JPS58171264A - Electroconductive polishing member - Google Patents
Electroconductive polishing memberInfo
- Publication number
- JPS58171264A JPS58171264A JP57051952A JP5195282A JPS58171264A JP S58171264 A JPS58171264 A JP S58171264A JP 57051952 A JP57051952 A JP 57051952A JP 5195282 A JP5195282 A JP 5195282A JP S58171264 A JPS58171264 A JP S58171264A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- parts
- binder
- sheet
- carbon powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
- B24D3/342—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
- B24D3/344—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent the bonding agent being organic
Abstract
Description
【発明の詳細な説明】
この発明は磁気ヘッドなどの精密仕上げの用に供される
導電性研磨用部材に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a conductive polishing member used for precision finishing of magnetic heads and the like.
電気、電子産業のめざましい発展の中で精密化がさけば
れ、そこで用いられる超精密部品の仕」二け、ラッピン
グ、面出し、傷取り、クリーニング作業が必要となり、
研磨が行なわれている。超精密研磨材料としてシリコン
ウェハ、磁気ヘット。Amid the remarkable development of the electrical and electronic industries, precision has been sought, and the ultra-precision parts used therein require finishing, wrapping, surfacing, scratch removal, and cleaning.
Polishing is being done. Silicon wafers and magnetic heads are used as ultra-precision polishing materials.
レンズ、精密モータ部品などあげられるが、これらの研
磨においては、一つの小さな傷も許されない。たとえば
、オーディオやビデオで用いられている磁気ヘッドの傷
は音や画面を荒す原因となる。These include lenses and precision motor parts, but when polishing these parts, even the slightest scratch cannot be tolerated. For example, scratches on magnetic heads used in audio and video devices can cause roughness in the sound and screen.
このような磁気ヘッドは、従来オーディオ関連商品を中
心に著しく発展Ｉ７て来たが、最近ではビデオテレビあ
るいはコンピュータ関連に使用されるに至り、高い品質
が要求される様になってきた。Such magnetic heads have been developed significantly in the past mainly in audio-related products, but recently they have come to be used in video televisions and computer-related products, and high quality is now required.
特にヘッド部の表面精度は、これら関連商品の生命を左
右するだけに、ヘッドの仕１−げ工程では細心の注意が
払われている。高い記録密度の要求されるビデオテレビ
の場合、磁気ヘッド部の仕上げ状態が悪いと、録画■及
び出生量にむらが生じ均一な良質の画像を得る事ができ
なくなる。また誤動装作の許されないコンピュータの場
合も同様で光学鏡面性」二けされた信頼性のある磁気ヘ
ッドが要求される。Particular attention is paid to the surface accuracy of the head portion in the finishing process of the head, as it affects the life of these related products. In the case of video televisions that require high recording density, if the finish of the magnetic head is poor, the recording volume and amount of recording will be uneven, making it impossible to obtain uniform, high-quality images. Similarly, in the case of a computer where malfunction is not allowed, a reliable magnetic head with optical specularity is required.
磁気ヘッドの研磨工程は、大きく２つの段階にわかれる
。第１段階は荒削りで、金型あるいは加工等成型時のパ
リ取り、あるいは面出し工程である。次の第２段階は、
イ」」二げ研磨で、用途に応じた精度、形状に仕」−げ
るもので、多くは０．１μ以下の表面精度にまたコンピ
ュータ、ビデオテレビ等用に高級な磁気ヘッドでは０．
０５μ以下の光学鏡面に仕上げられる。第１段階では、
精度的要求が低い為、場合によっては砥石が用いられる
事があるが、第２段階では、仕上げの面精度及び仕上げ
形状から、信頼性の高い柔軟性のあるポリエステル基材
の研磨用シート、つまりポリエステル基村上に砥粒をバ
インダで結着固定した研摩層を設けてなるものが用いら
れる事が多い。The magnetic head polishing process can be roughly divided into two stages. The first stage is rough cutting, which is the process of removing burrs during molding or machining, or leveling the surface. The second step is
By double polishing, the precision and shape can be achieved according to the application, and the surface precision is often 0.1μ or less, and high-grade magnetic heads for computers, video televisions, etc. have a surface precision of 0.1μ or less.
