JPH0389505A - Manufacture of magnetic alloy - Google Patents
Manufacture of magnetic alloyInfo
- Publication number
- JPH0389505A JPH0389505A JP22615989A JP22615989A JPH0389505A JP H0389505 A JPH0389505 A JP H0389505A JP 22615989 A JP22615989 A JP 22615989A JP 22615989 A JP22615989 A JP 22615989A JP H0389505 A JPH0389505 A JP H0389505A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- volume ratio
- nitrogen
- magnetic
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 54
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 49
- 229910052742 iron Inorganic materials 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 15
- 239000000956 alloy Substances 0.000 claims abstract description 15
- 239000007789 gas Substances 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 238000004544 sputter deposition Methods 0.000 claims abstract description 10
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract description 5
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 25
- 239000001301 oxygen Substances 0.000 claims description 25
- 229910052760 oxygen Inorganic materials 0.000 claims description 25
- 229910052757 nitrogen Inorganic materials 0.000 claims description 24
- 239000011261 inert gas Substances 0.000 claims description 11
- 150000002500 ions Chemical class 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 229910052752 metalloid Inorganic materials 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000004907 flux Effects 0.000 abstract description 13
- 239000012535 impurity Substances 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract description 2
- 229910000979 O alloy Inorganic materials 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 11
- 229910052786 argon Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 150000002738 metalloids Chemical class 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910020641 Co Zr Inorganic materials 0.000 description 1
- 229910020520 Co—Zr Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 229910001337 iron nitride Inorganic materials 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高密度磁気記録用の磁気ヘッドに適する磁性
合金の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing a magnetic alloy suitable for a magnetic head for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力（Ｈｃ）を有する磁性材料
を使用して記録トラック幅を狭くすることにより、高密
度磁気記録再生を実現している。そして、この高い抗磁
力をもつ磁気記録媒体に記録再生するための磁気ヘッド
材料として、飽和磁束密度ＢＳの高い磁性合金が必要と
されており、センダスト合金やＣｏ−Ｚｒ系非晶質合金
等をコアの一部または全部に使用した磁気ヘッドが提案
されている。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and magnetic recording media are now made of magnetic materials with high coercive force (Hc) to narrow the recording track width. Achieves density magnetic recording and reproduction. Magnetic alloys with high saturation magnetic flux density BS are required as magnetic head materials for recording and reproducing on magnetic recording media with high coercive force, and Sendust alloys, Co-Zr amorphous alloys, etc. A magnetic head using part or all of the core has been proposed.
しかしながら、これらの合金のＢｓは１０ｋＧ程度か或
いはそれ以下であり、磁気記録媒体の抗磁力が２０００
０ｅ以上になるとセンダスト合金やＣｏ−Ｚｒ系非晶質
合金を使用した磁気ヘッドでは良好な磁気記録再生が困
難になった。また、磁気記録媒体の長平方向ではなく、
厚さ方向に磁化して記録する垂直磁化記録方式も提案さ
れているがこの垂直磁化記録方式を良好に行うには、磁
気ヘッドの主磁極先端部の厚さを０．５μｍ以下にする
必要があり、比較的抗磁力の低い磁気記録媒体に記録す
るにも、高い飽和磁束密度をもつ磁気ヘッド用磁性合金
が必要になる。However, the Bs of these alloys is about 10 kG or less, and the coercive force of the magnetic recording medium is 2000 kG.
When it exceeds 0e, it becomes difficult to perform good magnetic recording and reproduction with magnetic heads using Sendust alloy or Co--Zr amorphous alloy. Also, instead of the longitudinal direction of the magnetic recording medium,
A perpendicular magnetization recording method that records by magnetizing in the thickness direction has also been proposed, but in order to perform this perpendicular magnetization recording successfully, the thickness of the tip of the main pole of the magnetic head must be 0.5 μm or less. Therefore, even for recording on a magnetic recording medium with relatively low coercive force, a magnetic alloy for a magnetic head with a high saturation magnetic flux density is required.
そして、センダスト合金やＣｏ−Ｚｒ系非晶質合金より
も飽和磁束密度の高い磁性合金として、窒化鉄やＦｅ−
３ｔ系合金等の鉄を主成分とした磁性合金が知られてい
る。Iron nitride and Fe-
Magnetic alloys containing iron as a main component, such as 3t alloys, are known.
