JPS63216968A - Manufacture of soft-magnetic material - Google Patents
Manufacture of soft-magnetic materialInfo
- Publication number
- JPS63216968A JPS63216968A JP5052287A JP5052287A JPS63216968A JP S63216968 A JPS63216968 A JP S63216968A JP 5052287 A JP5052287 A JP 5052287A JP 5052287 A JP5052287 A JP 5052287A JP S63216968 A JPS63216968 A JP S63216968A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- target
- magnetic material
- prescribed
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000000696 magnetic material Substances 0.000 title claims description 13
- 238000004544 sputter deposition Methods 0.000 claims abstract description 14
- 239000010409 thin film Substances 0.000 claims abstract description 12
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 7
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 7
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 6
- 229910001257 Nb alloy Inorganic materials 0.000 claims abstract 3
- 239000002131 composite material Substances 0.000 claims abstract 2
- 239000007789 gas Substances 0.000 claims description 22
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 6
- 239000010408 film Substances 0.000 abstract description 3
- 229910010293 ceramic material Inorganic materials 0.000 abstract description 2
- 230000001105 regulatory effect Effects 0.000 abstract 2
- 230000005291 magnetic effect Effects 0.000 description 17
- 239000000463 material Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910000859 α-Fe Inorganic materials 0.000 description 4
- 239000011162 core material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 229910021386 carbon form Inorganic materials 0.000 description 1
- -1 carbon forms carbon ions Chemical class 0.000 description 1
- 150000001723 carbon free-radicals Chemical class 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、高保磁力の磁気記録媒体に高密度に情報を記
録するのに適した磁気ヘッドのコア材料に用いられる軟
磁性材料の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a soft magnetic material used as a core material of a magnetic head suitable for recording information at high density on a magnetic recording medium with high coercive force.
従来の技術
高密度磁気記録再生においては、記録媒体の保磁力を大
きくすれば有利であることが一般に知られているが、高
保磁力の記録媒体に情報を記録するためには強い磁場が
必要となる。ヘッドコア材として主流をなすフェライト
材はその飽和磁束密度が４０００〜５０００ガウス程度
であるために得られる記録磁界の強さに限界があり、磁
気記録媒体の保磁力がｔｏｏｏエルステッドを越えてく
ると記録が不十分になるという欠点がある。Conventional technology In high-density magnetic recording and reproduction, it is generally known that it is advantageous to increase the coercive force of the recording medium, but in order to record information on a recording medium with high coercive force, a strong magnetic field is required. Become. Ferrite material, which is the mainstream material for head core materials, has a saturation magnetic flux density of about 4,000 to 5,000 Gauss, so there is a limit to the strength of the recording magnetic field that can be obtained, and when the coercive force of the magnetic recording medium exceeds too Oersted, recording The disadvantage is that it is insufficient.
一方金属磁性材料で総括されるセンダスト、パーマロイ
等の結晶質磁性合金、あるいはＣｏＴａＺｒ。On the other hand, crystalline magnetic alloys such as sendust and permalloy, which are classified as metal magnetic materials, or CoTaZr.
ＣｏＺｒＮｂ等の非晶質合金等を用いた磁気ヘッドは、
一般にフェライト材よりも飽和磁束密度が高く、摺動ノ
イズも低いという優れた特徴を有する。この金属磁性材
料薄膜を作製する時、主にスパッタ法が用いられている
。この時、現在のところスパッタガスとしてアルゴンガ
スが使用されている（たとえば第９回日本応用磁気学会
学術講演会概要集 Ｐ２４２．Ｐ２２９等）、シかしこ
の方法で作製した薄膜は耐摩耗性、加工性、高周波特性
という点に欠点を有している。Magnetic heads using amorphous alloys such as CoZrNb, etc.
Generally, it has superior characteristics such as higher saturation magnetic flux density and lower sliding noise than ferrite materials. When producing this metal magnetic material thin film, a sputtering method is mainly used. At this time, argon gas is currently used as the sputtering gas (for example, the 9th Japanese Society of Applied Magnetics Academic Conference Summary P242, P229, etc.), but the thin film produced by this method is wear resistant and difficult to process. It has drawbacks in terms of performance and high frequency characteristics.
発明が解決しようとする問題点
従来の非晶質合金に関しては、その耐摩耗性に対して疑
問が持たれており、寿命もフェライト材を用いたヘッド
に比べると劣るものであった。本発明は耐摩耗性にすぐ
れた軟磁性材料を作製する方法に関してである。Problems to be Solved by the Invention Regarding conventional amorphous alloys, there have been doubts about their wear resistance, and their lifespans have been inferior to heads using ferrite materials. The present invention relates to a method for producing a soft magnetic material with excellent wear resistance.
問題点を解決するための手段
スパッタ法により軟磁性薄膜を作製する際にスパッタガ
スとしてアルゴンガスと炭化水素ガスからなる混合ガス
を用いることにより炭素を含んだ軟磁性薄膜が作製でき
る。この炭素を含むことにより耐摩耗性に優れた軟磁性
薄膜となる。Means for Solving the Problems By using a mixed gas of argon gas and hydrocarbon gas as a sputtering gas when producing a soft magnetic thin film by sputtering, a soft magnetic thin film containing carbon can be produced. By including this carbon, the soft magnetic thin film has excellent wear resistance.
