JPS57100429A - Manufacture of structural body - Google Patents
Manufacture of structural bodyInfo
- Publication number
- JPS57100429A JPS57100429A JP56164893A JP16489381A JPS57100429A JP S57100429 A JPS57100429 A JP S57100429A JP 56164893 A JP56164893 A JP 56164893A JP 16489381 A JP16489381 A JP 16489381A JP S57100429 A JPS57100429 A JP S57100429A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- structural body
- structural
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/167—X-ray
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electron Beam Exposure (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803039110 DE3039110A1 (de) | 1980-10-16 | 1980-10-16 | Verfahren fuer die spannungsfreie entwicklung von bestrahlten polymethylmetacrylatschichten |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57100429A true JPS57100429A (en) | 1982-06-22 |
JPH0310089B2 JPH0310089B2 (ja) | 1991-02-12 |
Family
ID=6114528
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56164893A Granted JPS57100429A (en) | 1980-10-16 | 1981-10-15 | Manufacture of structural body |
Country Status (4)
Country | Link |
---|---|
US (1) | US4393129A (ja) |
EP (1) | EP0051166B1 (ja) |
JP (1) | JPS57100429A (ja) |
DE (1) | DE3039110A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59182444A (ja) * | 1983-04-01 | 1984-10-17 | Sumitomo Chem Co Ltd | ポジ型フオトレジストの改良現像液 |
JPH035756A (ja) * | 1989-06-01 | 1991-01-11 | Fuji Photo Film Co Ltd | 水なしps版用現像液 |
US7485412B2 (en) | 2004-06-28 | 2009-02-03 | Canon Kabushiki Kaisha | Ink jet head manufacturing method and ink jet head manufactured by the manufacturing method |
US8017307B2 (en) | 2004-06-28 | 2011-09-13 | Canon Kabushiki Kaisha | Method for manufacturing minute structure, method for manufacturing liquid discharge head, and liquid discharge head |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3221981C2 (de) * | 1982-06-11 | 1985-08-29 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Verfahren zum Herstellen von aus Trennkörpern mit Abschlußplatten bestehenden Trenndüsenelementen zur Trennung gas- oder dampfförmiger Gemische |
DE3408848C2 (de) * | 1984-03-10 | 1987-04-16 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Verfahren zur Herstellung von Vielkanalplatten |
DE3408849C2 (de) * | 1984-03-10 | 1987-04-16 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Verfahren zur Herstellung geschichteter Vielkanalplatten aus Metall für Bildverstärker und Verwendung der so hergestellten Vielkanalplatten |
BR8505473A (pt) * | 1984-11-02 | 1986-08-05 | Kernforschungsz Karlsruhe | Processo para produzir uma pluralidade de elementos conectores deformaveis,processo para produzir cada parte de um conector de duas partes mecanicamente separavel possuindo multiplos elementos conectores elementos conectores deformaveis e conector multiplo mecanicamente separavel para ligacoes eletricas de componentes microeletronicas |
DE3440110C1 (de) * | 1984-11-02 | 1986-05-28 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Verfahren zur Herstellung mechanisch trennbarer Vielfach-Verbindungen fuer den elektrischen Anschluss mikroelektronischer Bauelemente |
DE3440109A1 (de) * | 1984-11-02 | 1986-05-07 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Verfahren zur herstellung verformbarer vielfach-verbindungen fuer den elektrischen anschluss mikroelektronischer bauelemente und nach diesem verfahren hergestellte vielfachverbindungen |
DE3623637A1 (de) * | 1986-07-12 | 1988-01-21 | Kernforschungsz Karlsruhe | Verfahren zur herstellung von mikrostrukturen unterschiedlicher strukturhoehe mittels roentgentiefenlithographie |
DE4024275A1 (de) * | 1990-07-31 | 1992-02-06 | Kernforschungsz Karlsruhe | Verfahren zur herstellung von mikrostrukturen mit bereichsweise unterschiedlicher strukturhoehe |
DE4107851A1 (de) * | 1991-03-12 | 1992-09-17 | Basf Ag | Verfahren zur herstellung von mikroformkoerpern mit hohem aspektverhaeltnis |
DE4141352A1 (de) * | 1991-12-14 | 1993-06-17 | Basf Ag | Verfahren zur herstellung von mikrostrukturkoerpern |
