JPS62266165A - Preparation of monomolecular film - Google Patents
Preparation of monomolecular filmInfo
- Publication number
- JPS62266165A JPS62266165A JP61108843A JP10884386A JPS62266165A JP S62266165 A JPS62266165 A JP S62266165A JP 61108843 A JP61108843 A JP 61108843A JP 10884386 A JP10884386 A JP 10884386A JP S62266165 A JPS62266165 A JP S62266165A
- Authority
- JP
- Japan
- Prior art keywords
- hydrophilic
- group
- monomolecular film
- groups
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000006239 protecting group Chemical group 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 14
- 150000002430 hydrocarbons Chemical group 0.000 claims abstract description 6
- 230000002209 hydrophobic effect Effects 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- 150000002894 organic compounds Chemical class 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 7
- 239000002994 raw material Substances 0.000 abstract description 5
- 239000004215 Carbon black (E152) Substances 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000010410 layer Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000001186 cumulative effect Effects 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- -1 E-1 compound Chemical class 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- KFPPFDUBWHHKCH-UHFFFAOYSA-N 16-[dimethyl(propan-2-yl)silyl]oxyhexadecan-1-ol Chemical compound CC(C)[Si](C)(C)OCCCCCCCCCCCCCCCCO KFPPFDUBWHHKCH-UHFFFAOYSA-N 0.000 description 1
- 102100025027 E3 ubiquitin-protein ligase TRIM69 Human genes 0.000 description 1
- 101000830203 Homo sapiens E3 ubiquitin-protein ligase TRIM69 Proteins 0.000 description 1
- PQLVXDKIJBQVDF-UHFFFAOYSA-N acetic acid;hydrate Chemical compound O.CC(O)=O PQLVXDKIJBQVDF-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical class 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- YCXVDEMHEKQQCI-UHFFFAOYSA-N chloro-dimethyl-propan-2-ylsilane Chemical compound CC(C)[Si](C)(C)Cl YCXVDEMHEKQQCI-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 125000005043 dihydropyranyl group Chemical group O1C(CCC=C1)* 0.000 description 1
- OGQYPPBGSLZBEG-UHFFFAOYSA-N dimethyl(dioctadecyl)azanium Chemical compound CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC OGQYPPBGSLZBEG-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- AHAREKHAZNPPMI-UHFFFAOYSA-N hexa-1,3-diene Chemical compound CCC=CC=C AHAREKHAZNPPMI-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000000213 sulfino group Chemical group [H]OS(*)=O 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
この発明は有機単分子膜、特に親水性基材に吸着可能で
あり、かつ吸着後に気体側（基材と反対側）に親水性基
、もしくは反応性親水性基を有することを特徴とする有
機単分子膜のｖｌＡ造方決方法するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention is capable of adsorbing onto an organic monomolecular film, particularly a hydrophilic substrate, and after adsorption, a hydrophilic group, Alternatively, it is a method for producing a vlA organic monomolecular film characterized by having a reactive hydrophilic group.
「従来の技術」
有機化合物の単分子膜、累積膜には数多くの用途がある
。エレクトロニクスの分野では、例えば、膜厚を正確に
制御した半導体装置用絶縁膜、磁気ディスク装置等の保
護潤滑膜、光電変換膜、光学的情報記録膜、光学的情報
記憶膜などへの一応用が検討されている。これらの目的
のために、単分子膜、累積膜を作製する方法として、水
面上で両親媒性物質を高度に分子配向させて単分子層と
じ、その単分子層を基材上に写し取る方法、いわゆるラ
ングミュアーブロジエツト法か多く用いられている。``Prior Art'' Monomolecular films and cumulative films of organic compounds have many uses. In the field of electronics, one application is, for example, insulating films for semiconductor devices with precisely controlled film thickness, protective lubricant films for magnetic disk drives, photoelectric conversion films, optical information recording films, optical information storage films, etc. It is being considered. For these purposes, methods for producing monomolecular films and cumulative films include a method in which amphiphilic substances are highly oriented on the water surface to form a monomolecular layer, and the monomolecular layer is transferred onto a substrate; The so-called Langmuir-Blodget method is often used.