作用
この技術的手段の作用はつぎのようになる。炭化水素ガ
スはプラズマ中で分解し水素と炭素に分かれる。その中
でも炭素はプラズマ中で炭素イオン、炭素ラジカルを形
成し、反応しやすい状態になっている。−ガスバッタに
よりターゲットからたたき出された原子は、このプラズ
マ中を通って基板上に堆積されるわけであるが、プラズ
マ中を通る際に、反応しやすい状態になっている炭素と
結合するものもあり、基板上には炭素を含んだ軟磁性材
料が堆積されるわけである。Effect The effect of this technical means is as follows. Hydrocarbon gas decomposes in the plasma and separates into hydrogen and carbon. Among them, carbon forms carbon ions and carbon radicals in plasma, making it highly reactive. -The atoms that are ejected from the target by the gas batter pass through this plasma and are deposited on the substrate, but as they pass through the plasma, some of them combine with carbon, which is in a state where it is easy to react. Soft magnetic material containing carbon is deposited on the substrate.
実施例
以下、本発明の軟磁性材料の製造方法の一実施例につい
て図面を用いて詳細に説明する。EXAMPLE Hereinafter, an example of the method for manufacturing a soft magnetic material of the present invention will be described in detail with reference to the drawings.
（実施例１）
第１図は、本発明に用いたスパッタ装置の模式図である
。ターゲットｌはＣｏＴａＺｒ合金ターゲット、基板２
は非磁性のセラミック材である。(Example 1) FIG. 1 is a schematic diagram of a sputtering apparatus used in the present invention. Target 1 is a CoTaZr alloy target, substrate 2
is a non-magnetic ceramic material.
基板は水冷するのが適切である。真空室内を１×１０’
Ｔｏｒｒより高真空に排気したのち、ＣＨ。The substrate is suitably water cooled. 1x10' inside the vacuum chamber
After evacuating to a higher vacuum than Torr, CH.
ガスを０．８〜２ｍＴｏｒｒ導入し、アルゴンガスを１
０ｍＴｏｒｒになるまで導入する。全圧力が２０ｍＴ−
ｏｒｒになるように排気系のオリフィスを調整する。つ
ぎにターゲットに負の高電圧（Ｄ、Ｃ，スパッタ法）も
しくは高周波電圧（Ｒ。Gas was introduced at 0.8 to 2 mTorr, and argon gas was
Introduce until the pressure reaches 0 mTorr. Total pressure is 20mT-
Adjust the orifice of the exhaust system so that it is orr. Next, apply a negative high voltage (D, C, sputtering method) or high frequency voltage (R) to the target.
Ｆ、スパッタ法）を加えて放電を起こす。数十分間のプ
レスパツタの後シャッター４を開く。スバ７タ時間を調
節することにより所望の厚さの耐摩耗性に優れたＣｏＴ
ａＺｒＣ薄膜が得られる。なおスパッタ中にコイル３に
電流を流すことにより幾らかは膜の堆積速度を大きくす
ることができる。F, sputtering method) to generate a discharge. After several minutes of press release, the shutter 4 is opened. CoT with excellent wear resistance of desired thickness by adjusting the sputtering time
A ZrC thin film is obtained. Note that the film deposition rate can be increased somewhat by passing current through the coil 3 during sputtering.
（実施例２）
第２図は、本発明に用いたスパック装置の模式図である
。ターゲット１はＣｏＴａＺｒ合金であり、２枚のター
ゲットが対向するように置かれている。(Example 2) FIG. 2 is a schematic diagram of a spackle device used in the present invention. The target 1 is a CoTaZr alloy, and two targets are placed facing each other.
ターゲット１の裏側にはマグネット９が置かれである。A magnet 9 is placed on the back side of the target 1.
マグネットの磁極は図に示すように、片側のターゲット
の裏側にはＮ極が、他方にはＳ極が配置されており、磁
力線はターゲツト面に垂直になっている。真空室内をｌ
Ｘ１０４Ｔｏｒｒより高真空に排気した後ＣＨ，ガスを
０．２〜０．８ｍＴｏｒｒ導入し、アルゴンガスを１．
６ ｍ Ｔｏｒｒになるまで導入する。全圧力が３ｍＴ
ｏ ｒ ｒになるように排気系のオリフィスを調整する
。以下実施例１と同様に放電を起こし、スパック法によ
りＣｏＴａＺｒＣ薄膜が得られる。As shown in the figure, the magnetic poles of the magnet are arranged such that the N pole is arranged on the back side of the target on one side, and the S pole is arranged on the other side, and the lines of magnetic force are perpendicular to the target surface. Inside the vacuum chamber
After evacuation to a high vacuum of X104 Torr, CH gas was introduced at 0.2 to 0.8 mTorr, and argon gas was introduced at 1.
