publication Critical patent/JPS57200558A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Abstract

PURPOSE:To reduce a required space, by enabling wafers to pass through slits of two gate valves thereby every other wafer is first transferred and then the remaining wafers are transferred. CONSTITUTION:The wafers, for example twenty-five wafers, equi-spaced and stored in a cassette in a chamber A of an air-tight apparatus will be transferred into an adjacent chamber B. In this case, the two gate valves 2A, 2B each having slits 5 through which the wafers can be passed are provided between the chambers A, B, which gate valve 2A is movable, and which gate 2B is fixed. When the slits 5 of the gate valves are registered, every other wafer, that is, thirteen are transferred via slits 5 into the cassette 2B. Next, the movable gate valve 2A is moved vertically to register the slits 5, and the remaining twelve wafers are transferred into the cassette 2B.
JP8256581A 1981-06-01 1981-06-01 Gate valve method of transferring wafer into air-tight chamber Pending JPS57200558A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8256581A JPS57200558A (en) 1981-06-01 1981-06-01 Gate valve method of transferring wafer into air-tight chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8256581A JPS57200558A (en) 1981-06-01 1981-06-01 Gate valve method of transferring wafer into air-tight chamber

Publications (1)

Publication Number Publication Date
JPS57200558A true JPS57200558A (en) 1982-12-08

Family

ID=13778004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8256581A Pending JPS57200558A (en) 1981-06-01 1981-06-01 Gate valve method of transferring wafer into air-tight chamber

Country Status (1)

Country Link
JP (1) JPS57200558A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6090829U (en) * 1983-11-28 1985-06-21 株式会社プラズマシステム Gate opening/closing device for each multi-tiered room
JP2007270161A (en) * 2006-03-30 2007-10-18 Jfe Steel Kk Gas wiping nozzle, and hot-dipped steel plate manufacturing method
JP2007302959A (en) * 2006-05-12 2007-11-22 Jfe Steel Kk Method for manufacturing hot-dip metal-plated steel strip
US8834673B2 (en) 2006-11-10 2014-09-16 Adp Engineering Co., Ltd. Process chamber having gate slit opening and closing apparatus
KR101531632B1 (en) * 2014-02-24 2015-06-29 주식회사 아스타 Gate valve structure for vacuum system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6090829U (en) * 1983-11-28 1985-06-21 株式会社プラズマシステム Gate opening/closing device for each multi-tiered room
JP2007270161A (en) * 2006-03-30 2007-10-18 Jfe Steel Kk Gas wiping nozzle, and hot-dipped steel plate manufacturing method
JP2007302959A (en) * 2006-05-12 2007-11-22 Jfe Steel Kk Method for manufacturing hot-dip metal-plated steel strip
US8834673B2 (en) 2006-11-10 2014-09-16 Adp Engineering Co., Ltd. Process chamber having gate slit opening and closing apparatus
KR101531632B1 (en) * 2014-02-24 2015-06-29 주식회사 아스타 Gate valve structure for vacuum system

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