JPS57106083A - Amorphous silicon diode array - Google Patents

Amorphous silicon diode array

Info

Publication number
JPS57106083A
JPS57106083A JP55182352A JP18235280A JPS57106083A JP S57106083 A JPS57106083 A JP S57106083A JP 55182352 A JP55182352 A JP 55182352A JP 18235280 A JP18235280 A JP 18235280A JP S57106083 A JPS57106083 A JP S57106083A
Authority
JP
Japan
Prior art keywords
layer
elements
diode array
doped
formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55182352A
Other languages
Japanese (ja)
Inventor
Mitsuhiko Tashiro
Nobuki Ibaraki
Yoshiko Yoshioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55182352A priority Critical patent/JPS57106083A/en
Publication of JPS57106083A publication Critical patent/JPS57106083A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/868PIN diodes

Abstract

PURPOSE:To prevent leakage of a current between adjoining elements and to facilitate the formation of a minute pattern, by forming a PIN junction nipping an undoping layer and facilitating separation between elements of a diode array. CONSTITUTION:A common electrode 2 is placed on an insulating substrate 1 such as glass, and an amorphous SiN layer, in which phosphorous is doped, is formed thereon. An amorphous SiP layer, in which arsenic is doped, is formed thereon, and an individual electrode 5 is placed thereon. An undoing non-crystalline Si layer 6 is positioned between the nip formed by layers 3 and 4 to form a PIN junction structure, and elements can be separated in a condition that a N layer 2 and the layer 6 are brought to common use. This facilitates the formation of a minute pattern and causes increasing the freedom in selecting an etching liquid.
JP55182352A 1980-12-23 1980-12-23 Amorphous silicon diode array Pending JPS57106083A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55182352A JPS57106083A (en) 1980-12-23 1980-12-23 Amorphous silicon diode array

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55182352A JPS57106083A (en) 1980-12-23 1980-12-23 Amorphous silicon diode array

Publications (1)

Publication Number Publication Date
JPS57106083A true JPS57106083A (en) 1982-07-01

Family

ID=16116803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55182352A Pending JPS57106083A (en) 1980-12-23 1980-12-23 Amorphous silicon diode array

Country Status (1)

Country Link
JP (1) JPS57106083A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130563A (en) * 1982-01-29 1983-08-04 Seiko Epson Corp Manufacture of image sensor
JPS59204266A (en) * 1983-05-06 1984-11-19 Fuji Xerox Co Ltd Thin film reading device
JPS6037178A (en) * 1983-08-09 1985-02-26 Citizen Watch Co Ltd Nonlinear resistance element for display device
JPS60189379A (en) * 1984-03-08 1985-09-26 Matsushita Electric Ind Co Ltd Solid-state image pickup device
JPS60233853A (en) * 1984-05-02 1985-11-20 Oki Electric Ind Co Ltd Light receiving element array
JPS61295659A (en) * 1985-06-24 1986-12-26 Mitsubishi Electric Corp Optical reading device and manufacture thereof
JPS627156A (en) * 1985-07-03 1987-01-14 Mitsubishi Electric Corp Light reader
US4677742A (en) * 1983-01-18 1987-07-07 Energy Conversion Devices, Inc. Electronic matrix arrays and method for making the same
JPS639358A (en) * 1986-06-30 1988-01-16 Fuji Xerox Co Ltd Original reader
US4999693A (en) * 1986-01-06 1991-03-12 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device with a high response speed

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130563A (en) * 1982-01-29 1983-08-04 Seiko Epson Corp Manufacture of image sensor
US4677742A (en) * 1983-01-18 1987-07-07 Energy Conversion Devices, Inc. Electronic matrix arrays and method for making the same
JPS59204266A (en) * 1983-05-06 1984-11-19 Fuji Xerox Co Ltd Thin film reading device
JPS6037178A (en) * 1983-08-09 1985-02-26 Citizen Watch Co Ltd Nonlinear resistance element for display device
JPH0566751B2 (en) * 1983-08-09 1993-09-22 Citizen Watch Co Ltd
JPS60189379A (en) * 1984-03-08 1985-09-26 Matsushita Electric Ind Co Ltd Solid-state image pickup device
JPS60233853A (en) * 1984-05-02 1985-11-20 Oki Electric Ind Co Ltd Light receiving element array
JPS61295659A (en) * 1985-06-24 1986-12-26 Mitsubishi Electric Corp Optical reading device and manufacture thereof
JPS627156A (en) * 1985-07-03 1987-01-14 Mitsubishi Electric Corp Light reader
US4999693A (en) * 1986-01-06 1991-03-12 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device with a high response speed
JPS639358A (en) * 1986-06-30 1988-01-16 Fuji Xerox Co Ltd Original reader

Similar Documents

Publication Publication Date Title
JPS57106083A (en) Amorphous silicon diode array
GB2106419A (en) Growth of structures based on group iv semiconductor materials
JPS55121685A (en) Manufacture of photovoltaic device
JPS5613777A (en) Photoelectric converter
JPS5613779A (en) Photoelectric converter and its preparation
JPS6482620A (en) Manufacture of semiconductor device
US3700976A (en) Insulated gate field effect transistor adapted for microwave applications
JPS6437535A (en) Thin film semiconductor element
JPS55120180A (en) Fabricating method of photovoltaic device
JPS55105340A (en) Semiconductor device and its manufacturing method
JPS5694672A (en) Manufacture of silicon semiconductor element
JPS57116347A (en) Photoconductive material
JPS5691459A (en) Semiconductor device
JPS57173958A (en) Semiconductor ic device
JPS55163879A (en) Manufacture of semiconductor device
JPS5656664A (en) Hybrid integrated circuit
JPS6455853A (en) Semiconductor device and manufacture thereof
JPS55130141A (en) Fabricating method of semiconductor device
JPS6423529A (en) Manufacture of semiconductor device
JPS55105370A (en) Manufacture of charge bonding element
JPS5660059A (en) Manufacture of semiconductor device
JPS6489559A (en) Memory
JPS55113370A (en) Semicondcutor device
JPS54140878A (en) Field effect semiconductor device
JPS5544774A (en) Producing method for semiconductor device