JPS627538B2 - - Google Patents
Info
- Publication number
- JPS627538B2 JPS627538B2 JP12114681A JP12114681A JPS627538B2 JP S627538 B2 JPS627538 B2 JP S627538B2 JP 12114681 A JP12114681 A JP 12114681A JP 12114681 A JP12114681 A JP 12114681A JP S627538 B2 JPS627538 B2 JP S627538B2
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- wafer
- exposure
- targets
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 description 12
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56121146A JPS5821740A (ja) | 1981-07-31 | 1981-07-31 | 投影露光用フオトマスク |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56121146A JPS5821740A (ja) | 1981-07-31 | 1981-07-31 | 投影露光用フオトマスク |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5821740A JPS5821740A (ja) | 1983-02-08 |
JPS627538B2 true JPS627538B2 (ko) | 1987-02-18 |
Family
ID=14803988
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56121146A Granted JPS5821740A (ja) | 1981-07-31 | 1981-07-31 | 投影露光用フオトマスク |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5821740A (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63184929U (ko) * | 1987-05-21 | 1988-11-28 | ||
JPH0535116Y2 (ko) * | 1988-11-11 | 1993-09-06 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60149130A (ja) * | 1984-01-17 | 1985-08-06 | Hitachi Ltd | パターン検出方法およびそれに用いる反射防止膜用材料 |
JPS636659A (ja) * | 1986-06-27 | 1988-01-12 | Hitachi Ltd | 本人確認方式 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56109350A (en) * | 1980-02-01 | 1981-08-29 | Hitachi Ltd | Photomask |
-
1981
- 1981-07-31 JP JP56121146A patent/JPS5821740A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56109350A (en) * | 1980-02-01 | 1981-08-29 | Hitachi Ltd | Photomask |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63184929U (ko) * | 1987-05-21 | 1988-11-28 | ||
JPH0535116Y2 (ko) * | 1988-11-11 | 1993-09-06 |
Also Published As
Publication number | Publication date |
---|---|
JPS5821740A (ja) | 1983-02-08 |
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