JPS6355719A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS6355719A JPS6355719A JP19853386A JP19853386A JPS6355719A JP S6355719 A JPS6355719 A JP S6355719A JP 19853386 A JP19853386 A JP 19853386A JP 19853386 A JP19853386 A JP 19853386A JP S6355719 A JPS6355719 A JP S6355719A
- Authority
- JP
- Japan
- Prior art keywords
- sulfonic acid
- film
- thin film
- magnetic
- ferromagnetic metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 48
- -1 sulfonic acid perfluoroalkyl ester Chemical class 0.000 claims abstract description 46
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 35
- 229910052751 metal Inorganic materials 0.000 claims description 40
- 239000002184 metal Substances 0.000 claims description 40
- 239000010409 thin film Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 abstract description 18
- 230000001050 lubricating effect Effects 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 238000000151 deposition Methods 0.000 abstract description 6
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 4
- 239000003054 catalyst Substances 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 239000012320 chlorinating reagent Substances 0.000 abstract description 3
- AQYSYJUIMQTRMV-UHFFFAOYSA-N hypofluorous acid Chemical compound FO AQYSYJUIMQTRMV-UHFFFAOYSA-N 0.000 abstract description 3
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 abstract description 3
- 238000007740 vapor deposition Methods 0.000 abstract description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract description 2
- 159000000011 group IA salts Chemical class 0.000 abstract 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 abstract 1
- 239000000314 lubricant Substances 0.000 description 21
- 239000003795 chemical substances by application Substances 0.000 description 14
- 239000010408 film Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 9
- 235000014113 dietary fatty acids Nutrition 0.000 description 7
- 239000000194 fatty acid Substances 0.000 description 7
- 229930195729 fatty acid Natural products 0.000 description 7
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 6
- 230000003449 preventive effect Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 150000004665 fatty acids Chemical class 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002391 heterocyclic compounds Chemical class 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000005461 lubrication Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 2
- 229910000521 B alloy Inorganic materials 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 2
- 229910002440 Co–Ni Inorganic materials 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- NYHBQMYGNKIUIF-UUOKFMHZSA-N Guanosine Chemical compound C1=NC=2C(=O)NC(N)=NC=2N1[C@@H]1O[C@H](CO)[C@@H](O)[C@H]1O NYHBQMYGNKIUIF-UUOKFMHZSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- AUNGANRZJHBGPY-SCRDCRAPSA-N Riboflavin Chemical compound OC[C@@H](O)[C@@H](O)[C@@H](O)CN1C=2C=C(C)C(C)=CC=2N=C2C1=NC(=O)NC2=O AUNGANRZJHBGPY-SCRDCRAPSA-N 0.000 description 2
- RYYWUUFWQRZTIU-UHFFFAOYSA-N Thiophosphoric acid Chemical class OP(O)(S)=O RYYWUUFWQRZTIU-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002191 fatty alcohols Chemical class 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000003353 gold alloy Substances 0.000 description 2
- HCZHHEIFKROPDY-UHFFFAOYSA-N kynurenic acid Chemical compound C1=CC=C2NC(C(=O)O)=CC(=O)C2=C1 HCZHHEIFKROPDY-UHFFFAOYSA-N 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000005033 polyvinylidene chloride Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- MAOBFOXLCJIFLV-UHFFFAOYSA-N (2-aminophenyl)-phenylmethanone Chemical compound NC1=CC=CC=C1C(=O)C1=CC=CC=C1 MAOBFOXLCJIFLV-UHFFFAOYSA-N 0.000 description 1
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- UOFGSWVZMUXXIY-UHFFFAOYSA-N 1,5-Diphenyl-3-thiocarbazone Chemical compound C=1C=CC=CC=1N=NC(=S)NNC1=CC=CC=C1 UOFGSWVZMUXXIY-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- WOHLSTOWRAOMSG-UHFFFAOYSA-N 2,3-dihydro-1,3-benzothiazole Chemical compound C1=CC=C2SCNC2=C1 WOHLSTOWRAOMSG-UHFFFAOYSA-N 0.000 description 1
- IHXKXSJKLJZXKZ-UHFFFAOYSA-N 2-aminocyclohexa-2,5-diene-1,4-dione Chemical compound NC1=CC(=O)C=CC1=O IHXKXSJKLJZXKZ-UHFFFAOYSA-N 0.000 description 1
- GPLIMIJPIZGPIF-UHFFFAOYSA-N 2-hydroxy-1,4-benzoquinone Chemical class OC1=CC(=O)C=CC1=O GPLIMIJPIZGPIF-UHFFFAOYSA-N 0.000 description 1
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical class CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 1
- VSHVAOIJUGIMJM-UHFFFAOYSA-N 2-nitrocyclohexa-2,5-diene-1,4-dione Chemical compound [O-][N+](=O)C1=CC(=O)C=CC1=O VSHVAOIJUGIMJM-UHFFFAOYSA-N 0.000 description 1
- SEEZWGFVHCMHJF-UHFFFAOYSA-N 2-nitrosophenol Chemical class OC1=CC=CC=C1N=O SEEZWGFVHCMHJF-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- MIKUYHXYGGJMLM-GIMIYPNGSA-N Crotonoside Natural products C1=NC2=C(N)NC(=O)N=C2N1[C@H]1O[C@@H](CO)[C@H](O)[C@@H]1O MIKUYHXYGGJMLM-GIMIYPNGSA-N 0.000 description 1
- AUNGANRZJHBGPY-UHFFFAOYSA-N D-Lyxoflavin Natural products OCC(O)C(O)C(O)CN1C=2C=C(C)C(C)=CC=2N=C2C1=NC(=O)NC2=O AUNGANRZJHBGPY-UHFFFAOYSA-N 0.000 description 1
- NYHBQMYGNKIUIF-UHFFFAOYSA-N D-guanosine Natural products C1=2NC(N)=NC(=O)C=2N=CN1C1OC(CO)C(O)C1O NYHBQMYGNKIUIF-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- HGAZMNJKRQFZKS-UHFFFAOYSA-N chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C HGAZMNJKRQFZKS-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- GVJHHUAWPYXKBD-UHFFFAOYSA-N d-alpha-tocopherol Natural products OC1=C(C)C(C)=C2OC(CCCC(C)CCCC(C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-UHFFFAOYSA-N 0.000 description 1