（発明が解決しようとする課題）
ところが、従来より知られている、これらの高Ｂｓ磁性
合金は保磁力Ｈｃが大きく、そのままでは磁気ヘッドの
材料としては不十分であるのでセンダスト合金やパーマ
ロイ等の保持力の小さい磁性材料か、或いは５ｉ０２等
の非磁性材料を中間層とした多層構造の磁気ヘッドが提
案されている。(Problem to be solved by the invention) However, these conventionally known high Bs magnetic alloys have a large coercive force Hc and are not sufficient as materials for magnetic heads as they are, so sendust alloys, permalloy, etc. A multilayer magnetic head has been proposed in which the intermediate layer is made of a magnetic material with low coercive force or a non-magnetic material such as 5i02.
しかしながら、この様に異なる系の物質を多層化するに
は工数やコストがかかり、信頼性を保つのも難しいとい
うＩ：’；Ｉ Ｚ点があった。However, creating multiple layers of materials of different systems in this way requires a lot of man-hours and costs, and it is also difficult to maintain reliability.
これらの問題点を解決するために、本発明穴等はＦｅ−
Ｎ−０合金やＦｅ−Ｔａ−Ｎ−０合金等によって、多層
構造にしない単層でも高飽和磁束密度を有しさらに低保
磁力である磁性合金を提案した。（特願昭６３−２０７
１３６、特願昭６４−３５０７１など）。本発明は、こ
のような磁気特性の優れた磁性合金を得るのに適した磁
性合金の製造方法を提供することを目的とする。In order to solve these problems, the holes etc. of the present invention are made of Fe-
We have proposed a magnetic alloy using N-0 alloy, Fe-Ta-N-0 alloy, etc., which has a high saturation magnetic flux density even in a single layer without a multilayer structure, and has a low coercive force. (Special application 1986-207
136, patent application No. 64-35071, etc.). An object of the present invention is to provide a method for manufacturing a magnetic alloy suitable for obtaining such a magnetic alloy with excellent magnetic properties.
（課題を解決するための手段）
本発明は上記の課題を解決するために、鉄、または鉄を
主成分として鉄以外の金属または半金属の少なくとも１
種類以上の元素を鉄中に含有させた合金を、不活性ガス
と窒素と酸素の混合ガス雰囲気中でスパッタリング法に
より基板上に堆積するに際し、前記混合ガス中の窒素ガ
スの体積比Ｘを２〜３０％、酸素ガスの体積比ｙを２〜
３０％にした磁性合金の製造方法（ただし、不活性ガス
体積比十ｘ＋ｙ−１００である）を提供すると共に、
さらに、鉄、または鉄を主成分として鉄以外の金属また
は半金属の少なくとも１種類以上の元素を鉄中に含有さ
せた合金を、スパッタリング法によって基板上に堆積さ
せるに際し、不活性ガスと窒素と酸素の混合ガスのイオ
ンまたは窒素と酸素の混合ガスのイオンを前記基板上に
照射しながら行うようにした磁性合金の製造方法を提供
するものである。(Means for Solving the Problems) In order to solve the above-mentioned problems, the present invention provides iron or at least one metal or metalloid containing iron as the main component.
When depositing an alloy containing more than one type of element in iron on a substrate by sputtering in a mixed gas atmosphere of inert gas, nitrogen, and oxygen, the volume ratio X of nitrogen gas in the mixed gas is set to 2. ~30%, the volume ratio y of oxygen gas is 2~
30% (however, the inert gas volume ratio is 10 x + y - 100), and further comprising iron, or at least one metal or metalloid containing iron as a main component other than iron. When depositing an alloy containing the above elements in iron on a substrate by sputtering, the substrate is irradiated with ions of an inert gas and a mixed gas of nitrogen and oxygen, or ions of a mixed gas of nitrogen and oxygen. The present invention provides a method for manufacturing a magnetic alloy in which the manufacturing method is performed while
（実施例）
本発明の磁性合金の製造方法の一実施例を第１図に示す
。(Example) An example of the method for manufacturing a magnetic alloy of the present invention is shown in FIG.
