JPS6399931A - Manufacture of base for optical disk - Google Patents
Manufacture of base for optical diskInfo
- Publication number
- JPS6399931A JPS6399931A JP24525586A JP24525586A JPS6399931A JP S6399931 A JPS6399931 A JP S6399931A JP 24525586 A JP24525586 A JP 24525586A JP 24525586 A JP24525586 A JP 24525586A JP S6399931 A JPS6399931 A JP S6399931A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- mold
- space
- photocurable resin
- optical disc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 239000011347 resin Substances 0.000 claims abstract description 74
- 229920005989 resin Polymers 0.000 claims abstract description 74
- 238000000034 method Methods 0.000 claims abstract description 15
- 238000002347 injection Methods 0.000 claims description 27
- 239000007924 injection Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 27
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 238000012546 transfer Methods 0.000 claims description 2
- 239000004809 Teflon Substances 0.000 abstract description 7
- 229920006362 Teflon® Polymers 0.000 abstract description 7
- 239000010453 quartz Substances 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 238000003860 storage Methods 0.000 abstract 4
- 238000005266 casting Methods 0.000 abstract 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- -1 methacrylate polyene Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920006295 polythiol Polymers 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- IAXXETNIOYFMLW-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) 2-methylprop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C(=C)C)CC1C2(C)C IAXXETNIOYFMLW-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- KQWGXHWJMSMDJJ-UHFFFAOYSA-N cyclohexyl isocyanate Chemical compound O=C=NC1CCCCC1 KQWGXHWJMSMDJJ-UHFFFAOYSA-N 0.000 description 1
- 235000012489 doughnuts Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000010813 municipal solid waste Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、音声、画像、情報などを保存、記録、再生す
る光ディスク用基板に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical disc substrate for storing, recording, and reproducing audio, images, information, and the like.
デジタルオーディオディスク、ビデオディスク、光ディ
スク記録媒体、光磁気ディスクなどに用いる光ディスク
用基板は、厚さ約１ｍｍの透明板の表面に１溝やピット
など情報パターンを形成したものである。Optical disc substrates used for digital audio discs, video discs, optical disc recording media, magneto-optical discs, etc. are made by forming information patterns such as grooves and pits on the surface of a transparent plate about 1 mm thick.
これらの元ディスク用基板を形成する方法としては、従
来より次の３方法が知られている。すなわち
（１１溝やピットなど情報パターンを有する金属製スタ
ンパを配置した金型内に、ポリカーボネート、ポリメチ
ルメタクリレートなどの高分子材料を射出成形する方法
〔日経メカニカル： ｐ、５１（１９８２−２−１入日
経エレクトロニクス： ｐ、１ｓ５ （１９８２−６−
７） ）、
（２１あらかじめ用意した透明支持板の表面に、情報パ
ターン付きの光硬化性樹脂膜な付層せしめる方法（特開
昭５３−８６７５６．％開昭５５−１５２０２８）、
（５） 情報パターンを有するスタンパと光透過性平
板とを対向させ【できる空間に光硬化性樹脂を注入後、
光透過性平板の情より元を照射し、光硬化性樹脂を硬化
せしめ、その後、スタンパと光硬化性平板とを取り除く
ことにより、光硬化性樹脂硬化物から成る情報パターン
付き透明板を得る方法があった。The following three methods are conventionally known as methods for forming these original disk substrates. That is, (11) a method of injection molding a polymeric material such as polycarbonate or polymethyl methacrylate into a mold in which a metal stamper having an information pattern such as grooves or pits is placed [Nikkei Mechanical: p, 51 (1982-2-1) Nikkei Electronics: p, 1s5 (1982-6-
7) ), (21 Method of layering a photocurable resin film with an information pattern on the surface of a transparent support plate prepared in advance (Japanese Patent Application Laid-Open No. 53-86756.% Patent Application Publication No. 55-152028), (5) Information A stamper with a pattern and a light-transmitting flat plate are placed facing each other.
