JPS6423525A - Vertical-type low-pressure vapor growth equipment - Google Patents
Vertical-type low-pressure vapor growth equipmentInfo
- Publication number
- JPS6423525A JPS6423525A JP17911387A JP17911387A JPS6423525A JP S6423525 A JPS6423525 A JP S6423525A JP 17911387 A JP17911387 A JP 17911387A JP 17911387 A JP17911387 A JP 17911387A JP S6423525 A JPS6423525 A JP S6423525A
- Authority
- JP
- Japan
- Prior art keywords
- boat
- gas
- wafers
- partition
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To form a thin film uniformly on a wafer and to automate a transfer of the wafer by a method wherein a partition is installed between a reaction tube and a boat, only a gas diffused through the partition where a gas introduction hole is made is used for a vapor growth operation and the boat can be turned. CONSTITUTION:A number of silicon wafers 13 are supported horizontally on a boat 14 which is hung inside a reaction tube 11 in such a way that the boat can be turned freely. The inside is heated by using a resistance heating furnace 12; a gas introduced from a gas introduction tube 15 while the wafer boat 14 is turned flows between the reaction tube 11 and a tubular partition 17; one part of the gas is diffused into the inside through introduction holes 18 at the tubular partition 17 and is fed onto the wafers 13. A shape of the holes made at the tubular partition 17 is not restricted especially. However, a size of the holes is to be selected in such a way that the concentration of the gas flowing from an upper part to a lower part of the wafers can be made uniform. By this setup, it is possible to form a uniform thin film on the wafers.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17911387A JPS6423525A (en) | 1987-07-20 | 1987-07-20 | Vertical-type low-pressure vapor growth equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17911387A JPS6423525A (en) | 1987-07-20 | 1987-07-20 | Vertical-type low-pressure vapor growth equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6423525A true JPS6423525A (en) | 1989-01-26 |
Family
ID=16060239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17911387A Pending JPS6423525A (en) | 1987-07-20 | 1987-07-20 | Vertical-type low-pressure vapor growth equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6423525A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07326590A (en) * | 1995-06-16 | 1995-12-12 | Kokusai Electric Co Ltd | Vertical cvd device and its boat |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6252200A (en) * | 1985-08-28 | 1987-03-06 | Nec Corp | Device for gaseous-phase epitaxial growth |
-
1987
- 1987-07-20 JP JP17911387A patent/JPS6423525A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6252200A (en) * | 1985-08-28 | 1987-03-06 | Nec Corp | Device for gaseous-phase epitaxial growth |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07326590A (en) * | 1995-06-16 | 1995-12-12 | Kokusai Electric Co Ltd | Vertical cvd device and its boat |
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