Finished with an optical mirror surface of 0.05μ or less. In the first stage,
In some cases, a grindstone is used due to low accuracy requirements, but in the second stage, a highly reliable and flexible polyester-based polishing sheet, i.e. Often used is a polyester base coated with an abrasive layer in which abrasive grains are bound and fixed with a binder.
従来、研磨時における最大の課題は、いかにして傷のな
い均一な光学鏡面を得るかであった。研磨によるムラや
島の発生は研磨用シートに用いられる砥粒の粒径分布状
態と研磨用シートへのゴミの混入による事が多い。前者
は砥粒の精製のレベルを向−トさせる事で容易に対処す
る事ができる。Conventionally, the biggest challenge during polishing has been how to obtain a uniform optical mirror surface without scratches. The occurrence of unevenness and islands due to polishing is often caused by the particle size distribution of the abrasive grains used in the polishing sheet and the mixing of dust into the polishing sheet. The former can be easily dealt with by increasing the level of refinement of the abrasive grains.
しかしながら、後者の場合、研磨環境のクリーンレベル
を高くする事によって、あるいは研磨部分に吸引機を設
置する事によって等種々の物理的手法による無ジン化の
検討がなされているが、研磨作業そのものが研磨クズを
発生させる工程である事から本質的にゴミを無くす事は
難しく、−刃研磨用シートへのゴミの付着は研磨用シー
トの剥離帯電あるいは摩擦帯電等静電気による帯電が原
因となっているため、現状の研磨用シートを用いて、ゴ
ミの付着を防止したり、一度付着したゴミを物理的手法
を用いて除去する事は姉、シい。However, in the latter case, various physical methods such as increasing the cleanliness level of the polishing environment or installing suction machines in the polishing area have been considered, but the polishing process itself is Since it is a process that generates polishing debris, it is essentially difficult to eliminate dust, and the adhesion of dust to the blade polishing sheet is caused by electrostatic charging such as peeling of the polishing sheet or frictional charging. Therefore, it is impossible to prevent dust from adhering to the surface using current polishing sheets or to remove dust once it has adhered using physical methods.
今日まで、精密研磨用部祠に関する検討は、主に研磨砥
粒の粒径分布と砥粒の形状に関する研削能力を中心にし
たものであった。しかしながら、精密研磨用シートにお
いて重要な事は、傷の無い研磨面を与える事である。に
もかかわらず、この種の報告はほとんどなされていない
。To date, studies regarding precision polishing parts have mainly focused on the grinding ability with respect to the grain size distribution and shape of the abrasive grains. However, what is important in precision polishing sheets is to provide a scratch-free polished surface. However, very few reports of this type have been made.
この発明者らは、」１記の事情に鑑み鋭意検討した結果
、従来の精密研磨用のシートと同程度の研削能力を与え
、しかもゴミ１異物の付着が防がれて研磨ムラや傷の発
生がみられない研磨面を与えることができる新規かつ有
用な導電性研磨用部材゛。As a result of intensive study in view of the circumstances described in item 1, the inventors of the present invention have found that it provides a grinding ability comparable to that of conventional precision polishing sheets, and also prevents the adhesion of dust and foreign matter, thereby reducing polishing unevenness and scratches. A novel and useful conductive polishing member capable of providing a polished surface free from generation.
を見い出し、この発明を完成するに至ったものである。This discovery led to the completion of this invention.
すなわち、この発明は、砥粒をバインダで結着固定した
研磨層をベース上に設けてなるシート。That is, the present invention provides a sheet in which a polishing layer in which abrasive grains are bound and fixed with a binder is provided on a base.
テープなどの研磨用部材において、上記の研磨層中に平
均粒径２０〜５０７１Ｌμのカーボン粉末を上記バイン
ダ１００重量部に対して１〜２０重量部の割合で含有さ
せたことを特徴とする導電性研磨用部材に係るものであ
る。A polishing member such as a tape, characterized in that the polishing layer contains carbon powder with an average particle size of 20 to 5071 Lμ at a ratio of 1 to 20 parts by weight based on 100 parts by weight of the binder. This relates to a polishing member.