A method for obtaining a transparent plate with an information pattern made of a cured photocurable resin by irradiating the base of a light-transmitting flat plate to cure the photocurable resin, and then removing the stamper and the photocurable flat plate. was there.
（１）の方法により得られる光ディスク用基板は、高分
子材料が流動・固化する際に生ずる分子配向を完全に除
去することが難しいため、基板内に光学的異方性を生じ
易く、また、情報パターンの形状がスタンパから基板に
忠実に転写されにくいため、光ディスクの動作時特性が
低下する傾向にあった。The optical disc substrate obtained by method (1) is likely to have optical anisotropy within the substrate because it is difficult to completely remove the molecular orientation that occurs when the polymer material flows and solidifies. Since the shape of the information pattern is difficult to be faithfully transferred from the stamper to the substrate, the operating characteristics of the optical disk tend to deteriorate.
筐）の方法により得られる元ディスク用基板は、あらか
じめ透明支持板を製造しておかなければならないため、
工数が１えるとともに工程が複雑となり、市価格となる
傾向があった。For the original disk substrate obtained by the method of (Kei), a transparent support plate must be manufactured in advance.
As the number of man-hours increased, the process became more complex, and the price tended to be higher than the market price.
（５）の方法は、（１）および（２）の方法の欠点を解
決できる可能性をもつが、従来の方法では、以下に述べ
るような問題がありた。Method (5) has the potential to solve the drawbacks of methods (1) and (2), but the conventional methods have the following problems.
すなわち、一般的な（３）の方法におい℃は、第２図（
αｌ 、 （Ａ）に示すように、ガラスなどの透明板１
と情報パターン付きスタンパ２を外周りング３を介して
向い合せに配置して形成した童の空間中へ、注入口４よ
り光硬化性樹脂を注入し、この樹脂を光源６を用いて硬
化させている。That is, in the general method (3), °C is calculated as shown in Figure 2 (
αl, as shown in (A), a transparent plate 1 such as glass
A photocurable resin is injected from the injection port 4 into the child's space formed by arranging the information patterned stamper 2 facing each other via the outer ring 3, and this resin is cured using the light source 6. ing.
ここで、この種の光硬化性樹脂とし【一般九使用される
アクリレートまたはメタクリレートのポリエン・ポリチ
オール系光硬化性樹脂Ｒ脂は、硬化時に体積収縮を生じ
る。このため、硬化物の外周部にひけやボイドな生じる
問題があった。この問題を解決する試みとして、スタン
パ部を可動式にしたり（特開昭５５−１６０３８８ ）
、弾力性の外周リングを用いてＣ％開昭５７−２５９
２１）、硬化収量な緩和することが行なわれていた。Here, as this type of photocurable resin, the acrylate or methacrylate polyene/polythiol photocurable resin R resin, which is generally used, undergoes volumetric shrinkage during curing. For this reason, there is a problem in that sink marks and voids occur on the outer periphery of the cured product. In an attempt to solve this problem, the stamper part was made movable (Japanese Patent Laid-Open No. 160388/1983).
, C% using an elastic outer ring
21), the curing yield was reduced.
しかし、これらの従来の方法によると、イ）光硬化性樹
脂硬化物からなる基板の厚さが不均一になりたり、（＋
２）内径の外径の寸法管理が崩しくなったり、ｒ−＋外
周リングとスパッタ、または外周リングと透明板の間に
入った微量の光硬化性Ｗ脂が空気中の酸素により硬化不
良を生じ、未硬化樹脂が基板を汚染したり、あるいは半
硬化の付着性残留物が堆積しＣ型の寸法精度を低下させ
たり、に）体積収縮緩和の型構造であるため、硬化後の
基板とスタンパおよび平板との密着性が高くなり、この
ため基板取り出しが困難になり、あるいは取り出す瞳に
基板や世に損傷をあたえるなどの問題があった。However, according to these conventional methods, (a) the thickness of the substrate made of a cured photocurable resin becomes uneven;
2) Dimensional control of the inner diameter and outer diameter may be disrupted, or a trace amount of photocurable W resin that has entered between the r-+ outer ring and spatter or between the outer ring and the transparent plate may cause curing failure due to oxygen in the air. Uncured resin may contaminate the substrate, or semi-cured adhesive residue may accumulate, reducing the dimensional accuracy of the C-type. The adhesiveness with the flat plate becomes high, which causes problems such as making it difficult to take out the board, or causing damage to the board or the world when the pupil is taken out.