一対のターゲット５．５は鉄、または鉄に他の金属また
は半金属を含有させた合金である。このターゲット５．
５はターゲットホルダ９によって支えられており、この
ターゲット５とターゲットホルダ９には、直流電源１３
よりマイナス電位が印加され、さらにこのターゲットホ
ルダ９の周囲にはシールド４が取り付けである。The pair of targets 5.5 is made of iron or an alloy of iron containing another metal or metalloid. This target 5.
5 is supported by a target holder 9, and the target 5 and target holder 9 are connected to a DC power source 13.
A more negative potential is applied, and a shield 4 is attached around the target holder 9.
また、このターゲットホルダ９の内部には、両ターゲッ
ト５．５間にプラズマ１４を集束するための磁石６．６
が挿入され、かつターゲット５の表面の加熱を防ぐため
に冷却水８が流入している。Also, inside this target holder 9, there is a magnet 6.6 for focusing the plasma 14 between both targets 5.5.
is inserted, and cooling water 8 flows in to prevent the surface of the target 5 from heating.
そして、接地された真空＃Ｉ！１５の左右に、２個のタ
ーゲットホルダ９が絶縁体７によって絶縁されて設けら
れている。And the grounded vacuum #I! Two target holders 9 are provided on the left and right sides of 15 and are insulated by an insulator 7.
また、この真空槽１５の上部より、酸素（０２窒素（Ｎ
２）、アルゴン（Ａ「）がそれぞれ流量計１〜うにより
所定の流量に調節されて導入されている。なお、アルゴ
ンはターゲット５をスパッタすると同時に、成膜する磁
性合金膜中の酸素と窒素の量を調節するためのものであ
る。Further, from the upper part of this vacuum chamber 15, oxygen (02 nitrogen (N
2), argon (A') is introduced after being adjusted to a predetermined flow rate using flowmeters 1 to 3. At the same time, argon sputters the target 5, and at the same time, the oxygen and nitrogen in the magnetic alloy film to be formed are introduced. This is to adjust the amount of
そして、真空槽１５の下部には、基板ホルダー１２上に
基板１１がおかれ、不純物を防ぐためのシャッター１０
が址板１１を覆っている。At the bottom of the vacuum chamber 15, the substrate 11 is placed on the substrate holder 12, and a shutter 10 is installed to prevent impurities.
covers the base plate 11.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットホルダー９に支えられたターゲット
５．５間にプラズマ１４を発生させると、ターゲット５
はマイナス電位であるので、プラズマ１４中のアルゴン
イオン（Ａｒ”）かターゲット５に衝突し、ターゲット
５の鉄原子または鉄原子と他の金属・半金属原子が飛び
出す。In such a sputtering apparatus, when plasma 14 is generated between the targets 5.5 supported by the left and right target holders 9 by the DC power supply 13, the target 5.
Since is at a negative potential, argon ions (Ar") in the plasma 14 collide with the target 5, and iron atoms or iron atoms and other metal/metallic atoms of the target 5 fly out.
そして、ターゲット５から飛び出したこれらの原子とプ
ラズマ中の酸素及び窒素の原子または分子が基板１１の
上に成長していく。These atoms ejected from the target 5 and oxygen and nitrogen atoms or molecules in the plasma grow on the substrate 11.
なお、スパッタ開始後の数分間は、シャッター１０を閉
じて基板１１を覆うことにより、ターゲット５の表面の
不純物が基板１１の上に付かないようにし、その後でシ
ャッター１０を開けるようにする。そして、流量計１〜
３にて酸素、窒素、アルゴンの導入量を調節することに
より、所望の元素組成比のＦｅ−Ｎ−０合金またはＦｅ
−Ｍ−Ｎ−０合金（Ｍは鉄以外の金属または半金属）を
得ることができる。Note that for several minutes after the start of sputtering, the shutter 10 is closed to cover the substrate 11 to prevent impurities on the surface of the target 5 from adhering to the substrate 11, and then the shutter 10 is opened. And flow meter 1~
By adjusting the amounts of oxygen, nitrogen, and argon introduced in step 3, Fe-N-0 alloy or Fe
-M-N-0 alloy (M is a metal or metalloid other than iron) can be obtained.