図面は、この発明の導電性研磨用シートの一例を示した
ものであり、ベース１上に砥粒２がノ〈インダ３によっ
て結着固定された研磨層４が設けられており、この研磨
層４中にはカーボン粉末５が均一に分散結着されている
。The drawing shows an example of the conductive polishing sheet of the present invention, in which a polishing layer 4 in which abrasive grains 2 are bonded and fixed by an inder 3 is provided on a base 1. Carbon powder 5 is uniformly dispersed and bound in 4.
ベース１としてはポリエチレンテレフタレートフィルム
の如きポリエステルフィルムが好適に用いられ、その厚
さは用途目的に応じて適宜選択される。砥粒２としては
、酸化アルミニウム粉、シリコンカーバイド粉、酸化ク
ロム粉、酸化鉄粉。A polyester film such as a polyethylene terephthalate film is preferably used as the base 1, and its thickness is appropriately selected depending on the purpose of use. The abrasive grains 2 are aluminum oxide powder, silicon carbide powder, chromium oxide powder, and iron oxide powder.
ダイヤモンド粉などが用いられ、表面の仕上げ精度に応
じてその粒径が選択されるが、一般には平均粒径が０．
３〜３０μ程度のものが用いられる。Diamond powder or the like is used, and its particle size is selected depending on the surface finish accuracy, but generally the average particle size is 0.
A material having a diameter of about 3 to 30 μm is used.
バインダ３としては、尿素−ホルムアルデヒド樹脂、フ
ェノール−ホルムアルデヒド樹脂、ウレタン樹脂やポリ
エステル樹脂の如き耐熱性でかつ耐摩耗性にすぐれる樹
脂が好ましく用いられる。研磨層４の厚みとしては、一
般に５〜４０μ程度である。As the binder 3, resins that are heat resistant and have excellent abrasion resistance, such as urea-formaldehyde resin, phenol-formaldehyde resin, urethane resin, and polyester resin, are preferably used. The thickness of the polishing layer 4 is generally about 5 to 40 microns.
カーボン粉末５は、この発明の研磨用シートの要部をな
すものであり、その平均粒径が２０〜５０ｍμの範囲に
あるものが用いられ、研磨層４中の含有量としては、バ
インダ１００重量部に対して１〜２０重量部、好適には
５〜１５重量部の範囲に設定されている。The carbon powder 5 is a main part of the polishing sheet of the present invention, and has an average particle size in the range of 20 to 50 mμ, and the content in the polishing layer 4 is 100% by weight of the binder. 1 to 20 parts by weight, preferably 5 to 15 parts by weight.
このように、この発明の研磨用シートは、研磨層４中に
カーボン粉末５を含まぜるようにしたから、この粉末５
によって上記研磨層４に良好な導電性を付与でき、これ
によって帯電によるゴミ。As described above, since the polishing sheet of the present invention includes the carbon powder 5 in the polishing layer 4, this powder 5
This makes it possible to impart good electrical conductivity to the polishing layer 4, thereby eliminating dust caused by charging.
異物の付着が抑止されるため、研磨面への研磨ムラや傷
の発生が減少する。しかも、」１記カーボン粉末５は、
金属粉末などに較べてすぐれた導電機能を有しているた
め、バインダに対する含有量を前記少量にしても充分な
る帯電防止機能を発揮させることかでき、このため研磨
層４本来の機能、つまり研磨能力になんら悪影響をおよ
ぼさず、また砥粒２のバインダ３に対する結着固定性を
阻害するおそれもない。Since the adhesion of foreign matter is suppressed, uneven polishing and occurrence of scratches on the polished surface are reduced. Moreover, the carbon powder 5 described in 1.
Since it has a superior conductive function compared to metal powder, etc., it is possible to exhibit sufficient antistatic function even if the content of the binder is reduced to the above-mentioned small amount. There is no adverse effect on the performance, and there is no fear that the binding and fixing properties of the abrasive grains 2 to the binder 3 will be impaired.
これに対して、たとえば上述の金属粉末では、バインダ
１００重」部に対して２０重量部以上、好ましくは３０
重量部以上含有させなければ、ゴミなどの付着を防止す
るに充分な帯電防止効果が得られず、かかる多量配合で
は、砥粒の配合比率がそれだけ低下して研磨能力を損な
い、しかもバインダに対する砥粒の結着固定性が悪くな
って研磨時に脱落しやすくなる。On the other hand, for example, with the above-mentioned metal powder, 20 parts by weight or more, preferably 30 parts by weight or more, per 100 parts by weight of the binder.
