JPS58207651A - Electrostatic preventing type containing jig - Google Patents

Electrostatic preventing type containing jig

Info

Publication number
JPS58207651A
JPS58207651A JP8993182A JP8993182A JPS58207651A JP S58207651 A JPS58207651 A JP S58207651A JP 8993182 A JP8993182 A JP 8993182A JP 8993182 A JP8993182 A JP 8993182A JP S58207651 A JPS58207651 A JP S58207651A
Authority
JP
Japan
Prior art keywords
jig
containing jig
electrification
tetrafluoroethylene
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8993182A
Other languages
Japanese (ja)
Other versions
JPH048945B2 (en
Inventor
Masashi Yamamoto
山本　正志
Kunihiro Sakai
酒井　邦弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Toyo Fiber Co Ltd
Original Assignee
Hitachi Ltd
Toyo Fiber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Toyo Fiber Co Ltd filed Critical Hitachi Ltd
Priority to JP8993182A priority Critical patent/JPS58207651A/en
Publication of JPS58207651A publication Critical patent/JPS58207651A/en
Publication of JPH048945B2 publication Critical patent/JPH048945B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H01L21/6733—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls characterized by a material, a roughness, a coating or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Workshop Equipment, Work Benches, Supports, Or Storage Means (AREA)

Abstract

PURPOSE:To contrive not to generate the electrification between matters to be contained and a containing jig by a method wherein the surface is composed of a composite material which turns conductive and acid-resistant by containing a conductor such as carbon fiber or carbon black into the copolymer of perfluoroalkylvinylether and tetrafluoroethylene. CONSTITUTION:The containing jig 1 is formed of the composite material wherein carbon fiber is mixed with the copolymer of perfluoroalkylvinylehter and tetrafluoroethylene, and has acid resistance and conductivity. The containing jig 1 is constituted of a case type frame structure, and provided with a plurality of containing grooves 2 on opposed inside walls by being corresponding thereto. Thus, it is so formed that containing is performed by inserting the edge of a piece of wafer 3 into a pair of containing grooves 2 which are opposed. Besides, windows 5 are provided on side walls 4, so that cleaning liquid, etc. easily flow into the containing jig 1. By such a containing jig, even when electrification occurs in spin-drying, the electricity is removed in an extremely short time after electrification because the containing jig is conductive.

Description

【発明の詳細な説明】 本発明は静電防止型収容治具に関する。[Detailed description of the invention] The present invention relates to an antistatic housing jig.

半導体装置の製造に用いる半導体薄板（ウニ・・）はそ
の取り扱いの便のために、洗浄治具、エツチング治具、
保管治具等の収容治具に収容されて取り扱われる。ウェ
ハのエツチング、洗浄、乾燥の一連の作業においては、
耐薬品性の四ふり化エチレン樹脂あるいはポリグロビレ
ン樹脂等の樹脂収容治具が一般に用いられている。Semiconductor thin plates (sea urchins...) used in the manufacture of semiconductor devices are processed using cleaning jigs, etching jigs, etc. for ease of handling.
It is handled by being stored in a storage jig such as a storage jig. During the series of wafer etching, cleaning, and drying operations,
A resin storage jig made of chemical-resistant tetrafluorinated ethylene resin or polyglobylene resin is generally used.

ところで、洗浄後の乾燥作業では、収容治具全体をたと
えば１２００　ｒ、ｐ、ｍ、で高速回転させて収容治具
内のウニ・・の乾燥を図っている。By the way, in the drying work after cleaning, the entire storage jig is rotated at a high speed of, for example, 1200 r, p, m, in order to dry the sea urchins in the storage jig.