不発明は、上記の問題点を解決するためになされたもの
で、内径および外径精度、厚さ精度の優れた光ディスク
基板を高速かつ簡易に製造することを目的とするもので
ある。The invention was made to solve the above problems, and the object is to quickly and easily manufacture an optical disc substrate with excellent inner and outer diameter accuracy and thickness accuracy.
上記問題点を解決するために、本発明は、少なくとも一
方が透明性を有する情報パターン付き取と外周部にｍｉ
ｎ処理を施した平板とを間隔をあけて対向配置して形成
される主空間の外周部に、ノツチおよび樹脂溜り空間を
もつ外周リングを嵌装して盟を形成し、この型の主空間
および樹脂溜り空間の−ｓＫ光硬化性樹脂を注入し、そ
の後、情報パターン付き板および外周部離型処理平板の
少な（とも一方からエネルギ線を照射して上記元硬化性
樹脂を硬化させ、得られた光硬化性樹脂硬化物を外周離
型処理平板および情報パターン付き板から剥離し、つい
で、樹脂溜り空間において硬化した光硬化性樹脂を除去
して、主空間で硬化した光硬化性樹脂から成る情報パタ
ーン付き転写板を得ることを特徴とするものである。In order to solve the above-mentioned problems, the present invention provides an information patterned tray, at least one of which is transparent;
The main space of this type is formed by fitting an outer ring having a notch and a resin reservoir space to the outer periphery of the main space formed by arranging the n-treated flat plates facing each other at intervals. Then, the -sK photocurable resin in the resin reservoir space is injected, and then an energy beam is irradiated from one side of the information patterned plate and the flat plate with mold release treatment on the outer periphery to harden the original curable resin. The cured photocurable resin is peeled off from the peripheral release-treated flat plate and the information patterned plate, and then the photocurable resin cured in the resin reservoir space is removed from the photocurable resin cured in the main space. The present invention is characterized in that a transfer plate with an information pattern is obtained.
本発明において、平板の外周部に施される離型処理は、
たとえば、テフロン（商標名：デ１ボン社製のＰＴＦＥ
、ＦＥＰその他の共重合体を含むフルオロカーボン樹力
旨）等の離型剤を被覆することにより行なわれる。In the present invention, the mold release treatment applied to the outer periphery of the flat plate is
For example, Teflon (trade name: PTFE manufactured by De1bon)
This is done by coating with a mold release agent such as fluorocarbon resin containing FEP and other copolymers.
外周部離型処理平板と情報パターン付き板とにより形成
される主空間の外周部に嵌装される外周リングは、好ま
しくは、目的とする元ディスク用基板の規定外径を実質
的に定義するもので、たとえば実質的に直角三角形状に
形成されたノツチを有し、直角三角形の斜辺の外１１１
１＆Ｃ樹脂溜り空間を有するように構成されている。Preferably, the outer circumference ring fitted around the outer circumference of the main space formed by the outer circumference release-treated flat plate and the information patterned plate substantially defines the prescribed outer diameter of the intended original disk substrate. For example, the notch is formed substantially in the shape of a right triangle, and the outside 111 of the hypotenuse of the right triangle is
It is configured to have a 1&C resin reservoir space.