If the content is not more than 1 part by weight, sufficient antistatic effect to prevent the adhesion of dust etc. cannot be obtained.If such a large amount is added, the blending ratio of abrasive grains decreases accordingly, impairing the polishing ability, and the abrasiveness of the binder The binding and fixation of the grains deteriorates, making them more likely to fall off during polishing.
−１−記カーボン粉末５の粒径は、これが小さいほど導
電機能上望ましいものであるが、あまり小さくなりすき
ると、研磨層４の柔軟性、ベースｌに対する接着性およ
び砥粒２の結着性などに悪い影響をおよぼすおそれがあ
る。また粒径が大きくなると、導電機能の低下とともに
、研磨層４の柔軟性なども低トしやすい。カーボン粉末
５の平均粒径を、前記２０〜５０ｍμの範囲に設定した
のは、」１記理由に基づくものであり、この範囲に設定
することによって研磨層本来の機能などをなんら損なう
ことなく良好な導電性を付与することができる。-1- The smaller the particle size of the carbon powder 5, the more desirable it is from the viewpoint of electrical conductivity. However, if it becomes too small, the flexibility of the polishing layer 4, the adhesion to the base l, and the binding property of the abrasive grains 2 will be reduced. There is a risk that it may have a negative impact on the In addition, when the particle size becomes large, the conductive function and the flexibility of the polishing layer 4 tend to decrease. The reason why the average particle size of the carbon powder 5 is set in the range of 20 to 50 mμ is based on the reason stated in 1. By setting it in this range, it is possible to improve the polishing layer without impairing the original function of the polishing layer. It is possible to impart good conductivity.
なお、前記の金属粉末などではかかる粒子径のものを得
難く、一般にその粒径が大となるため、これが研磨層の
特性を損なう原因ともなり、また研磨面に表面傷を与え
る直接の原因ともなる。It should be noted that it is difficult to obtain such a particle size with the metal powders mentioned above, and the particle size is generally large, which can cause damage to the characteristics of the polishing layer and is also a direct cause of surface scratches on the polished surface. Become.
以上詳述したとおり、この発明によれば、研磨層に特定
のカーボン粉末を特定酸含有させるという簡単な構成に
よって、従来得ることができなかった磁気ヘッドなどの
精密仕」−げ用としてきわめて有用な導電性研磨用部材
を提供することができる。As detailed above, the present invention has a simple structure in which the polishing layer contains specific carbon powder and a specific acid, making it extremely useful for precision finishing of magnetic heads, etc., which could not be obtained conventionally. A conductive polishing member can be provided.
つぎに、この発明の実施例につき説明する。以下におい
て、部とあるは重計部を意味するものとする。Next, embodiments of this invention will be described. In the following, the term "part" refers to the weight section.
実施例１
２５μ厚のポリエステルベースフィルム」二に、モ均粒
径５μの酸化アルミニウム粉３００部とポリエステル系
ウレタン樹脂８０部と脂肪族イソシアネート化合物２０
部との混合物にさらにファーネスブラック（平均粒径２
０〜３５ｒｒＬμ）５部を添加したものを塗布し、１５
０℃で２分間加熱乾燥して、全厚４０μの導電性研磨用
シートを得た。Example 1: 25μ thick polyester base film. Second, 300 parts of aluminum oxide powder with an average particle size of 5μ, 80 parts of polyester urethane resin, and 20 parts of aliphatic isocyanate compound.
Furnace black (average particle size: 2
Apply 5 parts of 0-35rrLμ),
It was dried by heating at 0° C. for 2 minutes to obtain a conductive polishing sheet having a total thickness of 40 μm.
実施例２
３８μ厚のポリエステルベースフィルム上に、平均粒径
５μのシリコンカーバイド粉２５０部とポリエステル系
ウレタン樹脂８０部と芳香族イソシアネート２０部との
混合物にさらにファーネスブラック（平均粒径２０〜４
０ｍμ）１５部を添加したものを塗布し、１５０℃で２
分間加熱乾燥して、全厚５３μの導電性研磨用シートを
得た。Example 2 A mixture of 250 parts of silicon carbide powder with an average particle size of 5 μm, 80 parts of a polyester urethane resin, and 20 parts of aromatic isocyanate was added to a 38 μm thick polyester base film, and furnace black (average particle size of 20 to 4 μm) was added to the mixture.
