JPS52119172A - Forming method of fine pattern - Google Patents
Forming method of fine patternInfo
- Publication number
- JPS52119172A JPS52119172A JP3646476A JP3646476A JPS52119172A JP S52119172 A JPS52119172 A JP S52119172A JP 3646476 A JP3646476 A JP 3646476A JP 3646476 A JP3646476 A JP 3646476A JP S52119172 A JPS52119172 A JP S52119172A
- Authority
- JP
- Japan
- Prior art keywords
- forming method
- fine pattern
- resist layer
- type resist
- negativetype
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To obtain the fime negative-type resist pattern by coating the negativetype resist layer, the metal film and the positive type resist layer on the semiconductor substrate in sequence and by applying the electron beam or the Xray and by performing the etching process in these order.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51036464A JPS5819127B2 (en) | 1976-03-31 | 1976-03-31 | Fine pattern formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51036464A JPS5819127B2 (en) | 1976-03-31 | 1976-03-31 | Fine pattern formation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52119172A true JPS52119172A (en) | 1977-10-06 |
JPS5819127B2 JPS5819127B2 (en) | 1983-04-16 |
Family
ID=12470523
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51036464A Expired JPS5819127B2 (en) | 1976-03-31 | 1976-03-31 | Fine pattern formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5819127B2 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54118175A (en) * | 1978-02-22 | 1979-09-13 | Ibm | Method of exposing radiation sensitive layer with xxray |
JPS55153191A (en) * | 1979-05-17 | 1980-11-28 | Nec Corp | Manufacture of cylindrical magnetic-domain element |
JPS5672847U (en) * | 1979-11-09 | 1981-06-15 | ||
JPS5679428A (en) * | 1979-12-03 | 1981-06-30 | Hitachi Ltd | Working of ultra-fine article |
JPS5694351A (en) * | 1979-12-26 | 1981-07-30 | Perkin Elmer Corp | Mask for xxray lithograph and production thereof |
JPS57172736A (en) * | 1981-03-30 | 1982-10-23 | Yokogawa Hewlett Packard Ltd | Multilayer photoresist processing |
JPS6122625A (en) * | 1984-07-10 | 1986-01-31 | Toshiba Corp | Pattern forming method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61203227A (en) * | 1985-03-07 | 1986-09-09 | Nippon Steel Corp | Mounting and demounting of shaft |
-
1976
- 1976-03-31 JP JP51036464A patent/JPS5819127B2/en not_active Expired
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54118175A (en) * | 1978-02-22 | 1979-09-13 | Ibm | Method of exposing radiation sensitive layer with xxray |
JPS588129B2 (en) * | 1978-02-22 | 1983-02-14 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | How to expose the radiation-sensitive layer to X-rays |
JPS55153191A (en) * | 1979-05-17 | 1980-11-28 | Nec Corp | Manufacture of cylindrical magnetic-domain element |
JPS5672847U (en) * | 1979-11-09 | 1981-06-15 | ||
JPS5679428A (en) * | 1979-12-03 | 1981-06-30 | Hitachi Ltd | Working of ultra-fine article |
JPS5694351A (en) * | 1979-12-26 | 1981-07-30 | Perkin Elmer Corp | Mask for xxray lithograph and production thereof |
JPH0142134B2 (en) * | 1979-12-26 | 1989-09-11 | Perkin Elmer Corp | |
JPS57172736A (en) * | 1981-03-30 | 1982-10-23 | Yokogawa Hewlett Packard Ltd | Multilayer photoresist processing |
JPS6122625A (en) * | 1984-07-10 | 1986-01-31 | Toshiba Corp | Pattern forming method |
Also Published As
Publication number | Publication date |
---|---|
JPS5819127B2 (en) | 1983-04-16 |
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