［発明が解決しようとする問題点］
しかしながら、この方法で作製される単分子膜、累積膜
を構成する材料分子は、一般に長鎖アルキル基の一方の
末端のみに蜆水基を有するものである。かかる構成分子
から成る単分子膜、累積膜を作製する場合は、熱力学的
な安定性の問題から、膜の支台、すなわち基材と逆側で
ある気体側に疎水・１！１部分を露出させた膜構成にし
ておく必要がある。もし気体側に親水基部分を露出さｔ
！−でおいても、敢闘しておくだけで構成分子の反転が
起こり、表面は疎水・１１に変わってしまうことか知ら
れている。[Problems to be Solved by the Invention] However, the material molecules constituting the monomolecular film or cumulative film produced by this method generally have a water group at only one end of a long chain alkyl group. . When producing a monomolecular film or a cumulative film made of such constituent molecules, due to thermodynamic stability issues, a hydrophobic 1!1 portion is added to the support of the film, that is, the gas side opposite to the base material. It is necessary to have an exposed membrane configuration. If the hydrophilic group part is exposed on the gas side,
! It is known that even in the case of -, just by fighting hard, the constituent molecules will be reversed and the surface will change to hydrophobic 11.
したかって従来（」親水ｔ’を基を気体側ＩＪ露出した
形の単分子膜を形成覆ることは非常に回動てあり、従っ
て単分子膜あるいはその累積膜を作製後にその十に親水
・１）１物質を吸着させたり膜に物質を反応さ１！で新
しい機能をイマ１５するには、この困ガ１さが大きな問
題となっていた。Therefore, in the past, forming and covering a monomolecular film with the gas side IJ exposed based on the hydrophilic t' was extremely difficult. ) 1 substance is adsorbed or the substance is reacted with the membrane 1! This difficulty became a major problem when it came to implementing new functions.
しかし、親水性基には一般に反応″［）１に富むものが
多く、もしかかる膜か作成できれば、単分子膜、あるい
（Ｊ上その累積膜の表面に反応１）ｌをイ」５できるこ
とになる。親水゛［）［基のこのような反応゛［）［あ
るいｆｊ、親水・１）１ぞのものを利用しで、例λば、
〉１（導体装置用絶縁層、磁気ディスク装置等の保訝潤
滑層、光重変換機能を持つ層、光学的情報記録層、光学
的情報記憶層イ【どを単分子膜上に設Ｃｊることかでき
るようになるわ（Ｊである。However, many hydrophilic groups are generally rich in the reaction ``[)1'', and if such a film can be created, it would be possible to form a monomolecular film or (on the surface of the cumulative film with the reaction 1) ``5''. become. By using such reactions of hydrophilic ゛[)[ groups ゛[) [or fj, hydrophilic 1) 1, for example, λ,
〉1 (Insulating layer for conductor devices, protective lubricating layer for magnetic disk devices, etc., layer with light weight conversion function, optical information recording layer, optical information storage layer, etc., are provided on the monomolecular film) I'll be able to do some things (J).
本発明の目的（よ以−Ｆ述べた問題点を解決りるために
、新規な単分子膜の製造方法を提供することにあるが、
具体的には、親水性支台に吸着可能であり、かつ吸着後
に気体側、すなわち基材と反苅側に親水性基を有する有
機単分子膜の製造方法を提供することにある。The purpose of the present invention is to provide a novel method for producing a monomolecular film in order to solve the problems mentioned above.
Specifically, it is an object of the present invention to provide a method for producing an organic monomolecular film that can be adsorbed onto a hydrophilic abutment and has a hydrophilic group on the gas side after adsorption, that is, on the side opposite to the base material.
