JPS558069A - Manufacture of semiconductor - Google Patents

Manufacture of semiconductor

Info

Publication number
JPS558069A
JPS558069A JP8115878A JP8115878A JPS558069A JP S558069 A JPS558069 A JP S558069A JP 8115878 A JP8115878 A JP 8115878A JP 8115878 A JP8115878 A JP 8115878A JP S558069 A JPS558069 A JP S558069A
Authority
JP
Japan
Prior art keywords
type
range
ranges
corrector
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8115878A
Other languages
Japanese (ja)
Inventor
Mitsuharu Morishita
Shiro Iwatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8115878A priority Critical patent/JPS558069A/en
Publication of JPS558069A publication Critical patent/JPS558069A/en
Pending legal-status Critical Current

Links

Landscapes

  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE: For raising integration degree when making IC's, to eliminate epitaxial layer and separation diffusion by making selective diffusion of a plurality of P+- type corrector ranges, an N+-type base range inside said corrector ranges, an N+- type emitter range inside said base range on an N+-type semiconductor substrate.
CONSTITUTION: Selective diffusion is made of a plurality of P+-type corrector ranges 20, an N+-type base range 6, and a P+-type emitter range 7, the latter inside the former in the order of mention, on an N+-type semiconductor substrate 1. Thereafter, an IC having a PNP type transistor by providing a corrector electrode 9, a base electrode 10 and an emitter electrode 11 at ranges 20, 6 and 7 respectively, and fitting a substrate electrode 12 on the reverse side of said substrate 1. Thereby, neither epitaxial growth nor element separation diffusion range is required so that chip can be reduced in size.
COPYRIGHT: (C)1980,JPO&Japio
JP8115878A 1978-07-03 1978-07-03 Manufacture of semiconductor Pending JPS558069A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8115878A JPS558069A (en) 1978-07-03 1978-07-03 Manufacture of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8115878A JPS558069A (en) 1978-07-03 1978-07-03 Manufacture of semiconductor

Publications (1)

Publication Number Publication Date
JPS558069A true JPS558069A (en) 1980-01-21

Family

ID=13738629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8115878A Pending JPS558069A (en) 1978-07-03 1978-07-03 Manufacture of semiconductor

Country Status (1)

Country Link
JP (1) JPS558069A (en)

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