JPS5656662A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPS5656662A JPS5656662A JP13261179A JP13261179A JPS5656662A JP S5656662 A JPS5656662 A JP S5656662A JP 13261179 A JP13261179 A JP 13261179A JP 13261179 A JP13261179 A JP 13261179A JP S5656662 A JPS5656662 A JP S5656662A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- type
- capacitor
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 239000003990 capacitor Substances 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 239000004020 conductor Substances 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To enlarge the effective area by a method wherein an uneven part is provided on the surface of the semiconductor layer and at least one of a transistor, diode, resistance and capacitor is arranged therein when an IC is composed of these components formed in one semiconductor substrate. CONSTITUTION:An N<+> type buried-in region 2 is formed diffusively on the P type semiconductor substrate 1, while an N type layer 9 is grown epitaxially on the whole surface thereof, and the layer 9 is separated, with the region 2 being contained therein, like and island by a P<+> type diffused region 4. Next, within this layer 9 formed like an island are formed the transistor, diode, resistance, capacitor and other semiconductor elements to compose the IC, the process of which is as follows: when the capacitor is taken as an example, first an uneven part is formed on the surface of the layer 9 by etching, then an N<+> type layer 10 which is positioned there to serve as one polar plate is formed diffusively and the whole surface is covered with an SiO2 film 12. Next, a window is opened between the film 12 and a film 6 which is united with the film 12 and is extended to the other side, a metallic conductor 7 is connected to the layer 10, while the other metallic electrode plate 11 is connected to the film 12.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13261179A JPS5656662A (en) | 1979-10-15 | 1979-10-15 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13261179A JPS5656662A (en) | 1979-10-15 | 1979-10-15 | Semiconductor integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5656662A true JPS5656662A (en) | 1981-05-18 |
Family
ID=15085369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13261179A Pending JPS5656662A (en) | 1979-10-15 | 1979-10-15 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5656662A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101015009B1 (en) * | 2008-04-18 | 2011-02-16 | 주식회사 케이이씨 | Capacitor and fabticating method thereof |
-
1979
- 1979-10-15 JP JP13261179A patent/JPS5656662A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101015009B1 (en) * | 2008-04-18 | 2011-02-16 | 주식회사 케이이씨 | Capacitor and fabticating method thereof |
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