このようにして得られるＦｅ−Ｎ−０合金において、第
７図に示すように混合ガス中の窒素体積比Ｘが２％未満
であると十分な低保持力（Ｈｃ）が得られず、また酸素
体積比ｙが２％未満であっても十分な低Ｈｃは得られな
い。次に第３図に示すように酸素体積比ｙを２％とした
場合、窒素体積比が３０％以下であれば、飽和磁束密度
Ｂｓが１０ｋＧ以上の磁性合金を得ることができる。ま
た、第４図に示すように窒素体積比Ｘを２％とした場合
、酸素体積比が３０％以下であれば飽和磁束密度Ｂｓが
１０ｋＧ以上の磁性合金を得ることができる。また、Ｆ
ｅ−Ｍ−Ｎ−０合金においてＭが少量であれば第３図及
び第４図と略同様の結果が得られる。このように、鉄、
または鉄を主成分として金属または半金属の少なくとも
１種類以上の元素を鉄中に含有させた合金を、不活性ガ
スと窒素と酸素の混合ガス雰囲気中でスパッタリングを
行って、Ｆｅ−Ｎ−０合金またはＦ ｅ −Ｍ −Ｎ−
０合金を基板上に成膜する磁性合金の製造方法において
、混合ガス中の窒素ガスの体積比を２〜３０％、酸素ガ
スの体積比を２〜３０％にすることにより、１０ｋＧ以
上の高Ｂｓを持ち保持力の小さい磁性合金を得ることが
できることがわかる。In the Fe-N-0 alloy obtained in this way, if the nitrogen volume ratio Even if the oxygen volume ratio y is less than 2%, a sufficiently low Hc cannot be obtained. Next, as shown in FIG. 3, when the oxygen volume ratio y is 2% and the nitrogen volume ratio is 30% or less, a magnetic alloy with a saturation magnetic flux density Bs of 10 kG or more can be obtained. Further, as shown in FIG. 4, when the nitrogen volume ratio X is 2%, a magnetic alloy with a saturation magnetic flux density Bs of 10 kG or more can be obtained if the oxygen volume ratio is 30% or less. Also, F
If the amount of M in the e-M-N-0 alloy is small, results substantially similar to those shown in FIGS. 3 and 4 can be obtained. In this way, iron,
Alternatively, an alloy containing iron as a main component and at least one metal or metalloid element is sputtered in an atmosphere of a mixed gas of inert gas, nitrogen, and oxygen to produce Fe-N-0 Alloy or F e -M -N-
In the method for manufacturing magnetic alloys in which 0 alloy is deposited on a substrate, the volume ratio of nitrogen gas in the mixed gas is set to 2 to 30%, and the volume ratio of oxygen gas is set to 2 to 30%. It can be seen that a magnetic alloy having Bs and low coercive force can be obtained.
本発明の磁性合金の製造方法の他の例を第２図に示す。Another example of the method for manufacturing the magnetic alloy of the present invention is shown in FIG.
