JPS622240U - - Google Patents

Info

Publication number
JPS622240U
JPS622240U JP9387485U JP9387485U JPS622240U JP S622240 U JPS622240 U JP S622240U JP 9387485 U JP9387485 U JP 9387485U JP 9387485 U JP9387485 U JP 9387485U JP S622240 U JPS622240 U JP S622240U
Authority
JP
Japan
Prior art keywords
electrode plates
plasma cvd
wafers
fixing
electrode plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9387485U
Other languages
English (en)
Other versions
JPH0513004Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985093874U priority Critical patent/JPH0513004Y2/ja
Publication of JPS622240U publication Critical patent/JPS622240U/ja
Application granted granted Critical
Publication of JPH0513004Y2 publication Critical patent/JPH0513004Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図ａは本考案にかかる電極板と支柱の平面
面、同図ｂはそのＢＢ′断面図、第２図はプラズ
マＣＶＤ装置の全体図、第３図はその電極板の結
線図、第４図ａは従来の電極板と支柱の平面面、
同図ｂはそのＡＡ′断面図である。 図において、１は反応容器、２は電極板、３は
ウエハー、７，７′は絶縁支柱、７１は絶縁支柱
の心棒、７２は絶縁支柱のガイド管、７３は絶縁
支柱のウエハー受け止めガイド管を示している。

Claims (1)

    【実用新案登録請求の範囲】
  1. 複数の電極板の両面にウエハーが配置されるプ
    ラズマＣＶＤ装置であつて、前記電極板にウエハ
    ーを固定する絶縁体ピンと、前記電極板の相互を
    固定する絶縁支柱とを共通にした構造を有するこ
    とを特徴とするプラズマＣＶＤ装置。
JP1985093874U 1985-06-20 1985-06-20 Expired - Lifetime JPH0513004Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985093874U JPH0513004Y2 (ja) 1985-06-20 1985-06-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985093874U JPH0513004Y2 (ja) 1985-06-20 1985-06-20

Publications (2)

Publication Number Publication Date
JPS622240U true JPS622240U (ja) 1987-01-08
JPH0513004Y2 JPH0513004Y2 (ja) 1993-04-06

Family

ID=30651941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985093874U Expired - Lifetime JPH0513004Y2 (ja) 1985-06-20 1985-06-20

Country Status (1)

Country Link
JP (1) JPH0513004Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014103318A1 (ja) * 2012-12-27 2014-07-03 株式会社神戸製鋼所 プラズマｃｖｄ法による保護膜の形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561526A (en) * 1979-06-15 1981-01-09 Matsushita Electric Ind Co Ltd Substrate holding jig for substrate treatment
JPS5898920A (ja) * 1981-12-08 1983-06-13 Mitsubishi Electric Corp プラズマ気相成長装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561526A (en) * 1979-06-15 1981-01-09 Matsushita Electric Ind Co Ltd Substrate holding jig for substrate treatment
JPS5898920A (ja) * 1981-12-08 1983-06-13 Mitsubishi Electric Corp プラズマ気相成長装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014103318A1 (ja) * 2012-12-27 2014-07-03 株式会社神戸製鋼所 プラズマｃｖｄ法による保護膜の形成方法
JP2014125670A (ja) * 2012-12-27 2014-07-07 Kobe Steel Ltd プラズマｃｖｄ法による保護膜の形成方法

Also Published As

Publication number Publication date
JPH0513004Y2 (ja) 1993-04-06

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