- OBISXEJSEGNNKL-UHFFFAOYSA-N dinitrogen-n-sulfide Chemical compound [N-]=[N+]=S OBISXEJSEGNNKL-UHFFFAOYSA-N 0.000 description 1
- 239000012990 dithiocarbamate Substances 0.000 description 1
- OAEGRYMCJYIXQT-UHFFFAOYSA-N dithiooxamide Chemical compound NC(=S)C(N)=S OAEGRYMCJYIXQT-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229940029575 guanosine Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 150000002497 iodine compounds Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000008301 phosphite esters Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000002151 riboflavin Substances 0.000 description 1
- 229960002477 riboflavin Drugs 0.000 description 1
- 235000019192 riboflavin Nutrition 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- KBAFDSIZQYCDPK-UHFFFAOYSA-M sodium;octadecane-1-sulfonate Chemical compound [Na+].CCCCCCCCCCCCCCCCCCS([O-])(=O)=O KBAFDSIZQYCDPK-UHFFFAOYSA-M 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- MBDNRNMVTZADMQ-UHFFFAOYSA-N sulfolene Chemical compound O=S1(=O)CC=CC1 MBDNRNMVTZADMQ-UHFFFAOYSA-N 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 150000003558 thiocarbamic acid derivatives Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229960001295 tocopherol Drugs 0.000 description 1
- 229930003799 tocopherol Natural products 0.000 description 1
- 235000010384 tocopherol Nutrition 0.000 description 1
- 239000011732 tocopherol Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- GVJHHUAWPYXKBD-IEOSBIPESA-N α-tocopherol Chemical compound OC1=C(C)C(C)=C2O[C@@](CCC[C@H](C)CCC[C@H](C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-IEOSBIPESA-N 0.000 description 1
Landscapes
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔卒業上の利用分野〕
本発明は、真空蒸着やスパッタリング等の真空薄膜形成
技術等の手法により非磁性支持体上に強磁性金属薄膜を
磁性層として形成した、いわゆる強磁性全屈薄膜型の磁
気記録媒体に関するものである。[Detailed Description of the Invention] [Graduation Field of Application] The present invention relates to a so-called magnetic layer in which a ferromagnetic metal thin film is formed as a magnetic layer on a non-magnetic support by vacuum thin film forming techniques such as vacuum evaporation and sputtering. The present invention relates to a ferromagnetic fully refractive thin film type magnetic recording medium.
本発明は、非（Ｉｇ性支持体上に強磁性金属薄膜を磁性
層として形成してなる磁気記録媒体において、磁性層で
ある強磁性金属ｇｔ膜にスルホン酸パーフルオロアルキ
ルエステルを被着し、
あらゆる使用条件下においても優れた走行性１耐摩耗性
、耐久性を発揮する磁気記録媒体を提供しようとするも
のである。The present invention provides a magnetic recording medium in which a ferromagnetic metal thin film is formed as a magnetic layer on a non-Ig support, in which a sulfonic acid perfluoroalkyl ester is deposited on the ferromagnetic metal GT film as the magnetic layer, The present invention aims to provide a magnetic recording medium that exhibits excellent running properties, wear resistance, and durability under all conditions of use.
従来より磁気記録媒体としては、非磁性支持体上にｒ
Ｆ ｅ ２０１．Ｃｏを含有するｒ ＦｅｚＯｚ＋
Ｆ ｅ ｚｏ４＋ Ｃｏを含有するＦｅ１ｏ４＋Ｔ−Ｆ
ｅ２０３とＦｅｚＯａとのヘルドライド化合物、Ｃｏ
を含有するヘルドライド化合物、 Ｃｒ Ｏｚ等の酸
化物強磁性粉末あるいはＦｅ、Ｃｏ、Ｎｉ等を主成分と
する合金Ｆｎ性粉末等の粉末Ｉｎ性材料を塩化ビニル−
酢酸ビニル系共重合体、ポリエステル樹脂、ポリウレタ
ン樹脂等の有機バインダー中に分（１′ｌせしめた磁性
塗料を塗布・乾燥することにより作製される塗布型の磁
気記録媒体が広（使用されている。Conventionally, as a magnetic recording medium, r
F e 201. rFezOz+ containing Co
Fe1o4+T-F containing Fezo4+ Co
Herdride compound of e203 and FezOa, Co
Powdered In materials such as hellride compounds containing CrOz, oxide ferromagnetic powders such as CrOz, or alloy Fn powders containing Fe, Co, Ni, etc., as vinyl chloride-
Coating-type magnetic recording media, which are made by applying and drying a magnetic paint containing a 1'l of chlorine into an organic binder such as a vinyl acetate copolymer, polyester resin, or polyurethane resin, are widely used. .
これに対して、高密度（ｎ気記録への要求の高まりとと
もに、Ｃｏ−Ｎｉ合金等の強磁性金属材料を、メッキや
真空薄膜形成技術（真空蒸着法やスパッタリング法、イ
オンブレーティング法等）によってポリエステルフィル
ムやポリイミドフィルム等の非磁性支持体上に直接被着
した、いわゆる強磁性金属薄膜型の磁気記録媒体が提案
され、注目を集めている。この強磁性金属薄膜型磁気記
録媒体は、抗磁力や角形比等に優れ、短波長での電磁変
換特性に優れるばかりでなく、磁性層の厚みを））めで
薄（することが可能であるため記ｉｊａ 磁や再生時の
厚み損失が著しく小さいこと、磁性層中に非磁性材であ
る有機バインダーを混入する必要がないため磁性材料の
充填密度を高めることができること等、数々の利点を有
している。On the other hand, with the increasing demand for high-density (n-air recording), ferromagnetic metal materials such as Co-Ni alloys are being coated with plating and vacuum thin film forming techniques (vacuum evaporation, sputtering, ion blating, etc.). proposed a so-called ferromagnetic metal thin film type magnetic recording medium directly deposited on a non-magnetic support such as a polyester film or polyimide film, and is attracting attention.This ferromagnetic metal thin film type magnetic recording medium is Not only does it have excellent coercive force and squareness ratio, and it has excellent electromagnetic conversion characteristics at short wavelengths, but it also allows the magnetic layer to be thinner and thinner. It has many advantages, such as being small and being able to increase the packing density of the magnetic material because there is no need to mix an organic binder, which is a non-magnetic material, into the magnetic layer.
しかしながら、上述の強磁性金属薄膜型の６１気記録媒
体では、磁性層表面の平滑性が極めて良好であるために
実質的な接触面積が大きくなり、凝着現象（いわゆるは
りつき）が起こり易くなったり摩擦係数が大きくなる等
、耐久性や走行性等に欠点が多く、その改善が大きな課
題となっている。However, in the above-mentioned ferromagnetic metal thin film type 61K recording medium, the surface smoothness of the magnetic layer is extremely good, so the effective contact area is large, making it easy for adhesion phenomena (so-called sticking) to occur. It has many drawbacks in terms of durability and running performance, such as a large coefficient of friction, and improving these issues is a major challenge.