本発明忙使用される光硬化性樹脂は特に限定されず、こ
の種の光ディスク用基板材料として一般に使用されるア
クリレートまたはメタクリレートのポリエン・ポリチオ
ール系党硬化性樹脂を使用することができる。好適な光
硬化性樹脂の具体例としては、ジペンタエリスリトール
へキサアクリレ−）３Ｃ１ｌ量１イソホａンジイソシア
ネート１七ルと２−ヒトミキシエチルアクリレート２モ
ルとの反応生成物４０重量％、イソボルニルメタアクリ
レート２９重量％、１−ヒトミキシシフａへキシルフェ
ニルケトン１重量％の組成を有するもの；ジペンタエリ
スリトールへキサアクリレート３０重量％ ％ １ ）
１’−メチレンビス（４−イソシアナトシクロヘキサ
ン）１モルと２−ｗドロキシエチルアクリレート２モル
との反応生成物４０重量％、ボルニルメタクリレート２
９重量％、１−ヒトａキシシクａヘキシルフェニルケト
ン１重量慢の組成ヲ有するもの等を挙げることができる
。The photocurable resin used in the present invention is not particularly limited, and acrylate or methacrylate polyene/polythiol-based hardenable resins that are generally used as substrate materials for optical discs of this type can be used. Specific examples of suitable photocurable resins include dipentaerythritol (hexaacrylate) 3C (1 l) 40% by weight of a reaction product of 1 isophone diisocyanate (17 l) and 2 moles of 2-human mixethyl acrylate; isobornyl; One with a composition of 29% by weight of methacrylate, 1% by weight of 1-human mixiphenyl ketone; 30% by weight of dipentaerythritol hexaacrylate (%1)
40% by weight reaction product of 1 mole of 1'-methylenebis(4-isocyanatocyclohexane) and 2 moles of 2-w droxyethyl acrylate, 2% by weight of bornyl methacrylate
Examples include those having a composition of 9% by weight and 1% by weight of 1-human a-hexyl phenyl ketone.
光硬化性樹脂の注入は、情報パターン付き板と平板との
間に形成される空間内に、注入ノズルを突出させた状態
で行なってもよく、両型部材のいずれ牟の内面と実質的
に同一面から行なって、注入が実質的に完了した時点で
、空間内に突出させ、その状態で元エネルギの照射を行
なうようにしてもよい。前者の場合には、ノズルを可動
構造とする必要がなく、操作が単純となる利点があり、
後者の場合には、比較的広い空間に対して注入を行なう
ことになるので、注入が容轟となる利点がある。The injection of the photocurable resin may be performed with the injection nozzle protruding into the space formed between the information patterned plate and the flat plate, and the injection nozzle may be injected into the space formed between the information patterned plate and the flat plate, and the injection nozzle may be injected into the space formed between the information patterned plate and the flat plate, so that the injection nozzle is injected into the space formed between the information patterned plate and the flat plate. The injection may be performed from the same surface, and when the injection is substantially completed, the injection may be made to protrude into the space, and the original energy may be irradiated in that state. In the former case, there is no need to make the nozzle a movable structure, and there is an advantage that the operation is simple.
In the latter case, since the injection is performed in a relatively wide space, there is an advantage that the injection can be carried out with a loud noise.
上記空間内への光硬化性樹脂の注入は、一般には目的と
する光ディスク用基板の規定形状を実質的に定義する主
空間と、該基板の規定外径外の部分く設けられかつ上記
主空間と連通する樹脂溜り空間にまではみ出すように注
入される。Injecting the photocurable resin into the space is generally carried out in the main space that substantially defines the specified shape of the intended optical disk substrate, and in a portion outside the specified outer diameter of the substrate and the main space. The resin is injected so that it extends into the resin reservoir space that communicates with the resin.
また、この光硬化性樹脂は、好ましくは、目的とする光
ディスク用基板の直径方向中心位置から注入される。こ
の際、好ましくは、目的とする光ディスク用基板の中央
孔の径に実質的に等しい外径を有する注入ノズルを用い
て注入を行ない、さらに好ましくは、この注入ノズルを
主空間内に突出させた状態でエネルギ繰の照射を行なり
て光硬化性樹脂を硬化させる。Moreover, this photocurable resin is preferably injected from the center position in the diametrical direction of the target optical disc substrate. At this time, the injection is preferably performed using an injection nozzle having an outer diameter substantially equal to the diameter of the central hole of the target optical disc substrate, and more preferably, the injection nozzle is made to protrude into the main space. In this state, repeated energy irradiation is performed to harden the photocurable resin.
