JPS5687329A - Method of treatment of semiconductor wafer - Google Patents
Method of treatment of semiconductor waferInfo
- Publication number
- JPS5687329A JPS5687329A JP16497579A JP16497579A JPS5687329A JP S5687329 A JPS5687329 A JP S5687329A JP 16497579 A JP16497579 A JP 16497579A JP 16497579 A JP16497579 A JP 16497579A JP S5687329 A JPS5687329 A JP S5687329A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- reaction
- gas supplier
- gas
- plasma treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16497579A JPS596509B2 (ja) | 1979-12-18 | 1979-12-18 | 半導体ウエハの処理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16497579A JPS596509B2 (ja) | 1979-12-18 | 1979-12-18 | 半導体ウエハの処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5687329A true JPS5687329A (en) | 1981-07-15 |
JPS596509B2 JPS596509B2 (ja) | 1984-02-13 |
Family
ID=15803437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16497579A Expired JPS596509B2 (ja) | 1979-12-18 | 1979-12-18 | 半導体ウエハの処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS596509B2 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5840834U (ja) * | 1981-09-14 | 1983-03-17 | 日本電気株式会社 | 気相成長装置 |
JPS63291422A (ja) * | 1987-05-25 | 1988-11-29 | Tokyo Electron Ltd | アッシング方法 |
US8195693B2 (en) | 2004-12-16 | 2012-06-05 | International Business Machines Corporation | Automatic composition of services through semantic attribute matching |
JP2013159798A (ja) * | 2012-02-02 | 2013-08-19 | Mitsubishi Electric Corp | プラズマcvd装置 |
-
1979
- 1979-12-18 JP JP16497579A patent/JPS596509B2/ja not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5840834U (ja) * | 1981-09-14 | 1983-03-17 | 日本電気株式会社 | 気相成長装置 |
JPS63291422A (ja) * | 1987-05-25 | 1988-11-29 | Tokyo Electron Ltd | アッシング方法 |
US8195693B2 (en) | 2004-12-16 | 2012-06-05 | International Business Machines Corporation | Automatic composition of services through semantic attribute matching |
JP2013159798A (ja) * | 2012-02-02 | 2013-08-19 | Mitsubishi Electric Corp | プラズマcvd装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS596509B2 (ja) | 1984-02-13 |
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