一般に、磁気記録媒体は磁気信号の記録・再往Ｏ過程で
磁気ヘッドとの高速相対運動のもとにおかれ、その際走
行が円滑に、かつ安定な状態で行われなければならない
。デた、磁気へノドとの接触による摩耗や損傷はなるべ
く少ないほうがよい。In general, a magnetic recording medium is subjected to high-speed relative motion with a magnetic head during the recording and re-transmission process of magnetic signals, and must run smoothly and stably at this time. In addition, it is better to minimize wear and damage caused by contact with the magnetic head.
そこで例えば、上記磁気記録媒体の磁性層、すなわち強
磁性金属薄膜表面に潤滑剤を塗布して保護膜を形成する
ことにより、上記耐久性や走行性を改善することが試み
られている。For example, attempts have been made to improve the durability and runnability by applying a lubricant to the surface of the magnetic layer of the magnetic recording medium, that is, a ferromagnetic metal thin film to form a protective film.
（発明が解決しようとする問題点〕
ところで、上述のように潤滑剤を塗布して保護膜を形成
した場合には、この保３１！膜が磁性層である強磁性金
属薄膜に対して良好な密着性を示し、かつ高い潤滑効果
を発揮することが要求されろ。(Problems to be Solved by the Invention) By the way, when a protective film is formed by applying a lubricant as described above, this protective film is not good for the ferromagnetic metal thin film that is the magnetic layer. It is required to exhibit adhesion and high lubricating effect.
また、これら密着性や潤滑効果は、熱帯、亜熱帯地方等
のように高温多湿の条件下でも、寒冷地のように低温の
条件下でも優れたものでなければならない。In addition, these adhesion properties and lubrication effects must be excellent both under hot and humid conditions, such as in tropical and subtropical regions, and under low-temperature conditions, such as in cold regions.
しかしながら、従来広く用いられている潤滑剤の使用温
度範囲は躍られており、特に、０〜−５℃のような低温
下では固体化または凍結するものが多く、充分にその潤
滑効果を発揮させることができなかった。However, the operating temperature range of conventionally widely used lubricants has been rapidly increasing, and many of them solidify or freeze especially at low temperatures such as 0 to -5℃, making it difficult to fully demonstrate their lubricating effects. I couldn't.
そこで本発明は、如何なる使用条件下においても古着性
や′１８滑性が保たれ、かつ長期に亘り潤滑効果が持続
する潤滑剤を提供し、走行性、耐久性に優れた磁気記録
媒体を提供することを目的とする。Therefore, the present invention provides a lubricant that maintains wearability and lubricity under any usage conditions and maintains a lubricating effect over a long period of time, and provides a magnetic recording medium with excellent running performance and durability. The purpose is to
本発明者は、上述の目的を達成せんものと鋭意研究の結
果、スルホン酸パーフルオロアルキルエステルが広い温
度範囲に亘って良好な潤滑効果を発揮することを見出し
本発明を完成するに至ったものであって、非磁性支持体
上に強磁性金属薄膜を形成し、上記強磁性金属薄膜にス
ルホン酸パーフルオロアルキルエステルを被着したこと
を特徴とするものである。As a result of intensive research to achieve the above-mentioned object, the present inventor discovered that sulfonic acid perfluoroalkyl ester exhibits a good lubricating effect over a wide temperature range, leading to the completion of the present invention. It is characterized in that a ferromagnetic metal thin film is formed on a nonmagnetic support, and a sulfonic acid perfluoroalkyl ester is deposited on the ferromagnetic metal thin film.
本発明で潤滑剤として使用されるスルホン酸パーフルオ
ロアルキルエステルは、一般式％式％（１）
（但し、式中Ｒは脂肪族炭化水素基、芳香族炭化水素基
等の炭化水素基を表し、ｎは５以上の整数、０≦ｊ≦５
である。）
で表される化合物である。The sulfonic acid perfluoroalkyl ester used as a lubricant in the present invention has the general formula % (1) (where R represents a hydrocarbon group such as an aliphatic hydrocarbon group or an aromatic hydrocarbon group). , n is an integer greater than or equal to 5, 0≦j≦5
It is. ) is a compound represented by
上記スルホン酸パーフルオロアルキルエステルは、市販
の相当するスルホニルクロライド（Ｒ５Ｏ□Ｃ１）とパ
ーフルオロアルコール（Ｃ，１Ｆｚ−＋（Ｃ）Ｉｚ）＝
ＯＨ）とを塩基を触媒として容易に合成することができ
る。反応を示せば次の通りである。The above sulfonic acid perfluoroalkyl ester is a combination of commercially available corresponding sulfonyl chloride (R5O□C1) and perfluoroalcohol (C,1Fz-+(C)Iz)=
OH) can be easily synthesized using a base as a catalyst. The reaction is as follows.
ａｓｅ
Ｒ３Ｏ□Ｃ１” ｃｌｌＦ！□＋ （ＣＨｚ） ＪＯＨ
□→Ｒ３Ｏ＋ （ＣＩ（２） ＪＣ，ｈ−や。ase R3O□C1” cllF!□+ (CHz) JOH
□→R3O+ (CI(2) JC, h-ya.
市販されていないものについては、スルホン酸アルカリ
塩を塩化剤として五塩化リンを用いて塩素化することに
よって得た。例えばステアリルスルホン酸ナトリウム塩
をスルホニルクロライド化するには、次のようにする。Those not commercially available were obtained by chlorinating an alkali sulfonic acid salt using phosphorus pentachloride as a chlorinating agent. For example, to convert sodium stearyl sulfonate to sulfonyl chloride, proceed as follows.
Ｃｌ５
ＣＩＪ：＋＋ＳＯ３Ｎａ ＝ ＣＩｓｌ（：＋
ｔＳＯｚＣ１ここで、上記一般式（１＞において、スル
ホン酸パーフルオロアルキルエステルのパーフルオロア
ルキル基の炭素数ｎは５以上の整数であることが望まし
く、パーフルオロアルキル基の炭素数が５未満の場合に
は所定の潤滑効果を期待することができない。Cl5 CIJ:++SO3Na=CIsl(:+
tSOzC1 Here, in the above general formula (1>, the number n of carbon atoms in the perfluoroalkyl group of the sulfonic acid perfluoroalkyl ester is preferably an integer of 5 or more, and when the number of carbon atoms in the perfluoroalkyl group is less than 5 Therefore, the desired lubrication effect cannot be expected.