しかし、樹脂収容治具およびウニ／１は絶縁体であるこ
とから、高速回転時の空気との摩擦で静電気が帯電する
。このため、周囲の浮遊異物などが引き付けられ、つｚ
’・の表面に付着し、クエ・・に整列配置形成された磁
気回路素子の不良原因となる。たとえば、５μｍ幅配線
の５１ペレツトのＬＳＩの外観不良率のうちの約７０％
が静電気に起因する不良となる。However, since the resin storage jig and the sea urchin/1 are insulators, they are charged with static electricity due to friction with the air during high speed rotation. For this reason, floating foreign objects etc. in the surrounding area are attracted and
It adheres to the surface of the squares and causes defects in the magnetic circuit elements arranged and arranged on the squares. For example, approximately 70% of the appearance defect rate of an LSI with 51 pellets of 5 μm wide wiring
is a defect caused by static electricity.

したがって、本発明の目的は被収容物および収容治具が
帯電しない構造の収容治具を提供することにある。Therefore, an object of the present invention is to provide a storage jig having a structure in which the stored object and the storage jig are not charged with electricity.

このような目的を達成するために本発明は、被収容物を
収容する収容治具であって、前記収容治具は少なくとも
その表面は、ｐＦＡ（−＜−フルオロアルキルビニール
エーテルとテトラフルオロエチレンの共重合体）に、カ
ーボン繊維またはカーボンブランク等の導電体を含有さ
せて導電性でかつ耐酸性となった複合材料によって構成
されてなるものであって、以下実施例により本発明を説
明する。In order to achieve such an object, the present invention provides a housing jig for housing an object, wherein at least the surface of the housing jig is made of pFA (-<- fluoroalkyl vinyl ether and tetrafluoroethylene). The present invention will be described below with reference to Examples.

図面は本発明の一実施例による収容治具を示す斜視図で
ある。この収容治具１はパーフルオロアルキルビニール
エーテルとテトラフルオロエチレンの共重合体（ＰＦＡ
）にカーボン繊維を混合させた複合材料によって形作ら
れ、耐酸性と導電性を有している。収容治具１は箱型枠
構造からなるとともに、対面する内側壁には対応して複
数の収容溝２が投げられている。そして、対面する１対
の収容溝２に１枚のウェハ３の周縁を挿入して収容がな
されるようになっている。また、側壁４には窓５が設け
られ、収容治具１内に洗浄液等が流入し易いようになっ
ている。The drawing is a perspective view showing a housing jig according to an embodiment of the present invention. This storage jig 1 is a copolymer of perfluoroalkyl vinyl ether and tetrafluoroethylene (PFA).
) is made of a composite material mixed with carbon fiber, and has acid resistance and conductivity. The storage jig 1 has a box-shaped frame structure, and a plurality of storage grooves 2 are formed in corresponding inner walls thereof. Then, the periphery of one wafer 3 is inserted into a pair of facing accommodation grooves 2 to be accommodated. Further, a window 5 is provided in the side wall 4 so that cleaning liquid and the like can easily flow into the housing jig 1.

このような収容治具では、回転乾燥時に帯電しても、収
容治具が導電性となっていることから、帯電後極めて短
時間内に除電される。たとえば、４ＫＶのコロナ放電を
３０秒行なった後（回転１０００〜１５０ｇ　ｒｐｍ　
）の帯電後の減衰率測定によれば、従来の四ふっ化エチ
レン樹脂収容治具の場合は、６０Ｖ程度の帯電量が１時
間経過後でも変化しないのに対して、本実施例収容治具
では６０Ｖ程度の帯電ハ、が１０秒後には１６〜２４Ｖ
と約１／３となり、１２０秒後には５ｖとなり、その後
完全に除電された。In such a storage jig, even if it is charged during rotational drying, since the storage jig is conductive, the static electricity is removed within a very short time after being charged. For example, after performing 4KV corona discharge for 30 seconds (rotation 1000-150g rpm
According to the measurement of the attenuation rate after charging in ), in the case of the conventional tetrafluoroethylene resin storage jig, the amount of charge of about 60 V did not change even after one hour had passed, whereas in the case of the present example storage jig Then, the charging voltage is about 60V, but after 10 seconds it becomes 16-24V.
The voltage was reduced to about 1/3, and after 120 seconds, it became 5V, and then the static electricity was completely eliminated.

