JPS6425416A - Electron beam exposure method - Google Patents
Electron beam exposure methodInfo
- Publication number
- JPS6425416A JPS6425416A JP18151087A JP18151087A JPS6425416A JP S6425416 A JPS6425416 A JP S6425416A JP 18151087 A JP18151087 A JP 18151087A JP 18151087 A JP18151087 A JP 18151087A JP S6425416 A JPS6425416 A JP S6425416A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- electron beam
- upper layer
- layer resist
- inferior
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To suppress the influence of electrons of an electron beam reflected from a substrate and form a dense, fine pattern where no proximity effect is recognized by preparing a resist having a sensitivity which is inferior to that of an upper layer resist at a lower layer, thereby making the resist have a two-layer resist structure; namely lower and upper layer resists. CONSTITUTION:Lower and upper layer resists 2 and 3 are coated on a silicon substrate 1. It is preferable for the lower layer resist to have sensitivity that is inferior to that of the upper layer resist. Once the resist is irradiated by an electron beam, the upper layer resist is sufficiently exposed to the electron beam but the lower resist is not exposed to its beam. Then the electron beam is reflected to the silicon substrate and even the lower resist is also exposed to its beam. Being different from the case of a single layer resist 3 the arrangement of another resist 2 having inferior sensitivity makes the influence of reflected electrons small. The resultant cross section obtained after its development exhibits a large undercut in the case of the single layer resist as shown by dotted lines 5 but a small undercut in the case of the two-layer resist as shown by solid lines 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18151087A JPS6425416A (en) | 1987-07-21 | 1987-07-21 | Electron beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18151087A JPS6425416A (en) | 1987-07-21 | 1987-07-21 | Electron beam exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6425416A true JPS6425416A (en) | 1989-01-27 |
Family
ID=16102022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18151087A Pending JPS6425416A (en) | 1987-07-21 | 1987-07-21 | Electron beam exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6425416A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7038204B2 (en) | 2004-05-26 | 2006-05-02 | International Business Machines Corporation | Method for reducing proximity effects in electron beam lithography |
JP2015126004A (en) * | 2013-12-25 | 2015-07-06 | 凸版印刷株式会社 | Test piece for calculating electron scattering distance and method for calculating electron scattering distance |
-
1987
- 1987-07-21 JP JP18151087A patent/JPS6425416A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7038204B2 (en) | 2004-05-26 | 2006-05-02 | International Business Machines Corporation | Method for reducing proximity effects in electron beam lithography |
JP2015126004A (en) * | 2013-12-25 | 2015-07-06 | 凸版印刷株式会社 | Test piece for calculating electron scattering distance and method for calculating electron scattering distance |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0097417A3 (en) | Electron beam lithography | |
EP0391636A3 (en) | Method of correcting proximity effects | |
EP0984327A3 (en) | Process for producing halftone mask | |
JPS5655571A (en) | Fine pattern forming method of aluminum film or aluminum alloy film | |
JPS6439021A (en) | X-ray mask | |
JPS6425416A (en) | Electron beam exposure method | |
JPS52119172A (en) | Forming method of fine pattern | |
EP0057268A3 (en) | Method of fabricating x-ray lithographic masks | |
JPS5461931A (en) | Forming method of photo resist patterns | |
JPS54116883A (en) | Electron beam exposure method | |
JPS5772327A (en) | Formation of resist pattern | |
JPS57155539A (en) | Mask | |
Dolan et al. | Canyon lithography | |
JPS5694353A (en) | Micropattern forming method | |
JPS5652751A (en) | Photomask correcting method | |
JPS53112671A (en) | Forming method for pattern | |
JPS5568626A (en) | Pattern formation | |
JPS57198632A (en) | Fine pattern formation | |
JPS5721819A (en) | Forming method for pattern | |
JPS5655044A (en) | Formation of resist pattern | |
JPS5277671A (en) | Method and equipment of masking | |
JPS5452473A (en) | Forming method for coating for fine pattern | |
JPS5339078A (en) | Electron beam exposure method | |
JPS53114676A (en) | Electron beam exposure method | |
JPS6075837A (en) | Mask for x-ray exposing and its production |