上述のようにして合成されるスルホン酸パーフルオロア
ルキルエステルは、単独で潤滑剤として用いてもよいが
、従来公知の潤滑剤と混合して用い、さらに使用温度帯
域の拡大を図るようにしてもよい。The sulfonic acid perfluoroalkyl ester synthesized as described above may be used alone as a lubricant, but it may also be used in combination with a conventionally known lubricant to further expand the operating temperature range. good.
使用される潤滑剤としては、脂肪酸またはその金属塩、
脂肪酸アミド、脂肪酸エステル、脂肪族アルコールまた
はそのアルコキシド、脂肪族アミン、多価アルコール、
ソルビタンエステル、マンニソタンエステル、硫黄化脂
肪酸、脂肪族メルカプタン、変性シリコーンオイル、パ
ーフルオロアルキルエチレンオキシド、パーフルオロポ
リエーテル類、高級アルキルスルホン酸またはその金属
塩、パーフルオロアルキルスルホン酸またはそのアンモ
ニウム塩あるいはその金属塩、パーフルオロアルキルカ
ルボン酸またはその金属塩等が例示される。The lubricants used include fatty acids or their metal salts;
Fatty acid amide, fatty acid ester, fatty alcohol or its alkoxide, fatty amine, polyhydric alcohol,
Sorbitan ester, mannisotane ester, sulfurized fatty acid, aliphatic mercaptan, modified silicone oil, perfluoroalkyl ethylene oxide, perfluoropolyethers, higher alkyl sulfonic acid or its metal salt, perfluoroalkyl sulfonic acid or its ammonium salt, or Examples include metal salts thereof, perfluoroalkylcarboxylic acids or metal salts thereof.
特に、一般式Ｃ，Ｆｚ、、ＩＣ０ＯＲ’ （但し、式
中ｍは６〜１０の整数を表し、Ｒ″は炭素数１〜２５の
炭化水素基を表す。）で示されるパーフルオロアルキル
カルボン酸エステルや一般式Ｒ’Ｃ００（ＣＨ２）ＪＣ
ｔ＝Ｆｚｋ−＋ （但し、Ｒ″は炭素数１〜２５の炭化
水素基を表し、０≦ｊ≦５、ｋ≧３である。）も低温特
性が良好であることから上記不飽和脂肪酸アミドと併用
するのに好適である。In particular, perfluoroalkylcarboxylic acids represented by the general formula C, Fz, IC0OR' (where m represents an integer of 6 to 10, and R'' represents a hydrocarbon group having 1 to 25 carbon atoms) Ester or general formula R'C00(CH2)JC
t=Fzk-+ (However, R″ represents a hydrocarbon group having 1 to 25 carbon atoms, and 0≦j≦5, k≧3) also has good low-temperature properties, so the above unsaturated fatty acid amides Suitable for use in combination with
さらには、より厳しい使用条件に対処し、かつ潤滑効果
を持続するために、上記カルボン酸パーフルオロアルキ
ルエステル中に重■比で３０ニア０〜７０：３０程度の
配合比で極圧剤を併用してもよい。Furthermore, in order to cope with more severe usage conditions and maintain the lubricating effect, an extreme pressure agent is added to the carboxylic acid perfluoroalkyl ester at a mixing ratio of 30:0 to 70:30. You may.
上記極圧剤は、境界潤滑領域において部分的に金属接触
を生じたとき、これに伴う摩擦熱によって金属面と反応
し、反応生成物被膜を形成することにより摩擦・摩耗防
止作用を行うものであって、リン酸エステル、亜リン酸
エステル又はリン酸エステルアミン塩等のリン系極圧剤
、硫化油脂、モノサルファイド又はポリサルファイド等
のイオウ系極圧剤、ヨウ素化合物、臭素化合物又は塩素
化合物等のハロゲン系極圧剤、チオリン酸塩、チオカル
バミン酸塩又は金属アルキルジチオカルバミン酸塩等の
有機金属系極圧剤、ジアルキルチオリン酸アミン、チオ
フォスフェート又はチオフォスファイト等の複合型極圧
剤等が知られている。When the extreme pressure agent makes partial metal contact in the boundary lubrication area, it reacts with the metal surface due to the accompanying frictional heat, forming a reaction product film to prevent friction and wear. In particular, phosphorus-based extreme pressure agents such as phosphate esters, phosphite esters or phosphate ester amine salts, sulfur-based extreme pressure agents such as sulfurized oils and fats, monosulfides or polysulfides, iodine compounds, bromine compounds or chlorine compounds, etc. Halogenated extreme pressure agents, organometallic extreme pressure agents such as thiophosphates, thiocarbamates, or metal alkyl dithiocarbamates, and complex extreme pressure agents such as dialkylthiophosphate amines, thiophosphates, or thiophosphites are well known. It is being
また、上述の潤滑剤、極圧剤の他必要に応じて防錆剤を
併用してもよい。Moreover, in addition to the above-mentioned lubricants and extreme pressure agents, a rust preventive agent may be used in combination as required.
使用可能な防錆剤としては、通常この種の磁気記録媒体
の防錆剤として使用されるものであれば如何なるもので
もよ（、例えば二価フェノール。As the rust preventive agent that can be used, any rust preventive agent that is normally used as a rust preventive agent for this type of magnetic recording medium may be used (for example, dihydric phenol).
アルキルフニノールあるいはニトロソフェノール等のフ
ェノール類、純ナフトール又はニトロ、ニトロソ、アミ
ノ、ハロゲノ置換ナフトール等のナフトール類、メチル
キノン、ヒドロキシキノン。Phenols such as alkylfuninols or nitrosophenols, naphthols such as pure naphthol or nitro-, nitroso-, amino-, or halogeno-substituted naphthols, methylquinone, hydroxyquinone.