［問題点を解決するための手段］
本発明は一般式：
％式％（）
（式中、Ｘ（ま親水性基、Ｒは炭素原子数か８以上、望
ましくは１４以上の炭化水素基を示す）で示される１種
または２種以上の有機化合物の一方の親水性基を疎水性
保護基に変換して後、ラングミュアーブロジ■ツ１〜法
を用いて親水性基板十に配向制御して吸着させる事を特
徴とする単分子膜の製造方法である。[Means for Solving the Problems] The present invention is based on the general formula: After converting one hydrophilic group of one or more organic compounds represented by (shown) into a hydrophobic protecting group, orientation control is applied to a hydrophilic substrate using Langmuir's method 1 to 1. This is a method for producing a monomolecular film, which is characterized by adsorption.
本発明の要旨とするところは、同一の親水性基を両末端
に有する有機化合物を原料として、ラングミュアーブロ
ジエツ１へ法を用いて親水性基材十に基材側と気体側の
両方に親水・ＩＩ Ｗを持つ単分子膜を製造するに際し
、原料物質である同一の親水１ノ１基を両末端に有する
有機化合物の−ｈの親水性基のみを疎水性保護基によっ
て保護しておくということである。The gist of the present invention is to use an organic compound having the same hydrophilic group at both ends as a raw material, to form a hydrophilic base material on both the base material side and the gas side using the Langmuir-Brosietz method. When producing a monomolecular film with hydrophilic II W, only the hydrophilic group of -h of the raw material, an organic compound having the same hydrophilic 1-1 group at both ends, is protected with a hydrophobic protecting group. It means to leave it.
本発明における単分子膜の親水性基である前記一般式（
Ｉ）のＸとしてはヒドロキシル基、カルボキシル基、メ
ルカプト基、チオカルボキシルジチオカルボキシル基、
スルフィノ基、スルホ基、カルバモイル
１６換アミノ基等があげられ、単分子膜形成物質はこれ
らの親水性基のうりの１種を両末端に有するイー１機化
合物である。また前記一般式（Ｉ）のＲとして＋，Ｉに
価の鎖式飽和炭化水素基、鎖式不飽和炭化水素基または
これらの炭化水素基の一部に１個または２個以」−のフ
ェニレン基を含む炭化水素基があげられる。The hydrophilic group of the monomolecular film in the present invention is the general formula (
X in I) is a hydroxyl group, a carboxyl group, a mercapto group, a thiocarboxyldithiocarboxyl group,
Examples include a sulfino group, a sulfo group, a carbamoyl 16-substituted amino group, and the monolayer-forming substance is an E-1 compound having one of these hydrophilic groups at both ends. Further, as R in the general formula (I), +, I is a valent chain saturated hydrocarbon group, a chain unsaturated hydrocarbon group, or a part of these hydrocarbon groups has one or more ``- phenylene. Examples include hydrocarbon groups containing groups.
これらの化合物は１種のみを用いてもよいし、もし必要
があれば２種Ｊス」−を混合して用いてもよい。These compounds may be used alone or, if necessary, two types may be used in combination.
本発明の方法によれば両末端の親水性基のうらの一方を
疎水′１イ１保護基で保護することにＪ、ってラングミ
コアーブロジェット法を用いて単分子膜を形成すること
ができる。Ｖなわら、一方の親水′１ノ［基を疎水゛１
基に変換しておけば通常用いられている両親媒１）１物
質と全く同等に扱うことができる。According to the method of the present invention, one of the backs of the hydrophilic groups at both ends is protected with a hydrophobic protecting group, and a monomolecular film is formed using the Langmicore-Blodgett method. Can be done. V, one hydrophilic '1 no [group is hydrophobic '1
If it is converted into a group, it can be treated exactly the same as the commonly used amphiphile 1).