注入ノズルおよび外周リングのノツチおよび樹脂溜り空
間にも、好ましくは、上記と同様の離型処理が施される
。The injection nozzle, the notch of the outer ring, and the resin reservoir space are also preferably subjected to the same mold release treatment as described above.
本発明では、上記のように、光硬化性樹脂を、主空間の
みならず、主空間の外周部にある樹脂溜り空間にまでは
み出して注入させているので、主空間すなわち目的とす
る光ディスク用基板の規定形状部分における樹脂の硬化
に伴なう収縮分を、上記規定形状外の部分すなわち樹脂
溜り空間にある樹脂により補充し、それによって、規定
形状部分における樹脂不足を解消して、外周部にひけや
ボイドが発生するのを防ぐことができる。In the present invention, as described above, the photocurable resin is injected not only into the main space but also into the resin reservoir space on the outer periphery of the main space. The shrinkage caused by the curing of the resin in the prescribed shape portion is replenished by the resin in the portion outside the prescribed shape, that is, the resin reservoir space, thereby resolving the lack of resin in the prescribed shape portion, and causing the resin to harden on the outer periphery. It is possible to prevent sink marks and voids from occurring.
また、型を構成する平板の外周部に離型処理を施してい
るので、液状で注入される光硬化性樹脂を均一に型内に
流し込むことができ、また、樹脂硬化後には、離型を容
易にすることができる。さらに、注入ノズルおよび外周
リングのノツチおよび樹脂溜り空間にも離型処理を施す
場合には、光硬化性樹脂の流し込みをさらに均一化する
ことができるとともに、樹脂硬化後の離型をさらに容易
にすることができる。In addition, since the outer periphery of the flat plate that makes up the mold is subjected to mold release treatment, the photocurable resin injected in liquid form can be uniformly poured into the mold, and after the resin has hardened, the mold release process is applied. It can be easily done. Furthermore, when mold release treatment is applied to the injection nozzle, the notch of the outer ring, and the resin reservoir space, it is possible to make the pouring of the photocurable resin more uniform, and it is also easier to release the mold after the resin has hardened. can do.
以下、実施例により詳しく説明する。 Hereinafter, this will be explained in detail with reference to Examples.
実施例１
ｋｃ１図に示すように、内径１４Ｑｍｍ、外径１８０１
ｎＪｎ１腰厚２０μｍのドーナツ状にテフロンコート１
０を施した、外径１９Ｑｍ＊、厚さ２ｍｙｔの石英板１
と外径Ｉ ５ＯｒｓｓのＮｉ製スタンパ２とを１．５ｍ
ｍ の間隔を保りて向い合せく配直し、膜厚２０μｍの
テフロンコート７を施したノツチ（１３）および樹脂溜
り空間１２をもつ外局りング３をはめこんだ型を作成し
た。Example 1 As shown in figure kc1, inner diameter 14Qmm, outer diameter 1801
nJn1 Teflon coating 1 in a donut shape with a waist thickness of 20 μm
0 quartz plate 1 with an outer diameter of 19Qm* and a thickness of 2myt
and a Ni stamper 2 with an outer diameter of I 5 orss of 1.5 m.
A mold was prepared in which the molds were rearranged so as to face each other with a distance of m2, and an outer ring 3 having a notch (13) coated with a Teflon coat 7 with a thickness of 20 μm and an outer ring 3 having a resin reservoir space 12 was fitted therein.