アミノキノン、ニトロキノン又はハロゲキノキン等のキ
ノン類、ヘンシフエノン及びその銹厚体であるヒドロキ
シベンゾフェノン、アミノベンゾフェノン等のジアリー
ルケトン、アクリジン、４−キノリツール、キヌレン酸
又はリボフラビン等の窒素原子を含む複素環化合物、ト
コフェロール又はグアノシン等の酸素原子を含む複素環
化合物、スル十ラン、スルホレン又はビチオン等の硫黄
原子を含む複素環化合物、チオフェノール、ジチゾン又
はチオオキシン等のメルカプト基を有する化合物、エン
タチオ酸又はルベアン酸等のチオカルボン酸またはその
塩、ジアゾスルフィド又はベンゾチアゾリン等のチアゾ
ール系化合物等が挙げられる。上記防錆剤は、潤滑剤と
混合させて用いても良いが、例えば強磁性金属薄膜の表
面に先ず上記防錆剤を塗布し、しかる後潤滑剤を塗布す
るというように、２Ｎ以上に分けて被着すると効果が高
い。Quinones such as aminoquinone, nitroquinone or halogen quinone; diaryl ketones such as hensifhenone and its thick derivatives hydroxybenzophenone and aminobenzophenone; heterocyclic compounds containing nitrogen atoms such as acridine, 4-quinolitool, kynurenic acid or riboflavin; tocopherol; Heterocyclic compounds containing an oxygen atom such as guanosine, heterocyclic compounds containing a sulfur atom such as sulfolane, sulfolene or bithione, compounds having a mercapto group such as thiophenol, dithizone or thiooxin, thiocarboxylic compounds such as entathioic acid or rubeanic acid Examples include acids or salts thereof, diazosulfide, thiazole compounds such as benzothiazoline, and the like. The above-mentioned rust preventive agent may be used in combination with a lubricant, but it may be divided into 2N or more, for example, by first applying the above-mentioned rust preventive agent to the surface of the ferromagnetic metal thin film, and then applying the lubricant. It is highly effective when applied.
これらスルホン酸パーフルオロアルキルエステルを含有
する潤滑剤層を強磁性金属薄膜上に付着させる方法とし
ては、上記潤滑剤を溶媒に溶解して得られた溶液を強磁
性金属ａ膜の表面に塗布もしくは噴霧するか、あるいは
逆にこの溶液中に強磁性金属薄膜を浸漬し乾燥すればよ
い。A method for depositing a lubricant layer containing these sulfonic acid perfluoroalkyl esters on a ferromagnetic metal thin film is to apply a solution obtained by dissolving the above lubricant in a solvent to the surface of the ferromagnetic metal a film, or The ferromagnetic metal thin film may be sprayed, or conversely, the ferromagnetic metal thin film may be immersed in this solution and dried.
ここで、その塗布量は、０．５■／ｄ〜１００■／Ｍで
あるのが好ましく、１■／Ｍ〜２０■／ｄであるのがよ
り好ましい。この塗布量があまり少なすぎると、摩擦係
数の低下、耐摩耗性・耐久性の向上という効果が顕れず
、一方あまり多すぎると、摺動部材と強磁性金属薄膜と
の間ではりつき現象が起こり、却って走行性が悪くなる
。Here, the coating amount is preferably 0.5 .mu./d to 100 .mu./M, more preferably 1 .mu./M to 20 .mu./d. If the coating amount is too small, the effect of lowering the coefficient of friction and improving wear resistance and durability will not be achieved. On the other hand, if it is too large, a sticking phenomenon will occur between the sliding member and the ferromagnetic metal thin film. On the contrary, the running performance deteriorates.
本発明が適用される磁気記録媒体は、非磁性支持体上に
磁性層として強磁性金属薄膜を設けたものであるが、こ
こで非磁性支持体の素材としては、ポリエチレンテレフ
タレート等のポリエステル類、ポリエチレン、ポリプロ
ピレン等のポリオレフィン類、セルローストリアセテー
ト、セルロースダイアセテート、セルロースアセテート
ブチレート等のセルロース誘導体、ポリ塩化ビニル、ポ
リ塩化ビニリデン等のビニル系樹脂、ポリカーボネート
、ポリイミド、ポリアミドイミド等のプラスチック、ア
ルミニウム合金、チタン合金等の軽金属、アルミナガラ
ス等のセラミックス等が≠げ口ｒ、る。The magnetic recording medium to which the present invention is applied is one in which a ferromagnetic metal thin film is provided as a magnetic layer on a non-magnetic support, and the material for the non-magnetic support may include polyesters such as polyethylene terephthalate, Polyolefins such as polyethylene and polypropylene, cellulose derivatives such as cellulose triacetate, cellulose diacetate, and cellulose acetate butyrate, vinyl resins such as polyvinyl chloride and polyvinylidene chloride, plastics such as polycarbonate, polyimide, and polyamideimide, aluminum alloys, Light metals such as titanium alloys, ceramics such as alumina glass, etc.
この非磁性支持体の形態としては、フィルム、ソート、
ディスク、カード、ドラム等のいずれでもよい。The forms of this non-magnetic support include film, sorting,
It may be a disk, card, drum, etc.
上記非磁性支持体には、その表面に山４Ｊｓ突起やしわ
状突起１粒状突起等の突起を１ ［ｉ以上を形成し、表
面粗さをコントロールしてもよい。The surface roughness of the non-magnetic support may be controlled by forming protrusions of 1 [i or more, such as 4Js peaks, 1 wrinkle-like protrusion, 1 granular protrusion, etc., on the surface of the non-magnetic support.
上記山状突起は、例えば高分子フィルム製膜時に粒径５
００〜３０００人程度の無機微粒子を内添することによ
り形成され、高分子フィルム表面からの高さは１００〜
１０００人、密度はおよそｌＸｌ０’〜ｌ０ＸＩＯ’個
／真重２とする。山状突起を形成するために使用される
無機微粒子としては、炭酸カルシウム（ＣａＣＯ＊）や
シリカ、アルミナ等が好適である。For example, the above-mentioned mountain-like protrusions have a particle size of 5 when forming a polymer film.
It is formed by internally adding inorganic fine particles of about 0.00 to 3000, and the height from the polymer film surface is 100 to 3000.
1000 people, density approximately 1X10' to 10XIO' individuals/true weight 2. As the inorganic fine particles used to form the mountain-like projections, calcium carbonate (CaCO*), silica, alumina, etc. are suitable.