Introduce until the pressure reaches 6 m Torr. Total pressure is 3mT
Adjust the orifice of the exhaust system so that o r r. Thereafter, a discharge is generated in the same manner as in Example 1, and a CoTaZrC thin film is obtained by the spuck method.
なお実施例１．２ともに共通することであるが、導入す
るＣＨ４ガス圧力、アルゴンガス圧力は実施例ではその
一例を示したのみであり、ＣＨ４ガスとアルゴンガスの
混合ガス中でのＣＨ、ガスの分圧比が５％以上５０％以
下であれば、オリフィスを調整した後の全圧力が１ｍＴ
ｏｒｒから３０ｍＴｏｒｒの広い範囲で耐摩耗性の優れ
た薄膜が得られる。Although it is common to both Examples 1 and 2, the CH4 gas pressure and argon gas pressure to be introduced are only one example shown in the example. If the partial pressure ratio is 5% or more and 50% or less, the total pressure after adjusting the orifice is 1mT.
A thin film with excellent wear resistance can be obtained over a wide range from orr to 30 mTorr.
また用いるターゲットもここではＣｏＴａＺｒとなって
いるがＣｏ Ｚ ｒ Ｎ ｂを用いても同様の性質を持
つＣｏＺｒＮｂＣ薄膜が得られる。Although the target used here is CoTaZr, a CoZrNbC thin film having similar properties can be obtained by using CoZrNb.
また真空室内に導入する炭化水素ガスはＣＨ。The hydrocarbon gas introduced into the vacuum chamber is CH.
のみならず、Ｃ２Ｈ，、Ｃ８Ｈ８，もしくはこれらの混
合ガスであっても同様の効果が得られる。Similar effects can also be obtained with not only C2H, C8H8, or a mixture thereof.
発明の効果
本発明による軟磁性材料の製造方法により、たとえばＶ
ＴＲ用ヘッドのコア材としてこの材料を用いた際に、長
時間使用してもその摩耗量は少なくフェライトなみの寿
命が保証され、高飽和磁束密度の、耐摩耗性に優れたＣ
ｏＴａＺｒＣ薄膜が比較的容易な方法で得られるわけで
ある。Effects of the Invention By the method for producing a soft magnetic material according to the present invention, for example, V
When this material is used as the core material of a TR head, it exhibits minimal wear even after long-term use, guaranteeing a lifespan comparable to ferrite, and has a high saturation magnetic flux density and excellent wear resistance.
This means that an oTaZrC thin film can be obtained by a relatively easy method.
第１図、第２図は本発明の軟磁性材料の製造方法に用い
るスパッタ装置の模式図である。
１・・・・・・ターゲット、２・・・・・・基（反、３
・・・・・・コイル、４・・・・・・シャッター、５・
・・・・・基板ホルダー、６・・・・・・ガス導入口、
７・・・・・・排気口、８・・・・・・チャンバー。FIGS. 1 and 2 are schematic diagrams of a sputtering apparatus used in the method for manufacturing a soft magnetic material of the present invention. 1...Target, 2...Group (anti, 3
... Coil, 4 ... Shutter, 5.
...Substrate holder, 6...Gas inlet,
7...Exhaust port, 8...Chamber.
Claims (3)
Ｎｂ合金もしくはこれら各元素よりなる複合ターゲット
を用い、ＣｏＴａＺｒＣもしくはＣｏＺｒＮｂＣ薄膜を
スパッタ法で作製する際、炭化水素ガスとアルゴンガス
の混合ガスをスパッタガスに用いることを特徴とする軟
磁性材料の製造方法。(1) CoTaZr alloy or CoZr target
A method for producing a soft magnetic material, characterized in that a mixed gas of hydrocarbon gas and argon gas is used as a sputtering gas when producing a CoTaZrC or CoZrNbC thin film by sputtering using an Nb alloy or a composite target made of these elements. .
５０％以下であることを特徴とする特許請求の範囲第（
１）項記載の軟磁性材料の製造方法。(2) Claim No. 1, characterized in that the partial pressure ratio of hydrocarbon gas in the mixed gas is 5% or more and 50% or less.
1) A method for manufacturing the soft magnetic material described in section 1).
３の１種類以上からなることを特徴とする特許請求の範
囲第（１）項記載の軟磁性材料の製造方法。(3) Hydrocarbons are CH_4, C_2H_6, C_3H_
The method for manufacturing a soft magnetic material according to claim (1), characterized in that the soft magnetic material is made of one or more of the following three types.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5052287A JPS63216968A (en) | 1987-03-05 | 1987-03-05 | Manufacture of soft-magnetic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5052287A JPS63216968A (en) | 1987-03-05 | 1987-03-05 | Manufacture of soft-magnetic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63216968A true JPS63216968A (en) | 1988-09-09 |
Family
ID=12861313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5052287A Pending JPS63216968A (en) | 1987-03-05 | 1987-03-05 | Manufacture of soft-magnetic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63216968A (en) |
-
1987
- 1987-03-05 JP JP5052287A patent/JPS63216968A/en active Pending
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