0mμ) added to 15 parts and heated at 150°C for 2
The conductive polishing sheet was dried by heating for a minute to obtain a conductive polishing sheet having a total thickness of 53 μm.
実施例３
７５μ厚のポリエステルベースフィルム上に、平均粒径
５μのシリコンカーバイド粉３００部とポリエステル樹
脂１００部との混合物にさらにファーネスブラック（平
均粒径３０〜４５ｍμ）３０部を添加したものを塗布し
、１００℃で２分間加熱乾燥して、全厚９０μの導電性
研磨用シートを得た。Example 3 A mixture of 300 parts of silicon carbide powder with an average particle size of 5 μm and 100 parts of polyester resin to which 30 parts of furnace black (average particle size of 30 to 45 μm) was added was coated on a 75 μm thick polyester base film. Then, it was heated and dried at 100° C. for 2 minutes to obtain a conductive polishing sheet having a total thickness of 90 μm.
参考例
２５μ厚のポリエステルベースフィルム上に、実施例１
と同様の酸化アルミニウム粉３００部とポリエステル系
ウレタン樹脂８０部と脂肪族イソシアネート化合物２０
部との混合物を塗布し、１５０℃で２分間加熱乾燥して
、全厚４０μの研磨用シートを得た。Reference Example 2 Example 1 was applied on a 5μ thick polyester base film.
300 parts of the same aluminum oxide powder, 80 parts of polyester urethane resin, and 20 parts of aliphatic isocyanate compound.
A polishing sheet having a total thickness of 40 μm was obtained by applying a mixture of the above-mentioned parts and drying it by heating at 150° C. for 2 minutes.
上記の実施例１〜３および参考例の各研磨用シートにつ
き、電気抵抗を測定し、また剥離帯電によるゴミ（ここ
では１００メツシユの鉄粉）の付着率を調べた。さらに
その後ステンレス板の研磨を行なって、研磨層の発生程
度および研磨能力を調べた。これらの結果は、つぎの表
に示されると（注） ■）シート面に全く付着しないを
優、シート面に３０％以下の付着を良、
シート面に３０％以−Ｌの付着を不良
と判定した。The electrical resistance of each polishing sheet of Examples 1 to 3 and Reference Example was measured, and the adhesion rate of dust (here, 100 meshes of iron powder) due to peeling and charging was examined. Furthermore, the stainless steel plate was polished after that, and the degree of formation of a polishing layer and the polishing ability were examined. These results are shown in the table below: (Note) ■) No adhesion at all to the sheet surface is considered excellent, 30% or less adhesion to the sheet surface is good, and 30% or more adhesion to the sheet surface is poor. I judged it.
２）全くなしを優、１〜２本すしが入 るを良、多数すじが入るを不良 と判定した。2) No sushi is good, 1-2 pieces of sushi is included. Good if there are many streaks, bad if there are many streaks. It was determined that
３）研磨量が多いを優、かなり研磨さ れているを良、はとんど研磨され ないを不良 と判定した。3) A large amount of polishing is excellent, and it is quite polished. In good condition, has been polished Not a defective It was determined that
上表から明らかなように、この発明の導電性研磨用シー
トによれば、研磨層の発生を防止できる一方充分な研磨
能力を発揮でき、磁気ヘッドなどの精密部品の研磨用と
してきわめて好適であることがわかる。As is clear from the table above, the conductive polishing sheet of the present invention can prevent the formation of a polishing layer while exhibiting sufficient polishing ability, making it extremely suitable for polishing precision parts such as magnetic heads. I understand that.
図面はこの発明の導電性研磨用部材の一例を示す断面図
である。
１・・・ベース、２・・・砥粒、３・・・バインダ、４
・・・研磨層、５・・・カーボン粉末。The drawing is a sectional view showing an example of the conductive polishing member of the present invention. 1... Base, 2... Abrasive grain, 3... Binder, 4
... Polishing layer, 5... Carbon powder.