１７はターゲットスパッタ用のイオンガンａであり、こ
のイオンガンａからアルゴン等の不活性ガスのイオンビ
ームがターゲット１６に照射し、ターゲット１６の鉄、
または鉄と他の金属或いは半金属の原子が飛び出して基
板ホルダー１９上の基板２０に堆積する。また、１８は
基板照射用のイオンガンｂてあり、このイオンガンｂか
らアルゴン等の不活性ガスと窒素および酸素のイオンビ
ームが直接基板を照射している。このようにして基板上
にＦｅ−Ｎ−０合金膜またはＦｅ−Ｍ−Ｎ−０合金膜が
堆積する。第５図はＦｅ−Ｎ−０合金において酸素体積
比ｙｔを１０％にした時の窒素体積比ｘＬとＢｓの関係
を示した図である。この図から窒素体積比ｘｌを９０％
にしてもＢｓは１０ｋＧ以上であり、さらにｘｉを１０
０％の部分に延長してもＢｓは１０ｋＧ以上である。第
６図はＦｅ−Ｎ−０合金において窒素体積比ｘｌを１０
％にした時の酸素体積比ｙ１とＢｓの関係を示した図で
ある。酸素体積比ｙｔを９０％にしてもＢｓは１０ｋＧ
以上であり、さらにｙｌを１００９６の部分に延長して
もＢｓは１０ｋＧ以上の高Ｂｓであり、非常に広範囲の
条件である高Ｂｓの磁性合金が得られるので制御しやす
く製造が容易になる。また、Ｆｅ−Ｍ−Ｎ−０合金でも
Ｍが少量であれば、第５図、第６図と略同様の結果が得
られる。従って、鉄、または、鉄を主成分として金属ま
たは半金属の少なくとも１Ｎ類以上の元素を含有させた
合金を、スパッタリング法によって基板上に堆積させる
際に、不活性ガスと窒素と酸素の混合ガスのイオンまた
は窒素と酸素の混合ガスのイオンを前記基板上に照射す
ることにより、飽和磁束密度Ｂｓが非常に高いＦｅ−Ｎ
−０合金膜またはＦｅ−Ｍ−Ｎ−０合金膜を得ることが
できることがわかる。なお、基板照射を不活性ガスのイ
オンだけで行った場合に、低Ｈｃが得られないことを、
本発明穴は実験で確認している。17 is an ion gun a for target sputtering, and an ion beam of an inert gas such as argon is irradiated onto the target 16 from this ion gun a, and the iron of the target 16,
Alternatively, atoms of iron and other metals or semimetals are ejected and deposited on the substrate 20 on the substrate holder 19. Further, reference numeral 18 denotes an ion gun b for substrate irradiation, from which the substrate is directly irradiated with an ion beam of inert gas such as argon, nitrogen, and oxygen. In this way, an Fe-N-0 alloy film or a Fe-M-N-0 alloy film is deposited on the substrate. FIG. 5 is a diagram showing the relationship between the nitrogen volume ratio xL and Bs when the oxygen volume ratio yt is 10% in the Fe-N-0 alloy. From this figure, the nitrogen volume ratio xl is 90%
Even so, Bs is more than 10kG, and xi is 10
Even if extended to the 0% portion, Bs is 10 kG or more. Figure 6 shows that the nitrogen volume ratio xl is 10 in the Fe-N-0 alloy.
It is a figure showing the relationship between oxygen volume ratio y1 and Bs when expressed as %. Even if the oxygen volume ratio yt is 90%, Bs is 10kG
This is the above, and even if yl is further extended to the 10096 portion, the Bs is still as high as 10 kG or more, and a high Bs magnetic alloy can be obtained under a very wide range of conditions, making it easier to control and manufacture. Furthermore, if the Fe-M-N-0 alloy contains a small amount of M, substantially the same results as in FIGS. 5 and 6 can be obtained. Therefore, when depositing iron or an alloy containing iron as the main component and at least 1N elements of metals or semimetals on a substrate by sputtering, a mixture of inert gas, nitrogen, and oxygen is used. By irradiating the substrate with ions of ions or ions of a mixed gas of nitrogen and oxygen, Fe-N with a very high saturation magnetic flux density Bs is produced.
It can be seen that a -0 alloy film or a Fe-M-N-0 alloy film can be obtained. It should be noted that low Hc cannot be obtained when the substrate is irradiated only with inert gas ions.
The holes of the present invention have been confirmed through experiments.
（発明の効果）
以上詳述したように、本発明になる製造方法を用いれば
飽和磁束密度Ｂｓが１０ｋＧ以上と非常に高い磁性合金
を製造することができ、この磁性合金を例えば薄膜磁気
ヘッドに適用することにより高密度な磁気記録再生が実
現できる特長がある。(Effects of the Invention) As detailed above, by using the manufacturing method of the present invention, it is possible to manufacture a magnetic alloy with a very high saturation magnetic flux density Bs of 10 kG or more, and this magnetic alloy can be used, for example, in a thin film magnetic head. It has the advantage that high-density magnetic recording and reproduction can be achieved by applying it.