膜厚２０４７１１にテフロンコート９を施した注入ノズ
ル８より、アク１）ル系およびメタクリル系硬化性樹脂
（ジペンタエリスリトールへ中サブクリレート３０！量
１イソホａンジイソシアネート１モルと２−ヒトミキシ
エチルアクリレート２モルとの反応生成物４０Ｘｔ１６
．イソボルニルメタクリレート２９重ｔＳ、ｔ−ヒドロ
キシシフａへキシル７二二ルケトン１重量５６）５を型
内＆ＣＣ大入、この光硬化性樹脂がノツチ１５を越え【
樹脂溜り１２に約半分入ったところで注入弁１１を閉止
して注入を止めた。その後、光源６により光硬化性樹脂
５を硬化せしめた。From an injection nozzle 8 coated with Teflon coat 9 to a film thickness of 204711, acrylic and methacrylic curable resins (dipentaerythritol, medium subacrylate 30, amount 1, isophonate diisocyanate 1 mol and 2-human mixethyl Reaction product 40Xt16 with 2 moles of acrylate
．． Isobornyl methacrylate 29 weight tS, t-hydroxyschiff a hexyl 722 ketone 1 weight 56) 5 were put into the mold & CC large, and this photocurable resin exceeded the notch 15 [
When the resin was about halfway into the resin reservoir 12, the injection valve 11 was closed to stop the injection. Thereafter, the photocurable resin 5 was cured using the light source 6.
このようにして得られた光硬化性樹脂の硬化物を石英板
１とＭｉｆＪ１スタンパ２とからはずし、ついで１＠脂
溜り１２の硬化物をもはずして、情報パターン付きの光
ディスク用基板を得た。The cured product of the photocurable resin thus obtained was removed from the quartz plate 1 and the MifJ1 stamper 2, and then the cured product from the fat reservoir 12 was also removed to obtain an optical disc substrate with an information pattern. .
ここで得た元ディスク用基板は、外径１５０±１ｍｍｇ
以下、板厚変動±ｏ、ｏｓｍｍ、８３０間光に対する光
学的レタデーシｌン５ｍｒｎ以下（ダブルパス）であり
、ボイド、ひけなどがンより実用できる性能を有してい
た。The original disk substrate obtained here had an outer diameter of 150 ± 1 mm.
The optical retardation against light was less than 5 mrn (double pass) between plate thickness variation ±o, osmm, and 830 degrees, and it had practical performance with less voids and sink marks.
本発明によれば、光学的歪が少なく、耐熱性があり、機
械的強度および精度の優れた透明度の高い元ディスク用
基板を、高速かつ低価格で供給することが可能である。According to the present invention, it is possible to supply a highly transparent source disk substrate with little optical distortion, heat resistance, excellent mechanical strength and precision at high speed and at low cost.
第１図は、本発明に係る光ディスク用基板製造テａセス
を説明する図、第２図−１、（Ａ）は、元ディスク用基
板製造プロセスの従来技術を説明する図である。
１・・・透明板 ２・・・スタンパ３・−外
周りング ４・−樹脂注入口５・・・光硬化性樹
脂 ６・・・光源７・−外周リング離型コート
８・・・注入ノズル
９・・・注入ノズル離型コート
１０−・・透明板外周離型コート
１１−・・注入弁 １２・・・樹脂溜り空間
１５・・・ノツチ
代理人 弁理士 小 川 勝 勇゛
殆１図
１！Ｅｌ／１本反 ５ 光Ｅ更イ乙す１オ直す
月旨 ３ 炙り人ノスシｐＡ星う８３寸２ ス
タンパ ＣＬ ラ免 １０透朗瀬び
Ｌ肩離竺］−ト５７Ｆ周リンγ ７グＦ／ｉ１１ル
グ屑１！コーＦＩ＋ 注入弁４カ１ガト土入ａ
ａ；主入ノズ°ル １２７１４月旨ブ留り空間
１５ ノッ千FIG. 1 is a diagram illustrating a process for manufacturing an optical disk substrate according to the present invention, and FIG. 2-1 (A) is a diagram illustrating a conventional technique for manufacturing an original disk substrate. 1...Transparent plate 2...Stamper 3--outer ring 4--resin injection port 5...photocurable resin 6...light source 7--outer ring release coat 8...injection nozzle 9...Injection nozzle release coat 10--Transparent plate outer periphery release coat 11--Injection valve 12...Resin reservoir space 15...Notsuchi representative Patent attorney Masaru Ogawa Isamu Ogawa Most 1 Figure 1 ! El / 1 anti 5 Light E change 1 O repair month 3 Roasted Nosushi pA star 83 sun 2 stamper CL lamen 10 transparent L shoulder separation] - 57F round γ 7g F /i11 rug trash 1! Cor FI+ Injection valve 4 valves 1 gate soil input a
a; Main entry nozzle 12714 month block space 15 notch
Claims (1)