このような実施例によれば、回転乾燥時の帯電も数十秒
後には除電されるため、つＬハへの浮遊異物の付着は起
きにくくなり、静電気に起因する不良の発生を低減でき
るようになる。According to such an embodiment, since the static charge during rotary drying is removed after several tens of seconds, it becomes difficult for floating foreign matter to adhere to the tube, and the occurrence of defects due to static electricity can be reduced. become.

なお、本発明は前記実施例に限定されない。たとえば、
カーボン繊維に代えてカーボンブラック等の導′札体を
混合してもよい。また、収容治具を形作る母材はＰＦＡ
以外のものでもよい。さらに、収容治具はその表面のみ
を導電性としてもよい。Note that the present invention is not limited to the above embodiments. for example,
A conductive material such as carbon black may be mixed instead of carbon fiber. In addition, the base material that forms the accommodation jig is PFA.
It may be something other than that. Furthermore, only the surface of the housing jig may be made conductive.

以上のように、本発明によれば、回転乾燥時に帯電して
もその後短時間に除電が成される治具構造となっている
こ芋から、被収容物に浮遊異物が付着し雛くなるため、
半導体装置の製造におけるつ１ハの収容治具として用い
れば、静電気に起因する不良の発生を抑止することがで
きるので歩留の向上を図ることができる。As described above, according to the present invention, floating foreign matter attaches to the stored object and becomes chicks from the sweet potato, which has a jig structure that eliminates the charge in a short time even if it is charged during rotary drying. For,
If used as a first housing jig in the manufacture of semiconductor devices, it is possible to prevent defects caused by static electricity, thereby improving yield.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の一実施例によるつ１ハ収容治具の斜視図
である。 ｌ・・・収容治具、２・・・収容溝、３・・・ウェハ、
４・・・側壁、５・・・窓。 １：面The drawing is a perspective view of a one-piece housing jig according to an embodiment of the present invention. l...accommodating jig, 2...accommodating groove, 3...wafer,
4...Side wall, 5...Window. 1: Face

Claims (1)

【特許請求の範囲】[Claims] ■、被収容物を収容する収容治具であって、前記収容治
具は少なくともその表面をＰＦＡ（パーフルオロアルキ
ルビニールエーテルとテトラフルオロエチレンの共重合
体）にカーボン繊維またはカーボンブランク等の導電体
を含有させて導電性でかつ耐酸性となった複合材料によ
って構成していることを特徴とする静電防止型収容治具
。(2) A housing jig for housing an object, wherein at least the surface of the housing jig is made of PFA (a copolymer of perfluoroalkyl vinyl ether and tetrafluoroethylene) and a conductive material such as carbon fiber or carbon blank. An antistatic storage jig characterized in that it is made of a composite material that is conductive and acid-resistant by containing.
JP8993182A 1982-05-28 1982-05-28 Electrostatic preventing type containing jig Granted JPS58207651A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8993182A JPS58207651A (en) 1982-05-28 1982-05-28 Electrostatic preventing type containing jig

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8993182A JPS58207651A (en) 1982-05-28 1982-05-28 Electrostatic preventing type containing jig

Publications (2)

Publication Number Publication Date
JPS58207651A true JPS58207651A (en) 1983-12-03
JPH048945B2 JPH048945B2 (en) 1992-02-18

Family

ID=13984436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8993182A Granted JPS58207651A (en) 1982-05-28 1982-05-28 Electrostatic preventing type containing jig

Country Status (1)