そのために用いることのできる疎水ｆ／Ｉ保護基として
は、］ヘリメヂルシリル基、ジメチルイソプ［１ビルシ
リル阜、ジメチルタージャリーブプルシリル基のような
１へリアルキルシリル基、ジヒドロピラニル基等を含む
エーテル系保護基、同じくＴステル系保護基、トリフ［
１０酢酸アミド等のようなアミド系保護基など一般に有
機合成化学の分野で用いられるもののうら適切なものを
使えばよい。これらの疎水１）１保護基の選択にあたっ
ては式（Ｉ＞の化合物の一方の親水・１）１基のみが選
択的に保護されること、および親水性基材に単分子膜を
作製した後に、表面の疎水性保護基が脱保護されやずい
ことなどを考慮して選択される。また疎水・１ノ１保護
基の導入方法としては直接一方の親水↑ノ１基を疎水性
保護基に変換する方法であっても、あるいは両方の親水
１ノ［基を疎水性保護基に変換した後、一方の保護基の
みを脱保護する方法であってもよい。Hydrophobic f/I protecting groups that can be used for this purpose include helimethylsilyl group, dimethylisopropylsilyl group, heliarykylsilyl group such as dimethyltajaribupursilyl group, dihydropyranyl group, etc. Ether protecting groups, T stellate protecting groups, trif [
Appropriate ones may be used among those generally used in the field of organic synthetic chemistry, such as amide-based protecting groups such as 10-acetamide. When selecting these hydrophobic 1) 1 protecting groups, it is important to remember that only one hydrophilic group of the compound of formula (I) 1) is selectively protected, and that after forming a monomolecular film on the hydrophilic substrate, , are selected taking into consideration that the hydrophobic protecting group on the surface is likely to be deprotected. In addition, the method for introducing hydrophobic 1/1 protecting groups is to directly convert one hydrophilic ↑/1 group to a hydrophobic protecting group, or to convert both hydrophilic 1/1 groups to a hydrophobic protecting group. After that, only one of the protecting groups may be deprotected.
このようにして一方の親水１）Ｕ基を疎水性保護基で保
護した化合物を用い、水面上で単分子膜として配向させ
てラングミュアーブロジエツト法によって親水性ＭＩＮ
上に写し取る。水面上ではその保護基がはすれないよう
に、水中の各種イオン）層面、水の温度、水面上での展
開時間などの諸条件を適切に選択する必要がある。さら
に、水中には、水面の単分子膜の塩を生成するような金
属イオンが含まれていてもよい。In this way, using a compound in which one hydrophilic 1) U group is protected with a hydrophobic protecting group, it is oriented as a monomolecular film on the water surface, and the hydrophilic MIN is
Copy it on top. In order to prevent the protective group from being removed on the water surface, it is necessary to appropriately select various conditions such as the layer surface of various ions in water, the temperature of the water, and the development time on the water surface. Further, the water may contain metal ions that form a salt of a monomolecular film on the water surface.
ｊｑられる単分子膜は表面が疎水↑４保護基で保護され
ているので適当に調整した試薬溶液の中に浸すか、適当
な試薬蒸気に曝すなどの方法によって遊離の親水性基と
することかできる。Since the surface of the monomolecular film to be conjugated is protected with hydrophobic ↑4 protecting groups, it can be made into free hydrophilic groups by immersing it in an appropriately prepared reagent solution or by exposing it to an appropriate reagent vapor. can.
「作 用］
両末端に同一の親水性基を有する有機化合物を原料とし
、保護基とその脱保護条件を適切に選択することにより
、一方の親水↑１１基のみを保護した後、ラングミュア
ーブロジエツト法によって、親水１ノ１−基材上に、表
面に親水性基を持たせた単分子膜を作製することができ
る。本発明の方法によると片末端の親水性基を疎水性保
護基により疎水化しておくため、水面上で単分子膜とし
て容易に配向させることができ、また親水↑ノ［基材に
写し取った後に脱保護覆れば、表面に目的通りの親水性
基を設けることができる。``Effect'' Using an organic compound that has the same hydrophilic group at both ends as a raw material, by appropriately selecting the protecting group and its deprotection conditions, only the hydrophilic ↑11 groups on one side are protected, and then Langmuir block is applied. By the jet method, a monomolecular film having a hydrophilic group on the surface can be produced on a hydrophilic 1-1 base material.According to the method of the present invention, the hydrophilic group at one end is protected by hydrophobic protection. Because it is hydrophobicized by the group, it can be easily oriented as a monomolecular film on the water surface, and it can also be hydrophilic ↑ [If it is transferred to the substrate and then deprotected and covered, the desired hydrophilic group will be created on the surface. be able to.