第１図は本発明の第１の製造方法に用いられるスパッタ
装置の概略図、第２図は第２の製造方法に用いられるイ
オンビームスパッタ装置の模式図、第３図は第１図の製
造方法において、酸素体積比ｙを２％とした時の窒素体
積比Ｘと飽和磁束密度Ｂｓの関係を示した図、第４図は
、第１の製造方法において、窒素体積比Ｘを２％とした
時の酸素体積比ｙと飽和磁束密度Ｂｓの関係を示した図
、第５図は第２の製造方法において酸素体積比ｙＩを１
０％とした時の窒素体積比ｘｉと飽和磁束密度Ｂｓの関
係を示した図、第６図は第２の製造方法において、窒素
体積比ｘ１を１０％とした時の酸素体積比ｙ１と飽和磁
束密度Ｂｓの関係を記した図、第７図は混合ガス中の窒
素体積比および酸素体積比と保磁力との関係を示す図で
ある。FIG. 1 is a schematic diagram of a sputtering device used in the first manufacturing method of the present invention, FIG. 2 is a schematic diagram of an ion beam sputtering device used in the second manufacturing method, and FIG. 3 is a schematic diagram of the sputtering device used in the first manufacturing method of the present invention. Figure 4 shows the relationship between the nitrogen volume ratio X and the saturation magnetic flux density Bs when the oxygen volume ratio y is 2% in the first manufacturing method. Figure 5 shows the relationship between the oxygen volume ratio y and the saturation magnetic flux density Bs when the oxygen volume ratio yI is 1 in the second manufacturing method.
A diagram showing the relationship between the nitrogen volume ratio xi and the saturation magnetic flux density Bs when the nitrogen volume ratio xi is set to 0%, and Figure 6 shows the relationship between the oxygen volume ratio y1 and the saturation when the nitrogen volume ratio x1 is set to 10% in the second manufacturing method FIG. 7 is a diagram showing the relationship between the magnetic flux density Bs and the relationship between the nitrogen volume ratio and oxygen volume ratio in the mixed gas and the coercive force.
Claims (2)
半金属の少なくとも１種類以上の元素を鉄中に含有させ
た合金を、不活性ガスと窒素と酸素の混合ガス雰囲気中
でスバッタリング法により基板上に堆積させるに際し、
前記混合ガス中の窒素ガスの体積比ｘを２〜３０％、酸
素ガスの体積比ｙを２〜３０％にしたことを特徴とする
磁性合金の製造方法。ただし不活性ガス体積比＋ｘ＋ｙ
＝１００である。(1) Iron or an alloy containing iron as the main component and at least one metal or metalloid element other than iron is sputtered in a mixed gas atmosphere of inert gas, nitrogen, and oxygen. When depositing on a substrate using the ring method,
A method for manufacturing a magnetic alloy, characterized in that the volume ratio x of nitrogen gas in the mixed gas is set to 2 to 30%, and the volume ratio y of oxygen gas is set to 2 to 30%. However, inert gas volume ratio +x+y
=100.
半金属の少なくとも１種類以上の元素を鉄中に含有させ
た合金を、スパッタリング法によって基板上に堆積させ
るに際し、不活性ガスと窒素と酸素の混合ガスのイオン
または窒素と酸素の混合ガスのイオンを前記基板上に照
射しながら行うようにしたことを特徴とする磁性合金の
製造方法。(2) When depositing iron or an alloy containing iron as the main component and at least one metal or metalloid element other than iron on a substrate by sputtering, inert gas and nitrogen A method for producing a magnetic alloy, characterized in that the process is carried out while irradiating the substrate with ions of a mixed gas of nitrogen and oxygen or ions of a mixed gas of nitrogen and oxygen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22615989A JPH0389505A (en) | 1989-08-31 | 1989-08-31 | Manufacture of magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22615989A JPH0389505A (en) | 1989-08-31 | 1989-08-31 | Manufacture of magnetic alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0389505A true JPH0389505A (en) | 1991-04-15 |
Family
ID=16840789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22615989A Pending JPH0389505A (en) | 1989-08-31 | 1989-08-31 | Manufacture of magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0389505A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6822831B2 (en) * | 1999-11-26 | 2004-11-23 | Fujitsu Limited | Magnetic thin film, magnetic thin film forming method, and recording head |
-
1989
- 1989-08-31 JP JP22615989A patent/JPH0389505A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6822831B2 (en) * | 1999-11-26 | 2004-11-23 | Fujitsu Limited | Magnetic thin film, magnetic thin film forming method, and recording head |
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