DE4230297C1 (de) * | 1992-09-10 | 1994-03-17 | Kernforschungsz Karlsruhe | Verwendung eines Gießharzes und Verfahren zu dessen Herstellung |
DE4329728A1 (de) * | 1993-09-03 | 1995-03-09 | Microparts Gmbh | Düsenplatte für Fluidstrahl-Druckkopf und Verfahren zu deren Herstellung |
US5959375A (en) * | 1997-09-30 | 1999-09-28 | Garcia; Ernest J. | Device and method for redirecting electromagnetic signals |
DE19926775C2 (de) * | 1999-06-11 | 2003-04-17 | Suisse Electronique Microtech | Verfahren zur Mikrostrukturierung eines Kunststoffs |
US6517665B1 (en) * | 2000-01-25 | 2003-02-11 | Sandia National Laboratories | Liga developer apparatus system |
US6387578B1 (en) | 2000-05-05 | 2002-05-14 | Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College | Post-exposure heat treatment to reduce surface roughness of PMMA surfaces formed by radiation lithography |
US6440639B1 (en) | 2000-09-28 | 2002-08-27 | International Business Machines Corporation | High-aspect ratio resist development using safe-solvent mixtures of alcohol and water |
JP2005074747A (ja) * | 2003-08-29 | 2005-03-24 | Canon Inc | インクジェットヘッドの製造方法およびインクジェットヘッド |
US8434229B2 (en) * | 2010-11-24 | 2013-05-07 | Canon Kabushiki Kaisha | Liquid ejection head manufacturing method |
CN114545745A (zh) * | 2022-03-01 | 2022-05-27 | 重庆邮电大学 | 一种曝光抗蚀剂改性工艺及液相微纳加工设备 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53120430A (en) * | 1977-03-29 | 1978-10-20 | Toshiba Corp | Developing liquid for resist sensitive to radioactive ray |
JPS53123929A (en) * | 1977-04-05 | 1978-10-28 | Tokyo Ouka Kougiyou Kk | Developing liquid for use in radiant ray positive type resist |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE627820A (ja) * | 1962-02-01 | |||
DE1572153B2 (de) * | 1966-06-27 | 1971-07-22 | E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) | Fotopolymerisierbares aufzeichnungsmaterial |
JPS5217901A (en) * | 1975-07-31 | 1977-02-10 | Mitsubishi Chem Ind | Developer for lithographic press plate |
US4055515A (en) * | 1975-12-31 | 1977-10-25 | Borden, Inc. | Developer for printing plates |
US4087569A (en) * | 1976-12-20 | 1978-05-02 | International Business Machines Corporation | Prebaking treatment for resist mask composition and mask making process using same |
US4130425A (en) * | 1976-12-29 | 1978-12-19 | Marcole, Inc. | Subtractive developer for lithographic plates |
JPS5568630A (en) * | 1978-11-17 | 1980-05-23 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Pattern formation |
US4302529A (en) * | 1980-01-08 | 1981-11-24 | Honeywell Inc. | Process for developing a positive electron resist |
-
1980
- 1980-10-16 DE DE19803039110 patent/DE3039110A1/de active Granted
-
1981
- 1981-09-17 US US06/303,094 patent/US4393129A/en not_active Expired - Lifetime
- 1981-10-09 EP EP81108142A patent/EP0051166B1/de not_active Expired
- 1981-10-15 JP JP56164893A patent/JPS57100429A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53120430A (en) * | 1977-03-29 | 1978-10-20 | Toshiba Corp | Developing liquid for resist sensitive to radioactive ray |
JPS53123929A (en) * | 1977-04-05 | 1978-10-28 | Tokyo Ouka Kougiyou Kk | Developing liquid for use in radiant ray positive type resist |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59182444A (ja) * | 1983-04-01 | 1984-10-17 | Sumitomo Chem Co Ltd | ポジ型フオトレジストの改良現像液 |
JPH0326826B2 (ja) * | 1983-04-01 | 1991-04-12 | Sumitomo Chemical Co | |
JPH035756A (ja) * | 1989-06-01 | 1991-01-11 | Fuji Photo Film Co Ltd | 水なしps版用現像液 |
US7485412B2 (en) | 2004-06-28 | 2009-02-03 | Canon Kabushiki Kaisha | Ink jet head manufacturing method and ink jet head manufactured by the manufacturing method |
US8017307B2 (en) | 2004-06-28 | 2011-09-13 | Canon Kabushiki Kaisha | Method for manufacturing minute structure, method for manufacturing liquid discharge head, and liquid discharge head |
Also Published As
Publication number | Publication date |
---|---|
EP0051166A1 (de) | 1982-05-12 |
DE3039110C2 (ja) | 1990-04-12 |
DE3039110A1 (de) | 1982-05-13 |
US4393129A (en) | 1983-07-12 |
EP0051166B1 (de) | 1985-04-03 |
JPH0310089B2 (ja) | 1991-02-12 |
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