「実施例」 次に本発明を実施例によって説明する。"Example" Next, the present invention will be explained by examples.
実施例
１．１６−シヒドロキシヘキザデカンの単分子膜の作製
を行った。１，１６−シヒドロキシヘキ４）−デカン（
４ｍｍｏｐ ）のテｌヘラヒドロフラン（２０ｍｆり溶
液に等量のジメチルイソプロピルシリルクロリドと等量
のトリエチルアミンを加え、３０分間５０’Ｃで加熱し
た。Ｏ′Ｃに冷却後、ヘキサジを３０ｄｌ加え、Ｏ′Ｃ
の水で水洗（３Ｘ３０ｄｌだ。硫酸マグネシウムで乾燥
後、減圧で溶媒を除去し、シリカゲルカラムで精製して
、１６−（ジメチルイソプロピルシリロキシ）ヘキサデ
カノールを得た。この−・、′７コ二
物質をクロロホルムに溶解して、蒸留水上に展開し、表
面圧を２５ｄｙｎ／ｃｍ”に保ちつつ、石英基板上に写
し取った。写し取ったままの基板表面の表面エネルギー
を液滴の接触角から計算すると、ｉ’ａｅｒｇ／ｃｍ２
であり、非常に疎水性が大きかった。Example 1. A monomolecular film of 16-cyhydroxyhexadecane was prepared. 1,16-cyhydroxyhexa-4)-decane (
Equivalent amounts of dimethylisopropylsilyl chloride and equivalent amounts of triethylamine were added to a solution of 4 mmop) of terahelahydrofuran (20 mf) and heated at 50'C for 30 minutes. After cooling to O'C, 30 dl of hexadiene was added, and O 'C
(3×30 dl). After drying over magnesium sulfate, the solvent was removed under reduced pressure and purified with a silica gel column to obtain 16-(dimethylisopropylsilyloxy)hexadecanol. The two substances were dissolved in chloroform, spread on distilled water, and transferred onto a quartz substrate while maintaining the surface pressure at 25 dyn/cm. The surface energy of the substrate surface as transferred was calculated from the contact angle of the droplet. Then, i'aerg/cm2
It was extremely hydrophobic.
続いてこの基板を酢酸−水（３： １ ）溶液に浸して
からよく水洗することにより基板上に１．１６−シヒド
ロキシヘキサデカンの単分子膜を得た。基板表面の表面
エネルギーは４９ｅｒ（１／Ｃｍ２と大きく、高い親水
性を示した。この単分子膜の高い親水性は、室温で１週
間放置しておいても全く変化しなかった。Subsequently, this substrate was immersed in an acetic acid-water (3:1) solution and thoroughly washed with water to obtain a monomolecular film of 1,16-cyhydroxyhexadecane on the substrate. The surface energy of the substrate surface was as large as 49er (1/Cm2), indicating high hydrophilicity. The high hydrophilicity of this monomolecular film did not change at all even after being left at room temperature for one week.
次にこの１，１６−シヒドロキシヘキサデカンが単分子
膜として配向、吸着した石英基板上で、この単分子膜表
面の親水性基（ここでは水酸基〉の反応性を利用した実
験を行なった。Next, on a quartz substrate on which this 1,16-cyhydroxyhexadecane was oriented and adsorbed as a monomolecular film, an experiment was conducted utilizing the reactivity of the hydrophilic groups (here, hydroxyl groups) on the surface of this monomolecular film.