上記しわ状突起は、例えば特定の７Ｒ合溶媒を用いた樹
脂の希薄溶液を塗布乾燥することにより形成される起伏
であって、その高さは０．０１〜１０μｍ、好ましくは
０．０３〜０．５μｍ、突起間の最短間隔ばＯ，１〜２
０μｍとする。このしわ状突起を形成するための樹脂と
しては、ポリエチレンテレフタレート、ポリエチレンナ
フタレート等の飽和ポリエステル、ポリアミド、ポリス
チロール、ポリカーボネート、ポリアクリレート、ポリ
スルホン、ポリエーテルスルホン、ポリ塩化ビニル、ポ
リ塩化ビニリデン、ポリビニルブチラール、ポリフェニ
レンオキサイド、フェノキン樹脂等の各種樹脂の単体、
混合体または共重合体であり、可溶性溶剤を有するもの
が適している。そして、これらの樹脂をその良溶媒に熔
解せしめた樹脂／震度１〜１１０００ｐｐの溶液に、そ
の樹脂の貧溶媒であって前記良溶媒より高い沸点を有す
る溶媒を樹脂に対してｌＯ〜１００倍計添加した溶液を
、高分子フィルムの表面に塗布・乾燥することにより、
非常に微細なしわ状凹凸を有する薄層を得ることができ
る。The wrinkle-like protrusions are undulations formed by applying and drying a dilute solution of resin using a specific 7R mixed solvent, and the height thereof is 0.01 to 10 μm, preferably 0.03 to 0.0 μm. .5 μm, the shortest distance between protrusions is O, 1~2
It is set to 0 μm. Examples of resins used to form these wrinkle-like projections include saturated polyesters such as polyethylene terephthalate and polyethylene naphthalate, polyamides, polystyrene, polycarbonates, polyacrylates, polysulfones, polyethersulfones, polyvinyl chloride, polyvinylidene chloride, and polyvinyl butyral. , polyphenylene oxide, various resins such as phenoquine resin,
Mixtures or copolymers with soluble solvents are suitable. Then, to a solution of resin/seismic intensity of 1 to 11,000 pp in which these resins are dissolved in the good solvent, a solvent that is a poor solvent for the resin and has a boiling point higher than the good solvent is added to the resin by 10 to 100 times the amount of the resin. By applying the added solution to the surface of the polymer film and drying it,
Thin layers with very fine wrinkle-like irregularities can be obtained.
粒状突起は、アクリル樹脂等の存機超微粒子またはシリ
カ、金属粉等の無機微粒子を球状あるいは半球状に付着
させることにより形成される。この粒状突起の高さは、
５０〜５００人、密度は１×１０ｈ〜５０Ｘ１０６個／
賎２程度とする。The granular protrusions are formed by adhering ultrafine particles such as acrylic resin or inorganic particles such as silica or metal powder in a spherical or hemispherical shape. The height of this granular protrusion is
50-500 people, density 1 x 10h - 50 x 106 pieces/
The size should be about 2.
これら突起の少なくとも一種以上を形成すれば磁性層で
ある強磁性金属薄膜の表面性が制御されるが、２種以上
を徂み合わせることにより効果が増し、特に山伏突起を
設けたベースフィルム上にしわ状突起とつふ状突起を形
成すれば、極めて耐久性、走行性が改善される。The surface properties of the ferromagnetic metal thin film that is the magnetic layer can be controlled by forming at least one type of these protrusions, but the effect is increased by combining two or more types of protrusions. By forming wrinkle-like protrusions and ridge-like protrusions, durability and runnability are greatly improved.
この場合、突起の全体としての高さは、１００〜２００
０人の範囲内であることが好ましく、その密度はｌ＋ｎ
２当り平均でｌＸＩＯ３〜ｌＸｌ０’個であることが好
ましい。In this case, the overall height of the protrusion is 100 to 200
The density is preferably within the range of 0 people, and the density is l+n
It is preferable that the average number per 2 is 1XIO3 to 1X10'.
また、上記（注性層である強磁性金属薄膜は、真空蒸着
法やイオンブレーティング法、スパックリング法等の真
空ａ膜形成波（ネｉにより連続膜として形成される。Further, the ferromagnetic metal thin film which is the pourable layer is formed as a continuous film by a vacuum a film formation wave such as a vacuum evaporation method, an ion blating method, or a spackling method.
上記真空蒸着法は、１０−′〜１０−’Ｔｏｒｒの真空
下で強磁性金属材料を砥抗加熱、高周波加熱、電子ビー
ム加熱等により蒸発させ、ディスク基板上に蒸発金属（
強磁性金属材料）を沈着するというものであり、一般に
高い抗磁力を得るため基板に対して上記強磁性金属材料
を斜めに蒸着する斜方蒸着法が採用される。あるいは、
より高い抗磁力を得るために酸素雰囲気中で上記蒸着を
行うものも含まれる。In the vacuum evaporation method described above, a ferromagnetic metal material is evaporated under a vacuum of 10-' to 10-' Torr by abrasive heating, high-frequency heating, electron beam heating, etc., and the evaporated metal (
Generally, in order to obtain a high coercive force, an oblique evaporation method is employed in which the ferromagnetic metal material is deposited obliquely to the substrate. or,
It also includes those in which the above-mentioned vapor deposition is performed in an oxygen atmosphere in order to obtain higher coercive force.
上記イオンブレーティング法も真空蒸着法の一種であり
、１０−４〜１０−’Ｔｏｒｒの不活性ガス雰囲気中で
ＤＣグロー放電、ＲＦグロー放電を起こして、放電中で
上記強磁性金属材料を蒸発させるというものである。The above-mentioned ion brating method is also a type of vacuum deposition method, in which DC glow discharge and RF glow discharge are caused in an inert gas atmosphere of 10-4 to 10-' Torr, and the above-mentioned ferromagnetic metal material is evaporated during the discharge. It is to let them do it.
上記スパッタリング法は、１０−〜１０−’Ｔｏｒｒの
アルゴンガスを主成分とする雰囲気中でグロー放電を起
こし、生したアルゴンガスイオンでターゲット表面の原
子をたたき出すというものであり、グロー放電の方法に
より直流２Ｉ７ｉ！、３極スパツタ法や、高周波スパッ
ク法、またはマグネトロン放電を利用したマグネトロン
スパック法等がある。The sputtering method described above involves causing glow discharge in an atmosphere mainly composed of argon gas at 10-10-' Torr, and using the generated argon gas ions to knock out atoms on the target surface. DC2I7i! , a three-pole sputter method, a high-frequency sputter method, a magnetron sputter method using magnetron discharge, and the like.
このスパッタリング法による場合には、ＣｒやＷ。In the case of this sputtering method, Cr or W is used.
■等の下地膜を形成しておいてもよい。A base film such as (2) may be formed in advance.
なお、上記いずれの方法においても、基板上にあらかじ
めＢｉ、Ｓｂ、Ｐｂ、Ｓｎ、Ｇａ、Ｉｎ。In any of the above methods, Bi, Sb, Pb, Sn, Ga, and In are preliminarily deposited on the substrate.