Country Link
JP (1) JPS58207651A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063941U (en) * 1983-10-07 1985-05-07 信越化学工業株式会社 Wafer handling jigs for electronic materials
JPS60147121A (en) * 1984-01-12 1985-08-03 Mitsui Toatsu Chem Inc Container for wafer processing
JPS6112099A (en) * 1984-06-26 1986-01-20 倉敷紡績株式会社 Jig for producing semiconductor
JPS6137842A (en) * 1984-07-30 1986-02-22 Daikin Ind Ltd Antistatic polymeric material
JPS6456866U (en) * 1987-09-30 1989-04-10
JPH0260954A (en) * 1988-08-29 1990-03-01 Daikin Ind Ltd Antistatic polymeric material
JPH02201926A (en) * 1989-01-31 1990-08-10 Fujitsu Ltd Holder for and method of wet cleaning
JPH0312949A (en) * 1989-06-12 1991-01-21 Fujitsu Ltd Wafer carrier holding device
JPH0380535A (en) * 1989-08-23 1991-04-05 Fujitsu Ltd Washing holder
WO2003049157A1 (en) * 2001-12-03 2003-06-12 E. I. Du Pont De Nemours And Company Transfer member with electric conductivity and its manufacturing method
US7699067B2 (en) * 2005-12-02 2010-04-20 Hon Hai Precision Industry Co., Ltd. Clamping apparatus for washing optical members
JP2019220528A (en) * 2018-06-18 2019-12-26 株式会社Ｓｃｒｅｅｎホールディングス Chuck member and substrate processing apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108880A (en) * 1974-02-01 1975-08-27
JPS53114670A (en) * 1977-03-17 1978-10-06 Toshiba Ceramics Co Jig for diffusion furnace

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108880A (en) * 1974-02-01 1975-08-27
JPS53114670A (en) * 1977-03-17 1978-10-06 Toshiba Ceramics Co Jig for diffusion furnace

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063941U (en) * 1983-10-07 1985-05-07 信越化学工業株式会社 Wafer handling jigs for electronic materials
JPS60147121A (en) * 1984-01-12 1985-08-03 Mitsui Toatsu Chem Inc Container for wafer processing
JPS6112099A (en) * 1984-06-26 1986-01-20 倉敷紡績株式会社 Jig for producing semiconductor
JPS6137842A (en) * 1984-07-30 1986-02-22 Daikin Ind Ltd Antistatic polymeric material
JPH0416501B2 (en) * 1984-07-30 1992-03-24 Daikin Ind Ltd
JPS6456866U (en) * 1987-09-30 1989-04-10
US5106539A (en) * 1988-08-29 1992-04-21 Daikin Industries, Ltd. Non-electrification polymeric composite material
JPH0260954A (en) * 1988-08-29 1990-03-01 Daikin Ind Ltd Antistatic polymeric material
JPH02201926A (en) * 1989-01-31 1990-08-10 Fujitsu Ltd Holder for and method of wet cleaning
JPH0312949A (en) * 1989-06-12 1991-01-21 Fujitsu Ltd Wafer carrier holding device
JPH0380535A (en) * 1989-08-23 1991-04-05 Fujitsu Ltd Washing holder
WO2003049157A1 (en) * 2001-12-03 2003-06-12 E. I. Du Pont De Nemours And Company Transfer member with electric conductivity and its manufacturing method
CN1332419C (en) * 2001-12-03 2007-08-15 纳幕尔杜邦公司 Transfer member with electric conductivity and its manufacturing method
US7699067B2 (en) * 2005-12-02 2010-04-20 Hon Hai Precision Industry Co., Ltd. Clamping apparatus for washing optical members
JP2019220528A (en) * 2018-06-18 2019-12-26 株式会社Ｓｃｒｅｅｎホールディングス Chuck member and substrate processing apparatus
WO2019244520A1 (en) * 2018-06-18 2019-12-26 株式会社Ｓｃｒｅｅｎホールディングス Chuck member and substrate treatment device

Also Published As

Publication number Publication date
JPH048945B2 (en) 1992-02-18

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