Claims (1)
二に設けてなるシート、テープなどの研磨用部材におい
て１１．に記の研磨層中に平均粒径２０〜５０ｍ、μの
カーボン粉末を」−記バインダ１００重量部に対して１
〜２０重量部の割合で含有させたことを特徴とする導電
性研磨用部材。(1) Based on a polishing layer in which abrasive grains are bound and fixed with a binder.
11. In the polishing member such as a sheet or tape provided in 2. Carbon powder with an average particle diameter of 20 to 50 m and μ is added to the polishing layer as described in 1.
An electrically conductive polishing member, characterized in that the conductive polishing member contains 20 parts by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57051952A JP2501781B2 (en) | 1982-03-30 | 1982-03-30 | Conductive polishing member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57051952A JP2501781B2 (en) | 1982-03-30 | 1982-03-30 | Conductive polishing member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58171264A true JPS58171264A (en) | 1983-10-07 |
| JP2501781B2 JP2501781B2 (en) | 1996-05-29 |
Family
ID=12901206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57051952A Expired - Lifetime JP2501781B2 (en) | 1982-03-30 | 1982-03-30 | Conductive polishing member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2501781B2 (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6099569A (en) * | 1983-11-02 | 1985-06-03 | Mitsubishi Metal Corp | Grindstone |
| EP0414494A2 (en) * | 1989-08-21 | 1991-02-27 | Minnesota Mining And Manufacturing Company | Conductive coated abrasives |
| US5137542A (en) * | 1990-08-08 | 1992-08-11 | Minnesota Mining And Manufacturing Company | Abrasive printed with an electrically conductive ink |
| US5203884A (en) * | 1992-06-04 | 1993-04-20 | Minnesota Mining And Manufacturing Company | Abrasive article having vanadium oxide incorporated therein |
| US5560753A (en) * | 1992-02-12 | 1996-10-01 | Minnesota Mining And Manufacturing Company | Coated abrasive article containing an electrically conductive backing |
| US6979248B2 (en) * | 2002-05-07 | 2005-12-27 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
| US7294667B2 (en) | 2001-02-08 | 2007-11-13 | 3M Innovative Properties Company | Coated abrasive articles containing graphite |
| JP2008114350A (en) * | 2006-11-07 | 2008-05-22 | Disco Abrasive Syst Ltd | Dry type polishing device |
| CN102967632A (en) * | 2012-11-30 | 2013-03-13 | 淄博包钢灵芝稀土高科技股份有限公司 | Method for guiding polishing powder production and product quality control by using electric conductivity |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5336195A (en) * | 1976-09-16 | 1978-04-04 | Citizen Watch Co Ltd | Electronic display device |
-
1982
- 1982-03-30 JP JP57051952A patent/JP2501781B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5336195A (en) * | 1976-09-16 | 1978-04-04 | Citizen Watch Co Ltd | Electronic display device |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6099569A (en) * | 1983-11-02 | 1985-06-03 | Mitsubishi Metal Corp | Grindstone |
| EP0414494A2 (en) * | 1989-08-21 | 1991-02-27 | Minnesota Mining And Manufacturing Company | Conductive coated abrasives |
| US5108463A (en) * | 1989-08-21 | 1992-04-28 | Minnesota Mining And Manufacturing Company | Conductive coated abrasives |
| US5137542A (en) * | 1990-08-08 | 1992-08-11 | Minnesota Mining And Manufacturing Company | Abrasive printed with an electrically conductive ink |
| US5560753A (en) * | 1992-02-12 | 1996-10-01 | Minnesota Mining And Manufacturing Company | Coated abrasive article containing an electrically conductive backing |
| US5203884A (en) * | 1992-06-04 | 1993-04-20 | Minnesota Mining And Manufacturing Company | Abrasive article having vanadium oxide incorporated therein |
| US7294667B2 (en) | 2001-02-08 | 2007-11-13 | 3M Innovative Properties Company | Coated abrasive articles containing graphite |
| US6979248B2 (en) * | 2002-05-07 | 2005-12-27 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
| JP2008114350A (en) * | 2006-11-07 | 2008-05-22 | Disco Abrasive Syst Ltd | Dry type polishing device |
| CN102967632A (en) * | 2012-11-30 | 2013-03-13 | 淄博包钢灵芝稀土高科技股份有限公司 | Method for guiding polishing powder production and product quality control by using electric conductivity |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2501781B2 (en) | 1996-05-29 |
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