Ｃｄ、Ｇｅ、Ｓｉ、Ｔ１等の下地金属層を被着形成して
おき、基板面に対して垂直方向から成膜することにより
、磁気異方性の配向かなく面内等方法に優れた磁性層を
形成することができ、例えば磁気ディスクとする場合に
は好適である。By pre-depositing a base metal layer such as Cd, Ge, Si, T1, etc., and depositing the film in a direction perpendicular to the substrate surface, excellent magnetic properties can be achieved in an in-plane manner without magnetic anisotropy orientation. It is suitable for forming a layer, for example, into a magnetic disk.
このような真空薄膜形成技術により金属磁性コ膜を形成
する際に、使用される強磁性金属材料としては、Ｆｅ、
Ｃｏ、Ｎｉ等の金属の他に、Ｃ０−Ｎｉ合金、Ｇｏ−Ｐ
Ｌ金合金Ｃｏ−Ｎ１−ｐｔ金合金Ｆｌｌｌ−Ｃｏ合金、
Ｆｅ−Ｎｉ合金、Ｆｅ−Ｃｏ−Ｎｉ合金、Ｆｅ−Ｇｏ−
Ｂ合金、Ｇｏ−Ｎｉ−Ｆｅ−Ｂ合金＋ Ｃｏ Ｃｒ合
金あるいはこれらにＣｒ、Ａ１等の金属が含有されたも
の等が挙げられる。特に、Ｃｏ−Ｃｒ合金を使用した場
合には、垂直磁化膜が形成される。When forming a metal magnetic film using such a vacuum thin film formation technique, the ferromagnetic metal materials used include Fe, Fe,
In addition to metals such as Co and Ni, C0-Ni alloy, Go-P
L gold alloy Co-N1-pt gold alloy Full-Co alloy,
Fe-Ni alloy, Fe-Co-Ni alloy, Fe-Go-
Examples include B alloy, Go-Ni-Fe-B alloy + Co Cr alloy, and those containing metals such as Cr and A1. In particular, when a Co--Cr alloy is used, a perpendicularly magnetized film is formed.
このような手法により形成される磁性層の膜厚は、０．
０４〜１μｍ程度である。The thickness of the magnetic layer formed by such a method is 0.
It is about 0.04 to 1 μm.
また、非磁性支持体の磁性層が設けられろ面とは反対側
に、いわゆるバックコート層を形成してもよい。バック
コート層は、塩化ビニル−酢酸ビニル、フェノール樹脂
又はポリフッ化ビニル並びにポリウレタン樹脂又はブタ
ジェン系共重合体等の結合剤樹脂と導電性を付与するた
めのカーボン系微粉末又は表面粗度のコントロール及び
耐久性向上のために添加される無機顔料等の粉末成分と
をアセトン、メチルエチルケトン又はベンゼン等の有機
溶媒に混合分散させたバックコート用塗料を非磁性支持
体面に塗布することにより形成される。Furthermore, a so-called back coat layer may be formed on the side of the nonmagnetic support opposite to the bottom surface on which the magnetic layer is provided. The back coat layer consists of binder resin such as vinyl chloride-vinyl acetate, phenol resin or polyvinyl fluoride, polyurethane resin or butadiene copolymer, carbon-based fine powder for imparting conductivity, or surface roughness control. It is formed by coating the surface of a non-magnetic support with a back coat paint in which a powder component such as an inorganic pigment added to improve durability is mixed and dispersed in an organic solvent such as acetone, methyl ethyl ketone or benzene.
前述のバックコート層には潤滑剤を使用してもよい。こ
の場合、上記バンクコート層中に潤滑剤を内添する方法
、あるいはバックコート層上に潤滑剤を被着する方法が
ある。いずれにしても、上記潤滑剤としては、脂肪酸、
脂肪酸エステル、脂肪酸アミド、金属石鹸、脂肪族アル
コール、パラフィン、シリコーン等従来より周知の潤滑
剤が使用できる。A lubricant may be used in the aforementioned backcoat layer. In this case, there is a method of internally adding a lubricant to the bank coat layer, or a method of depositing a lubricant on the back coat layer. In any case, the above-mentioned lubricants include fatty acids,
Conventionally known lubricants such as fatty acid esters, fatty acid amides, metal soaps, fatty alcohols, paraffins, and silicones can be used.
〔作用〕
スルホン酸パーフルオロアルキルエステル磁性金属薄膜
に被着することにより良好な潤滑作用を発揮して摩擦係
数を低減する。[Function] Sulfonic acid perfluoroalkyl ester adheres to a magnetic metal thin film, exhibiting a good lubricating effect and reducing the coefficient of friction.
特にスルホン酸パーフルオロアルキルエステルは、低温
下においても良好な潤滑効果を発揮する。In particular, sulfonic acid perfluoroalkyl esters exhibit good lubricating effects even at low temperatures.
以下、本発明の具体的な実施例について説明するが、本
発明はこれら実施例に限定されるものではない。Hereinafter, specific examples of the present invention will be described, but the present invention is not limited to these examples.
先ス、以下の合成例に従ってスルホン酸パーフルオロア
ルキルエステルを合成した。First, a sulfonic acid perfluoroalkyl ester was synthesized according to the following synthesis example.
合成例
相当する市販されているスルホニルクロライドもしくは
スルホン酸アルカリ塩を五塩化リンを塩化剤として用い
て塩素化し、得られたスルホニルクロライドをパーフル
オロアルコールとともに塩基を触媒として反応させるこ
とによって相当するスルホン酸パーフルオロアルキルエ
ステルを得た。Synthesis Example The corresponding commercially available sulfonyl chloride or sulfonic acid alkali salt is chlorinated using phosphorus pentachloride as a chlorinating agent, and the obtained sulfonyl chloride is reacted with perfluoroalcohol using a base as a catalyst to obtain the corresponding sulfonic acid. A perfluoroalkyl ester was obtained.
以上の合成方法に従い、化合物１〜化合物６を合成した
。得られた化合物を第１表に示す。Compounds 1 to 6 were synthesized according to the above synthesis method. The obtained compounds are shown in Table 1.
第１表
次いで、これらスルホン酸パーフルオロアルキルエステ
ルを用いて強（Ｈ性金属薄膜型の磁気記録媒体を作製し
た。Table 1 Next, a strong (H) metal thin film type magnetic recording medium was prepared using these sulfonic acid perfluoroalkyl esters.
