JPS5688319A - Method for forming film pattern - Google Patents

Method for forming film pattern

Info

Publication number
JPS5688319A
JPS5688319A JP16601979A JP16601979A JPS5688319A JP S5688319 A JPS5688319 A JP S5688319A JP 16601979 A JP16601979 A JP 16601979A JP 16601979 A JP16601979 A JP 16601979A JP S5688319 A JPS5688319 A JP S5688319A
Authority
JP
Japan
Prior art keywords
mask
laser light
film pattern
metallic coating
upper portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16601979A
Other languages
Japanese (ja)
Inventor
Yoichiro Onishi
Toshio Hida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP16601979A priority Critical patent/JPS5688319A/en
Publication of JPS5688319A publication Critical patent/JPS5688319A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a film pattern having excellent productivity in a complete dry process by providing a mask with a metallic coating film on the upper portion of the metallic coating layer formed on a substrate, and by irradiating the laser light on the mask from the upper portion. CONSTITUTION:The mask 60 comprising the metal coating film 40 such as gold, chromium, and the like and a base material 5 such as glass and the like is arranged on the metallic coating layer 2 such as tin oxide and the like which is deposited on the insulating substrate 1 such as glass and the like. Then, from the upper portion over said mask 60, is scanned and irradiated the laser light 7 which is focused by a required optical system. Since the metallic coating film 40 deposited on the mask 60 reflects the laser light and the base material 5 passes the laser light, the required part in the coating layer 2 is evaporated, and a film pattern 20 which is exactly the same as the mask pattern is formed. In this method the film pattern whose productivity is excellent can be formed by simple process.
JP16601979A 1979-12-19 1979-12-19 Method for forming film pattern Pending JPS5688319A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16601979A JPS5688319A (en) 1979-12-19 1979-12-19 Method for forming film pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16601979A JPS5688319A (en) 1979-12-19 1979-12-19 Method for forming film pattern

Publications (1)

Publication Number Publication Date
JPS5688319A true JPS5688319A (en) 1981-07-17

Family

ID=15823402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16601979A Pending JPS5688319A (en) 1979-12-19 1979-12-19 Method for forming film pattern

Country Status (1)

Country Link
JP (1) JPS5688319A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0473766A (en) * 1990-07-16 1992-03-09 Toshiba Corp Proximity exposure device
WO2000069219A1 (en) * 1999-05-07 2000-11-16 Ibiden Co., Ltd. Hot plate and method of producing the same
JP2008078634A (en) * 2006-08-25 2008-04-03 Semiconductor Energy Lab Co Ltd Method of producing semiconductor device
US20110195352A1 (en) * 2010-02-11 2011-08-11 Do-Young Kim Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0473766A (en) * 1990-07-16 1992-03-09 Toshiba Corp Proximity exposure device
WO2000069219A1 (en) * 1999-05-07 2000-11-16 Ibiden Co., Ltd. Hot plate and method of producing the same
US6967313B1 (en) 1999-05-07 2005-11-22 Ibiden Company, Ltd. Hot plate and method of producing the same
JP2008078634A (en) * 2006-08-25 2008-04-03 Semiconductor Energy Lab Co Ltd Method of producing semiconductor device
US20110195352A1 (en) * 2010-02-11 2011-08-11 Do-Young Kim Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same
US8785081B2 (en) * 2010-02-11 2014-07-22 Samsung Display Co., Ltd. Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same

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