JPS6423144A - Method for detecting flaw in thin film layer of crystal substrate - Google Patents

Method for detecting flaw in thin film layer of crystal substrate

Info

Publication number
JPS6423144A
JPS6423144A JP18031287A JP18031287A JPS6423144A JP S6423144 A JPS6423144 A JP S6423144A JP 18031287 A JP18031287 A JP 18031287A JP 18031287 A JP18031287 A JP 18031287A JP S6423144 A JPS6423144 A JP S6423144A
Authority
JP
Japan
Prior art keywords
thin film
film layer
angle
incidence
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18031287A
Other languages
English (en)
Other versions
JPH0625740B2 (ja
Inventor
Tomoya Ogawa
Shiyuuji Nangou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RATOTSUKU SYST ENG KK
Original Assignee
RATOTSUKU SYST ENG KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RATOTSUKU SYST ENG KK filed Critical RATOTSUKU SYST ENG KK
Priority to JP62180312A priority Critical patent/JPH0625740B2/ja
Publication of JPS6423144A publication Critical patent/JPS6423144A/ja
Publication of JPH0625740B2 publication Critical patent/JPH0625740B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP62180312A 1987-07-20 1987-07-20 結晶基板の薄膜層内欠陥検出方法 Expired - Fee Related JPH0625740B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62180312A JPH0625740B2 (ja) 1987-07-20 1987-07-20 結晶基板の薄膜層内欠陥検出方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62180312A JPH0625740B2 (ja) 1987-07-20 1987-07-20 結晶基板の薄膜層内欠陥検出方法

Publications (2)

Publication Number Publication Date
JPS6423144A true JPS6423144A (en) 1989-01-25
JPH0625740B2 JPH0625740B2 (ja) 1994-04-06

Family

ID=16081011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62180312A Expired - Fee Related JPH0625740B2 (ja) 1987-07-20 1987-07-20 結晶基板の薄膜層内欠陥検出方法

Country Status (1)

Country Link
JP (1) JPH0625740B2 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5995218A (en) * 1997-01-17 1999-11-30 Nec Corporation Method for inspecting defects of wafer and inspection equipment thereof
KR19990088623A (ko) * 1998-05-28 1999-12-27 가부시키가이샤 어드밴티스트 표면상태측정방법및장치
JP2006214818A (ja) * 2005-02-02 2006-08-17 Sharp Corp 光学部品の欠陥検出方法および欠陥検出装置
JP2012063330A (ja) * 2010-09-17 2012-03-29 Kansai Paint Co Ltd 複層塗膜の非接触非破壊評価方法及びそれを用いた装置
KR20150066447A (ko) * 2013-12-06 2015-06-16 도쿄엘렉트론가부시키가이샤 거리를 구하는 방법, 정전 척을 제전하는 방법, 및, 처리 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4888982A (ja) * 1972-02-23 1973-11-21

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4888982A (ja) * 1972-02-23 1973-11-21

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5995218A (en) * 1997-01-17 1999-11-30 Nec Corporation Method for inspecting defects of wafer and inspection equipment thereof
KR19990088623A (ko) * 1998-05-28 1999-12-27 가부시키가이샤 어드밴티스트 표면상태측정방법및장치
JP2006214818A (ja) * 2005-02-02 2006-08-17 Sharp Corp 光学部品の欠陥検出方法および欠陥検出装置
JP2012063330A (ja) * 2010-09-17 2012-03-29 Kansai Paint Co Ltd 複層塗膜の非接触非破壊評価方法及びそれを用いた装置
KR20150066447A (ko) * 2013-12-06 2015-06-16 도쿄엘렉트론가부시키가이샤 거리를 구하는 방법, 정전 척을 제전하는 방법, 및, 처리 장치

Also Published As

Publication number Publication date
JPH0625740B2 (ja) 1994-04-06

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