実施例１゜
１４μｍ厚のポリエチレンテレツクレートフィルムに斜
め蒸着法によりＣｏを被着させ、膜厚１０００人の強磁
性金属薄膜を形成した。Example 1 A ferromagnetic metal thin film having a thickness of 1000 mm was formed by depositing Co on a 14 μm thick polyethylene terecrate film by oblique vapor deposition.
次に、この強磁性金属薄膜表面に、第１表に示すスルホ
ン酸パーフルオロアルキルエステル（先の合成例で合成
した化合物ｌ）をフレオン？ｇ ？Ｆｔに熔解し、塗布
量が５■／ｄとなるように塗布し、１／２インチ幅に裁
断してサンプルテープを作製した。Next, the sulfonic acid perfluoroalkyl ester shown in Table 1 (compound 1 synthesized in the previous synthesis example) was applied to the surface of this ferromagnetic metal thin film using freon? G? A sample tape was prepared by melting the sample tape in Ft, coating it at a coating amount of 5 .mu./d, and cutting it into 1/2 inch width.
実施例２
スルホン酸パーフルオロアルキルエステルとして先の第
１表に示す化合物２を用い、他は実施例１と同様の方法
によりサンプルテープを作製した。Example 2 A sample tape was prepared in the same manner as in Example 1, except that Compound 2 shown in Table 1 above was used as the sulfonic acid perfluoroalkyl ester.
実施例３
スルホン酸パーフルオロアルキルエステルとして先の第
１表に示す化合物３を用い、他は実施例１と同様の方法
によりサンプルテープを作製した。Example 3 A sample tape was prepared in the same manner as in Example 1 except that Compound 3 shown in Table 1 above was used as the sulfonic acid perfluoroalkyl ester.
実施例４
スルホン酸パーフルオロアルキルエステルとして先の第
１表に示す化合物４を用い、他は実施例１と同様の方法
によりサンプルテープを作製した。Example 4 A sample tape was prepared in the same manner as in Example 1 except that Compound 4 shown in Table 1 above was used as the sulfonic acid perfluoroalkyl ester.
実施例５
スルホン酸パーフルオロアルキルエステルとして先の第
１表に示す化合物５を用い、他は実施例１と同様の方法
によりサンプルテープを作製した。Example 5 A sample tape was prepared in the same manner as in Example 1, except that Compound 5 shown in Table 1 above was used as the sulfonic acid perfluoroalkyl ester.
実施例６
スルホン酸パーフルオロアルキルエステルとして先の第
１表に示す化合物６を用い、他は実施例１と同様の方法
によりサンプルテープを作製した。Example 6 A sample tape was prepared in the same manner as in Example 1 except that Compound 6 shown in Table 1 above was used as the sulfonic acid perfluoroalkyl ester.
作製された各サンプルテープについて、温度２５℃、相
対湿度（Ｔ？Ｈ）６０％、および−５℃の各条件下での
動摩擦係数及びシャトル耐久性を測定した。この動摩擦
係数は、材質がステンレス（ＳＵＳ３０４）のガイドビ
ンを用い、一定のテンションをかけ５ ｍｍ／ｓｅｃの
速度で送り、試験したものである。また、シャトル耐久
性は、１回につき２分間のシャトル走行を行い、出力が
一３ｄＢ低下までのシャトル回数で評価した。スチル耐
久性はポーズ状態での出力の一３ｄＢまでの減衰時間を
評価した。なお、比較例として、全く潤滑剤を被着しな
いブランクテープについても測定した。For each sample tape produced, the dynamic friction coefficient and shuttle durability were measured under the following conditions: temperature 25°C, relative humidity (T?H) 60%, and -5°C. This dynamic friction coefficient was tested by using a guide bottle made of stainless steel (SUS304) and feeding it at a speed of 5 mm/sec under a constant tension. In addition, the shuttle durability was evaluated by running the shuttle for 2 minutes each time, and determining the number of shuttle runs until the output decreased by 13 dB. Still durability was evaluated by evaluating the decay time for the output to -3 dB in a pause state. As a comparative example, a blank tape to which no lubricant was applied was also measured.
結果を第２表に示す。The results are shown in Table 2.
第２表
上記表から明らかなように、本発明の各実施例の条件下
で動摩擦係数が小さく、走行が極めて安定しており、ま
た１００回往復走行後もテープ表面の損傷は全く見られ
なかった。また、スチル耐久性も極めて良く、１５０回
シャトル走行を行っても出力の一３ｄＢ低下は見られな
かった。これに対して、潤滑剤層のない比較例のテープ
では、摩擦係数が往復走行回数が多くなるにつれて大と
なり、走行も不安定でテープの摩擦が見られ、耐久性も
悪いものであった。Table 2 As is clear from the above table, under the conditions of each example of the present invention, the coefficient of dynamic friction was small, the running was extremely stable, and no damage was observed on the tape surface even after running back and forth 100 times. Ta. Furthermore, the still durability was extremely good, and even after 150 shuttle runs, no decrease in output by 13 dB was observed. On the other hand, in the comparative tape without a lubricant layer, the friction coefficient increased as the number of reciprocating runs increased, running was unstable, tape friction was observed, and durability was poor.
以上の説明からも明らかなように、本発明においては、
強磁性金属薄膜型の磁気記録媒体の潤滑剤としてスルホ
ン酸パーフルオロアルキルエステルを用いているので、
如何なる温度条件下においても動摩擦係数を小さくする
ことができ、走行安定性や耐摩耗性に優れた磁気記録媒
体とすることができる。As is clear from the above description, in the present invention,
Since sulfonic acid perfluoroalkyl ester is used as a lubricant for ferromagnetic metal thin film magnetic recording media,
The coefficient of dynamic friction can be reduced under any temperature conditions, and a magnetic recording medium with excellent running stability and wear resistance can be obtained.
Claims (1)
金属薄膜にスルホン酸パーフルオロアルキルエステルを
被着したことを特徴とする磁気記録媒体。1. A magnetic recording medium comprising a ferromagnetic metal thin film formed on a non-magnetic support, and a sulfonic acid perfluoroalkyl ester coated on the ferromagnetic metal thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19853386A JPS6355719A (en) | 1986-08-25 | 1986-08-25 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19853386A JPS6355719A (en) | 1986-08-25 | 1986-08-25 | Magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6355719A true JPS6355719A (en) | 1988-03-10 |
Family
ID=16392731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19853386A Pending JPS6355719A (en) | 1986-08-25 | 1986-08-25 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6355719A (en) |
-
1986
- 1986-08-25 JP JP19853386A patent/JPS6355719A/en active Pending
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