分子量約３０００の重合体
０＝Ｃ＝Ｎ−ＣＦ２（Ｃ２Ｆ４０）、−（ＣＦ２０）、
−ＣＦ２−Ｎ＝Ｃ＝０（ｐ：ｑ＝１：１、各構造単位は
不規則である）をフレオンに溶解し、０．０８重量％の
溶液を作製した。この溶液を水酸基が表面に設けられて
いる前記石英基板上に２５００回ン分の回転速度で回転
塗布し、１００℃で焼成した後、フレオンで洗浄した。Polymer with a molecular weight of about 3000 0=C=N-CF2(C2F40), -(CF20),
-CF2-N=C=0 (p:q=1:1, each structural unit is irregular) was dissolved in Freon to prepare a 0.08% by weight solution. This solution was spin-coated onto the quartz substrate having hydroxyl groups on its surface at a rotation speed of 2,500 times, baked at 100° C., and then washed with Freon.
得られた基板の表面エネルギーを重合体と接触させる前
と比較したところ、接触前の４９から１５ｅｒｇ／ｃｍ
２に大幅に減少していることがわかった。When the surface energy of the obtained substrate was compared with that before contacting with the polymer, it was found to be 49 to 15 erg/cm before contact.
It was found that the number decreased significantly to 2.
もし水酸基とイソシアナート基が反応していなければ、
フレオンによる洗浄で重合体は単分子膜上からはずれて
しまうはずである。従って本発明の単分子膜上の親水性
基の反応性が有効にいかされ、単分子膜表面の水酸基は
重合体の末端のイソシアナート基と反応していることが
わかる。If the hydroxyl group and isocyanate group do not react,
Washing with Freon should remove the polymer from the monolayer. Therefore, it can be seen that the reactivity of the hydrophilic groups on the monomolecular film of the present invention is effectively utilized, and the hydroxyl groups on the surface of the monomolecular film react with the isocyanate groups at the terminals of the polymer.
［発明の効果］
以上説明したように本発明の方法によって１ｑられる単
分子膜は親水性基をその表面に有しているので、親水性
基の反応性あるいは親水性そのものを利用して種々の応
用が期待される。[Effects of the Invention] As explained above, the monomolecular film produced by the method of the present invention has hydrophilic groups on its surface, so it can be used in various ways by utilizing the reactivity of the hydrophilic groups or the hydrophilicity itself. Applications are expected.
Claims (1)
水素基を示す） で示される１種または２種以上の有機化合物の一方の親
水性基を疎水性保護基に変換して後、ラングミュアーブ
ロジエツト法を用いて親水性基板上に配向制御して吸着
させる事を特徴とする単分子膜の製造方法。(1) One of one or more organic compounds represented by the general formula: X-R-X (wherein, X is a hydrophilic group and R is a hydrocarbon group having 8 or more carbon atoms) 1. A method for producing a monomolecular film, which comprises converting a hydrophilic group into a hydrophobic protecting group, and then adsorbing the monolayer onto a hydrophilic substrate in a controlled orientation using the Langmuir-Blodget method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61108843A JPS62266165A (en) | 1986-05-12 | 1986-05-12 | Preparation of monomolecular film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61108843A JPS62266165A (en) | 1986-05-12 | 1986-05-12 | Preparation of monomolecular film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62266165A true JPS62266165A (en) | 1987-11-18 |
Family
ID=14494984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61108843A Pending JPS62266165A (en) | 1986-05-12 | 1986-05-12 | Preparation of monomolecular film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62266165A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005507319A (en) * | 2001-03-02 | 2005-03-17 | ウィリアム・マーシュ・ライス・ユニバーシティ | Voltage-assisted assembly of molecular devices |
-
1986
- 1986-05-12 JP JP61108843A patent/JPS62266165A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005507319A (en) * | 2001-03-02 | 2005-03-17 | ウィリアム・マーシュ・ライス・ユニバーシティ | Voltage-assisted assembly of molecular devices |
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