板と外周部に離型処理を施した平板とを間隔をあけて対
向配置して形成される主空間の外周部に、ノッチおよび
樹脂溜り空間をもつ外周リングを嵌装して型を形成し、
この型の主空間および樹脂溜り空間の一部に光硬化性樹
脂を注入し、その後、情報パターン付き板および外周部
離型処理平板の少なくとも一方からエネルギ線を照射し
て上記光硬化性樹脂を硬化させ、得られた光硬化性樹脂
硬化物を外周離型処理平板および情報パターン付き板か
ら剥離し、ついで、樹脂溜り空間において硬化した光硬
化性樹脂を除去して、主空間で硬化した光硬化性樹脂か
ら成る情報パターン付き転写板を得ることを特徴とする
光ディスク用基板の製造方法。 ２、上記外周リングのノッチおよび樹脂溜り空間に離型
処理を施すとともに、上記光硬化性樹脂の注入を、離型
処理を処した注入ノズルにより行なう特許請求の範囲第
１項に記載の光ディスク用基板の製造方法。 ３、上記型の主空間は、目的とする光ディスク用基板の
規定形状を実質的に定義するとともに、上記注入ノズル
は、実質的に、該目的とする光ディスク用基板の直径方
向中心位置に設けられ、該目的とする光ディスク用基板
の中央孔の径に実質的に等しい外径を有し、上記光硬化
性樹脂へのエネルギ線の照射は、上記主空間内に注入ノ
ズルを突出させた状態で行なう特許請求の範囲第２項に
記載の光ディスク用基板の製造方法。[Claims] 1. In the outer periphery of a main space formed by arranging a plate with an information pattern, at least one of which is transparent, and a flat plate whose outer periphery has been subjected to mold release treatment, facing each other with an interval, A mold is formed by fitting an outer ring with a notch and a resin reservoir space,
A photocurable resin is injected into the main space and a part of the resin reservoir space of this mold, and then an energy beam is irradiated from at least one of the information patterned plate and the outer mold release treatment flat plate to cure the photocurable resin. The cured photocurable resin obtained is peeled off from the peripheral release mold treated flat plate and the information patterned plate, and then the cured photocurable resin in the resin reservoir space is removed and the cured light is removed in the main space. A method for manufacturing an optical disc substrate, which comprises obtaining a transfer plate with an information pattern made of a curable resin. 2. The optical disc according to claim 1, wherein the notch of the outer ring and the resin reservoir space are subjected to a mold release treatment, and the photocurable resin is injected using an injection nozzle that has been subjected to the mold release treatment. Substrate manufacturing method. 3. The main space of the mold substantially defines the prescribed shape of the intended optical disc substrate, and the injection nozzle is provided at a substantially central position in the diametrical direction of the intended optical disc substrate. , having an outer diameter substantially equal to the diameter of the central hole of the target optical disc substrate, and irradiating the photocurable resin with the energy beam with an injection nozzle protruding into the main space. A method for manufacturing an optical disk substrate according to claim 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24525586A JPS6399931A (en) | 1986-10-17 | 1986-10-17 | Manufacture of base for optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24525586A JPS6399931A (en) | 1986-10-17 | 1986-10-17 | Manufacture of base for optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6399931A true JPS6399931A (en) | 1988-05-02 |
Family
ID=17130957
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24525586A Pending JPS6399931A (en) | 1986-10-17 | 1986-10-17 | Manufacture of base for optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6399931A (en) |
-
1986
- 1986-10-17 JP JP24525586A patent/JPS6399931A/en active Pending
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